Growth of TiO2–Nb2O5 mixed thin films by metal–organic decomposition
The influence of mixed metal–organic decomposition (MOD) coating materials has been studied based on the crystal growth of TiO2 and TiO2–Nb2O5 mixed thin films. These thin films were grown on quartz substrates using a dip-coating method. The crystal structures of TiO2 films are well known to depend on sintering temperature, whereas the surface morphologies are not significantly affected by sintering temperature. Nb2O5 was mixed with the TiO2 source material as a possible electron donor. The Nb content of the TiO2–Nb2O5 mixed thin film depended on the Nb mole ratio in the TiO2–Nb2O5 mixed MOD coating material. Large crystal grains were observed with increasing Nb content in the TiO2–Nb2O5 mixed thin film, although Nb was inactive as a donor. It can be concluded that Nb enhances the growth of TiO2 by MOD. This enhancement of crystal growth by the intentional addition of an impurity can be expected to improve the characteristics of other semiconductor materials grown by wet processes.