An Orthogonal Type Two-Axis Lloyd’s Mirror for Holographic Fabrication of Two-Dimensional Planar Scale Gratings with Large Area

In this paper, an orthogonal type two-axis Lloyd’s mirror interference lithography technique was employed to fabricate two-dimensional planar scale gratings for surface encoder application. The two-axis Lloyd’s mirror interferometer is composed of a substrate and two reflective mirrors (X- and Y-mirrors), which are placed edge by edge perpendicularly. An expanded and collimated beam was divided into three beams by this interferometer, a direct beam and two reflected beams, projected onto the substrate, X- and Y-mirrors, respectively. The unexpected beam sections having twice reflected off the mirrors were blocked by a filter. The remaining two reflected beams interfered with the direct beam on the substrate, generating perpendicularly cross patterns thus forming two-dimensional scale gratings. However, the two reflected beams undesirably interfere with each other and generate a grating pattern along 45-degree direction against the two orthogonal direction, which influence the pattern uniformity. Though an undesired grating pattern can be eliminated by polarization modulation with introduction of waveplates, spatial configuration of waveplates inevitably downsized the eventual grating, which is a key parameter for grating interferometry application. For solving this problem, theoretical and experimental study was carefully carried out to evaluate the fabrication quality with and without polarization modulation. Two-dimensional scale gratings with a 1 μm period in X- and Y-directions were achieved by using the constructed experiment system with a 442 nm He-Cd laser source. Atomic force microscopy (AFM) images and the result of diffraction performances demonstrated that the orthogonal type two-axis Lloyd’s mirror interferometer can stand a small order undesired interference, that is, a degree of orthogonality between two reflected beams, denoted by γ, no larger than a nominal value of 0.1.

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Wrinkling Poly(trimethylene 2,5-Furanoate) Free-standing Films: Nanostructure Formation and Physical Properties

10.26434/chemrxiv.11867205.v1 ◽

2020 ◽

Author(s):

Michelina Soccio ◽

Nadia Lotti ◽

Andrea Munari ◽

Esther Rebollar ◽

Daniel E Martínez-Tong

Keyword(s):

Irradiation Time ◽

Polymer Surface ◽

Laser Source ◽

Free Standing ◽

Force Microscopy ◽

Nanostructure Formation ◽

Physicochemical Changes ◽

Angle Measurements ◽

Atomic Force ◽

Contact Angle Measurements

<p>Nanostructured wrinkles were developed on fully bio-based poly(trimethylene furanoate) (PTF) films by using the technique of Laser Induced Periodic Surface Structures (LIPSS). We investigated the effect of irradiation time on wrinkle formation using an UV pulsed laser source, at a fluence of 8 mJ/cm2. It was found that the pulse range between 600 and 4800 pulses allowed formation of periodic nanometric ripples. The nanostructured surface was studied using a combined macro- and nanoscale approach. We evaluated possible physicochemical changes taking place on the polymer surface after irradiation by infrared spectroscopy, contact angle measurements and atomic force microscopy. The macroscopic physicochemical properties of PTF showed almost no changes after nanostructure formation, differently from the results previously found for the terephthalic counterparts, as poly(ethyleneterephthalate), PET, and poly(trimethyleneterephthalate), PTT. The surface mechanical properties of the nanostructured PTF were found to be improved, as evidenced by nanomechanical force spectroscopy measurements. In particular, an increased Young’s modulus and higher stiffness for the nanostructured sample were measured. <br></p>

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Heterogeneous Growth and Self-Repairing Processes of Two-Dimensional Molecular Aggregates of Adsorbed Octadecyltrimethylammonium Bromide at Cleaved Mica/Aqueous Solution Interface as Observed by in Situ Atomic Force Microscopy†

Langmuir ◽

10.1021/la980278t ◽

1999 ◽

Vol 15 (10) ◽

pp. 3689-3692 ◽

Cited By ~ 8

Author(s):

Masatoshi Fujii ◽

Bangyin Li ◽

Kazuhiro Fukada ◽

Tadashi Kato ◽

Tsutomu Seimiya

Keyword(s):

Aqueous Solution ◽

Atomic Force Microscopy ◽

Two Dimensional ◽

Molecular Aggregates ◽

Force Microscopy ◽

Solution Interface ◽

Atomic Force ◽

Octadecyltrimethylammonium Bromide

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Investigation of surface morphology of thin metal films with magnetic layers Fe-Cr-Co

