Study on the Adhesion of Films on Gd by Magnetron Sputtering

2011 ◽  
Vol 214 ◽  
pp. 316-319
Author(s):  
Xiao Qiu Zheng ◽  
Shi Kun Xie ◽  
Rong Xi Yi
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Magnetron Sputtering ◽  
Protective Coating ◽  
Tension Test ◽  
Dc Magnetron Sputtering ◽  
Average Strength ◽  
Scanning Electron ◽  
Strength Of Adhesion

In order to research the adhesion of sputtering protective coating of Gd. Gd substrates were differently coated with 1Cr18Ni9Ti, Ti, Cu and Al by means of DC magnetron sputtering technology. The characteristics of the films were investigated by scanning electron microscopy (SEM), EDS, and the adhesions of films were tested by tension test. The results show that the films of 1Cr18Ni9Ti, Ti and Al are smooth and perfect, the interferences between 1Cr18Ni9Ti, Ti, Al and Gd join together strongly, and the average strength of adhesion is 25MPa in these tests on the optimize parameters. While the films of Cu are rough and bad, the interferences between Cu and Gd join together loosely, and the largest strength of adhesion is only 3.02MPa in these tests on the optimize parameters.

Research on the Adhesion of Stainless Steel Film on Gd by Magnetron Sputtering

2011 ◽  
Vol 189-193 ◽  
pp. 129-136
Author(s):  
Xiao Qiu Zheng ◽  
Shi Kun Xie ◽  
Rong Xi Yi
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Stainless Steel ◽  
Magnetron Sputtering ◽  
Protective Coating ◽  
Tension Test ◽  
Dc Magnetron Sputtering ◽  
Thin Fiber ◽  
Scanning Electron ◽  
Strength Of Adhesion

In order to research the adhesion of sputtering protective coating of Gd. Gd substrates was coated with 1Cr18Ni9Ti by means of DC magnetron sputtering technology. The characteristics of the film were investigated by scanning electron microscopy (SEM), EDS, SPM and the adhesions of film was tested by tension test. The results show that the films of 1Cr18Ni9Ti are distributed by means of islands when the sputtering was initiated and the grains are like thin fiber. After a few minutes, the films are smooth and perfect, the interferences between 1Cr18Ni9Ti and Gd join together strongly, and the largest strength of adhesion is 24.7MPa when the sputtering density is 966 w/cm2 and the sputtering time is 8 minutes.

Effects of Process Parameters on the Adhesion of Sputtering Protective Coating of Gd

2010 ◽  
Vol 148-149 ◽  
pp. 633-639
Author(s):  
Xiao Qiu Zheng ◽  
Shi Kun Xie ◽  
Rong Xi Yi
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Experimental Design ◽  
Magnetron Sputtering ◽  
Protective Coating ◽  
Tension Test ◽  
Orthogonal Experimental Design ◽  
Dc Magnetron Sputtering ◽  
Scanning Electron ◽  
Strength Of Adhesion

In order to research the adhesion of sputtering protective coating of Gd.Gd substrates were differently coated with Cu and Al by means of DC magnetron sputtering technology. The characteristics of the films were investigated by scanning electron microscopy (SEM), EDS, and the adhesions of films were tested by tension test. The results show that the films of Al are smooth and perfect, the interferences between Al and Gd join together strongly, and the largest strength of adhesion is 27.6MPa in these tests on the optimize parameters through orthogonal experimental design. While the films of Cu are rough and bad, the interferences between Cu and Gd join together loosely, and the largest strength of adhesion is only 3.02MPa in these tests on the optimize parameters through orthogonal experimental design.

Study on the Adhesion Properties of Protective Films to the Magnetic Refrigerant Material

2011 ◽  
Vol 239-242 ◽  
pp. 364-367
Author(s):  
Xiao Qiu Zheng ◽  
Yong Ping Ai
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Photoelectron Spectroscopy ◽  
Tension Test ◽  
Dc Magnetron Sputtering ◽  
Adhesion Properties ◽  
X Ray ◽  
Magnetic Refrigerant ◽  
Protective Films ◽  
Scanning Electron

Gd substrates were differently coated with Ti and 1Cr18Ni9Ti by means of DC magnetron sputtering technology. The characteristics of the films have been investigated by scanning electron microscopy(SEM), EDS,X-ray photoelectron spectroscopy(XPS),and the adhesion of films were tested by tension test. The results show that the surfaces of films are smooth and perfect, the interferences between Gd and films join together strongly, and the adhesion strengths are larger than 15MPa in these tests.

