Analysis on Surface Roughness and Surface Reflectance through DOE

In this work, a Full Factorial Experimentation technique, Design of Experiment (DOE) was developed and used to control the parameter of RIE (Reactive Ion Etching) process on a silicon wafer with aluminium layer. The objective of this work is to examine the Reactive Ion Etching (RIE) process on aluminium with different parameter, which are temperature, vacuum, RF (Radio Frequency) power and gas flow. Then, AFM (Atomic Force Microscope) and Lambda 950 spectrometer are used to analyse the grain size and light reflectance on the test specimen after RIE process. From the result, all four parameters of RIE were give an effect on grain size and surface reflectance on the test specimen. The parameter of gas flow is the most influence factor for grain size and surface reflectance in RIE process for aluminium layer compared to other parameters in this work.

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Control of Trenching and Surface Roughness in Deep Reactive Ion Etched 4H and 6H SiC

MRS Proceedings ◽

10.1557/proc-0911-b10-15 ◽

2006 ◽

Vol 911 ◽

Cited By ~ 9

Author(s):

Glenn M. Beheim ◽

Laura J. Evans

Keyword(s):

Surface Roughness ◽

Process Parameters ◽

Gas Flow ◽

Systematic Investigation ◽

High Rate ◽

Effect Of Temperature ◽

Important Process ◽

Deep Reactive Ion Etching ◽

Substrate Heating ◽

Full Factorial

AbstractAn optimized deep reactive ion etching (DRIE) process for the fabrication of SiC microstructures has been developed. The optimized process enables the etching of 4H and 6H SiC to depths > 100 microns with the required characteristics of (1) high rate (>0.5 microns/min), (2) vertical sidewalls, (3) minimal microtrenching at the sidewall base, and (4) smooth etched surfaces. The optimized process was determined based on the results of an experiment (full factorial design) which determined how the etch characteristics are affected by four important process parameters: temperature of the wafer chuck, pressure within the chamber, and concentrations of O2 and Ar in a gas flow comprised of O2, Ar and SF6. This study is believed to be the first systematic investigation of the effect of temperature on SiC DRIE characteristics; substrate heating was found to be a key in producing the desired etch properties.

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Wettability and Surface Roughness Study on RIE Treated Aluminium Deposited Surface

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.925.101 ◽

2014 ◽

Vol 925 ◽

pp. 101-104

Author(s):

Vithyacharan Retnasamy ◽

Zaliman Sauli ◽

Uda Hashim ◽

Moganraj Palianysamy ◽

Aaron Koay Terr Yeow ◽

...

Keyword(s):

Surface Roughness ◽

Contact Angle ◽

Factorial Design ◽

Process Parameters ◽

Design Of Experiment ◽

Etch Rate ◽

Contact Angles ◽

Atomic Force ◽

Roughness Analysis ◽

Full Factorial

Design of Experiment (DOE) is a technique for optimizing process which has controllable inputs and measurable outputs. As a method of DOE, 24 Full Factorial design is used to study the effect of Reactive Ion Etch towards the surface roughness of aluminum pad and effect of the roughness produced towards the contact angle. Surface roughness analysis is done using Atomic Force Microscop (AFM). Contact angle is measured using AutoCad software from the images captured from droplet test. This contact angles must be more than 90° for non-wetting profile or less than 90° for wetting profile. This work is also done to understand the interaction between the process parameters and how each parameters will affect the etch rate. The results are analyzed which shows that the increase in surface roughness produces an increase on the contact angle and vice versa.

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DEPOSITION AND CHARACTERIZATION OF TiN-COATED STEELS AT VARIOUS N2 GAS FLOW RATES WITH CONSTANT ETCHING BY USING CAPVD TECHNIQUE

Surface Review and Letters ◽

10.1142/s0218625x07009104 ◽

2007 ◽

Vol 14 (01) ◽

pp. 93-100 ◽

Cited By ~ 2

Author(s):

MUBARAK ALI ◽

ESAH BINTI HAMZAH ◽

MOHD RADZI HJ. MOHD TOFF

Keyword(s):

