Electron Microscopy of Ion Deposited Thin Films of the Oxides of Titanium

1985 ◽  
Vol 62 ◽  
Author(s):  
A. B. Harker ◽  
D. G. Howitt ◽  
P. J. Hood ◽  
P. Kobrin

ABSTRACTThe reactive ion beam deposition of ceramic films onto unheated substrates can produce amorphous films with essentially molecular mixing. The annealing and hot isotatic pressing (hipping) of these films to produce crystalline phases have reproducable effects which are sensitive to the temperature and the density of the film. Experiments with titanium oxides indicate that it is principally the equilibrium phases that are formed and that hipping can be used to encourage the same transformations at lower temperatures.Thin films of titanium oxide close to the stoichiometry of TiO2 were deposited onto unheated substrates of sodium chloride. Some of the films were removed from the substrate by floating them off in water and the remainder were either annealed or hipped to induce crystallization. The anneals were performed either in air or argon and the hipping was done under an argon pressure of about twenty thousand pounds per square inch. Several of the free standing films were annealed in the same atmospheres on nickel grids. All the specimens were prepared for transmission electron microscopy by the same floating technique and were examined in a Philips 400 T.E.M. at 125 keV. The as deposited films were amorphous and showed no visible texture other than that derived from a small amount of porosity. The films were sufficiently conductive that they could be examined directly in the T.E.M. without carbon coating provided they were supported on a grid of fairly fine mesh. One specimen was also examined in the Kratos 1.5 MeV high voltage electron microscope at the National Center for Electron Microscopy. The specimen was annealed in vacuum using an in-situ hot stage to directly observe the behavior of the film.The post deposition annealing and hipping of these films reproducibly induced the crystallization of anatase below 800°C. This is the equilibrium phase [1] and the extent to which the films transformed and the morphology of the growing crystallites were determined principally by the film thickness. There was little difference between the responses of free standing films and films left on the salt substrate. They tended to transform at about the same temperature, which was reproduced in the in-situ hot stage experiment and the microsructures which formed were very similar. The dependence upon thickness was also reflected in all the microstructures of the different post deposition treatments and it was possible to complete the transformations that were very sluggish in some of the films by hipping them at the same temperatures.

2013 ◽  
Vol 333 ◽  
pp. 199-206 ◽  
Author(s):  
K. Huang ◽  
H. Heinrich ◽  
D.D. Keiser ◽  
Yong Ho Sohn

A solid-to-solid, U-7wt.%Mo vs. Mg diffusion couple was assembled and annealed at 550°C for 96 hours. Themicrostructurein the interdiffusion zone and the development of concentration profiles were examined via scanning electron microscopy, transmission electron microscopy (TEM) and X-ray energy dispersive spectroscopy. A TEM specimen was prepared at the interface between U-7wt.%Mo andMgusing focused ion beam in-situ lift-out. The U-7wt.%Mo alloy was bonded well tothe Mg at the atomic scale, without any evidence of oxidation, cracks or pores.Despite the good bonding, very little or negligible interdiffusion was observed.This is consistent with the expectation based on negligible solubilities according to the equilibrium phase diagrams. Along with other desirableproperties, Mgis a potential inert matrix or barrier materialfor U-Mo fuel alloy systembeing developed forthe Reduced Enrichment for Research and Test Reactor (RERTR) program.


Nanoscale ◽  
2017 ◽  
Vol 9 (35) ◽  
pp. 12835-12842 ◽  
Author(s):  
C. N. Shyam Kumar ◽  
Venkata Sai Kiran Chakravadhanula ◽  
Adnan Riaz ◽  
Simone Dehm ◽  
Di Wang ◽  
...  

In situ TEM analysis of the thermally induced graphitization and domain growth of free-standing nanocrystalline graphene thin films.


Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.


