scholarly journals Engineering structure and functionalities of chemical vapor deposited photocatalytic titanium dioxide films through different types of precursors

CrystEngComm ◽  
2021 ◽  
Author(s):  
Diane Samelor ◽  
Asiya Turgambaeva ◽  
Vladislav Krisyuk ◽  
Adeline Miquelot ◽  
Jeremy Cure ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Solar Radiation ◽  
Structural Characteristics ◽  
Chemical Vapor ◽  
Tio2 Thin Films ◽  
Titanium Dioxide Films ◽  
Chemical Vapor Deposited ◽  
Different Types ◽  
Key Enabling Technologies

The photocatalytic properties of titanium dioxide TiO2 thin films, a seminal semiconductor material in solar radiation involving key enabling technologies depend on their structural characteristics which, in turn are monitored...

scholarly journals Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method

Cerâmica ◽  
2002 ◽  
Vol 48 (305) ◽  
pp. 38-42 ◽  
Author(s):  
M. I. B. Bernardi ◽  
E. J. H. Lee ◽  
P. N. Lisboa-Filho ◽  
E. R. Leite ◽  
E. Longo ◽  
...  
Keyword(s):  
Thin Films ◽  
Growth Parameters ◽  
Structural Characteristics ◽  
Chemical Vapor ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters

The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.

scholarly journals Influence of the growth parameters on TiO2 thin films deposited using the MOCVD method

Cerâmica ◽  
2002 ◽  
Vol 48 (308) ◽  
pp. 192-198 ◽  
Author(s):  
M. I. B. Bernardi ◽  
E. J. H. Lee ◽  
P. N. Lisboa-Filho ◽  
E. R. Leite ◽  
E. Longo ◽  
...  
Keyword(s):  
Thin Films ◽  
Growth Parameters ◽  
Structural Characteristics ◽  
Chemical Vapor ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters ◽  
Different Temperatures

In this work we report the synthesis of TiO2 thin films by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during the growth in the obtained structural characteristics was studied. Different temperatures of the organometallic bath, deposition time, temperature and type of the substrate were combined. Using Scanning Electron Microscopy associated to Electron Dispersive X-Ray Spectroscopy, Atomic Force Microscopy and X-ray Diffraction, the strong influence of these parameters in the thin films final microstructure was verified.

scholarly journals Enhancement of Photocatalytic Activities with Nanosized Polystyrene Spheres Patterned Titanium Dioxide Films for Water Purification

Catalysts ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 886 ◽  
Author(s):  
Hyeon Jin Seo ◽  
Ji Won Lee ◽  
Young Hoon Na ◽  
Jin-Hyo Boo
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Surface Area ◽  
Water Purification ◽  
Sol Gel ◽  
Catalytic Efficiency ◽  
Polystyrene Spheres ◽  
Tio2 Thin Films ◽  
Titanium Dioxide Films ◽  
Photocatalytic Activities

For environmental applications, such as water and air purification utilizing photocatalysts, we synthesized patterned titanium dioxide (TiO2) thin films using polystyrene (PS) spheres. This was primarily done to enhance the surface area and photocatalytic activities. TiO2 thin films were deposited on silicon wafers attached to variously sized PS spheres via the spin coating method and were annealed at 600 °C. The processing step involved patterning and coating a TiO2 sol–gel. The photocatalytic performance was analyzed using an UV–visible spectrophotometer. Within 20 min, a high catalytic efficiency (98% removal) with a 20-time faster decomposition rate of the malachite green (MG) solution than that of the nonpatterned TiO2 was obtained from the patterned TiO2 with 400 nm sized PS due to the large surface area. In addition, the phenol in the water removed as much as 50% within 2 h with the same photocatalyst, which was expected to be one of the strong candidates to be applied to the next generation of photocatalysts for water purification.

Studies of the Coefficient of Thermal Expansion of Low-k ILD Materials by X-Ray Reflectivity

2006 ◽  
Vol 914 ◽  
Author(s):  
George Andrew Antonelli ◽  
Tran M. Phung ◽  
Clay D. Mortensen ◽  
David Johnson ◽  
Michael D. Goodner ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermal Expansion ◽  
Coefficient Of Thermal Expansion ◽  
Chemical Vapor ◽  
Dielectric Materials ◽  
Free Standing ◽  
Dielectric Thin Films ◽  
X Ray ◽  
Chemical Vapor Deposited ◽  
Low K

AbstractThe electrical and mechanical properties of low-k dielectric materials have received a great deal of attention in recent years; however, measurements of thermal properties such as the coefficient of thermal expansion remain minimal. This absence of data is due in part to the limited number of experimental techniques capable of measuring this parameter. Even when data does exist, it has generally not been collected on samples of a thickness relevant to current and future integrated processes. We present a procedure for using x-ray reflectivity to measure the coefficient of thermal expansion of sub-micron dielectric thin films. In particular, we elucidate the thin film mechanics required to extract this parameter for a supported film as opposed to a free-standing film. Results of measurements for a series of plasma-enhanced chemical vapor deposited and spin-on low-k dielectric thin films will be provided and compared.

Growth, Structural and Mechanical Characterization and Reliability of Chemical Vapor Deposited Co and Co3O4 Thin Films as Candidate Materials for Sensing Applications

2011 ◽  
Vol 495 ◽  
pp. 108-111 ◽  
Author(s):  
Vasiliki P. Tsikourkitoudi ◽  
Elias P. Koumoulos ◽  
Nikolaos Papadopoulos ◽  
Costas A. Charitidis
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Elastic Modulus ◽  
Data Storage ◽  
Mechanical Stability ◽  
Chemical Vapor ◽  
Magnetic Sensors ◽  
Functional Coatings ◽  
Sensing Applications ◽  
Chemical Vapor Deposited

The adhesion and mechanical stability of thin film coatings on substrates is increasingly becoming a key issue in device reliability as magnetic and storage technology driven products demand smaller, thinner and more complex functional coatings. In the present study, chemical vapor deposited Co and Co3O4thin films on SiO2and Si substrates are produced, respectively. Chemical vapor deposition is the most widely used deposition technique which produces thin films well adherent to the substrate. Co and Co3O4thin films can be used in innovative applications such as magnetic sensors, data storage devices and protective layers. The produced thin films are characterized using nanoindentation technique and their nanomechanical properties (hardness and elastic modulus) are obtained. Finally, an evaluation of the reliability of each thin film (wear analysis) is performed using the hardness to elastic modulus ratio in correlation to the ratio of irreversible work to total work for a complete loading-unloading procedure.

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