Nanotechnology : the development , application - XXI Century ◽

10.18127/j15604128-202001-2-08 ◽

2021 ◽

Author(s):

V.S. Zayonchkovsky ◽

Aung Kyaw Kyaw ◽

A.V. Andreev

Keyword(s):

Atomic Force Microscopy ◽

Magnetron Sputtering ◽

Electron Microscopic Examination ◽

Nearest Neighbors ◽

Substrate Plane ◽

Large Area ◽

Electron Microscopic ◽

Force Microscopy ◽

Atomic Force ◽

Large Projection

Films containing layers of dispersion-hardening alloys (LDHA) based on the Fe-Cr-Co system were obtained by magnetron sputtering. LDHA acquire the properties of film permanent magnets after a single-stage «fast» high-vacuum annealing. Bulk materials acquire such properties only after many hours of multi-stage heat treatment. The film samples acquire these properties in tens of seconds. The morphology of their surface was studied to determine the origin of the coercive force of film samples. The surface morphology was studied using high resolution scanning electron microscopy and atomic force microscopy. We studied two compositions that, in bulk, have a different tendency to form many phases during crystallization. In magnetron sputtering, the alloy in which a multiphase state is easily formed is polycrystalline. The antipode alloy in magnetron sputtering is realized in an amorphous state. After annealing, both alloys are in a polycrystalline state. Electron microscopic examination showed that as a result of annealing, crystallites are formed with a large projection onto the substrate plane, which grow due to the nearest neighbors. Moreover, these crystallites have not only a large area, but also a height. After annealing, both alloys are in a polycrystalline state. Electron microscopic examination showed that as a result of annealing, crystallites are formed with a large projection onto the substrate plane, which grow due to the nearest neighbors. Moreover, these crystallites have not only a large area, but also a height. What is determined by atomic force microscopy. High crystallites are also faceted. This may indicate that the composition of these crystallites differs from the composition of the surrounding layer, which may be the reason for the increase in coercive force as a result of annealing.

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Tip-Based Nanomachining on Thin Films: A Mini Review

Nanomanufacturing and Metrology ◽

10.1007/s41871-021-00115-5 ◽

2021 ◽

Author(s):

Shunyu Chang ◽

Yanquan Geng ◽

Yongda Yan

Keyword(s):

Thin Film ◽

Thin Films ◽

Data Storage ◽

Three Dimensional ◽

Maintenance Cost ◽

Two Dimensional ◽

Force Microscopy ◽

Atomic Force ◽

Current State ◽

Two Dimensional Materials

AbstractAs one of the most widely used nanofabrication methods, the atomic force microscopy (AFM) tip-based nanomachining technique offers important advantages, including nanoscale manipulation accuracy, low maintenance cost, and flexible experimental operation. This technique has been applied to one-, two-, and even three-dimensional nanomachining patterns on thin films made of polymers, metals, and two-dimensional materials. These structures are widely used in the fields of nanooptics, nanoelectronics, data storage, super lubrication, and so forth. Moreover, they are believed to have a wide application in other fields, and their possible industrialization may be realized in the future. In this work, the current state of the research into the use of the AFM tip-based nanomachining method in thin-film machining is presented. First, the state of the structures machined on thin films is reviewed according to the type of thin-film materials (i.e., polymers, metals, and two-dimensional materials). Second, the related applications of tip-based nanomachining to film machining are presented. Finally, the current situation of this area and its potential development direction are discussed. This review is expected to enrich the understanding of the research status of the use of the tip-based nanomachining method in thin-film machining and ultimately broaden its application.

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Dielectric Function of AlN Grown on Si (111) by MBE

MRS Proceedings ◽

10.1557/proc-572-231 ◽

1999 ◽

Vol 572 ◽

Cited By ~ 1

Author(s):

Stefan Zollner ◽

Atul Konkar ◽

R. B. Gregory ◽

S. R. Wilson ◽

S. A. Nikishin ◽

...

