Surface-Plasmons-Assisted Nanoscale Photolithography

2005 ◽  
Author(s):  
Dongbing Shao ◽  
Shaochen Chen
Keyword(s):  
Low Cost ◽  
Near Field ◽  
Optical Diffraction ◽  
Scanning Probe ◽  
Fabrication Technology ◽  
Scanning Probe Lithography ◽  
Low Contrast ◽  
The Past ◽  
Wavelength Scale ◽  
Sub Wavelength

Photolithography has remained a useful micro-fabrication technology because of its high throughput, low cost, simplicity, and reproducibility over the past several decades. However its resolution is limited at a sub-wavelength scale due to optical diffraction. Among all different approaches to overcoming this problem, such as electron-beam lithography, imprint lithography and scanning probe lithography, near-field optical lithography inherits many merits of the traditional photolithography method. Major drawbacks of this approach include low contrast, low transmission and low density.

scholarly journals Subwavelength Nanostructuring of Gold Films by Apertureless Scanning Probe Lithography Assisted by a Femtosecond Fiber Laser Oscillator

Nanomaterials ◽  
2018 ◽  
Vol 8 (7) ◽  
pp. 536 ◽  
Author(s):  
Ignacio Falcón Casas ◽  
Wolfgang Kautek
Keyword(s):  
Fiber Laser ◽  
Near Field ◽  
Diffraction Limit ◽  
High Repetition Rate ◽  
Scanning Probe ◽  
Optical Methods ◽  
Laser Source ◽  
Gold Films ◽  
Laser Oscillator ◽  
Scanning Probe Lithography

Optical methods in nanolithography have been traditionally limited by Abbe’s diffraction limit. One method able to overcome this barrier is apertureless scanning probe lithography assisted by laser. This technique has demonstrated surface nanostructuring below the diffraction limit. In this study, we demonstrate how a femtosecond Yb-doped fiber laser oscillator running at high repetition rate of 46 MHz and a pulse duration of 150 fs can serve as the laser source for near-field nanolithography. Subwavelength features were generated on the surface of gold films down to a linewidth of 10 nm. The near-field enhancement in this apertureless scanning probe lithography setup could be determined experimentally for the first time. Simulations were in good agreement with the experiments. This result supports near-field tip-enhancement as the major physical mechanisms responsible for the nanostructuring.

Near-field imaging of surface plasmon on gold nano-dots fabricated by scanning probe lithography

2003 ◽  
Vol 209 (3) ◽  
pp. 236-240 ◽  
Author(s):  
J. Kim ◽  
J. Kim ◽  
K. I.-B. Song ◽  
S. Q. Lee ◽  
E. U. N.-K. Kim ◽  
...  
Keyword(s):  
Surface Plasmon ◽  
Near Field ◽  
Scanning Probe ◽  
Scanning Probe Lithography ◽  
Near Field Imaging ◽  
Field Imaging

Near-field plasmon-resonance scanning microscopy

1995 ◽  
Vol 53 ◽  
pp. 48-49
Author(s):  
Sheldon Schultz
Keyword(s):  
Plasmon Resonance ◽  
Near Field ◽  
Far Field ◽  
Lateral Size ◽  
Physical Sciences ◽  
Signal To Noise ◽  
Near Field Optics ◽  
The Past ◽  
Plane Light ◽  
Sub Wavelength

In the past few years the field of near-field scanning optical microscopy (NSOM) has developed rapidly with applications spanning all the physical sciences. A key goal of this form of microscopy is to obtain resolution at levels well beyond those possible with the usual far-field optics. In contrast to far-field optics, which is bounded by the well known limits imposed by diffraction, near-field optics has no "in principle" fundamental lower limit in lateral size, at least down to atomic dimensions, although in practice, signal-to-noise considerations may restrict the application of NSOM to a few nanometers.The simplest form of NSOM to visualize is based on the principle of a sub-wavelength aperture (with D/λ < < 1) in an opaque plane. Light impinging on this aperture may only be transmitted through the diameter D, and, indeed, were it observed in the far-field, would be spread out over the entire half space due to diffraction. However, if the sample to be studied is placed in the near-field of the aperture, say within a distance D away, the region illuminated will also be restricted to a lateral dimension very close to D.

