Influence of hydrogen dilution and doping gas on the material properties of plasma-deposited polycrystalline silicon thin films

2020 ◽  
Vol 709 ◽  
pp. 138220 ◽  
Author(s):  
Ji-Eun Hong ◽  
Joon-Ho Oh ◽  
Ka-Hyun Kim
Keyword(s):  
Thin Films ◽  
Material Properties ◽  
Polycrystalline Silicon ◽  
Silicon Thin Films ◽  
Hydrogen Dilution

Hydrogen Dilution Effect on the Crystallinity of Silicon Films Grow by Hot Wire Cell Method

1999 ◽  
Vol 557 ◽  
Author(s):  
M. Ichikawa ◽  
J. Takeshita ◽  
A. Yamada ◽  
M. Konagai
Keyword(s):  
Thin Films ◽  
Growth Rate ◽  
Polycrystalline Silicon ◽  
High Growth ◽  
Silicon Films ◽  
Hot Wire ◽  
Cell Method ◽  
Silicon Thin Films ◽  
Hydrogen Dilution ◽  
Polycrystalline Silicon Films

AbstractA new process, the Hot Wire Cell method, was developed and successfully used to grow polycrystalline silicon thin films at a low temperature and high growth rate. In the Hot Wire Cell method, reactant gases are decomposed as a result of reacting with a heated tungsten filament placed near to a substrate and polycrystalline silicon films can be deposited at a growth rate of 1.2nm/s without hydrogen dilution and 0.9nm/s with the use hydrogen dilution. The film crystallinity changed from amorphous to polycrystalline due to the addition of hydrogen, thus hydrogen dilution was effective for improving film crystallinity. Furthermore, we obtained (220) oriented polycrystalline silicon thin films with a 90% crystal fraction by the use of hydrogen dilution. These results showed that the Hot Wire Cell method is promising for the deposition of device-grade polycrystalline silicon films for photovoltaic applications.

In situ excimer laser irradiation as cleaning tool for solid phase epitaxy of laser crystallized polycrystalline silicon thin films

2013 ◽  
Vol 210 (12) ◽  
pp. 2729-2735 ◽  
Author(s):  
Ingmar Höger ◽  
Thomas Schmidt ◽  
Anja Landgraf ◽  
Martin Schade ◽  
Annett Gawlik ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Polycrystalline Silicon ◽  
Solid Phase ◽  
Solid Phase Epitaxy ◽  
Silicon Thin Films ◽  
Excimer Laser Irradiation

Heat Treatment of Amorphous and Polycrystalline Silicon Thin Films with High-Pressure H2O Vapor

1998 ◽  
Vol 37 (Part 1, No. 8) ◽  
pp. 4254-4257 ◽  
Author(s):  
Toshiyuki Sameshima ◽  
Mitsuru Satoh ◽  
Keiji Sakamoto ◽  
Kentaro Ozaki ◽  
Keiko Saitoh
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
High Pressure ◽  
Polycrystalline Silicon ◽  
Silicon Thin Films

Charge Assisted Deposition of Polycrystalline Silicon Thin Films by Cesium Sputter Ion Beam Deposition

2004 ◽  
Vol 43 (10) ◽  
pp. 6880-6883 ◽  
Author(s):  
Deuk Yeon Lee ◽  
Yong Hwan Kim ◽  
In Kyo Kim ◽  
Dong Joon Choi ◽  
Soon Moon Jeong ◽  
...  
Keyword(s):  
Thin Films ◽  
Polycrystalline Silicon ◽  
Ion Beam ◽  
Ion Beam Deposition ◽  
Silicon Thin Films ◽  
Beam Deposition
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