Control of electrostatic self-assembly seeding of diamond nanoparticles on carbon nanowalls

2021 ◽  
Vol 33 (10) ◽  
pp. 105605
Author(s):  
Lei Huang ◽  
Xiangqing Wu ◽  
Ryota Hijiya ◽  
Kungen Teii

Abstract Seeding of diamond nanoparticles on vertically-aligned multi-layer graphene, the so-called carbon nanowalls (CNWs), is studied by using deionized water, ethylene glycol, ethanol, and formamide as dispersion mediums. Detonation nanodiamond particles show the smallest mean size and size distribution with a high positive zeta potential when dispersed in ethanol. The contact angle of ethanol on CNWs is almost zero degree, confirming highly wetting behaviour. The diamond nanoparticles dispersed in ethanol are distributed the most uniformly with minimal aggregation on CNWs as opposed to those dispersed in other liquids. The resulting diamond nanoparticle-seeded CNWs, followed by short-term growth in microwave plasma chemical vapor deposition, show a marked decrease in field emission turn-on field down to 1.3 V μm−1 together with a large increase in current density, compared to bare CNWs without diamond seeding. The results provide a way to control the density, size, and uniformity (spacing) of diamond nanoparticles on CNWs and should be applied to fabricate hybrid materials and devices using nanodiamond and nanocarbons.

Shinku ◽  
1997 ◽  
Vol 40 (8) ◽  
pp. 660-663
Author(s):  
Hideo OKAYAMA ◽  
Tsukasa KUBO ◽  
Noritaka MOCHIZUKI ◽  
Akiyoshi NAGATA ◽  
Hiromu ISA

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 888
Author(s):  
Pengfei Zhang ◽  
Weidong Chen ◽  
Longhui Zhang ◽  
Shi He ◽  
Hongxing Wang ◽  
...  

In this paper, we successfully synthesized homoepitaxial diamond with high quality and atomically flat surface by microwave plasma chemical vapor deposition. The sample presents a growth rate of 3 μm/h, the lowest RMS of 0.573 nm, and the narrowest XRD FWHM of 31.32 arcsec. An effect analysis was also applied to discuss the influence of methane concentration on the diamond substrates.


2011 ◽  
Vol 117-119 ◽  
pp. 1310-1314
Author(s):  
Xing Rui Li ◽  
Xin Wei Shi ◽  
Ning Yao ◽  
Xin Chang Wang

Nano-crystalline diamond (NCD) films with good adhesion were deposited on flexible copper substrate with Ni interlayer by Microwave Plasma Chemical Vapor Deposition (MPCVD). In this paper, two-stage method was used to improve the adhesion between the copper substrates and the diamond films. The effect of deposition time of the first stage on the morphology, crystal structure, non-diamond phase and adhesive properties of diamond films was investigated. The performance and structure of the diamond films were studied by Scanning Electron Microscope (SEM), Raman Spectroscopy (Raman) and X-Ray Diffraction (XRD). The results showed that the films were nano-crystalline diamond films positively. Impress method was used to examine the adhesion between diamond film and the substrate. When deposition time is 1.5h, the adhesion between diamond film and the copper substrate is better than the others. When it was 2.5h or longer, because the graphite layers existed as intermediate, the adherence between the diamond films and copper substrates was very poor. Therefore, the diamond films were easily peeled off from the substrates. Otherwise, the second stage called annealing process after the deposition played an important role to the adhesion. The films would be easily peeled off by curling without the annealing process.


2008 ◽  
Vol 47 (4) ◽  
pp. 3050-3052
Author(s):  
Masataka Moriya ◽  
Yuji Matsumoto ◽  
Yoshinao Mizugaki ◽  
Tadayuki Kobayashi ◽  
Kouichi Usami

2000 ◽  
Vol 9 (7) ◽  
pp. 545-549
Author(s):  
Zhang Yong-ping ◽  
Gu You-song ◽  
Chang Xiang-rong ◽  
Tian Zhong-zhuo ◽  
Shi Dong-xia ◽  
...  

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