Enhancement-Mode Recessed Gate and Cascode Gate Junctionless Nanowire With Low-Leakage and High-Drive Current

2018 ◽  
Vol 65 (9) ◽  
pp. 4004-4008 ◽  
Author(s):  
Hiu Yung Wong ◽  
Nelson Braga ◽  
R. V. Mickevicius
Keyword(s):  
Drive Current ◽  
Enhancement Mode ◽  
Low Leakage ◽  
High Drive ◽  
Recessed Gate

Gate-All-Around (GAA) Fully Depleted (FD) Cantilever Channel MOSFET with High-k Dielectric and Metal Gate

2007 ◽  
Vol 995 ◽  
Author(s):  
Sagnik Dey ◽  
Se-Hoon Lee ◽  
Sachin V. Joshi ◽  
Prashant Majhi ◽  
Sanjay K. Banerjee
Keyword(s):  
Metal Gate ◽  
Leakage Currents ◽  
Drive Current ◽  
Fully Depleted ◽  
Low Leakage ◽  
High Drive ◽  
High K ◽  
High K Dielectric

AbstractA MOSFET formed by a Si cantilever channel suspended between source/drain “anchors” wrapped all-around by high-κ dielectric and metal gate is demonstrated. The device shows excellent subthreshold characteristics and low leakage currents due to the fully depleted body and the gate-all-around architecture implemented with a high-κ dielectric and metal gate. At the same time this also allows a high drive current due to mobility enhancements arising from volume inversion of the cantilever channel such that a large ION/IOFF is achieved.

High-current recessed gate enhancement-mode ultrawide bandgap Al x Ga1−x N channel MOSHFET with drain current 0.48 A mm−1 and threshold voltage +3.6 V

2021 ◽  
Vol 14 (1) ◽  
pp. 014003
Author(s):  
Shahab Mollah ◽  
Kamal Hussain ◽  
Abdullah Mamun ◽  
Mikhail Gaevski ◽  
Grigory Simin ◽  
...  
Keyword(s):  
Threshold Voltage ◽  
Drain Current ◽  
High Current ◽  
Enhancement Mode ◽  
Recessed Gate

Nmos Logic Circuits in Laser-Crystallized Silicon on Quartz

1983 ◽  
Vol 23 ◽  
Author(s):  
A. Chiang ◽  
M. H. Zarzycki ◽  
W. P. Meuli ◽  
N. M. Johnson
Keyword(s):  
High Performance ◽  
Logic Circuits ◽  
Leakage Currents ◽  
Enhancement Mode ◽  
Low Leakage ◽  
Fused Quartz ◽  
Amorphous Substrates ◽  
Circular Beam ◽  
Processing Steps ◽  
Dynamic Shift

ABSTRACTDepletion mode as well as enhancement mode n-channel thin-film transistors (TFT's) have been fabricated in CO2 laser-crystallized silicon on fused quartz. Nearly defect-free islands were obtained by using an offset circular beam to form a tilted melt interface. The optimization of subsequent processing steps to achieve simultaneously low leakage currents and voltage thresholds appropriate for depletion-load NMOS circuits involved adjustments of ion implantation and high temperature cycles with the aid of simulation. The resultant high performance silicon-gate TFT's have led to NMOS ring oscillators with 2.5 ns delay/stage and dynamic shift registers with MHz clock rates. These are the first logic circuits fabricated in beam-crystallized silicon on bulk amorphous substrates.

Non-Recessed-Gate Enhancement-Mode AlGaN/GaN High Electron Mobility Transistors with High RF Performance

2004 ◽  
Vol 43 (4B) ◽  
pp. 2255-2258 ◽  
Author(s):  
Akira Endoh ◽  
Yoshimi Yamashita ◽  
Keiji Ikeda ◽  
Masataka Higashiwaki ◽  
Kohki Hikosaka ◽  
...  
Keyword(s):  
Electron Mobility ◽  
High Electron Mobility Transistors ◽  
High Electron ◽  
High Electron Mobility ◽  
Enhancement Mode ◽  
Electron Mobility Transistors ◽  
Rf Performance ◽  
Recessed Gate

Recessed-gate enhancement-mode GaN HEMT with high threshold voltage

2005 ◽  
Vol 41 (7) ◽  
pp. 449 ◽  
Author(s):  
W.B. Lanford ◽  
T. Tanaka ◽  
Y. Otoki ◽  
I. Adesida
Keyword(s):  
Threshold Voltage ◽  
High Threshold ◽  
Enhancement Mode ◽  
Gan Hemt ◽  
Recessed Gate
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