Structural, optical and sensing properties of ZnS thick films deposited by RF magnetron sputtering technique at different powers

2020 ◽  
Vol 17 (3) ◽  
pp. 381-388
Author(s):  
Bassam Abdallah ◽  
Mahmoud Kakhia ◽  
Walaa Zetoune
Keyword(s):  
Magnetron Sputtering ◽  
Thick Films ◽  
Rf Magnetron Sputtering ◽  
Film Structure ◽  
Content Type ◽  
X Ray ◽  
Sensing Properties ◽  
Edx Analysis ◽  
Cubic Structure ◽  
Zns Films

Purpose This study aims to carry out the deposition of zinc sulfide (ZnS) thick films on glass and silicon (100) substrates using radio frequency (RF) magnetron sputtering method at different powers. Film structure has been analyzed by X-ray diffraction (XRD); the patterns showed that the films possesses a cubic structure with (111) preferred orientation. Photoluminance (PL) intensity of the films has been related to the crystallinity, which is varied with the power. Design/methodology/approach Scanning electron microscope (SEM) images have been used to discover the films’ morphology. The stoichiometry has been confirmed by energy dispersive X-ray spectroscopy (EDX) analysis. MicroRaman spectroscopy has been used to validate the film structure. Gas-sensing studies were carried out by means of a static gas chamber to sense acetone, ethanol, methanol, H2O and NH3 vapor in air ambient. Findings ZnS has a stoichiometric and cubic structure. The band gaps and photoluminance intensity of the films are correlated with the crystallinity, which is varied with the power. The EDX analysis approved the stoichiometry of the prepared films. Acetone, ethanol, humidity (H2O), methanol and NH3 vapor gases were used to justify the sensing properties at 25°C of the thickest ZnS film. Originality/value High-quality ZnS films have been obtained at different powers without annealing. Gases sensing properties at 25°C are justified for deposited ZnS films using acetone, ethanol, humidity (H2O), methanol and NH3 vapor gases. It reveals good response for NH3 and humidity vapors at room temperature; the sensing functioning at this temperature was attractive in recent research.

Deposition of ZnS films by RF magnetron sputtering: Structural and optical properties using Z-scan technique

2019 ◽  
Vol 33 (29) ◽  
pp. 1950348 ◽  
Author(s):  
B. Abdallah ◽  
M. D. Zidan ◽  
A. Allahham
Keyword(s):  
Optical Properties ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Optical Transmittance ◽  
Film Structure ◽  
Sem Images ◽  
X Ray ◽  
Glass Substrates ◽  
Xrd Patterns ◽  
Zns Films

Deposition of zinc sulfide (ZnS) thin films on Si (1 0 0) and glass substrates has been performed using RF magnetron sputtering method. Film structure has been analyzed by X-ray Diffraction (XRD), while the scanning electron microscope (SEM) images have been used to explore the film morphology. FTIR and Raman spectroscopies have been used to confirm the film composition. The stoichiometry has been verified by Energy dispersive X-ray spectroscopy (EDX) technique. The XRD patterns have indicated that the films possess a polycrystalline nanocrystallite cubic structure. The optical properties of the grown films were characterized by optical transmittance measurements (UV–Vis). The deduced energy bandgaps of the films show an increase from 3.75 eV to 3.88 eV with the power source changes from 90 W to 125 W. Furthermore, Z-scan technique (CW diode laser [Formula: see text] nm) was employed to estimate the nonlinear optical absorption of the prepared ZnS films.

scholarly journals Effects of Long Durations of RF–Magnetron Sputtering Deposition of Hydroxyapatite on Titanium Dental Implants

2021 ◽  
Author(s):  
Ihab Nabeel Safi ◽  
Basima Mohammed Ali Hussein ◽  
Hikmat J. Aljudy ◽  
Mustafa S. Tukmachi
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Magnetron Sputtering ◽  
Dental Implants ◽  
Substrate Surface ◽  
Rf Magnetron Sputtering ◽  
P Value ◽  
Edx Analysis ◽  
Significant Difference ◽  
Scanning Electron

Abstract Objectives Dental implant is a revolution in dentistry; some shortages are still a focus of research. This study use long duration of radiofrequency (RF)–magnetron sputtering to coat titanium (Ti) implant with hydroxyapatite (HA) to obtain a uniform, strongly adhered in a few micrometers in thickness. Materials and Methods Two types of substrates: discs and root form cylinders were prepared using a grade 1 commercially pure (CP) Ti rod. A RF–magnetron sputtering device was used to coat specimens with HA. Magnetron sputtering was set at 150 W for 22 hours at 100°C under continuous argon gas flow and substrate rotation at 10 rpm. Coat properties were evaluated via field emission scanning electron microscopy (FESEM), scanning electron microscopy–energy dispersive X-ray (EDX) analysis, atomic force microscopy, and Vickers hardness (VH). Student’s t-test was used. Results All FESEM images showed a homogeneous, continuous, and crack-free HA coat with a rough surface. EDX analysis revealed inclusion of HA particles within the substrate surface in a calcium (Ca)/phosphorus (P) ratio (16.58/11.31) close to that of HA. Elemental and EDX analyses showed Ca, Ti, P, and oxygen within Ti. The FESEM views at a cross-section of the substrate showed an average of 7 µm coat thickness. Moreover, these images revealed a dense, compact, and uniform continuous adhesion between the coat layer and the substrate. Roughness result indicated highly significant difference between uncoated Ti and HA coat (p-value < 0.05). A significant improvement in the VH value was observed when coat hardness was compared with the Ti substrate hardness (p-value < 0.05). Conclusion Prolonged magnetron sputtering successfully coat Ti dental implants with HA in micrometers thickness which is well adhered essentially in excellent osseointegration.

