Influence of oxygen concentration on ethylene removal efficiency

2017 ◽  
Author(s):  
T. Motodate ◽  
K. Takahashi ◽  
K. Takaki ◽  
S. Koide
Keyword(s):  
Oxygen Concentration ◽  
Removal Efficiency ◽  
Ethylene Removal

Study on the Experiments of Flue Gas Denitrification and Desulfurization Using Nitric Acid Solution

2008 ◽  
Author(s):  
Bao-Ming Sun ◽  
Shui-E Yin ◽  
Zhong-Li Wang
Keyword(s):  
Nitric Acid ◽  
Oxygen Concentration ◽  
Removal Efficiency ◽  
Flue Gas ◽  
Nitric Acid Concentration ◽  
Nox Removal ◽  
No Removal ◽  
Nox Removal Efficiency ◽  
The Individual ◽  
So2 Concentration

The present study attempts to take nitric acid as absorbent to clean up SO2 and NO gases simultaneously from the simulated flue gas in the lab-scale bubbling reactor, this study was divide into the individual DeNOx experiments and the combined DeSOx/DeNOx experiments: the individual DeNOx experiments were carried out to examine the effect of various operating parameters such as input NO concentration, nitric acid concentration, oxygen concentration input SO2 concentration, adding KMnO4 as additive and taking NaOH as the secondary absorption processes on the SO2 and NOx removal efficiencies at room temperature, the results of the individual DeNOx show that NO removal efficiency of 70%–95% were achieved under optimized conditions. NO removal efficiency increased with the increasing nitric acid concentration and increased by adding KMnO4 into the absorbent as additive as well. The removal efficiency of NO can reach 95% when using the two-step integrated processes of (HNO3+KMnO4)-NaOH, the absorption solution of 50% nitric acid, 400ppm of input NO concentration. 0.5% oxygen concentration and without SO2 in the simulated flue gas. No improvement on the NOx removal efficiency was observed with the increasing of KMnO4 and NaOH concentration in the scrubbing solution. The results of the combined DeSOx/DeNOx experiments show that the maximum DeNOx and DeSOx efficiencies ranged from 36.6% to 81% and from 99.4% to 100.0%, respectively. The prime parameters affecting the NOx removal efficiency are the oxygen concentration and the input SO2 concentration.

scholarly journals Photodegradation of HCFC-22 Using Microwave Discharge Electrodeless Mercury Lamp with TiO2Photocatalyst Balls

2014 ◽  
Vol 2014 ◽  
pp. 1-6 ◽  
Author(s):  
Seong-Gyu Seo ◽  
Young-Kwon Park ◽  
Sun-Jae Kim ◽  
Heon Lee ◽  
Sang-Chul Jung
Keyword(s):  
Oxygen Concentration ◽  
Removal Efficiency ◽  
Residence Time ◽  
Hybrid System ◽  
Microwave Power ◽  
Microwave Discharge ◽  
Emission Lines ◽  
Mercury Lamp ◽  
Inlet Concentration ◽  
Decomposition Efficiency

The photodegradation of chlorodifluoromethane (HCFC-22) was investigated using microwave/UV/TiO2photocatalysts hybrid system. The microwave discharge electrodeless mercury lamp (MDEML) used in this study showed mainly atomic Hg emission lines at 253.7 nm. The decomposition efficiency of HCFC-22 increased with decreasing inlet concentration and with increasing reactor residence time. The removal efficiency increased with increasing microwave power on every oxygen concentration. The highest degradation efficiency was obtained when both TiO2balls and MDEML were used.

