Optical and electrical properties of TiO2/Au/TiO2 multilayer coatings in large area deposition at room temperature

Rare Metals ◽  
2008 ◽  
Vol 27 (5) ◽  
pp. 457-462 ◽  
Author(s):  
J ZHOU ◽  
Z WU ◽  
Z LIU
Keyword(s):  
Electrical Properties ◽  
Room Temperature ◽  
Multilayer Coatings ◽  
Optical And Electrical Properties ◽  
Large Area ◽  
Area Deposition

Optical and electrical properties and simulation curves of NiO/Al/NiO transparent conductive film

2019 ◽  
Vol 33 (01) ◽  
pp. 1850417 ◽  
Author(s):  
Shuyun Wang ◽  
Kailin Wen ◽  
Yang Sun ◽  
Xianwu Xiu ◽  
Shuyun Teng ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Metal Film ◽  
Room Temperature ◽  
Optical And Electrical Properties ◽  
Light Wavelength ◽  
Conductive Films ◽  
Conductive Film ◽  
Average Transmittance ◽  
Interface Characteristics ◽  
Experimental Data Analysis

In this paper, NiO/Al/NiO transparent conductive films were prepared by magnetron sputtering at the room temperature. Effects of the NiO and Al layers thicknesses on the optical and electrical properties of the NiO/Al/NiO laminated films were analyzed. When the light wavelength falls in range 300–900 nm, with the increase of the NiO and Al layers thicknesses, the transmittance of the laminated film first increases significantly and then decreases slightly, finally tends to be stable. The laminated film obtained the best optical and electrical properties when the NiO layer is 40 nm and the Al layer is 12 nm. The maximum transmittance is 83%, the average transmittance is 77.3%, the film resistivity is [Formula: see text] and the carrier concentration is [Formula: see text]. At the same time, the transmittance of laminated film is simulated by FDTD software. But the simulation curve is different from the experimental data. Analysis results show that, with the NiO dielectric is added on both sides of the metal Al film, the light reflection characteristic of laminated film has been completely different from that of the single Al metal film because of the change of interface characteristics between Al film and NiO film, and the actual luminous transmittance greatly increases.

The optical and electrical properties of silver azide and their relation to its decomposition

1958 ◽  
Vol 246 (1245) ◽  
pp. 250-253 ◽  
Keyword(s):  
Electrical Properties ◽  
Absorption Band ◽  
Room Temperature ◽  
Dielectric Constants ◽  
Optical And Electrical Properties ◽  
Silver Azide ◽  
Photo Conductivity ◽  
Mechanism And Kinetics ◽  
Kinetics Of ◽  
Absorption Measurements

In order to gain more information of the mechanism and kinetics of the decomposition of the metallic azides, we have recently made measurements of the high- and low- (radio-) frequency dielectric constants, the optical absorption, and the photo conductivity of silver azide. A complete description of this work has already bee published (McLaren & Rogers 1957) and therefore only a summary of the main results and conclusions will be given here. The absorption measurements have shown that for crystals ca . 4 x 10 -3 cm thick no measurable transmission occurs at wavelengths shorter than ca . 3000 Å, and that at liquid-air temperature there is an absorption band at 3590 Å which is not resolve at room temperature; these results have been interpreted in terms of the formation of excitons.

scholarly journals Optical and Electrical Properties of Undoped Microcrystalline Silicon Deposited by the VHF-GD with Different Dilutions of Silane in Hydrogen

1996 ◽  
Vol 452 ◽  
Author(s):  
N. Beck ◽  
P. Orres ◽  
J. Fric ◽  
Z. Remeš ◽  
A. Poruba ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Room Temperature ◽  
Crystalline Silicon ◽  
Time Of Flight ◽  
Optical And Electrical Properties ◽  
Microcrystalline Silicon ◽  
Transient Time ◽  
Deep Traps ◽  
Flight Measurements ◽  
Strong Dilution

AbstractWe show that the optical and electrical properties of microcrystalline silicon (μc-Si:H) deposited by the VHF-GD technique at 110 MHz can considerably be tuned by changing the dilution ratio of silane to hydrogen.With increasing silane dilution we observe enhanced optical absorption for energies below 2 eV due to the transition of the material from amorphous / microcrystalline mixture to a pure microcrystalline phase. Simultaneously, the light scattering and the defect absorption increases. Strong dilution also promotes the incorporation of impurities into the material, leading to a pronounced extrinsic behaviour as seen from the decrease of the activiation energy of the electrical conductivity.The electrical properties were investigated in the dark by the Time of Flight technique. We measured drift mobilities at room temperature which slightly increase with dilution, reaching values of 3 cm2/Vs for electrons and 1.2 cm2/Vs for holes. The ratio between electron and hole drift mobilities is found to be around 2 for all samples studied, similar to that of crystalline silicon.Furthermore, post-transient Time of Flight measurements revealed detrimental electron deep traps in low dilution material.

