Auto-Masked Surface Texturing of Kerf-Loss Free Silicon Wafers Using Hexafluoroisopropanol in a Capacitively Coupled Plasma Etching System

2019 ◽  
Vol 8 (4) ◽  
pp. Q76-Q79
Author(s):  
Suhyun Kim ◽  
Jin-Su Park ◽  
Jun-Hyun Kim ◽  
Chang-Koo Kim ◽  
Jihyun Kim
Keyword(s):  
Plasma Etching ◽  
Surface Texturing ◽  
Silicon Wafers ◽  
Capacitively Coupled ◽  
Free Silicon ◽  
Capacitively Coupled Plasma ◽  
Etching System

Reduction of particle generation in capacitively coupled plasma etching reactor

2007 ◽  
Author(s):  
Kotaro Horikoshi ◽  
Taichi Hayamizu ◽  
Motohiro Hirano ◽  
Ko Sasaki ◽  
Makoto Nagano ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Capacitively Coupled ◽  
Particle Generation ◽  
Capacitively Coupled Plasma

Erosion of focus rings in capacitively coupled plasma etching reactors

2021 ◽  
Vol 39 (6) ◽  
pp. 063002
Author(s):  
Xifeng Wang ◽  
Hyunjae Lee ◽  
Sang Ki Nam ◽  
Mark J. Kushner
Keyword(s):  
Plasma Etching ◽  
Capacitively Coupled ◽  
Capacitively Coupled Plasma

scholarly journals Surface Texturing of Si with Periodically Arrayed Oblique Nanopillars to Achieve Antireflection

Materials ◽  
2021 ◽  
Vol 14 (2) ◽  
pp. 380
Author(s):  
Jun-Hyun Kim ◽  
Sanghyun You ◽  
Chang-Koo Kim
Keyword(s):  
Aspect Ratio ◽  
Plasma Etching ◽  
Surface Texturing ◽  
Light Reflection ◽  
Si Substrate ◽  
Weighted Mean ◽  
Optical Reflectance ◽  
Si Substrates ◽  
Aspect Ratios ◽  
Shadowing Effect

Si surfaces were texturized with periodically arrayed oblique nanopillars using slanted plasma etching, and their optical reflectance was measured. The weighted mean reflectance (Rw) of the nanopillar-arrayed Si substrate decreased monotonically with increasing angles of the nanopillars. This may have resulted from the increase in the aspect ratio of the trenches between the nanopillars at oblique angles due to the shadowing effect. When the aspect ratios of the trenches between the nanopillars at 0° (vertical) and 40° (oblique) were equal, the Rw of the Si substrates arrayed with nanopillars at 40° was lower than that at 0°. This study suggests that surface texturing of Si with oblique nanopillars reduces light reflection compared to using a conventional array of vertical nanopillars.

Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma

2000 ◽  
Vol 77 (4) ◽  
pp. 489-491 ◽  
Author(s):  
T. Kitajima ◽  
Y. Takeo ◽  
Z. Lj. Petrović ◽  
T. Makabe
Keyword(s):  
Capacitively Coupled ◽  
Capacitively Coupled Plasma
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