Influence of oxygen concentration on ethylene removal using dielectric barrier discharge

2017 ◽  
Vol 57 (1S) ◽  
pp. 01AG04 ◽  
Author(s):  
Katsuyuki Takahashi ◽  
Takuma Motodate ◽  
Koichi Takaki ◽  
Shoji Koide
Keyword(s):  
Dielectric Barrier Discharge ◽  
Oxygen Concentration ◽  
Barrier Discharge ◽  
Dielectric Barrier ◽  
Ethylene Removal

Effect of Cl in Gate Oxidation

1997 ◽  
Vol 477 ◽  
Author(s):  
P. W. Mertens ◽  
M. J. McGeary ◽  
M. Schaekers ◽  
H. Sprey ◽  
B. Vermeire ◽  
...  
Keyword(s):  
Oxygen Concentration ◽  
Removal Efficiency ◽  
Active Component ◽  
Carrier Lifetime ◽  
Metal Removal ◽  
Oxalyl Chloride ◽  
State Of The Art ◽  
High Quality ◽  
Gate Oxides ◽  
Poly Silicon

ABSTRACTThe present study reviews the use of Cl in gate oxidation furnaces for growth of high quality gate oxides with a thickness in the range of 2 to 15 1nm. The following, commercially available, “state of the art” Cl-precursors have been tested: 1,1,1- trichloroethane (TCA), trans-1,2-dichloroethylene (DCE) and oxalyl chloride (OC). Different parameters were evaluated including: metal removal efficiency, poly-silicon haze, Fe bulk incorporation, carrier lifetime and Cl-incorporation in the oxide. Cl2 was identified as the active component in Cl-oxidation. As a consequence, OC was identified as being the most efficient Cl-source. In particular, OC is the most suited Cl-source for applications requiring reduced oxygen concentration, such as the manufacturing of ultra thin gate oxides.

Effect of Cl in Gate Oxidation

1997 ◽  
Vol 473 ◽  
Author(s):  
P. W. Mertens ◽  
M. J. McGeary ◽  
M. Schaekers ◽  
H. Sprey ◽  
B. Vermeire ◽  
...  
Keyword(s):  
Oxygen Concentration ◽  
Removal Efficiency ◽  
Active Component ◽  
Carrier Lifetime ◽  
Metal Removal ◽  
Oxalyl Chloride ◽  
State Of The Art ◽  
High Quality ◽  
Gate Oxides ◽  
Poly Silicon

ABSTRACTThe present study reviews the use of Cl in gate oxidation furnaces for growth of high quality gate oxides with a thickness in the range of 2 to 15 nm. The following, commercially available, “state of the art” Cl-precursors have been tested: 1,1,1- trichloroethane (TCA), irons-1,2-dichloroethylene (DCE) and oxalyl chloride (OC). Different parameters were evaluated including: metal removal efficiency, poly-silicon haze, Fe bulk incorporation, carrier lifetime and Cl-incorporation in the oxide. Cl2was identified as the active component in Cl-oxidation. As a consequence, OC was identified as being the most efficient Cl-source. In particular, OC is the most suited Cl-source for applications requiring reduced oxygen concentration, such as the manufacturing of ultra thin gate oxides.

Control of Hg0 Re-Emission from Simulated Wet Flue Gas Desulfurization Liquors by Sodium Dithiocarbamate

2012 ◽  
Vol 610-613 ◽  
pp. 1473-1477 ◽  
Author(s):  
Chuan Min Chen ◽  
Li Xing Jiang ◽  
Song Tao Liu ◽  
Yu Ze Jiang
Keyword(s):  
Oxygen Concentration ◽  
Removal Efficiency ◽  
Flue Gas ◽  
Industrial Application ◽  
Inhibition Efficiency ◽  
Operating Conditions ◽  
Flue Gas Desulfurization ◽  
Mercury Removal ◽  
Ph Values ◽  
Oxygen Concentrations

