BATH PARAMETER DEPENDENCE OF CHEMICALLY-DEPOSITED COPPER SELENIDE THIN FILM

2004 ◽  
Vol 18 (22) ◽  
pp. 3063-3069 ◽  
Author(s):  
AL-MAMUN ◽  
A. B. M. O. ISLAM
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Film Thickness ◽  
Chemical Bath Deposition ◽  
Glass Substrate ◽  
Deposition Time ◽  
Low Cost ◽  
Copper Selenide ◽  
Reaction Bath ◽  
Selenide Thin Film

In this article, a low cost chemical bath deposition (CBD) technique has been used for the preparation of Cu 2-x Se thin films on to glass substrate. Different thin films (0.2–0.6 μm) were prepared by adjusting the bath parameter like concentration of ammonia, deposition time, temperature of the solution, and the ratios of the mixing composition between copper and selenium in the reaction bath. From these studies, it reveals that at low concentration of ammonia or TEA, the terminal thicknesses of the films are less, which gradually increases with the increase of concentrations and then drop down at still higher concentrations. It has been found that complexing the Cu 2+ ions with TEA first, and then addition of ammonia yields better results than the reverse process. The film thickness increases with the decrease of value x of Cu 2-x Se .

Copper Indium Diselenide thin films using a hybrid method of chemical bath deposition and thermal evaporation

2011 ◽  
Vol 1324 ◽  
Author(s):  
R. Ernesto Ornelas A ◽  
Sadasivan Shaji ◽  
Omar Arato ◽  
David Avellaneda ◽  
Alan Castillo ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Solar Cells ◽  
Chemical Bath Deposition ◽  
Low Cost ◽  
Secondary Phase ◽  
Copper Selenide ◽  
Copper Indium Diselenide ◽  
Visible Absorption ◽  
Copper Indium

ABSTRACTCopper indium diselenide (CIS) based solar cells are one among the promising thin film solar cells. Most of the processes reported for the preparation of CIS directly or indirectly involve Se vapor or H2Se gases which are extremely toxic to health and environment. In this work, we report the preparation of CIS thin films by stacked layers of Glass/In/Se/Cu2Se and Glass/In/Se/Cu2Se/Se. For this, first indium (In) thin film was thermally evaporated on glass substrate on which selenium (Se) and copper selenide (Cu2Se) thin films were deposited sequentially by chemical bath deposition. Selenium thin films were grown from an aqueous solution containing Na2SeSO3 and CH3COOH at room temperature, triple deposition for 7, 7 and 10 min from consecutive baths. Copper selenide thin films were deposited at 35 °C for 1 hour from an aqueous bath containing CuSO4, Na2SeSO3 and NH4OH. Analysis of the X-ray diffraction patterns of the thin films formed at 400 °C from the precursor layer containing extra selenium layer showed the presence of chalcopyrite CuInSe2, without any secondary phase. Morphology of all the samples was analyzed using Scanning Electron Microscopy. Optical band gap was evaluated from the UV-Visible absorption spectra of these films and the values were 1.1 eV and 1 eV respectively for CIS thin films formed at 400 °C from the selenium deficient and selenium rich precursor layers. Electrical characterizations were done using photocurrent measurements. Thus preparation of a CuInSe2 absorber material by a non-toxic selenization process may open up a low cost technique for the fabrication of CIS based solar cells.

scholarly journals High-performance thermoelectric silver selenide thin films cation exchanged from a copper selenide template

2020 ◽  
Vol 2 (1) ◽  
pp. 368-376 ◽  
Author(s):  
Nan Chen ◽  
Michael R. Scimeca ◽  
Shlok J. Paul ◽  
Shihab B. Hafiz ◽  
Ze Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Cation Exchange ◽  
High Performance ◽  
Low Cost ◽  
Copper Selenide ◽  
Silver Selenide ◽  
Solution Processed

A high-performance n-type thermoelectric Ag2Se thin film via cation exchange using a low-cost solution processed Cu2Se template.