Substrate Temperature and La0.9Sr0.1Ga0.8Mg0.2O3-δ Electrolyte Film Growth by Radio Frequency Magnetron Sputtering

2015 ◽  
Vol 833 ◽  
pp. 127-133
Author(s):  
Jie Yu ◽  
Jie Xing ◽  
Xiu Hua Chen ◽  
Wen Hui Ma ◽  
Rui Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Radio Frequency ◽  
Film Growth ◽  
Rf Magnetron Sputtering ◽  
X Ray Diffraction ◽  
X Ray ◽  
Electrolyte Film ◽  
Porous Anode

La0.9Sr0.1Ga0.8Mg0.2O3-δ (LSGM) electrolyte thin films were fabricated on La0.7Sr0.3Cr0.5Mn0.5O2.75 (LSCM) porous anode substrates by Radio Frequency (RF) magnetron sputtering method. The compatibility between LSGM and LSCM was examined. Microstructures of LSGM thin films fabricated were observed by scanning electron microscope (SEM). The effect of substrate temperature on LSGM thin films was clarified by X-ray Diffraction (XRD). Deposition rate increases firstly at the range of 50°C~150°C, and then decreases at the range of 150°C ~300°C. After annealing, perovskite structure with the same growth orientation forms at different substrate temperature. Crystallite size decreases at first, to the minimum point at 150°C, then increases as substrate temperature rises.

scholarly journals Synthesis, Characterization, and NH3 Sensing Properties of (Zn0.7 Mn0.3-x Cex Fe2O4) Nano-Ferrite

2021 ◽  
Vol 2114 (1) ◽  
pp. 012040
Author(s):  
Laith Saheb ◽  
Tagreed M. Al-Saadi
Keyword(s):  
Recovery Time ◽  
Particle Distribution ◽  
X Ray Diffraction ◽  
X Ray ◽  
Sensing Properties ◽  
Auto Combustion ◽  
Cubic Structure ◽  
Sensing Characteristics ◽  
Combustion Technique ◽  
Higher Sensitivity

Abstract This study includes the preparation of novel nano ferrite (Zn0.7 Mn0.3-x Cex Fe2O4) by using the auto combustion technique. For the following molar values, the percentage x was calculated: 0.0, 0.05, 0.1, 0.15, 0.2, 0.25, and 0.3. The nano-ferrite was calcined for 2 hours at 500°C. The energy dispersive x-ray spectroscopy (EDX), X-ray diffraction (XRD) and field emission scanning electron microscopy FE-SEM was used to examine structural, morphological, and sensing properties. The spinel cubic structure was revealed by XRD findings. The particle distribution was shown to contain voids by FE-SEM. The testing of sensing characteristics to NH3 gas indicated that the synthesized nano-ferrite has a small response time ranging from (15.3-25.2) s as well as a small recovery time between (36-58.5) s, also has a higher sensitivity of about 72.23%.

Differences between (103) and (002) X-ray diffraction characteristics of nanostructured AZO films deposited by RF magnetron sputtering

2019 ◽  
Vol 372 ◽  
pp. 442-450 ◽  
Author(s):  
I. Cosme ◽  
S. Vázquez-y-Parraguirre ◽  
O. Malik ◽  
S. Mansurova ◽  
N. Carlos ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
X Ray Diffraction ◽  
X Ray

The piezoresistive properties research of SiC thin films prepared by RF magnetron sputtering

2019 ◽  
Vol 33 (15) ◽  
pp. 1950152 ◽  
Author(s):  
Jing Wu ◽  
Xiaofeng Zhao ◽  
Chunpeng Ai ◽  
Zhipeng Yu ◽  
Dianzhong Wen
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Cantilever Beam ◽  
Photoelectron Spectroscopy ◽  
Film Surface ◽  
Rf Magnetron Sputtering ◽  
Micro Electro Mechanical System ◽  
Gauge Factor ◽  
X Ray ◽  
Sputtering Power

