Diffusion and Subsurface Bonding of Hydrogen in Silicon
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ABSTRACTThe hydrogen depth profiling in the near-surface region in silicon reveals the existence of a subsurface hydrogen layer. This layer acts as a barrier to diffusion. The observed subsurface hydrogen profile rises and then drops off sharply with increasing depth and is stable up to 770 K. Our annealing data indicate a rather complex motion of monatomic and molecular hydrogen in the near-surface region (<1500 A) in the temperature range 300 – 800 K. The subsurface molecule formation represents the dominant hydrogen trapping process in silicon.
1982 ◽
Vol 196
(2-3)
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pp. 483-487
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1978 ◽
Vol 78
(1)
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pp. 161-181
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1987 ◽
Vol 45
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pp. 380-381
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1985 ◽
Vol 43
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pp. 288-289
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1994 ◽
Vol 52
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pp. 636-637