Growth and Structural Properties of ZnO-SWCNTs Produced by Chemical Bath Deposition and Sol-Gel Methods

2014 ◽  
Vol 895 ◽  
pp. 460-473 ◽  
Author(s):  
Azimah Omar ◽  
Abdullah Huda ◽  
M.R. Razali ◽  
S. Shaari ◽  
M.R. Taha
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Thin Films ◽  
Carbon Nanotubes ◽  
Zinc Oxide ◽  
Chemical Bath Deposition ◽  
Low Cost ◽  
Sol Gel ◽  
Cross Sectional ◽  
Crystallite Sizes

Two different methods were used to synthesize and fabricate zinc oxide-carbon nanotubes (ZnO-CNTs) thin films; chemical bath deposition (CBD) and sol-gel method. Single-walled carbon nanotubes (SWCNTs) were implemented in preparing the thin films. The obtained thin films were annealed in air at different temperatures levels of 200 °C, 250 °C, 300 °C and 350 °C for 30 min. Both methods successfully grew various nanostructures of ZnO-CNTs such as nanoparticles, nanobranches and nanoflakes. The synthesized nanostructures were characterized by using field emission scanning electron microscopy (FESEM), X-ray diffraction (XRD) and transmission electron microscopy (TEM). The crystallite sizes were calculated between 38.54 nm and 6.13 nm. FESEM cross sectional images indicated the thin film thicknesses varied from 164.9 μm to 5.84 μm. The TEM images estimated the diameters of the SWCNTs in the range of 3.38 nm to 16.14 nm. TEM images also proved the presence of ZnO entangled between SWCNTs. A combination of ZnO and SWCNTs in the thin film proposes a simple and low cost CBD method to produce various ZnO-CNTs nanostructures with appropriate thickness. Keywords: zinc oxide; carbon nanotubes; nanostructures; thin film ABSTRAK Dua kaedah telah digunakan untuk mensintesiskan serta memfabrikasi filem nipis zink oksida-karbon nanotiub (ZnO-CNTs); kaedah pemendapan kubang kimia (CBD) dan sol-gel. Karbon-nanotiub berdinding satu (SWCNTs) telah digunakan dalam penyediaan filem nipis. Filem nipis yang diperolehi disepuh-lindap melalui udara pada tahap suhu yang berbeza dari 200 °C, 250 °C, 300 °C dan 350 °C selama 30 minit. Kedua-dua kaedah telah berjaya menumbuhkan pelbagai struktur nanoZnO-CNTs seperti nanozarah, nanodahan dan nanokepingan. Pencirian struktur nanoitu dilakukan menggunakan mikroskop elektron imbasan (FESEM), belauan sinar-X (XRD) dan mikroskop electron pancaran (TEM). Saiz kristal yang dikira adalah antara 38.54 nm dan 6.13 nm. Analisis bagi keratan rentas FESEM imej menunjukkan ketebalan filem yang pelbagai dari 164.9 μm sehingga 5.84 μm. Imej TEM menganggarkan diameter karbon nanotiub dalam julat 3.38 nm sehingga 16.14 nm. Imej TEM turut mengesahkan kewujudan ZnO yang melekat di antara CNTs. Kombinasi ZnO dan SWCNTs di dalam filem nipis mencadangkan penggunaan kaedah CBD yang ringkas dan berkos murah untuk menghasilkan pelbagai struktur ZnO-CNTs bersaiz nanodengan ketebalan yang sesuai. Kata-kata kunci: zink oksida; karbon nanotiub; struktur bersaiz nano; filem nipis

Characteristics of Zinc Oxide Film Prepared by Chemical Bath Deposition Method

2014 ◽  
Vol 602-603 ◽  
pp. 871-875
Author(s):  
Yen Pei Fu ◽  
Jian Jhih Chen
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Chemical Bath Deposition ◽  
Deposition Time ◽  
Oxide Films ◽  
Hexagonal Structure ◽  
Zno Films ◽  
Zinc Oxide Film ◽  
Incident Wavelength ◽  
Zinc Oxide Films