To research the piezoresistive properties of SiC thin films, a testing structure consisting of a cantilever beam, SiC thin films piezoresistors and a Cr/Pt electrode is proposed in this paper. The chips of testing structure were fabricated by micro-electro-mechanical system (MEMS) technology on a silicon wafer with [Formula: see text]100[Formula: see text] orientation, in which SiC thin films were deposited by using radio-frequency (13.56 MHz) magnetron sputtering method. The effect of sputtering power, annealing temperature and time on the microstructure and morphology of the SiC thin films were investigated by the X-ray diffraction (XRD) and scanning electron microscopy (SEM). It indicates that a good continuity and uniform particles on the SiC thin film surface can be achieved at sputtering power of 160 W after annealing. To verify the existence of Si–C bonds in the thin films, X-ray photoelectron spectroscopy (XPS) was used. Meanwhile, the piezoresistive properties of SiC thin films piezoresistors were measured using the proposed cantilever beam. The test result shows that it is possible to achieve a gauge factor of 35.1.

Properties of Nano-ZnO Films Deposited by RF Magnetron Sputtering for SAW Biosensors

2011 ◽  
Vol 418-420 ◽  
pp. 293-296
Author(s):  
Qiu Yun Fu ◽  
Peng Cheng Yi ◽  
Dong Xiang Zhou ◽  
Wei Luo ◽  
Jian Feng Deng
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Time ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Zno Film ◽  
Nano Zno ◽  
Axis Orientation ◽  
X Ray

Abstract. In this article, nano-ZnO films were deposited on SiO2/Si (100) substrates by RF (radio frequency) magnetron sputtering using high purity (99.99%) ZnO target. The effects of deposition time and annealing temperature have been investigated. XRD (X-ray diffraction) and FSEM (Field Emission Scanning Electron Microscopy) were employed to characterize the quality of the films. The results show that the ZnO film with thickness of 600nm annealed at 900°C has higher quality of both C-axis orientation and crystallization. And for the Zone film with thickness of 300nm annealed at 850°C, the quality of both C-axis orientation and crystallization is higher than that annealed at 900°C and 950°C.

scholarly journals The Effects of Annealing Temperature on the Structural Properties of ZrB2 Films Deposited via Pulsed DC Magnetron Sputtering

Coatings ◽  
2019 ◽  
Vol 9 (4) ◽  
pp. 253 ◽  
Author(s):  
Wei-Chun Chen ◽  
Chao-Te Lee ◽  
James Su ◽  
Hung-Pin Chen
Keyword(s):  
Electron Microscopy ◽  
Magnetron Sputtering ◽  
Structural Properties ◽  
Photoelectron Spectroscopy ◽  
Annealing Temperature ◽  
High Vacuum ◽  
Film Structure ◽  
Dc Magnetron Sputtering ◽  
Cross Sectional ◽  
X Ray

Zirconium diboride (ZrB2) thin films were deposited on a Si(100) substrate using pulsed direct current (dc) magnetron sputtering and then annealed in high vacuum. In addition, we discussed the effects of the vacuum annealing temperature in the range of 750 to 870 °C with flowing N2 on the physical properties of ZrB2 films. The structural properties of ZrB2 films were investigated with X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The XRD patterns indicated that the ZrB2 films annealed at various temperatures exhibited a highly preferred orientation along the [0001] direction and that the residual stress could be relaxed by increasing the annealing temperature at 870 °C in a vacuum. The surface morphology was smooth, and the surface roughness slightly decreased with increasing annealing temperature. Cross-sectional TEM images of the ZrB2/Si(100) film annealed at 870 °C reveals the films were highly oriented in the direction of the c-axis of the Si substrate and the film structure was nearly stoichiometric in composition. The XPS results show the film surfaces slightly contain oxygen, which corresponds to the binding energy of Zr–O. Therefore, the obtained ZrB2 film seems to be quite suitable as a buffer layer for III-nitride growth.

Application of V2O5 in Thin Film Microbatteries Prepared by RF Magnetron Sputtering

2009 ◽  
Vol 79-82 ◽  
pp. 931-934 ◽  
Author(s):  
Liang Tang Zhang ◽  
Jie Song ◽  
Quan Feng Dong ◽  
Sun Tao Wu
Keyword(s):  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Unit Area ◽  
Rf Magnetron Sputtering ◽  
Micro Electro Mechanical System ◽  
X Ray Diffraction ◽  
X Ray ◽  
Mems Technology ◽  
Surface Morphologies ◽  
Sputtering System

The polycrystalline V2O5 films as the anode in V2O5 /LiPON /LiCoO2 lithium microbattary were prepared by RF magnetron sputtering system. The V2O5 films’ crystal structures, surface morphologies and composition were characterized and analyzed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The microbatteries were fabricated by micro electro-mechanical system (MEMS) technology. The battery active unit area is 500μm×500μm, and the thickness of V2O5, LiPON and LiCoO2 films was estimated to be 200, 610, and 220nm, respectively. The discharge volumetric capacity is between 9.36μAhcm-2μm-1 and 9.63μAhcm-2μm-1 after 40 cycles.

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