Keyword(s):

Molecular Beam ◽

Buffer Layers ◽

Two Dimensional ◽

X Ray Diffraction ◽

Growth Morphology ◽

X Ray ◽

Force Microscopy ◽

Atomic Force ◽

Dimensional Growth ◽

Peak Widths

ABSTRACTWe measured the ellipsometric response from 0.7–5.4 eV of c-axis oriented AlN on Si (111) grown by molecular beam epitaxy. We determine the film thicknesses and find that for our AlN the refractive index is about 5–10% lower than in bulk AlN single crystals. Most likely, this discrepancy is due to a low film density (compared to bulk AlN), based on measurements using Rutherford backscattering. The films were also characterized using atomic force microscopy and x-ray diffraction to study the growth morphology. We find that AlN can be grown on Si (111) without buffer layers resulting in truely two-dimensional growth, low surface roughness, and relatively narrow x-ray peak widths.

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Large Area Supersonic Jet Epitaxy of AlN, GaN, and SiC on Silicon

MRS Proceedings ◽

10.1557/proc-449-277 ◽

1996 ◽

Vol 449 ◽

Author(s):

L.J. Lauhon ◽

S. A. Ustin ◽

W. Ho

Keyword(s):

Supersonic Jet ◽

X Ray Diffraction ◽

Large Area ◽

Free Jets ◽

X Ray ◽

Force Microscopy ◽

Atomic Force ◽

Supersonic Jet Epitaxy ◽

Carrier Gases

ABSTRACTAlN, GaN, and SiC thin films were grown on 100 mm diameter Si(111) and Si(100) substrates using Supersonic Jet Epitaxy (SJE). Precursor gases were seeded in lighter mass carrier gases and free jets were formed using novel slit-jet apertures. The jet design, combined with substrate rotation, allowed for a uniform flux distribution over a large area of a 100 mm wafer at growth pressures of 1–20 mTorr. Triethylaluminum, triethylgailium, and ammonia were used for nitride growth, while disilane, acetylene, and methylsilane were used for SiC growth. The films were characterized by in situ optical reflectivity, x-ray diffraction (XRD), atomic force microscopy (AFM), and spectroscopic ellipsometry (SE).

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GROWTH AND SURFACE MORPHOLOGY OF {101} CLEAVAGE PLANES OF L-ARGININE TRIFLUOROACETATE CRYSTALS

Surface Review and Letters ◽

10.1142/s0218625x07009542 ◽

2007 ◽

Vol 14 (03) ◽

pp. 439-444 ◽

Cited By ~ 1

Author(s):

Z. H. SUN ◽

D. XU ◽

G. W. YU ◽

G. H. ZHANG ◽

X. Q. WANG ◽

...

Keyword(s):

Surface Morphology ◽

Grown Crystal ◽

Two Dimensional ◽

Nonlinear Optical Material ◽

X Ray ◽

Cell Parameters ◽

Force Microscopy ◽

Atomic Force ◽

Growth Method ◽

Temperature Solution

Single crystals of nonlinear optical material, L-arginine trifluoroacetate (abbreviated as LATF), were grown from an aqueous solution by the low temperature solution growth method. The cell parameters of the grown crystal were determined by the X-ray powder diffraction analysis. Atomic force microscopy (AFM) was used to investigate the surface morphology of {101} cleavage faces of LATF. Straight steps and two-dimensional nuclei were observed. Liquid inclusions and impurities as defects for revealing macrosteps were demonstrated. The molecular structure and crystal structure correlative with surface morphology were discussed.

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Morphology of Silver Thin Films Deposited on TiO2(110) Surfaces

Surface Review and Letters ◽

10.1142/s0218625x98000712 ◽

1998 ◽

Vol 05 (01) ◽

pp. 387-392 ◽

Cited By ~ 18

Author(s):

D. Abriou ◽

D. Gagnot ◽

J. Jupille ◽

F. Creuzet

Keyword(s):

Photoelectron Spectroscopy ◽

Room Temperature ◽

Oxygen Vacancies ◽

Two Dimensional ◽

Silver Films ◽

X Ray ◽

Force Microscopy ◽

Atomic Force ◽

Silver Deposits ◽

Silver Thin Films

The growth mode of silver films deposited at room temperature on TiO 2(110) surfaces has been examined by means of atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) in ultrahigh vacuum (UHV) conditions, On clean vacancy-free TiO 2(110) surfaces, 0.1-nm-thick (on average) Ag deposits form a two-dimensional (2D) layer. When the thickness of the silver overlayer is increased, 3D clusters are shown to appear while the 2D film is preserved, furthermore, the influence of surface oxygen vacancies on the growth of Ag/TiO 2(110) is evidenced by well-characterized differences in the morphology of 9-nm-thick silver deposits.

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