In this study, ZnO films, prepared by Chemical Bath Deposition (CBD), are applied as the conductive layers for thin film solar cells. Zinc acetate is used as a source of zinc, and different proportions of ammonia solution are added and well mixed. The growth of zinc oxide films in reaction solutions is taken place at 80°C and then heated to 500°C for one hour. In this study, the different ammonia concentrations and deposition times is controlled. The thin film structure is Hexagonal structure, which is determined by X-ray diffraction spectrometer (XRD) analysis. Scanning electron microscopy (SEM) is used as the observation of surface morphology, the bottom of the film is the interface where the heterogeneous nucleation happens. With the increase of deposition time, there were a few attached zinc oxide particles, which is formed by homogeneous nucleation. According to UV / visible light (UV / Vis) absorption spectrometer transmittance measurements and the relationship between/among the incident wavelength, it can be converted to the energy gaps (Eg), which are about 3.0 to 3.2eV, by using fluorescence spectroscopy analysis. The emission of zinc oxide films has two wavelengths which are located on 510nm and 570nm. According to Based on the all analytic results, the ammonia concentration at 0.05M, and the deposition time is 120 minutes, would obtain the conditions of ZnO films which is more suitable for applications of conductive layer material in thin film solar cell.

scholarly journals Experimental Study on the Thickness-Dependent Hardness of SiO2 Thin Films Using Nanoindentation

Coatings ◽  
2020 ◽  
Vol 11 (1) ◽  
pp. 23
Author(s):  
Weiguang Zhang ◽  
Jijun Li ◽  
Yongming Xing ◽  
Xiaomeng Nie ◽  
Fengchao Lang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Integrated Circuits ◽  
Film Thickness ◽  
Depth Range ◽  
Micro Electro Mechanical Systems ◽  
Si Substrates ◽  
Sio2 Thin Film ◽  
Average Grain Size

SiO2 thin films are widely used in micro-electro-mechanical systems, integrated circuits and optical thin film devices. Tremendous efforts have been devoted to studying the preparation technology and optical properties of SiO2 thin films, but little attention has been paid to their mechanical properties. Herein, the surface morphology of the 500-nm-thick, 1000-nm-thick and 2000-nm-thick SiO2 thin films on the Si substrates was observed by atomic force microscopy. The hardnesses of the three SiO2 thin films with different thicknesses were investigated by nanoindentation technique, and the dependence of the hardness of the SiO2 thin film with its thickness was analyzed. The results showed that the average grain size of SiO2 thin film increased with increasing film thickness. For the three SiO2 thin films with different thicknesses, the same relative penetration depth range of ~0.4–0.5 existed, above which the intrinsic hardness without substrate influence can be determined. The average intrinsic hardness of the SiO2 thin film decreased with the increasing film thickness and average grain size, which showed the similar trend with the Hall-Petch type relationship.

scholarly journals Precise control of Jeff=12 magnetic properties in Sr2IrO4 epitaxial thin films by variation of strain and thin film thickness

2020 ◽  
Vol 102 (21) ◽  
Author(s):  
Stephan Geprägs ◽  
Björn Erik Skovdal ◽  
Monika Scheufele ◽  
Matthias Opel ◽  
Didier Wermeille ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetic Properties ◽  
Film Thickness ◽  
Epitaxial Thin Films ◽  
Thin Film Thickness ◽  
Precise Control

Photoconductivity of Nanocomposite MEH-PPV: TiO2 Thin Films

2011 ◽  
Vol 13 ◽  
pp. 87-92 ◽  
Author(s):  
M.S.P Sarah ◽  
F.S. Zahid ◽  
M.Z. Musa ◽  
U.M. Noor ◽  
Z. Shaameri ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Surface Morphology ◽  
Spin Coating ◽  
Glass Substrate ◽  
Spin Coating Technique ◽  
Coating Technique ◽  
Current Voltage ◽  
Current Voltage Characteristics

The photoconductivity of a nanocomposite MEH-PPV:TiO2 thin film is investigated. The nanocomposite MEH-PPV:TiO2 thin film was deposited on a glass substrate by spin coating technique. The composition of the TiO2 powder was varied from 5 wt% to 20 wt% (with 5 wt% interval). The concentration of the MEH-PPV is given by 1 mg/1 ml. The current voltage characteristics were measured in dark and under illumination. The photoconductivity showed increment in value as the composition of the TiO2 is raised in the polymer based solution. The absorption showed augmentation as the amount of TiO2 is increased. The escalation of the current voltage is then supported by the results of surface morphology.