Author(s):  
J. A. Pollock ◽  
M. Martone ◽  
T. Deerinck ◽  
M. H. Ellisman

Localization of specific proteins in cells by both light and electron microscopy has been facilitate by the availability of antibodies that recognize unique features of these proteins. High resolution localization studies conducted over the last 25 years have allowed biologists to study the synthesis, translocation and ultimate functional sites for many important classes of proteins. Recently, recombinant DNA techniques in molecular biology have allowed the production of specific probes for localization of nucleic acids by “in situ” hybridization. The availability of these probes potentially opens a new set of questions to experimental investigation regarding the subcellular distribution of specific DNA's and RNA's. Nucleic acids have a much lower “copy number” per cell than a typical protein, ranging from one copy to perhaps several thousand. Therefore, sensitive, high resolution techniques are required. There are several reasons why Intermediate Voltage Electron Microscopy (IVEM) and High Voltage Electron Microscopy (HVEM) are most useful for localization of nucleic acids in situ.


Author(s):  
J. T. Sizemore ◽  
D. G. Schlom ◽  
Z. J. Chen ◽  
J. N. Eckstein ◽  
I. Bozovic ◽  
...  

Investigators observe large critical currents for superconducting thin films deposited epitaxially on single crystal substrates. The orientation of these films is often characterized by specifying the unit cell axis that is perpendicular to the substrate. This omits specifying the orientation of the other unit cell axes and grain boundary angles between grains of the thin film. Misorientation between grains of YBa2Cu3O7−δ decreases the critical current, even in those films that are c axis oriented. We presume that these results are similar for bismuth based superconductors and report the epitaxial orientations and textures observed in such films.Thin films of nominally Bi2Sr2CaCu2Ox were deposited on MgO using molecular beam epitaxy (MBE). These films were in situ grown (during growth oxygen was incorporated and the films were not oxygen post-annealed) and shuttering was used to encourage c axis growth. Other papers report the details of the synthesis procedure. The films were characterized using x-ray diffraction (XRD) and transmission electron microscopy (TEM).


Materials ◽  
2021 ◽  
Vol 14 (6) ◽  
pp. 1431
Author(s):  
Seiichiro Ii ◽  
Takero Enami ◽  
Takahito Ohmura ◽  
Sadahiro Tsurekawa

Transmission electron microscopy in situ straining experiments of Al single crystals with different initial lattice defect densities have been performed. The as-focused ion beam (FIB)-processed pillar sample contained a high density of prismatic dislocation loops with the <111> Burgers vector, while the post-annealed specimen had an almost defect-free microstructure. In both specimens, plastic deformation occurred with repetitive stress drops (∆σ). The stress drops were accompanied by certain dislocation motions, suggesting the dislocation avalanche phenomenon. ∆σ for the as-FIB Al pillar sample was smaller than that for the post-annealed Al sample. This can be considered to be because of the interaction of gliding dislocations with immobile prismatic dislocation loops introduced by the FIB. The reloading process after stress reduction was dominated by elastic behavior because the slope of the load–displacement curve for reloading was close to the Young’s modulus of Al. Microplasticity was observed during the load-recovery process, suggesting that microyielding and a dislocation avalanche repeatedly occurred, leading to intermittent plasticity as an elementary step of macroplastic deformation.


2010 ◽  
Vol 16 (6) ◽  
pp. 662-669 ◽  
Author(s):  
S. Simões ◽  
F. Viana ◽  
A.S. Ramos ◽  
M.T. Vieira ◽  
M.F. Vieira

AbstractReactive multilayer thin films that undergo highly exothermic reactions are attractive choices for applications in ignition, propulsion, and joining systems. Ni/Al reactive multilayer thin films were deposited by dc magnetron sputtering with a period of 14 nm. The microstructure of the as-deposited and heat-treated Ni/Al multilayers was studied by transmission electron microscopy (TEM) and scanning transmission electron microscopy (STEM) in plan view and in cross section. The cross-section samples for TEM and STEM were prepared by focused ion beam lift-out technique. TEM analysis indicates that the as-deposited samples were composed of Ni and Al. High-resolution TEM images reveal the presence of NiAl in small localized regions. Microstructural characterization shows that heat treating at 450 and 700°C transforms the Ni/Al multilayered structure into equiaxed NiAl fine grains.


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