Neutron-induced boron fission as a major source of soft errors in deep submicron SRAM devices

2002 ◽  
Author(s):  
R.C. Baumann ◽  
E.B. Smith
Keyword(s):  
Soft Errors ◽  
Deep Submicron

Impact of Single-Event Upsets in Deep-Submicron Silicon Technology

MRS Bulletin ◽  
2003 ◽  
Vol 28 (2) ◽  
pp. 117-120 ◽  
Author(s):  
Robert Baumann
Keyword(s):  
Soft Errors ◽  
Deep Submicron ◽  
Soft Error ◽  
Mitigation Strategies ◽  
Single Event ◽  
Radiation Mechanisms ◽  
Silicon Technology ◽  
Single Event Upsets ◽  
Radiation Induced ◽  
Considerable Concern

AbstractThe once-ephemeral soft error phenomenon has recently caused considerable concern for manufacturers of advanced silicon technology. Soft errors, if unchecked, now have the potential for inducing a higher failure rate than all of the other reliability-failure mechanisms combined. This article briefly reviews the three dominant radiation mechanisms responsible for soft errors in terrestrial applications and how soft errors are generated by the collection of radiation-induced charge. Scaling trends in the soft error sensitivity of various memory and logic components are presented, along with a consideration of which applications are most likely to require intervention. Some of the mitigation strategies that can be employed to reduce the soft error rate in these devices are also discussed.

dC/dV and CV Characterization of Gate Resistance Defects in eDRAM Circuits

2013 ◽  
Author(s):  
Sweta Pendyala ◽  
Dave Albert ◽  
Katherine Hawkins ◽  
Michael Tenney
Keyword(s):  
Deep Submicron ◽  
Work Flow ◽  
Localization Technique ◽  
Characterization Techniques ◽  
Capacitance Voltage ◽  
Gate Resistance

Abstract Resistive gate defects are unusual and difficult to detect with conventional techniques [1] especially on advanced devices manufactured with deep submicron SOI technologies. An advanced localization technique such as Scanning Capacitance Imaging is essential for localizing these defects, which can be followed by DC probing, dC/dV, CV (Capacitance-Voltage) measurements to completely characterize the defect. This paper presents a case study demonstrating this work flow of characterization techniques.

Combine Micro-Probing and OBIRCH to Catch Non-Recognizable Fault in RF and Mixed-Mode Integrated Circuits

2007 ◽  
Author(s):  
Cha-Ming Shen ◽  
Yen-Long Chang ◽  
Lian-Fon Wen ◽  
Tan-Chen Chuang ◽  
Shi-Chen Lin ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Radio Frequency ◽  
Failure Analysis ◽  
Case Studies ◽  
Mixed Mode ◽  
Failure Mechanisms ◽  
Deep Submicron ◽  
Digital Logic ◽  
Successful Approach ◽  
Cmos Processes

Abstract Highly-integrated radio frequency and mixed-mode devices that are manufactured in deep-submicron or more advanced CMOS processes are becoming more complex to analyze. The increased complexity presents us with many eccentric failure mechanisms that are uniquely different from traditional failure mechanisms found during failure analysis on digital logic applications. This paper presents a novel methodology to overcome the difficulties and discusses two case studies which demonstrate the application of the methodology. Through the case studies, the methodology was proven to be a successful approach. It is also proved how this methodology would work for such non-recognizable failures.

Thermal Frequency Imaging: A New Application of Laser Voltage Imaging Applied on 40nm Technology

2011 ◽  
Author(s):  
Guillaume Celi ◽  
Sylvain Dudit ◽  
Thierry Parrassin ◽  
Philippe Perdu ◽  
Antoine Reverdy ◽  
...  
Keyword(s):  
Charge Carrier ◽  
Laser Beam ◽  
Integrated Circuit ◽  
Carrier Density ◽  
Deep Submicron ◽  
Charge Carrier Density ◽  
Voltage Imaging ◽  
A New Technique ◽  
Scan Chain

Abstract For Very Deep submicron Technologies, techniques based on the analysis of reflected laser beam properties are widely used. The Laser Voltage Imaging (LVI) technique, introduced in 2009, allows mapping frequencies through the backside of integrated circuit. In this paper, we propose a new technique based on the LVI technique to debug a scan chain related issue. We describe the method to use LVI, usually dedicated to frequency mapping of digital active parts, in a way that enables localization of resistive leakage. Origin of this signal is investigated on a 40nm case study. This signal can be properly understood when two different effects, charge carrier density variations (LVI) and thermo reflectance effect (Thermal Frequency Imaging, TFI), are taken into account.

Analysis of Induced End-of-Life Failures in SRAM Through Nanoprobing

2018 ◽  
Author(s):  
Oberon Dixon-Luinenburg ◽  
Jordan Fine
Keyword(s):  
End Of Life ◽  
Soft Errors ◽  
Cause Analysis ◽  
New Approach ◽  
Performance Loss ◽  
Root Cause ◽  
Long Period ◽  
Atomic Force ◽  
Stress Resultant ◽  
Voltage Stress

Abstract In this paper, we demonstrate a novel nanoprobing approach to establish cause-and-effect relationships between voltage stress and end-of-life performance loss and failure in SRAM cells. A Hyperion II Atomic Force nanoProber was used to examine degradation for five 6T cells on an Intel 14 nm processor. Ten minutes of asymmetrically applied stress at VDD=2 V was used to simulate a ‘0’ bit state held for a long period, subjecting each pullup and pulldown to either VDS or VGS stress. Resultant degradation caused read and hold margins to be reduced by 20% and 5% respectively for the ‘1’ state and 5% and 2% respectively for the ‘0’ state. ION was also reduced, for pulldown and pullup respectively, by 4.5% and 5.4% following VGS stress and 2.6% and 33.8% following VDS stress. Negative read margin failures, soft errors, and read time failures all become more prevalent with these aging symptoms whereas write stability is improved. This new approach enables highly specific root cause analysis and failure prediction for end-of-life in functional on-product SRAM.

Reliability-Driven CAD System for Deep-Submicron VLSI Circuits

1998 ◽  
Author(s):  
S. M. Kang ◽  
E. Rosenbaum ◽  
Y. K. Cheng ◽  
L. P. Yuan ◽  
T. Li
Keyword(s):  
Deep Submicron ◽  
Vlsi Circuits ◽  
Cad System

Concurrent detection of soft errors based on current monitoring

2002 ◽  
Author(s):  
Y. Tsiatouhas ◽  
T. Haniotakis ◽  
D. Nikolos ◽  
C. Efstathiou
Keyword(s):  
Soft Errors ◽  
Current Monitoring
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