scholarly journals Effects of Long Durations of RF–Magnetron Sputtering Deposition of Hydroxyapatite on Titanium Dental Implants

2021 ◽  
Author(s):  
Ihab Nabeel Safi ◽  
Basima Mohammed Ali Hussein ◽  
Hikmat J. Aljudy ◽  
Mustafa S. Tukmachi
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Magnetron Sputtering ◽  
Dental Implants ◽  
Substrate Surface ◽  
Rf Magnetron Sputtering ◽  
P Value ◽  
Edx Analysis ◽  
Significant Difference ◽  
Scanning Electron

Abstract Objectives Dental implant is a revolution in dentistry; some shortages are still a focus of research. This study use long duration of radiofrequency (RF)–magnetron sputtering to coat titanium (Ti) implant with hydroxyapatite (HA) to obtain a uniform, strongly adhered in a few micrometers in thickness. Materials and Methods Two types of substrates: discs and root form cylinders were prepared using a grade 1 commercially pure (CP) Ti rod. A RF–magnetron sputtering device was used to coat specimens with HA. Magnetron sputtering was set at 150 W for 22 hours at 100°C under continuous argon gas flow and substrate rotation at 10 rpm. Coat properties were evaluated via field emission scanning electron microscopy (FESEM), scanning electron microscopy–energy dispersive X-ray (EDX) analysis, atomic force microscopy, and Vickers hardness (VH). Student’s t-test was used. Results All FESEM images showed a homogeneous, continuous, and crack-free HA coat with a rough surface. EDX analysis revealed inclusion of HA particles within the substrate surface in a calcium (Ca)/phosphorus (P) ratio (16.58/11.31) close to that of HA. Elemental and EDX analyses showed Ca, Ti, P, and oxygen within Ti. The FESEM views at a cross-section of the substrate showed an average of 7 µm coat thickness. Moreover, these images revealed a dense, compact, and uniform continuous adhesion between the coat layer and the substrate. Roughness result indicated highly significant difference between uncoated Ti and HA coat (p-value < 0.05). A significant improvement in the VH value was observed when coat hardness was compared with the Ti substrate hardness (p-value < 0.05). Conclusion Prolonged magnetron sputtering successfully coat Ti dental implants with HA in micrometers thickness which is well adhered essentially in excellent osseointegration.

EPITAXIALLY GROWN YBCO THIN FILMS ON LOW LOSS LaAlO3 SUBSTRATE

1990 ◽  
Vol 04 (05) ◽  
pp. 369-373 ◽  
Author(s):  
Y. Z. ZHANG ◽  
L. LI ◽  
Y. Y. ZHAO ◽  
B. R. ZHAO ◽  
Y. G. WANG ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Scanning Electron Microscopy ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
Low Loss ◽  
X Ray ◽  
Ybco Thin Films ◽  
Zero Resistance ◽  
Scanning Electron

A planar dc magnetron sputtering device was used to prepare high T c and high J c YBCO thin films. Both single crystal and polycrystal thin films were successfully grown on (100) oriented LaAlO 3 substrates. Zero resistance temperature T c0 = 92.3 K and critical current density J c (0) = 3.82 × 106 A/cm 2 at 77 K was obtained. The films were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM).

Enhancement of Cu Nanoparticles Dispersion in Nanolubricants by Magnetron Sputtering Deposition and Its Influence on the Tribological Behavior

2021 ◽  
Vol 143 (11) ◽  
Author(s):  
M. F. Trajano ◽  
D. F. Franceschini ◽  
Edimilson F. Silva ◽  
M. Assolin Correa ◽  
F. Bohn ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Magnetron Sputtering ◽  
Tribological Properties ◽  
Nanoparticle Dispersion ◽  
Cu Nanoparticles ◽  
Sputtering Deposition ◽  
X Ray Scattering ◽  
Nanoparticles Dispersion ◽  
Scanning Electron

Abstract We investigated the chemical, physical, and tribological properties of nanolubricants consisting of epoxidized sunflower oil with Cu nanoparticles as additive. These latter are produced by magnetron sputtering at distinct current levels in the deposition, to improve the development of nanolubricants by enhancing the nanoparticles dispersion. The nanolubricants are here characterized by Fourier transform infrared spectroscopy, zeta potential, ultraviolet–visible absorbance spectroscopy, small-angle X-ray scattering, and scanning electron microscopy. After all, the tribological properties of the bionanolubricants are investigated using a high-frequency reciprocating rig equipment, scanning electron microscopy, and energy dispersive spectroscopy. Our results disclose the nanolubricants produced using the magnetron sputtering technique have excellent nanoparticle dispersion, as well as good tribological performance.