High Performance Metal Surface Coating Using Ta2O5 Thin Film Prepared by D.C. Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 240-243
Author(s):  
Narathon Khemasiri ◽  
Chanunthorn Chananonnawathorn ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Pongpan Chindaudom ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Metal Surface ◽  
High Performance ◽  
Grazing Incidence ◽  
Surface Finishing ◽  
Afm Micrographs ◽  
Protective Performance

Tantalum oxide (Ta2O5) thin films were deposited as the protective layers for the metal surface finishing by the DC reactive magnetron sputtering system. The effect of the Ta2O5 film thickness, ranging from 25 nm to 200 nm, on the physical properties and the anti-corrosive performance were investigated. The grazing-incidence X-ray diffraction (GIXRD) and the atomic force microscopy (AFM) were used to examine the crystal structures and the surface topologies of the prepared films, respectively. The XRD results showed that the Ta2O5 thin films were all amorphous. The AFM micrographs demonstrated the film morphology with quite smooth surface features. The surface roughness tended to be rough when the film thickness was increased. To examine the protective performance of the films, the poteniostat and galvanometer was utilized to examine the electrochemical activities with the 1M NaCl as the corrosive electrolyte. The results from the I-V polarization curves (Tafel slope) indicated that, with the Ta2O5 thin film, the current density was significantly reduced by 3 orders of magnitude when compared with the blank sample. Such results were observed because of fully encapsulated surface of the samples were covered with the sputtered Ta2O5 thin films. The study also showed that the Ta2O5 thin film deposited at 50 nm yielded the most extreme protective performance. The Ta2O5 thin films therefore could be optimized for the smallest film thickness for highly potential role in the protective performance of the metal surface finishing products.

Selective formation of cubic or tetragonal zirconia thin films of transparent, with no use of metal ion stabilizer by heating molecular precursor films under mild conditions

2021 ◽  
Vol 14 (02) ◽  
pp. 2151012
Author(s):  
Natangue Heita Shafudah ◽  
Hiroki Nagai ◽  
Mitsunobu Sato
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Quartz Glass ◽  
Glass Substrate ◽  
Metal Ion ◽  
Tetragonal Zirconia ◽  
Precursor Film ◽  
Quartz Glass Substrate ◽  
Molecular Precursor ◽  
Zirconia Thin Film

Cubic or tetragonal zirconia thin films of transparent and 100 nm thickness were selectively formed on a quartz glass substrate by heat-treating the molecular precursor films involving Zr(IV) complexes of nitrilotriacetic acid, at 500[Formula: see text]C in air for 1 h. A precursor solution was prepared by a reaction of the ligand and zirconium tetrabutoxide in alcohol under the presence of butylamine. By the addition of H2O2 or H2O into the solution, the spin-coated precursor films were converted to cubic zirconia thin films by the abovementioned procedure. Further, the identical phase was produced also in the case of the electro-sprayed precursor film which was formed by an addition of H2O2 into the solution. On the other hand, the tetragonal zirconia thin film was obtained from a precursor film formed by using a solution dissolving the original Zr(IV) complex of the ligand, without H2O2 nor H2O. The crystal structure of all thin films was determined by using both the X-ray diffraction (XRD) patterns and Raman spectra. Thus, the zirconia thin films of both crystals could be facilely and selectively obtained with no use of hetero-metal ion stabilizers. The XPS spectra of the thin films show that the O/Zr ratio of the cubic phase is 1.37 and slightly larger than tetragonal one (1.29), and also demonstrate that the nitrogen atoms, which may contribute to stabilize these metastable phases at room temperature, of about 5−7 atomic% was remained in the resultant thin films. The adhesion strengths of cubic zirconia thin film onto the quartz glass substrate was 68 MPa and larger than that of tetragonal one, when the precursor films were formed via a spin coating process. The optical and surface properties of the thin films were also examined in relation to the crystal systems.

Sign in / Sign up

Export Citation Format

Share Document