Properties of Li-Doped ZnO Films Deposited on Diamond Films

2013 ◽  
Vol 544 ◽  
pp. 234-237
Author(s):  
Mei Ai Lin ◽  
Lin Jun Wang ◽  
Jian Huang ◽  
Ke Tang ◽  
Bing Ren ◽  
...  
Keyword(s):  
Diamond Films ◽  
Hall Effect Measurement ◽  
Zno Films ◽  
Radio Frequency Magnetron Sputtering ◽  
X Ray Diffraction ◽  
X Ray ◽  
Doped Zno ◽  
Effect Of Oxygen ◽  
Reactive Gas

Li-doped zinc oxide (ZnO) films were deposited on nucleation side of freestanding diamond (FSD) films by the radio frequency magnetron sputtering method. The effect of oxygen partial pressure on structural, optical and electrical properties of the ZnO films was investigated by X-ray diffraction (XRD) Raman spectroscopy, semiconductor characterization system and Hall effect measurement system. The results showed that the introduction of oxygen as a reactive gas was helpful to improve the crystalline quality of Li-doped ZnO films.

The Fine Structure of the Mn Distribution in ZnO Layers Deposited by Magnetron Sputtering for Spintronic Application

2007 ◽  
Vol 999 ◽  
Author(s):  
Morad Abouzaid ◽  
Pierre Ruterana
Keyword(s):  
Magnetron Sputtering ◽  
Interface Reaction ◽  
Radio Frequency Magnetron Sputtering ◽  
X Ray Diffraction ◽  
X Ray ◽  
Transmission Electron ◽  
Doped Zno ◽  
Mn Doped ◽  
Spintronic Application

AbstractIn this work, we carry out structural analysis of ferromagnetic Mn-doped ZnO thin films deposited by radio frequency magnetron sputtering, using transmission electron microscopy (TEM) and high resolution x-ray diffraction. On top of sapphire (0001) substrates, Mn rich precipitates and an interface reaction layer are observed following the deposition of Zn(Mn)O layers above 500°C. The crystalline quality of ZnO layers deposited by magnetron sputtering is highly improved at 500°C as well as the measured ferromagnetic response.

Effect of Oxygen Partial Pressure on Properties of ZnO Films Deposited on Freestanding Diamond Films

2013 ◽  
Vol 544 ◽  
pp. 230-233
Author(s):  
Ke Tang ◽  
Lin Jun Wang ◽  
Jian Huang ◽  
Bing Ren ◽  
Jie Zhou ◽  
...  
Keyword(s):  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Diamond Films ◽  
Flux Ratio ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
X Ray ◽  
Effect Of Oxygen ◽  
Ar Gas

Highly c-axis-oriented ZnO films were deposited successfully on the nucleation sides of freestanding diamond (FSD) films by the direct current (DC) magnetron sputtering method in an oxygen (O2) + argon (Ar) gas mixture. The effect of oxygen partial pressure on properties of ZnO films was investigated by X-ray diffraction (XRD). The results showed that when flux ratio of argon to oxygen was 1, the ZnO films had a better crystalline quality.

The Effect of the Cu Source on Optical Properties of Cu-Doped ZnO Films

2014 ◽  
Vol 936 ◽  
pp. 618-623
Author(s):  
Lung Chien Chen ◽  
Xiu Yu Zhang ◽  
Kuan Lin Lee
Keyword(s):  
Optical Properties ◽  
Copper Acetate ◽  
Copper Nitrate ◽  
Zno Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Ultrasonic Spray ◽  
Spray Method ◽  
Potential Applications ◽  
Doped Zno

Cu-doped ZnO (CZO) films have been widely discussed due to its potential applications in semiconductor devices, such as gas sensors or solar cells, but few articles were reported to show the effect on properties of CZO films by using different Cu sources. The article demonstrates that CZO films have been prepared by using different Cu source via a simple ultrasonic spray method, in which copper nitrate and copper acetate were used as copper sources. Optical properties of CZO films prepared by copper nitrate and copper acetate were investigated by transmittance and photoluminescence measurement. The X-ray diffraction analysis and field emission scanning electron microscopy were used to investigate the composition and the morphology of the films. The CZO films prepared by using copper acetate shows better optical properties by comprehensive analysis.

Properties of Nano-ZnO Films Deposited by RF Magnetron Sputtering for SAW Biosensors

2011 ◽  
Vol 418-420 ◽  
pp. 293-296
Author(s):  
Qiu Yun Fu ◽  
Peng Cheng Yi ◽  
Dong Xiang Zhou ◽  
Wei Luo ◽  
Jian Feng Deng
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Time ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Zno Film ◽  
Nano Zno ◽  
Axis Orientation ◽  
X Ray

Abstract. In this article, nano-ZnO films were deposited on SiO2/Si (100) substrates by RF (radio frequency) magnetron sputtering using high purity (99.99%) ZnO target. The effects of deposition time and annealing temperature have been investigated. XRD (X-ray diffraction) and FSEM (Field Emission Scanning Electron Microscopy) were employed to characterize the quality of the films. The results show that the ZnO film with thickness of 600nm annealed at 900°C has higher quality of both C-axis orientation and crystallization. And for the Zone film with thickness of 300nm annealed at 850°C, the quality of both C-axis orientation and crystallization is higher than that annealed at 900°C and 950°C.