Secondary atmospheric pollutions may result from wet flue gas desulfurization (WFGD) systems caused by the reduction of Hg2+to Hg0and lead to a damping of the co-benefit mercury removal efficiency by WFGD systems. The effects of the operating conditions, which included the pH, temperature, and oxygen concentrations, on Hg0re-emission inhibition efficiency by DTCR from WFGD liquors was carried out. The established data reflected an outstanding performance on the Hg0re-emission inhibition from the simulated WFGD liquors by adding DTCR. Our data suggested that a concentration of 0.0005% (v/v) was enough for Hg0re-emission inhibition in the simulated WFGD liquors. The results also indicated that the Hg0re-emission inhibition efficiency by adding DTCR decreased as the operational temperatures increased and the Hg0re-emission inhibition efficiency increased as pH values and the oxygen concentration in the flue gas increased. The present findings could be valuable for industrial application of DTCR as a precipitant for stabilizing dissolved Hg2+to prevent re-emission of Hg0in WFGD solutions.

High-resolution transmission electron microscopic study of highly oxygen doped silicon layer

1989 ◽  
Vol 47 ◽  
pp. 692-693
Author(s):  
H. Takaoka ◽  
M. Tomita ◽  
T. Hayashi
Keyword(s):  
High Resolution ◽  
Oxygen Concentration ◽  
Silicon Layer ◽  
Detailed Structure ◽  
Electron Microscopic ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Doped Silicon ◽  
Argon Ion

High resolution transmission electron microscopy (HRTEM) is the effective technique for characterization of detailed structure of semiconductor materials. Oxygen is one of the important impurities in semiconductors. Detailed structure of highly oxygen doped silicon has not clearly investigated yet. This report describes detailed structure of highly oxygen doped silicon observed by HRTEM. Both samples prepared by Molecular beam epitaxy (MBE) and ion implantation were observed to investigate effects of oxygen concentration and doping methods to the crystal structure.The observed oxygen doped samples were prepared by MBE method in oxygen environment on (111) substrates. Oxygen concentration was about 1021 atoms/cm3. Another sample was silicon of (100) orientation implanted with oxygen ions at an energy of 180 keV. Oxygen concentration of this sample was about 1020 atoms/cm3 Cross-sectional specimens of (011) orientation were prepared by argon ion thinning and were observed by TEM at an accelerating voltage of 400 kV.

Degradation of 2,4-dichlorophenol by melamine amine celluloseimmobilized lacasses

TAPPI Journal ◽  
2017 ◽  
Vol 16 (10) ◽  
pp. 559-564 ◽  
Author(s):  
ZHEN WANG ◽  
PINGPING BIN ◽  
YING LIU ◽  
YU LIU ◽  
GUIHUA YANG ◽  
...  
Keyword(s):  
Enzymatic Activity ◽  
Removal Efficiency ◽  
Immobilized Laccase ◽  
Dialdehyde Cellulose

Epoxidized dialdehyde cellulose (EDC) was prepared and grafted with melamine to obtain melamine grafted epoxidized dialdehyde cellulose (EDC-melamine); the products were characterized by various methods and were used as carriers to immobilize laccase. Results show EDC-melamine can immobilize laccase effectively and have higher enzymatic activity compared with EDC. Furthermore, the enzymatic activity of EDC-melamine was found to be as high as 865 U•mg-1, compared with 140U•mg-1 for EDC. The removal efficiency of 2,4-dichlorophenol (2,4-DCP) for EDC-melamine immobilized laccase was about 71.5% at 40°C for 4 h at 10.0 mg•L-1 and dosage of laccase = 0.2 g/L. The removal efficiency can remain greater than 63%, even after six cycles.

The assessment of particulate matter (PM2.5) removal efficiency on air cleaner products through full scale test in Korea

2019 ◽  
Vol 18 (1) ◽  
pp. 76-80 ◽  
Author(s):  
Kichul Kim ◽  
Pil-Ju Park ◽  
Soomi Eo ◽  
Seungmi Kwon ◽  
Kwangrae Kim ◽  
...  
Keyword(s):  
Particulate Matter ◽  
Removal Efficiency ◽  
Full Scale ◽  
Full Scale Test ◽  
Air Cleaner ◽  
Scale Test
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