GROWTH, STRUCTURAL CHARACTERIZATION AND INTERFACIAL REACTION OF MAGNETRON SPUTTERED CeO2 THIN FILMS ON DIFFERENT SUBSTRATES

2014 ◽  
Vol 21 (04) ◽  
pp. 1450054 ◽  
Author(s):  
PARTHASARATHI BERA ◽  
CHINNASAMY ANANDAN
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Room Temperature ◽  
The Other ◽  
Oxidation States ◽  
Temperature Growth ◽  
Glass Substrates ◽  
Xrd Studies ◽  
Xrd Patterns ◽  
Fine Morphology

CeO 2 thin films were deposited on Si , Al , Ti –6 Al –4 V alloy, Si 3 N 4 and glass substrates by magnetron sputtering at room temperature. Growth of CeO 2 films on Si and Si 3 N 4 and effect of annealing were investigated by XRD, FESEM and AFM. Interaction between deposited CeO 2 films and Si , Al , Ti –6 Al –4 V alloy, Si 3 N 4 and glass substrates was investigated by XPS. XRD studies show that films are oriented preferentially to (200)-direction of CeO 2 and no significant change is observed in the XRD patterns of films after heat treatment. CeO 2 film on Si 3 N 4 exhibits rough morphology, whereas very fine morphology is observed in CeO 2 film on Si . CeO 2 film on Si shows lower roughness in relation to that on Si 3 N 4 as demonstrated by AFM studies. XPS results show that Ce is present as both +4 and +3 oxidation states in CeO 2 film deposited on Si and Al substrates, whereas Ce 4+ is the main species in CeO 2 films deposited on Ti –6 Al –4 V alloy, Si 3 N 4 and glass substrates. Ce3d , Si2p and O1s core level spectra demonstrate that Ce 2 O 3 or cerium silicate and SiO x type of species are formed at the interface of CeO 2 and Si . Similarly, formation of interfacial species like Ce 2 O 3 or cerium aluminate is evident in CeO 2 film on Al as demonstrated by XPS studies. On the other hand, interfacial reactions between CeO 2 and Ti –6 Al –4 V alloy, Si 3 N 4 and glass substrates are limited in the respective films.

Microstructure and Magnetic Properties of the CoTiO2 Thin Films

2012 ◽  
Vol 557-559 ◽  
pp. 661-664
Author(s):  
Li Yun Jia ◽  
Jia Ling Xu ◽  
Jiao Qu
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Room Temperature ◽  
The Other ◽  
Homogeneous Structure ◽  
Ferromagnetic Properties ◽  
Glass Substrates ◽  
Island Type ◽  
Microstructure And Magnetic Properties ◽  
Sputtering System

Co (t nm)/TiO2(200 nm) films were prepared by DC facing-target magnetron reactive sputtering system onto glass substrates at room temperature. The influence of the Co distribution on microstructure and magnetic properties of films was investigated in detail. The results indicate that CoTiO2thin films with t= 2 nm island-type deposited showed a homogeneous structure, and pure ferromagnetic properties of thin films are only attributed to the CoTiO2phases. On the other hand, in case of thin films above t= 2nm, the overall ferromagnetic properties depended on both CoTiO2and CoTi phases.

Effect of the Heat Treatment on the Microstructure and Morphology of Cigs Thin Films Prepared by RF Magnetron Sputtering at Room Temperature

2020 ◽  
Vol 1012 ◽  
pp. 119-124
Author(s):  
Paulo Victor Nogueira da Costa ◽  
Rodrigo Amaral de Medeiro ◽  
Carlos Luiz Ferreira ◽  
Leila Rosa Cruz
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Magnetron Sputtering ◽  
Room Temperature ◽  
Morphological Changes ◽  
Film Surface ◽  
Rf Magnetron Sputtering ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates

