Electrical taste stimulus: current intensity or current density?

1990 ◽  
Vol 15 (3) ◽  
pp. 341-347 ◽  
Author(s):  
D. Ajdukovié
Keyword(s):  
Current Density ◽  
Taste Stimulus ◽  
Current Intensity ◽  
Stimulus Current

scholarly journals Effect of current on biofilm-electrode reactor coupled with sulfur autotrophic denitrification process (BER-SAD) for nitrate removal from wastewater

2021 ◽  
Vol 267 ◽  
pp. 02021
Author(s):  
Hengyuan Liu ◽  
Chenhe Zhang
Keyword(s):  
Removal Efficiency ◽  
Current Density ◽  
Nitrate Removal ◽  
Great Influence ◽  
Current Intensity ◽  
Autotrophic Denitrification ◽  
Nitrite Production ◽  
Coupled Process ◽  
Denitrification Process

The biofilm-electrode reactor coupled with sulfur autotrophic denitrification process (BER-SAD) was used to remove nitrate in groundwater, and the effect of current intensity on the denitrification characteristics of the coupled process was explored. Current intensity had a great influence on the denitrification effect of the coupled process, the maximum nitrate removal efficiency of 99.9% and lowest nitrite production were gained under the optimum current density of 100 mA. Moreover, the accumulation concentration of SO42- increased gradually with the increase of current intensity. With the increase of current intensity, the proportion of hydrogen autotrophic denitrification decreased, while the proportion of sulfur autotrophic denitrification increased.

scholarly journals Electrochemical oxidation and electroanalysis of paracetamol on a boron-doped diamond anode material in aqueous electrolytes

2021 ◽  
Author(s):  
Kouakou Etienne Kouadio ◽  
Ollo Kambiré ◽  
Konan Sylvestre Koffi ◽  
Lassine Ouattara
Keyword(s):  
Electrolyte Solution ◽  
Current Density ◽  
Supporting Electrolyte ◽  
Current Intensity ◽  
Applied Current ◽  
Boron Doped Diamond ◽  
Preparative Electrolysis ◽  
Applied Current Density ◽  
Bdd Electrode ◽  
Boron Doped

Electrochemical oxidation of paracetamol on boron-doped diamond (BDD) anode has been studied by cyclic voltammetry and preparative electrolysis. Quantification of paracetamol during electrolysis has been mainly realized by differential pulse voltammetry technique in the Britton-Robinson buffer solutions used as the supporting electrolyte. Various parameters such as current intensity, nature of the supporting electrolyte, temperature, and initial concentration of paracetamol have been investigated. The electrochemical characterization by the outer sphere Fe(III)/Fe(II) redox couple has also been performed, showing the metallic character of BDD electrode. The obtained linear dependency of the oxidation peak current intensity and paracetamol concentration indicates that BDD electrode can be used as an electrochemical sensor for the detection and quantification of paracetamol. The investi­gation of paracetamol degradation during preparative electrolysis showed that: (i) the degradation rate of paracetamol increases with increase of current intensity applied; (ii) for the initial concentrations of 10, 6 and 1 mM of paracetamol, its oxidation rate reaches 60, 78 and 99 % respectively, after 1 h of electrolysis in 0.3 M H2SO4 (pH 0.6) at applied current density of 70 mA cm-2; (iii) at temperatures of electrolyte solution of 28, 55 and 75 °C, paracetamol oxidation rate reached 85, 92 and 97 % respectively, after 2 h at applied current density of 70 mA cm2. From the investigation of the effect of pH value of electrolyte solution, it appears that oxidation of paracetamol is more favorable in acidic solution at pH 3 than solutions of higher pH values.

scholarly journals Comparison of Half-Band and Full-Band Electrodes for Intracochlear Electrical Stimulation

1993 ◽  
Vol 102 (5) ◽  
pp. 363-367 ◽  
Author(s):  
Shi-Ang Xu ◽  
Jin Xu ◽  
Ken I. McAnally ◽  
Graeme M. Clark
Keyword(s):  
Electrical Stimulation ◽  
Brain Stem ◽  
Current Density ◽  
Neural Response ◽  
Scala Tympani ◽  
Longitudinal Band ◽  
Auditory Brain Stem ◽  
Stimulus Current ◽  
Full Band ◽  
Stimulating Electrodes

It was hypothesized that intracochlear stimulating electrodes oriented toward the modiolus would require a lower stimulus current to elicit a threshold neural response than longitudinal band electrodes. Electrically evoked auditory brain stem responses (EABRs) and electrode impedances were recorded with full-band and oriented half-band scala tympani electrodes in anesthetized, deafened cats. To elicit a threshold EABR, the stimulus current required for stimulation through half-band electrodes oriented toward the modiolus was not significantly different from the current required for stimulation through full-band electrodes. The impedances of full-band electrodes were significantly lower than those of half-band electrodes. Considering the significantly higher impedance and current density of half-band electrodes in comparison to full-band electrodes, as well as the critical orientation of half-band electrodes during implantation, we believe that full-band electrodes have advantages over half-band electrodes for scala tympani implantation.