Surface Roughness ◽

Physical Vapor Deposition ◽

Gas Flow ◽

Hard Coatings ◽

Force Microscopy ◽

Atomic Force ◽

Coated Tool ◽

Excellent Adhesion ◽

Cathodic Arc

Cathodic Arc Physical Vapor Deposition (CAPVD), a technique used for the deposition of hard coatings, for tooling applications, has many advantages. The main drawback of this technique is the formation of macrodroplets (MDs) during deposition, resulting in films with rougher morphology. Constant etching, by increasing nitrogen gas flow rate up to 200 sccm, helped in reducing the MD size and number; at higher rates, of say 300 sccm, the behavior was reversed. Minimum value of surface roughness recorded at 200 sccm was measured via both surface roughness tester and atomic force microscopy (AFM). Micro-Vickers hardness of TiN -coated tool showed about 564% times increase in hardness than the uncoated one. Scratch tester was used to study the critical loads for the coating and the excellent adhesion achievable, of say 200 sccm, was demonstrated, with relevance to the various modes.

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Reactive Ion Etching Parameter Effect on Aluminum Bond Pad Surface Morphology

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.925.140 ◽

2014 ◽

Vol 925 ◽

pp. 140-143

Author(s):

Moganraj Palianysamy ◽

Zaliman Sauli ◽

Uda Hashim ◽

Vithyacharan Retnasamy ◽

Steven Taniselass ◽

...

Keyword(s):

Experimental Study ◽

Surface Roughness ◽

Surface Morphology ◽

Gas Flow ◽

Reactive Ion Etching ◽

Important Process ◽

Ion Etching ◽

Argon Gas ◽

Atomic Force ◽

Surface Morphologies

Reactive Ion Etching (RIE) is an important process in fabrication of semiconductor devices. Design Of Experiment (DOE) has been used to study the effect of Reactive Ion Etch (RIE) towards surface morphology of aluminum bond pad. Important RIE factors involved in this experimental study are ratio of Tetrafluoromethane (CF4), Argon gas flow, BIAS, and ICP power. Different combinations of these factors produces different results of surface morphologies which was obtained using Atomic Force Microscopic (AFM). Produced results shows that overall surface roughness of the pad is affected by RIE and DOE offers a better way to optimize the desired outcome.

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Reactive Ion Etching Parameter Effect on Aluminum Bond Pad Surface Morphology

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.925.84 ◽

2014 ◽

Vol 925 ◽

pp. 84-87

Author(s):

Moganraj Palianysamy ◽

Zaliman Sauli ◽

Uda Hashim ◽

Vithyacharan Retnasamy ◽

Steven Taniselass ◽

...

Keyword(s):

Experimental Study ◽

Surface Roughness ◽

Surface Morphology ◽

Gas Flow ◽

Reactive Ion Etching ◽

Important Process ◽

Ion Etching ◽

Argon Gas ◽

Atomic Force ◽

Surface Morphologies

Reactive Ion Etching (RIE) is an important process in fabrication of semiconductor devices. Design Of Experiment (DOE) has been used to study the effect of Reactive Ion Etch (RIE) towards surface morphology of aluminum bond pad. Important RIE factors involved in this experimental study are ratio of Tetrafluoromethane (CF4), Argon gas flow, BIAS, and ICP power. Different combinations of these factors produces different results of surface morphologies which was obtained using Atomic Force Microscopic (AFM). Produced results shows that overall surface roughness of the pad is affected by RIE and DOE offers a better way to optimize the desired outcome.

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Surface roughness measurements of vanadium-contaminated fluidized cracking catalysts by atomic force microscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100166798 ◽

1996 ◽

Vol 54 ◽

pp. 866-867

Author(s):

H. Kinney ◽

M.L. Occelli ◽

S.A.C. Gould

Keyword(s):

Surface Roughness ◽

Zeolite Y ◽

Atomic Level ◽

Microporous Structure ◽

Contact Mode ◽

Force Microscopy ◽

Atomic Force ◽

Before And After ◽

Roughness Measurements ◽

Cracking Catalysts

For this study we have used a contact mode atomic force microscope (AFM) to study to topography of fluidized cracking catalysts (FCC), before and after contamination with 5% vanadium. We selected the AFM because of its ability to well characterize the surface roughness of materials down to the atomic level. It is believed that the cracking in the FCCs occurs mainly on the catalysts top 10-15 μm suggesting that the surface corrugation could play a key role in the FCCs microactivity properties. To test this hypothesis, we chose vanadium as a contaminate because this metal is capable of irreversibly destroying the FCC crystallinity as well as it microporous structure. In addition, we wanted to examine the extent to which steaming affects the vanadium contaminated FCC. Using the AFM, we measured the surface roughness of FCCs, before and after contamination and after steaming.We obtained our FCC (GRZ-1) from Davison. The FCC is generated so that it contains and estimated 35% rare earth exchaged zeolite Y, 50% kaolin and 15% binder.