Optimization of IGZO/Cu/IGZO Multilayers as Transparent Composite Electrode on Flexible Substrate by Room-temperature Sputtering and Post-Deposition Anneals

2013 ◽  
Vol 1577 ◽  
Author(s):  
Aritra Dhar ◽  
T. L. Alford
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Sheet Resistance ◽  
Room Temperature ◽  
Flexible Substrate ◽  
Middle Layer ◽  
Optical Transmittance ◽  
Optical And Electrical Properties ◽  
Composite Electrodes ◽  
Transparent Composite

ABSTRACTHighly transparent composite electrodes made of multilayers of In- and Ga-doped ZnO and Cu (IGZO/Cu/IGZO) thin films (30/3-9/30 nm thick) are deposited onto flexible substrates at room temperature and by using radio frequency magnetron sputtering. The effect of Cu thickness on the electrical and optical properties of the multilayer stack has been studied in accordance with the Cu morphology. The optical and electrical properties of the multilayers are studied with the UV–Vis spectrophotometry, Hall measurement and four point probe analyses. Results are compared with those from a single IGZO layered thin film. The average optical transmittance and sheet resistance both decreases with increase of copper thickness and has been optimized at 6 nm Cu middle layer thickness. The Haacke figure of merit (FOM) has been calculated to evaluate the performance of the films. The highest FOM achieved is 6 x 10-3 Ω-1 for a Cu thickness of 6 nm with a sheet resistance of 12.2 Ω/sq and an average transmittance of 86%. The multilayered thin films are annealed upto 150 °C in vacuum, forming gas and O2 environments and the optical and electrical properties are studied and compared against the as-deposited samples. Thus IGZO/Cu/IGZO multilayer is a promising flexible electrode material for the next-generation flexible optoelectronics.

DEPENDENCE OF THE OPTICAL AND ELECTRICAL PROPERTIES OF CHEMICALLY ANNEALED VACUUM-DEPOSITED a-Si:H FILMS ON THE DEPOSITION RATE

2012 ◽  
Vol 27 (02) ◽  
pp. 1350015
Author(s):  
AHMED M. EL-NAGGAR
Keyword(s):  
Activation Energy ◽  
Electrical Properties ◽  
Deposition Rate ◽  
Room Temperature ◽  
Energy Gap ◽  
Dark Conductivity ◽  
Optical Parameters ◽  
Optical And Electrical Properties ◽  
Optical Energy Gap ◽  
Optical Energy

The influence of the deposition rate of chemically annealed vacuum-deposited a-Si : H films on its optical and electrical properties was studied. The optical parameters were studied using spectrophotometric measurements of the film transmittance in the wavelength range 200–3000 nm. It was found that with increasing the silicon deposition rate from 0.09 to 0.23 nm/s, the refractive index, n, decreases from 3.78 to 3.45 at 1.5 μm, and the optical energy gap, Eg, decreases from 1.74 to 1.66 eV, while the Urbach parameter, ΔE, increases from 77 to 99 meV. The dark conductivity was measured at temperatures descending from 480 to 170 K. It was found that the room temperature dark conductivity values decreased from 1.11 × 10-6 (Ω⋅ cm )-1 to 2.08 × 10-10 (Ω⋅ cm )-1 with increasing the deposition rate from 0.09 to 0.23 nm/s respectively, while the activation energy Ea increased from 0.53 to 0.84 eV with increasing deposition rate. As a result, a good quality a-Si : H film with optical energy gap of 1.74 eV, Urbach parameter of 77 meV, dark conductivity of 1.11 × 10-6 (Ω⋅ cm )-1, and activation energy of 0.53 eV was successfully prepared at a low deposition rate of 0.09 nm/s.

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