Nondestructive control of the quality of automobile parts at the volzhskii automobile plant

1996 ◽  
Vol 38 (10) ◽  
pp. 450-452
Author(s):  
A. V. Novikov ◽  
V. V. Fedorov
Author(s):  
S. P. Bersenev ◽  
E. M. Slobtsova

Achievements in the area of automated ultrasonic control of quality of rails, solid-rolled wheels and tyres, wheels magnetic powder crack detection, carried out at JSC EVRAZ NTMK. The 100% nondestructive control is accomplished by automated control in series at two ultrasonic facilities RWI-01 and four facilities УМКК-1 of magnetic powder control, installed into the exit control line in the wheel-tyre shop. Diagram of location, converters displacement and control operations in the process of control at the facility RWI-01 presented, as well as the structural diagram of the facility УМКК-1. The automated ultrasonic control of rough tyres is made in the tyres control line of the wheel-tyre shop at the facility УКБ-1Д. The facility enables to control internal defects of tyres in radial, axis and circular directions of radiation. Possibilities of the facility УКБ-1Д software were shown. Nondestructive control of railway rails is made at two facilities, comprising the automated control line of the rail and structural shop. The УКР-64Э facility of automated ultrasonic rails control is intended to reveal defects in the area of head, web and middle part of rail foot by pulse echo-method with a immersion acoustic contact. The diagram of rail P65 at the facility УКР-64Э control presented. To reveal defects of the macrostructure in the area of rail head and web by mirror-shadow method, an ultrasonic noncontact electromagnetic-acoustic facility is used. It was noted, that implementation of the 100% nondestructive control into the technology of rolled stuff production enabled to increase the quality of products supplied to customers and to increase their competiveness.


2018 ◽  
Vol 11 (4) ◽  
pp. 443-452
Author(s):  
Kovarskaya Elena Z. ◽  
◽  
Moskovenko Igor B. ◽  
Shadrina Maria S. ◽  
◽  
...  

2014 ◽  
Vol 9 (3) ◽  
pp. 80-85 ◽  
Author(s):  
Kazuhiko Kitamura ◽  
Kazuhito Asai ◽  
Motoki Terano

Author(s):  
P. S. Gurchenko ◽  
Yu. E. Cazyuchits ◽  
A. M. Skibar ◽  
B. A. Chepyzhov

The data on the creation of the Minsk automobile plant, the formation and development of its foundre shops, measures taken to ensure the growth of the volume and quality of iron and steel casting on MAW are given. The measures to improve working conditions at the plant and improve the environmental situation are shown. The brief characteristics of the technological processes created at MAW for obtaining steel cast heat-treated shot and briquetting metal chips using induction heating, as well as modern molding and core mixtures and equipment developed at MAW and eqiopment created at OJSC «BELNIILIT», are given.


1972 ◽  
Vol 11 (12) ◽  
pp. 995-996
Author(s):  
V. S. Dvuglyanskii ◽  
V. A. Il'nitskii ◽  
N. A. Belozub ◽  
N. S. Sobchuk

Author(s):  
K. T. Tokuyasu

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).


Author(s):  
L. D. Jackel

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.


Author(s):  
G. Lehmpfuhl

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.


Author(s):  
K. Shibatomi ◽  
T. Yamanoto ◽  
H. Koike

In the observation of a thick specimen by means of a transmission electron microscope, the intensity of electrons passing through the objective lens aperture is greatly reduced. So that the image is almost invisible. In addition to this fact, it have been reported that a chromatic aberration causes the deterioration of the image contrast rather than that of the resolution. The scanning electron microscope is, however, capable of electrically amplifying the signal of the decreasing intensity, and also free from a chromatic aberration so that the deterioration of the image contrast due to the aberration can be prevented. The electrical improvement of the image quality can be carried out by using the fascionating features of the SEM, that is, the amplification of a weak in-put signal forming the image and the descriminating action of the heigh level signal of the background. This paper reports some of the experimental results about the thickness dependence of the observability and quality of the image in the case of the transmission SEM.


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