Electron diffraction analysis of the pentagonal arrangement of grains found in CVD Pure Ni films
1986 ◽
Vol 44
◽
pp. 594-595
Keyword(s):
The microstructure of 25-500 μm-thick, pure-Ni films formed by chemical vapor deposition on copper substrates at 180°C is complex, consisting of areas of a fine, heavily faulted structure and of relatively larger grains, 1-3 μm in diameter. The large grains have a <110> axis parallel to the growth direction and are frequently twinned. Pentagonal arrangements of the large grains, Figure 1, were commonly observed by transmission electron microscopy. Similar microstructural features have been reported to form during vapor deposition of other FCC metals, and have been shown to possess a true five-fold axis developed by twinning and distorting small crystals.
2008 ◽
Vol 47
(10)
◽
pp. 7998-8002
◽
2021 ◽
2021 ◽
Vol 21
(4)
◽
pp. 2538-2544