Surface Plasmon Assisted Laser Nanolithography Using Metalic Mask

2005 ◽  
Author(s):  
Dongbing Shao ◽  
Shanchen Chen
Keyword(s):  
Surface Plasmon ◽  
Quartz Substrate ◽  
Fdtd Method ◽  
High Density ◽  
Optical Diffraction ◽  
Intensity Control ◽  
Thick Photoresist ◽  
Wavelength Scale ◽  
Very High ◽  
Sub Wavelength

Traditional photolithography has a resolution at wavelength scale due to optical diffraction. In this paper, a high-density direct photolithography method beyond diffraction limit by utilizing surface plasmons (SPs) was developed on virtually any substrate. Simulation results by Finite Different Time Domain (FDTD) method have shown that surface plasmon excited on both the mask and the substrate helps to confine the light behind the apertures of the mask. Numerical simulations have demonstrated that very high density sub-wavelength patterns can be transferred using this method. In experiments, a polarized laser beam of 355nm wavelength was used as a light source to photo-initiate a 80nm-thick photoresist on a silicon substrate with 50nm Ti coating. 100nm line aperture patterns were made on gold film on quartz substrate as mask. Experimental results showed that illumination intensity control is crucial to the lithography results. The feature size using such method could be further scaled down, limited theoretically by the validity of dielectric function of the material, and practically by the fabrication of mask.

Optical microfibers and nanofibers

Nanophotonics ◽  
2013 ◽  
Vol 2 (5-6) ◽  
pp. 407-428 ◽  
Author(s):  
Xiaoqin Wu ◽  
Limin Tong
Keyword(s):  
Nonlinear Optics ◽  
Fiber Optics ◽  
Optical Fibers ◽  
Optical Sensors ◽  
Near Field ◽  
Field Enhancement ◽  
Atom Optics ◽  
Near Field Optics ◽  
Wavelength Scale ◽  
Sub Wavelength

AbstractAs a combination of fiber optics and nanotechnology, optical microfibers and nanofibers (MNFs) have been emerging as a novel platform for exploring fiber-optic technology on the micro/nanoscale. Typically, MNFs taper drawn from glass optical fibers or bulk glasses show excellent surface smoothness, high homogeneity in diameter and integrity, which bestows these tiny optical fibers with low waveguiding losses and outstanding mechanical properties. Benefitting from their wavelength- or sub-wavelength-scale transverse dimensions, waveguiding MNFs exhibit a number of interesting properties, including tight optical confinement, strong evanescent fields, evident surface field enhancement and large and abnormal waveguide dispersion, which makes them ideal nanowaveguides for coherently manipulating light, and connecting fiber optics with near-field optics, nonlinear optics, plasmonics, quantum optics and optomechanics on the wavelength- or sub-wavelength scale. Based on optical MNFs, a variety of technological applications, ranging from passive micro-couplers and resonators, to active devices such as lasers and optical sensors, have been reported in recent years. This review is intended to provide an up-to-date introduction to the fabrication, characterization and applications of optical MNFs, with emphasis on recent progress in our research group. Starting from a brief introduction of fabrication techniques for physical drawing glass MNFs in Section 2, we summarize MNF optics including waveguiding modes, evanescent coupling, and bending loss of MNFs in Section 3. In Section 4, starting from a “MNF tree” that summarizes the applications of MNFs into 5 categories (waveguide & near field optics, nonlinear optics, plasmonics, quantum & atom optics, optomechanics), we go to details of typical technological applications of MNFs, including optical couplers, interferometers, gratings, resonators, lasers and sensors. Finally in Section 5 we present a brief summary of optical MNFs regarding their current challenges and future opportunities.