This work investigates the microstructural and morphological changes on CIGS thin films submitted to a post-deposition heat treatment. The CIGS 1000 nm-thick films were deposited at room temperature by RF magnetron sputtering onto glass substrates covered with molybdenum films. After deposition, the samples were submitted to a heat treatment, with temperatures ranging from 450 to 575 oC. The treatment was also carried out under a selenium atmosphere (selenization), from 400 to 500 oC. Morphological analyzes showed that the as-deposited film was uniform and amorphous. When the treatment was carried out without selenization, the crystallization occurred at or above 450 oC, and the grains remained nanosized. However, high temperatures led to the formation of discontinuities on the film surface and the formation of extra phases, as confirmed by X-ray diffraction data. The crystallization of the films treated under selenium atmosphere took place at lower temperatures. However, above 450 °C the film surface was discontinuous, with a lot of holes, whose amount increased with the temperature, showing that the selenization process was very aggressive. X-ray diffraction analyses showed that the extra phases were eliminated during selenization and the films had a preferential orientation along [112] direction. The results indicate that in the manufacturing process of solar cells, CIGS films deposited at room temperature should be submitted to a heat treatment carried out at 450 °C (without selenization) or 400 °C (with selenization).

Microstructural and Optical Properties of SnO Thin Film by Thermal Evaporation

2013 ◽  
Vol 795 ◽  
pp. 558-562
Author(s):  
Lee Siang Chuah ◽  
Z. Mohamed ◽  
Zainuriah Hassan
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Thermal Evaporation ◽  
Hole Concentration ◽  
Hexagonal Wurtzite Structure ◽  
Thermal Evaporation Method ◽  
Sem Image ◽  
Glass Substrates ◽  
Xrd Patterns ◽  
P Type

In this work, we present results about the preparation and characterization of stannous oxide (SnO) thin films. SnO thin films were obtained via thermal evaporation method from SnO2powder as source material. These thin films were successfully deposited onto well cleaned glass substrates by thermal evaporation technique. The as deposited thin films were of thickness of 2500 Å and film were post-deposition annealed in air ambient at 400°C for 20 min and 40 min, respectively in a furnace. As-deposited films are highly conductive andptype. The best p-type SnO film annealed at 400 °C for 40 min shows a resistivity of 1.05 Ω·cm and a relatively high hole concentration of 2 × 1017cm3at room temperature. The X-ray diffraction (XRD) patterns of annealed films exhibit a polycrystalline hexagonal wurtzite structure without preferred orientation. The scanning electron microscopy (SEM) image shows the presence of uniformly dispersed spherical in shaped SnO particles. The mean grain sizes (diameter) are calculated to be about 80 and 100 nm for the p-type SnO films prepared at 400 °C for 20 min, and 40 min, respectively. Room temperature photoluminescence (PL) spectra of the SnO film exhibit two emission bands, around the wavelength of 300 nm and 450 nm. All spectra were measured at room temperature.

Study on preparing PLT(28) thin film and its electro-optic effect

1998 ◽  
Vol 13 (5) ◽  
pp. 1266-1270 ◽  
Author(s):  
Ai-Li Ding ◽  
Wei-Gen Luo ◽  
P. S. Qiu ◽  
J. W. Feng ◽  
R. T. Zhang
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Faraday Effect ◽  
The Other ◽  
Ceramic Powders ◽  
Glass Substrates ◽  
Annealing Conditions ◽  
Electro Optic

PLT(28) thin films deposited on glass substrates were studied by two sputtering processes. One is an in situ magnetron sputtering and the other is a low-temperature magnetron sputtering. The sintered PLT ceramic powders are used as a sputtering target for both processes. The influences of sputtering and annealing conditions on structure and crystallinity of the films were investigated. The electro-optic (E-O) properties of PLT(28) thin films prepared by the two processes were determined by a technique according to Faraday effect. The researches showed the E-O properties were strongly affected by the sputtering process. The film with larger grains exhibits stronger E-O effect. The quadratic E-O coefficient of PLT(28) thin film varies in the range of 0.1 × 10−16 to 1.0 × 10−16 (m/v)2.

