Parametric Study of Nanostructure Variations on the Macroscopic Thermal and Electrical Behavior of Neat CNT Thin Film Networks
Carbon nanotube thin films are considered by many researchers as a material for the future in many electrical and thermal applications, but a lack of systematic physics-based modeling approaches to quantify the bulk thermal and electrical response due to nanostructure variations makes employing these thin films difficult for commercial applications. In this work we employ the previously presented 3D physics-based computational model for characterizing the bulk thermal and electrical response of a neat carbon nanotube thin film network involving stochastic distributions of length, diameter, chirality, orientation and values of intercontact resistivity obtained from the literature. The model is employed to test the sensitivity of bulk thermal and electrical conductivity on stochastic variations in the nanostructure parameters. We examine the sensitivity of the thin film networks to the experimentally obtained Weibull probability distribution for length and diameter. Additionally, we present a study to quantify the macroscopic conductivity dependence on the nanotube chirality ratio. Through these studies we present an approach that is very generic and can be used for the sensitivity analysis due to variations within the nanostructure.