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Brittle Behaviour in Aspirin Crystals: Evidence of Spalling Fracture

10.26434/chemrxiv.13238708.v1 ◽

2020 ◽

Author(s):

Benjamin P. A. Gabriele ◽

Craig J. Williams ◽

Douglas Stauffer ◽

Brian Derby ◽

Aurora J. Cruz-Cabeza

Keyword(s):

Surface Roughness ◽

Atomic Force Microscopy ◽

Single Crystals ◽

Spalling Fracture ◽

Force Microscopy ◽

Atomic Force ◽

Afm Imaging

<div> <div> <div> <p>Single crystals of aspirin form I were cleaved and indented on their dominant face. Upon inspection, it was possible to observe strongly anisotropic shallow lateral cracks due to the extreme low surface roughness after cleavage. Atomic Force Microscopy (AFM) imaging showed spalling fractures nucleating from the indent corners, forming terraces with a height of one or two interplanar spacings d100. The formation of such spalling fractures in aspirin was rationalised using basic calculations of attachment energies, showing how (100) layers are poorly bonded when compared to their relatively higher intralayer bonding. An attempt at explaining the preferential propagation of these fractures along the [010] direction is discussed. </p> </div> </div> </div>

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Brittle Behaviour in Aspirin Crystals: Evidence of Spalling Fracture

10.26434/chemrxiv.13238708 ◽

2020 ◽

Author(s):

Benjamin P. A. Gabriele ◽

Craig J. Williams ◽

Douglas Stauffer ◽

Brian Derby ◽

Aurora J. Cruz-Cabeza

Keyword(s):

Surface Roughness ◽

Atomic Force Microscopy ◽

Single Crystals ◽

Spalling Fracture ◽

Force Microscopy ◽

Atomic Force ◽

Afm Imaging

<div> <div> <div> <p>Single crystals of aspirin form I were cleaved and indented on their dominant face. Upon inspection, it was possible to observe strongly anisotropic shallow lateral cracks due to the extreme low surface roughness after cleavage. Atomic Force Microscopy (AFM) imaging showed spalling fractures nucleating from the indent corners, forming terraces with a height of one or two interplanar spacings d100. The formation of such spalling fractures in aspirin was rationalised using basic calculations of attachment energies, showing how (100) layers are poorly bonded when compared to their relatively higher intralayer bonding. An attempt at explaining the preferential propagation of these fractures along the [010] direction is discussed. </p> </div> </div> </div>

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Assessing the Functional Properties of TiZr Nanotubular Structures for Biomedical Applications, through Nano-Scratch Tests and Adhesion Force Maps

Molecules ◽

10.3390/molecules26040900 ◽

2021 ◽

Vol 26 (4) ◽

pp. 900

Author(s):

Maria Vardaki ◽

Aida Pantazi ◽

Ioana Demetrescu ◽

Marius Enachescu

Keyword(s):

Surface Roughness ◽

Functional Properties ◽

Bacterial Adhesion ◽

Biomedical Applications ◽

Adhesion Force ◽

Roughness Parameters ◽

Force Microscopy ◽

Atomic Force ◽

The Mean ◽

Scratch Tests

In this work we present the results of a functional properties assessment via Atomic Force Microscopy (AFM)-based surface morphology, surface roughness, nano-scratch tests and adhesion force maps of TiZr-based nanotubular structures. The nanostructures have been electrochemically prepared in a glycerin + 15 vol.% H2O + 0.2 M NH4F electrolyte. The AFM topography images confirmed the successful preparation of the nanotubular coatings. The Root Mean Square (RMS) and average (Ra) roughness parameters increased after anodizing, while the mean adhesion force value decreased. The prepared nanocoatings exhibited a smaller mean scratch hardness value compared to the un-coated TiZr. However, the mean hardness (H) values of the coatings highlight their potential in having reliable mechanical resistances, which along with the significant increase of the surface roughness parameters, which could help in improving the osseointegration, and also with the important decrease of the mean adhesion force, which could lead to a reduction in bacterial adhesion, are providing the nanostructures with a great potential to be used as a better alternative for Ti implants in dentistry.

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