scholarly journals Effect of Pb dopant On A.C mechanism of ZnS thin films

2019 ◽  
Vol 12 (25) ◽  
pp. 80-88
Author(s):  
Salma M. Shaban
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Atomic Weight ◽  
Thickness Effect ◽  
Frequency Effect ◽  
Frequency Range ◽  
Glass Substrates ◽  
Evaporation Technique ◽  
Vacuum Evaporation Technique ◽  
Effect Of Doping

Vacuum evaporation technique was used to prepare pure and doped ZnS:Pb thin films at10% atomic weight of Pb element onto glass substrates at room temperature for 200 nm thickness. Effect of doping on a.c electrical properties such as, a.c conductivity, real, and imaginary parts of dielectric constant within frequency range (10 KHz - 10 MHz) are measured. The frequency dependence of a.c conductivity is matched with correlated barrier hoping especially at higher frequency. Effect of doping on behavior of a.c mechanism within temperature range 298-473 K was studied.

scholarly journals Optical and Structural Properties of CdS Quantum Dots Synthesized Using (MW-CBD) Technique

2020 ◽  
pp. 44-52
Author(s):  
Ahmed Ahmed S. Abed ◽  
Sattar J. Kasim ◽  
Abbas F. Abbas
Keyword(s):  
Thin Films ◽  
Quantum Dots ◽  
Room Temperature ◽  
Energy Gap ◽  
Cds Nanoparticles ◽  
Cds Quantum Dots ◽  
Optical Energy Gap ◽  
Glass Substrates ◽  
High Adhesion ◽  
Uv Visible

In the present study, the microwave heating method was used to prepare cadmium sulfide quantum dots CdSQDs films. CdS nanoparticles size average obtained as (7nm). The morphology, structure and composition of prepared CdSQDs were examined using (FE-SEM), (XRD) and (EDX). Optical properties of CdSQDs thin films formed and deposited onto glass substrates have been studied at room temperature using UV/ Visible spectrophotometer within the wavelength of (300-800nm), and Photoluminescence (PL) spectrum. The optical energy gap (Eg) which estimated using Tauc relation was equal (2.6eV). Prepared CdS nanoparticles thin films are free from cracks, pinholes and have high adhesion to substrate.

Structural, Optical and Magnetic Properties of Co and Fe Doped ZnO Thin Films Grown by Radio Frequency Magnetron Sputtering

2006 ◽  
Vol 957 ◽  
Author(s):  
Luis Manuel Angelats ◽  
Maharaj S Tomar ◽  
Rahul Singhal ◽  
Oscar P Perez ◽  
Hector J Jimenez ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Room Temperature ◽  
Rf Magnetron Sputtering ◽  
Visible Range ◽  
Radio Frequency Magnetron Sputtering ◽  
Optical And Magnetic Properties ◽  
Doped Zno ◽  
Xrd Patterns ◽  
Antiferromagnetic Behavior

ABSTRACTZn0.90Co0.10O and Zn0.85[Co0.50Fe0.50]0.15O targets were used to grow thin films by rf magnetron sputtering. XRD patterns of the films showed a strong preferred orientation along c-axis. Zn0.90Co0.10O film showed a transmittance above 75% in the visible range, while the transmittance of the Zn0.85[Co0.50Fe0.50]0.15O film was about 45%; with three absorption peaks attributed to d-d transitions of tetrahedrally coordinated Co2+. The band gap values for Zn0.90Co0.10O and Zn0.85[Co0.50Fe0.50]0.15O films were 2.95 and 2.70 eV respectively, which are slightly less than ZnO bulk. The Zn0.90Co0.10O film showed a relatively large positive magnetoresistance (MR) at the high magnetic field in the temperature range from 7 to 50 K, which reached 11.9% a 7K for the magnetoresistance. The lowest MR was found at 100 K. From M-H curve measured at room temperature shown a probable antiferromagnetic behavior, although was possible to observe little coercive field of 30 Oe and 40 Oe for Zn0.90Co0.10O and Zn0.85[Co0.50Fe0.50]0.15O films, respectively.

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