The Role of Oxygen Ambience on the Optical Characteristics of ZnO Films

2013 ◽  
Vol 711 ◽  
pp. 26-31
Author(s):  
Feng Li ◽  
Ru Yuan Ma
Keyword(s):  
Grain Size ◽  
Oxygen Vacancies ◽  
Green Emission ◽  
Intensity Change ◽  
Zno Films ◽  
Radio Frequency Magnetron Sputtering ◽  
X Ray Diffraction ◽  
X Ray ◽  
Uv Emission

Zinc oxide (ZnO) films are grown by two methods-pulse laser deposition (PLD) and radio-frequency magnetron sputtering at various oxygen ambiences. Based on x-ray diffraction spectra and photoluminescence (PL) spectra, effects of the oxygen ambient on the grain size and emission properties of the ZnO films are investigated. For the samples grown by PLD, the PL spectrum consists of a single ultraviolet (UV) peak except one sample deposited at a low O2 pressure of 7 Pa. All the samples grown by sputtering have both a UV peak and a green emission. The disappearance of the green emission of the PLD samples is ascribed to deficiency of oxygen vacancies (Ov), and the green emission of the sample grown by sputtering is due to abundant Ov. The intensity change of the UV emission is due to the variation of exciton emission, which is related to grain size and stoichiometry. The position shifting of the UV peak of the PLD samples originates from the Zn interstitial-related degradation of stoichiometry.

Effect of Ruthenium Concentration on Structural and I-V Characteristics of ZnO Thin Films by Sol–Gel Method

2017 ◽  
Vol 05 (01) ◽  
pp. 1750004
Author(s):  
R. Vettumperumal ◽  
S. Kalyanaraman ◽  
R. Thangavel
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Zno Thin Films ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
Gel Method ◽  
X Ray ◽  
Sol Gel Method ◽  
Doped Zno

Nanocrystalline ruthenium (Ru)-doped ZnO thin films on sapphire substrate was prepared using sol–gel method by spin coating technique. The structural and I-V characteristics of Ru doped ZnO thin films were studied from the X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM) analysis and Raman spectroscopy. X-ray diffraction (XRD) results revealed that the deposited films belonged to hexagonal wurtzite structure with c-axis orientation. It is also confirmed from the Raman spectra. Enhancement of longitudinal optical (LO) phonon is observed by the strong electron–phonon interaction. An observed increment in sheet resistance with increase in dopant percentage of Ru (1–2[Formula: see text]mol%) in ZnO films was found and better I-V characteristic behavior was observed at 1[Formula: see text]mol% of Ru-doped ZnO thin films. Trap limited current flow inside the material was calculated from the log I versus log V plot in the higher voltage region.

Effect of N and P codoping on ZnO properties

2013 ◽  
Vol 645 ◽  
pp. 64-67 ◽  
Author(s):  
Jin Zhong Wang ◽  
Elangovan Elamurugu ◽  
Hong Tao Li ◽  
Shu Jie Jiao ◽  
Lian Cheng Zhao ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Atomic Ratio ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Nitrogen And Phosphorus ◽  
X Ray ◽  
Co Doping ◽  
Glass Substrates ◽  
Doped Zno ◽  
Co Doped

Nitrogen and Phosphorus co-doped (N+P)- zinc oxide (ZnO) films were RF sputtered on corning glass substrates at 350 °C and comparatively studied with undoped, N-, and P- doped ZnO. X-ray diffraction spectra confirmed that the ZnO structure with a preferred orientation along direction. Scanning electron microscope analysis showed different microstructure for the N+P co-doping, and thus probably confirming the co-existence of both the dopants. X-ray photoelectron spectroscopy spectra revealed that the chemical composition in N+P co-doped ZnO are different from that found in undoped, N-, and P- doped ZnO. The atomic ratio of N and P in N+P co-doped ZnO is higher than that in single N or P doped ZnO. One broad ZnO emission peak around 420 nm is observed in photoluminescence spectra. The relative intensity of the strongest peak obtained from co-doped ZnO films is about twice than the P- doped and thrice than the pure and N- doped films.

The Structural and Optical Properties of(Cu, Al):ZnO Films

2013 ◽  
Vol 641-642 ◽  
pp. 547-550 ◽  
Author(s):  
Ying Xiang Yang ◽  
Hong Lin Tan ◽  
Cheng Lin Ni ◽  
Chao Xiang
Keyword(s):  
Optical Properties ◽  
Optical Band Gap ◽  
Sol Gel ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Zno Film ◽  
Structural And Optical Properties ◽  
X Ray ◽  
Grain Sizes ◽  
Doped Zno

Un-doped and (Cu, Al)-doped ZnO thin films were prepared by sol-gel spin coating technique on glass substrate. The effect of(Cu, Al)incorporation on the structural, morphological and optical properties of the Zinc oxide (ZnO)film was investigated by means of X-ray diffraction, scanning electron microscopy and UV-vis spectrophotometer. It has been found that the grain sizes, Optical band gap and the preferred orientation growth of (002) plane were decreased with increasing of (Cu, Al) dopants amount in ZnO films.

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