Design of All-Dielectric Long-wave infrared Wide-angle Metalens

2021 ◽  
Author(s):  
Ning Zhang ◽  
Qingzhi Li ◽  
Jun Chen ◽  
Feng Tang ◽  
Jingjun Wu ◽  
...  
Keyword(s):  
Focal Length ◽  
Low Cost ◽  
Numerical Aperture ◽  
Single Layer ◽  
Industrial Processing ◽  
Monochromatic Imaging ◽  
Long Wave ◽  
Wavelength Scale ◽  
Long Wave Infrared ◽  
Sub Wavelength

Abstract Optical metasurfaces are two-dimensional arrays of nano-scatterers that modify optical wavefronts at subwavelength spatial resolution. They achieve the effect of focusing through phase control under a sub-wavelength scale, named metalens. They are poised to revolutionize optics by enabling complex low-cost systems. However, there are monochromatic severe aberrations in the metasurfaces. In this paper,the long-wave infrared optical system coma is eliminated through a single-layer metasurface. By changing the phase function,this metalens have a numerical aperture of 0.89,a focal length of 150 μm,and a field of view of 120&#176; (0.4@60lp/mm) that enables diffraction-limited monochromatic imaging along the focal plane at a wavelength of 10.6μm. And the designed metasurface maintains a favorable MTF value at different angles. This equipment can be widely used in imaging and industrial processing.

scholarly journals Terahertz polarization spectroscopy in the near-field zone of a sub-wavelength-scale metal slit

2016 ◽  
Vol 24 (19) ◽  
pp. 21276 ◽  
Author(s):  
Daehoon Han ◽  
Kanghee Lee ◽  
Hanlae Jo ◽  
Yunheung Song ◽  
Minhyuk Kim ◽  
...  
Keyword(s):  
Near Field ◽  
Field Zone ◽  
Polarization Spectroscopy ◽  
Wavelength Scale ◽  
Sub Wavelength

The Contribution of Intermediate-Voltage, High-Resolution Electron Microscopy In Materials Science: An Appraisal

1990 ◽  
Vol 48 (1) ◽  
pp. 478-479
Author(s):  
John L. Hutchison
Keyword(s):  
High Resolution ◽  
Materials Science ◽  
High Resolution Electron Microscopy ◽  
Optical Diffraction ◽  
The Past ◽  
Resolution Electron ◽  
Extreme Sensitivity ◽  
Electron Microscopes ◽  
New Generation ◽  
Small Metal Particles

Over the past five years or so the development of a new generation of high resolution electron microscopes operating routinely in the 300-400 kilovolt range has produced a dramatic increase in resolution, to around 1.6 Å for “structure resolution” and approaching 1.2 Å for information limits. With a large number of such instruments now in operation it is timely to assess their impact in the various areas of materials science where they are now being used. Are they falling short of the early expectations? Generally, the manufacturers’ claims regarding resolution are being met, but one unexpected factor which has emerged is the extreme sensitivity of these instruments to both floor-borne and acoustic vibrations. Successful measures to counteract these disturbances may require the use of special anti-vibration blocks, or even simple oil-filled dampers together with springs, with heavy curtaining around the microscope room to reduce noise levels. In assessing performance levels, optical diffraction analysis is becoming the accepted method, with rotational averaging useful for obtaining a good measure of information limits. It is worth noting here that microscope alignment becomes very critical for the highest resolution.In attempting an appraisal of the contributions of intermediate voltage HREMs to materials science we will outline a few of the areas where they are most widely used. These include semiconductors, oxides, and small metal particles, in addition to metals and minerals.

Cross-culture outcomes of a brazilian professor Fulbright in the USA

2017 ◽  
Vol 26 (50) ◽  
pp. 115
Author(s):  
Marcelo Da Silva Leite ◽  
Celeste Gaia
Keyword(s):  
Higher Education ◽  
Low Cost ◽  
Cross Culture ◽  
College And University ◽  
Governmental Agencies ◽  
The Past ◽  
University Curriculum ◽  
Fulbright Scholar ◽  
The Usa ◽  
Higher Education Costs

Over the past decade due the expansion of globalization there has been an increasing emphasis on internationalization among faculty, administration and accrediting agencies in the Higher Education.  Although to promote internationalization in the Higher Education, costs are a big challenge, one way to have the international actions with low cost, it is seeking for grants from different governmental agencies and foundations.The Fulbright Scholar program provides a long-standing and externally-funded means for internationalizing college and university curriculum. This article is going to share the perspective   of a Brazilian Fulbright Scholar at an American college and the institution perspective of the Fulbright scholar participation at the College.

Sign in / Sign up

Export Citation Format

Share Document