An algorithm to optimize ECoG stimulus current patterns while constraining local current density across the entire brain

2017 ◽  
Vol 10 (4) ◽  
pp. e38 ◽  
Author(s):  
Seyhmus Guler ◽  
Moritz Dannhauer ◽  
Biel Roig-Solvas ◽  
Alexis Gkogkidis ◽  
Rob MacLeod ◽  
...  
Keyword(s):  
Current Density ◽  
Local Current Density ◽  
Entire Brain ◽  
Stimulus Current ◽  
Local Current

Activated Prominences; Mechanisms for Activation and Eruption

1979 ◽  
Vol 44 ◽  
pp. 307-313
Author(s):  
D.S. Spicer
Keyword(s):  
Pressure Gradient ◽  
Density Gradient ◽  
Current Density ◽  
Convective Instability ◽  
Tearing Mode ◽  
Magnetic Shear ◽  
Long Wavelength ◽  
Ideal Mhd ◽  
Gradient Change ◽  
Accelerated Particles

A possible relationship between the hot prominence transition sheath, increased internal turbulent and/or helical motion prior to prominence eruption and the prominence eruption (“disparition brusque”) is discussed. The associated darkening of the filament or brightening of the prominence is interpreted as a change in the prominence’s internal pressure gradient which, if of the correct sign, can lead to short wavelength turbulent convection within the prominence. Associated with such a pressure gradient change may be the alteration of the current density gradient within the prominence. Such a change in the current density gradient may also be due to the relative motion of the neighbouring plages thereby increasing the magnetic shear within the prominence, i.e., steepening the current density gradient. Depending on the magnitude of the current density gradient, i.e., magnetic shear, disruption of the prominence can occur by either a long wavelength ideal MHD helical (“kink”) convective instability and/or a long wavelength resistive helical (“kink”) convective instability (tearing mode). The long wavelength ideal MHD helical instability will lead to helical rotation and thus unwinding due to diamagnetic effects and plasma ejections due to convection. The long wavelength resistive helical instability will lead to both unwinding and plasma ejections, but also to accelerated plasma flow, long wavelength magnetic field filamentation, accelerated particles and long wavelength heating internal to the prominence.

Microstructural characterization of YBa2Cu3O7-x thin films formed by metalorganic CVD

1991 ◽  
Vol 49 ◽  
pp. 1080-1081
Author(s):  
P. Lu ◽  
W. Huang ◽  
C.S. Chern ◽  
Y.Q. Li ◽  
J. Zhao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Critical Current Density ◽  
Critical Current ◽  
Current Density ◽  
Film Growth ◽  
Chemical Vapor ◽  
Microstructural Characterization ◽  
Ion Milling ◽  
Conventional Grinding

The YBa2Cu3O7-x thin films formed by metalorganic chemical vapor deposition(MOCVD) have been reported to have excellent superconducting properties including a sharp zero resistance transition temperature (Tc) of 89 K and a high critical current density of 2.3x106 A/cm2 or higher. The origin of the high critical current in the thin film compared to bulk materials is attributed to its structural properties such as orientation, grain boundaries and defects on the scale of the coherent length. In this report, we present microstructural aspects of the thin films deposited on the (100) LaAlO3 substrate, which process the highest critical current density.Details of the thin film growth process have been reported elsewhere. The thin films were examined in both planar and cross-section view by electron microscopy. TEM sample preparation was carried out using conventional grinding, dimpling and ion milling techniques. Special care was taken to avoid exposure of the thin films to water during the preparation processes.

Analytical electron microscopy of grain boundaries in Al-Cu metallizations

1992 ◽  
Vol 50 (2) ◽  
pp. 1684-1685
Author(s):  
J. R. Michael ◽  
A. D. Romig ◽  
D. R. Frear
Keyword(s):  
Electron Microscopy ◽  
Integrated Circuits ◽  
Failure Mode ◽  
Current Density ◽  
Thermal History ◽  
Analytical Electron Microscopy ◽  
Cu Metallization ◽  
Analytical Electron ◽  
Interconnect Lines

Al with additions of Cu is commonly used as the conductor metallizations for integrated circuits, the Cu being added since it improves resistance to electromigration failure. As linewidths decrease to submicrometer dimensions, the current density carried by the interconnect increases dramatically and the probability of electromigration failure increases. To increase the robustness of the interconnect lines to this failure mode, an understanding of the mechanism by which Cu improves resistance to electromigration is needed. A number of theories have been proposed to account for role of Cu on electromigration behavior and many of the theories are dependent of the elemental Cu distribution in the interconnect line. However, there is an incomplete understanding of the distribution of Cu within the Al interconnect as a function of thermal history. In order to understand the role of Cu in reducing electromigration failures better, it is important to characterize the Cu distribution within the microstructure of the Al-Cu metallization.

Microstructure Development in a High Current Density NbTi Superconducting Composite

1985 ◽  
Vol 43 ◽  
pp. 186-189
Author(s):  
P. J. Lee ◽  
D. C. Larbalestier
Keyword(s):  
Current Density ◽  
High Current Density ◽  
Cold Drawing ◽  
Heat Treatments ◽  
Grain Structure ◽  
Fine Grain ◽  
Boundary Film ◽  
Quantitative Basis ◽  
Cold Worked ◽  
Very High

Several features of the metallurgy of superconducting composites of Nb-Ti in a Cu matrix are of interest. The cold drawing strains are generally of order 8-10, producing a very fine grain structure of diameter 30-50 nm. Heat treatments of as little as 3 hours at 300 C (∼ 0.27 TM) produce a thin (1-3 nm) Ti-rich grain boundary film, the precipitate later growing out at triple points to 50-100 nm dia. Further plastic deformation of these larger a-Ti precipitates by strains of 3-4 produces an elongated ribbon morphology (of order 3 x 50 nm in transverse section) and it is the thickness and separation of these precipitates which are believed to control the superconducting properties. The present paper describes initial attempts to put our understanding of the metallurgy of these heavily cold-worked composites on a quantitative basis. The composite studied was fabricated in our own laboratory, using six intermediate heat treatments. This process enabled very high critical current density (Jc) values to be obtained. Samples were cut from the composite at many processing stages and a report of the structure of a number of these samples is made here.

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