The role of carbon contamination in voltage linearity and leakage current in high-k metal-insulator-metal capacitors

Journal of Applied Physics ◽

10.1063/1.2973687 ◽

2008 ◽

Vol 104 (5) ◽

pp. 054510 ◽

Author(s):

Bing Miao ◽

Rajat Mahapatra ◽

Nick Wright ◽

Alton Horsfall

Keyword(s):

Leakage Current ◽

Metal Insulator ◽

Carbon Contamination ◽

High K ◽

Metal Insulator Metal

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Experimental evidence for the role of electrodes and oxygen vacancies in voltage nonlinearities observed in high-k metal-insulator-metal capacitors

Applied Physics Letters ◽

10.1063/1.2803221 ◽

2007 ◽

Vol 91 (17) ◽

pp. 172909 ◽

Author(s):

F. El Kamel ◽

P. Gonon ◽

C. Vallée

Keyword(s):

Experimental Evidence ◽

Oxygen Vacancies ◽

Metal Insulator ◽

High K ◽

Metal Insulator Metal

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Experimental Study of 1/f1+α Noise in Transient Leakage Current of Metal–Insulator–Metal With Stacked High-k Polycrystalline Films

IEEE Transactions on Electron Devices ◽

10.1109/ted.2020.2988440 ◽

2020 ◽

Vol 67 (6) ◽

pp. 2503-2509

Author(s):

Hsin-Jyun Lin ◽

Koji Akiyama ◽

Yoshihiro Hirota ◽

Yasushi Akasaka ◽

Genji Nakamura ◽

...

Keyword(s):

Experimental Study ◽

Leakage Current ◽

Polycrystalline Films ◽

Metal Insulator ◽

High K ◽

Metal Insulator Metal

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New insight into tantalum pentoxide Metal-Insulator-Metal (MIM) capacitors: Leakage current modeling, self-heating, reliability assessment and industrial applications

2008 IEEE International Reliability Physics Symposium ◽

10.1109/relphy.2008.4558891 ◽

2008 ◽

Author(s):

V. Martinez ◽

C. Besset ◽

F. Monsieur ◽

D. Ney ◽

L. Montes ◽

...

Keyword(s):

Leakage Current ◽

Reliability Assessment ◽

Industrial Applications ◽

Tantalum Pentoxide ◽

Metal Insulator ◽

Self Heating ◽

Metal Insulator Metal ◽

Insight Into ◽

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Atomic Layer Deposition of High-k and Nanolaminate Dielectrics for Transparent Thin Film Transistors and Metal/Insulator/Metal Tunnel Diodes

ECS Meeting Abstracts ◽

10.1149/ma2011-01/22/1369 ◽

2011 ◽

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Thin Film Transistors ◽

Atomic Layer ◽

Tunnel Diodes ◽

Metal Insulator ◽

Layer Deposition ◽

High K ◽

Metal Insulator Metal

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Study of leakage current in metal–insulator–metal Mg–Al co-doped barium strontium titanate thin films as a function of temperature and applied field

Thin Solid Films ◽

10.1016/j.tsf.2008.04.059 ◽

2008 ◽

Vol 516 (23) ◽

pp. 8441-8446 ◽

Author(s):

M.C. Kao ◽

S.Y. Lee ◽

H.Z. Chen ◽

S.L. Young

Keyword(s):

Leakage Current ◽

Strontium Titanate ◽

Barium Strontium Titanate ◽

Applied Field ◽

Metal Insulator ◽

Barium Strontium ◽

Metal Insulator Metal ◽

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Metal-organic chemical vapor deposition of high-k dielectric Ce–Al–O layers from various metal-organic precursors for metal–insulator–metal capacitor applications

Thin Solid Films ◽

10.1016/j.tsf.2013.03.045 ◽

2013 ◽

Vol 536 ◽

pp. 68-73 ◽

Author(s):

A. Abrutis ◽

M. Lukosius ◽

M. Skapas ◽

S. Stanionyte ◽

V. Kubilius ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Insulator ◽

High K ◽

Metal Insulator Metal ◽

Metal Organic ◽

Organic Precursors ◽

High K Dielectric ◽

Organic Chemical Vapor Deposition

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Examining the role of hydrogen in the electrical performance of in situ fabricated metal-insulator-metal trilayers using an atomic layer deposited Al2O3 dielectric

Applied Physics Letters ◽

10.1063/1.4801979 ◽

2013 ◽

Vol 102 (17) ◽

pp. 173501 ◽

Author(s):

Alexander C. Kozen ◽

Marshall A. Schroeder ◽

Kevin D. Osborn ◽

C. J. Lobb ◽

Gary W. Rubloff

Keyword(s):

Atomic Layer ◽

Electrical Performance ◽

Metal Insulator ◽

Fabricated Metal ◽

Metal Insulator Metal

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WITHDRAWN: Tailored cerium-aluminate high-k dielectric thin films for metal–insulator–metal device applications

Thin Solid Films ◽

10.1016/j.tsf.2009.12.008 ◽

2009 ◽

Author(s):

Rakesh Sohal ◽

Grzegorz Lupina ◽

Peter Zaumseil ◽

Thomas Schroeder

Keyword(s):

Metal Insulator ◽

Dielectric Thin Films ◽

High K ◽

Metal Insulator Metal ◽

Device Applications ◽

High K Dielectric

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Understanding the plane wave excitation of the metal-insulator-metal gap plasmon mode of a nanoribbons periodic array: role of insulator-metal-insulator lattice mode

OSA Continuum ◽

10.1364/osac.2.000389 ◽

2019 ◽

Vol 2 (2) ◽

pp. 389 ◽

Author(s):

Kofi Edee

Keyword(s):

Plasmon Mode ◽

Periodic Array ◽

Wave Excitation ◽

Metal Insulator ◽

Metal Insulator Metal ◽

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Low Leakage Current Al2O3 Metal-Insulator-Metal Capacitors Formed By Atomic Layer Deposition at Optimized Process Temperature and O2 Post Deposition Annealing

ECS Meeting Abstracts ◽

10.1149/ma2016-01/23/1174 ◽

2016 ◽

Keyword(s):

Atomic Layer Deposition ◽

Leakage Current ◽

Atomic Layer ◽

Post Deposition Annealing ◽

Metal Insulator ◽

Low Leakage ◽

Low Leakage Current ◽

Layer Deposition ◽

Metal Insulator Metal ◽

Post Deposition

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