The Microstructure and Tribological Behavior of Ti/a-C and Ti/a-C:H Films Prepared by Magnetron Sputtering

2013 ◽  
Vol 420 ◽  
pp. 123-128
Author(s):  
Chun Fu Hong ◽  
Jian Zhong Wang ◽  
Wei Yan ◽  
Ang Ding ◽  
Zhi Yong Liu ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Mechanical Properties ◽  
Scanning Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Magnetron Sputtering ◽  
Tribological Behavior ◽  
Carbon Matrix ◽  
High Wear Resistance ◽  
Transmission Electron ◽  
Scanning Electron

This paper reports two films, Ti/a-C and Ti/a-C:H, prepared on the Ti-6Al-4V alloys by magnetron sputtering in PVD and CVD process, respectively. The morphology and microstructure were characterized by Raman spectroscopy, scanning electron microscopy and transmission electron microscopy. Both films show nanosized Ti clusters incorporated into the amorphous carbon matrix. Mechanical properties of the films were investigated by nanoindentation and ball-on-disk tribo-test. Ti/a-C film shows a hardness as high as 40.9 GPa, while that of Ti/a-C:H is 12.2 GPa. Both films show reduced friction and high wear resistance.

scholarly journals Порообразование в тонких пленках германия при имплантации ионов Ge-=SUP=-+-=/SUP=-

2020 ◽  
Vol 46 (14) ◽  
pp. 33
Author(s):  
Н.М. Лядов ◽  
Т.П. Гаврилова ◽  
С.М. Хантимеров ◽  
В.В. Базаров ◽  
Н.М. Сулейманов ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Ion Implantation ◽  
Magnetron Sputtering ◽  
Ultrahigh Vacuum ◽  
Germanium Films ◽  
Fluence Range ◽  
Scanning Electron ◽  
Implantation Fluence

The results of a study of the morphology of the nanostructured by ion implantation germanium films are presented. The film samples were grown using the magnetron sputtering method in an ultrahigh vacuum and then were irradiated with Ge+ ions of 40 keV energy in the fluence range of (1.8–8)×10(16) ion/cm2. Using the scanning electron microscopy it was found that in the implanted germanium volume the vacancy complexes with a diameter of 50–150 nm gradually form and come to the surface upon reaching a certain implantation fluence, forming a developed relief of the irradiated films.

Effect of Yttrium(Y) Content in Al Target on the Thickness of CrAlTiN Film by Magnetron Sputtering

2008 ◽  
Vol 373-374 ◽  
pp. 163-166 ◽  
Author(s):  
Zhao Zheng Liu ◽  
Yao Hui Liu ◽  
Bai Ling Jiang ◽  
Si Rong Yu
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Magnetron Sputtering ◽  
Vacuum Chamber ◽  
Collision Probability ◽  
Neutral Particles ◽  
Positive Ions ◽  
Sputtering Yield ◽  
Scanning Electron

In this experiment UDP450 was used to prepare the CrAlTiN films with different Y contents deposited on Si(100) substrates. The thickness and structure of CrAlTiN films were characterized by scanning electron microscopy (SEM). The results show that the thickness of CrAlTiN films increases with the increasing of Y contents in Al targets. Meanwhile, the structures of these films are column structures with the least changes. XPS and EDS results indicate that Al contents in the films also increased with the increasing of Y contents in Al targets. Voltages of Al targets were changed with the variation of Y contents in Al targets when CrAlTiN layers were formed. The current of Al targets was a constant during producing CrAlTiN layer. The original voltages of Al targets during forming CrAlTiN layers increased greatly with the increase of Y contents in Al targets. The results show that the collision probability between the neutral particles and positive ions increased in the vacuum chamber. This indicates that the sputtering yield of Al targets is increased at a higher voltage. Consequently, the growing speed of CrAlTiN film and the sputtering yield of Al targets are all improved with the addition of Y element.

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