scholarly journals Flame analysis for prediction of thermocouple temperature and quality of sponge iron at TATA steel long products limited

2020 ◽  
Vol 872 ◽  
pp. 012078
Author(s):  
Himanshu Parida ◽  
Brahma Deo ◽  
Puneet Choudhary ◽  
Parimal Malakar ◽  
Susil Kumar Sahoo
Keyword(s):  
Sponge Iron ◽  
Thermocouple Temperature

Comparison of Forced-air Cooling with Static-air Cooling on the Microbiological Quality of Cooked Blue Crabs1

1992 ◽  
Vol 55 (2) ◽  
pp. 104-107
Author(s):  
DEOGHWAN OH ◽  
DOUGLAS L. MARSHALL ◽  
MICHAEL W. MOODY ◽  
J. DAVID BANKSTON
Keyword(s):  
Escherichia Coli ◽  
Fecal Coliform ◽  
Microbiological Quality ◽  
Total Coliform ◽  
Air Cooling ◽  
Plate Counts ◽  
Forced Air ◽  
Thermocouple Temperature ◽  
Microbiological Analyses

Microbiological analyses were made on samples of cooked blue crab taken immediately after debacking and either forced-air cooling or static-air cooling. Forced-air cooling had significantly lower (P<0.05) total coliform and fecal coliform counts, 2.51 and 2.30 log10 MPN/100 g, compared with those of static-air cooling, 2.83 and 2.60 log10 MPN/100 g. All treatments had less than 2.30 log10 MPN/100 g Escherichia coli. Staphylococcus aureus counts in the forced-air cooled crabs were approximately 4-fold lower than counts in static-air cooled crabs. The aerobic plate counts and psychrotrophic plate counts were significantly lower (P<0.01) by 1.04 and 0.81 log10 CFU/g, respectively, by forced-air cooling compared to static-air cooling. Thermocouple temperature readings were used to determine differences in cooling rates between forced-air and static-air cooling. After 1.5 h of cooling, the initial precooled crabmeat temperature of 34°C (93°F) was reduced by forced-air cooling and static-air cooling to 4°C (40°F) and 20°C (67°F), respectively. The rates of cooling using forced-air and static-air were significantly different (P<0.01).

scholarly journals Monitoring Suhu Proses Sangrai Biji Kopi

2017 ◽  
Vol 12 (2) ◽  
pp. 63
Author(s):  
Roza Susanti ◽  
Zas Ressy Aidha ◽  
Fedri Tri Satrio
Keyword(s):  
Temperature Monitoring ◽  
Coffee Bean ◽  
Roasting Process ◽  
Suitable Temperature ◽  
Roasting Temperature ◽  
Thermocouple Temperature

Temperature set of the coffee bean roasting to get the roasting temperature of arabica using thermocouple temperature cencor. Temperature monitoring is controlled by microcontroller. The suitable temperature set of roasting process determine the temperature of three conditions, they are light roast, medium roast, and dark roast. Roasting temperature set of the coffee bean have a goal to get the best quality of coffee bean.

Immunoferritin localization of intracellular antigens in positively stained frozen sections

1978 ◽  
Vol 36 (2) ◽  
pp. 168-169
Author(s):  
K. T. Tokuyasu
Keyword(s):  
Surface Tension ◽  
Water Surface ◽  
Thin Layers ◽  
The Other ◽  
Positive Staining ◽  
Frozen Sections ◽  
The Past ◽  
Ultrathin Frozen Sections ◽  
Definition Of

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).

Lithography below 100 nm

1983 ◽  
Vol 41 ◽  
pp. 96-99
Author(s):  
L. D. Jackel
Keyword(s):  
Spatial Distribution ◽  
Electron Beam ◽  
Electron Scattering ◽  
Electron Beam Lithography ◽  
Substrate Material ◽  
Local Electron ◽  
Electron Dose ◽  
Positive Resist ◽  
Exposure Process

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.

Convergent Beam Electron Diffraction

1978 ◽  
Vol 36 (3) ◽  
pp. 304-315
Author(s):  
G. Lehmpfuhl
Keyword(s):  
Electron Diffraction ◽  
Diffraction Pattern ◽  
Crystal Surface ◽  
Diffraction Spot ◽  
Crystal Thickness ◽  
Large Area ◽  
Electron Microscopic ◽  
Additional Information ◽  
Microscopic Investigations

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.

Sign in / Sign up

Export Citation Format

Share Document