POROUS SILICON: INFLUENCE OF ETCHING TEMPERATURE ON MICROSTRUCTURE AND LUMINESCENCE

2001 ◽  
Vol 08 (05) ◽  
pp. 429-433 ◽  
Author(s):  
D. J. BLACKWOOD ◽  
Y. ZHANG

Electrochemical etching in solutions based on hydrofluoric acid has been widely used to form light-emitting porous silicon. However, the effects of a number of the experimental parameters on the quality of the porous silicon produced have yet to be fully investigated. In the present paper the influence of temperature and viscosity of the etching solution is evaluated in terms of the morphology and porosity of the porous silicon produced as well as the wavelength of the photoluminescence or electroluminescence subsequently emitted. It was found that under stimulation from a UV light source the wavelength of the photoluminescence emitted from the porous silicon films blueshifted with decreasing etching temperature. SEM and AFM investigations revealed that this blueshifting of the photoluminescence resulted from the production of smaller nanocrystals at the lower etching temperatures.

1992 ◽  
Vol 283 ◽  
Author(s):  
Peter Steiner ◽  
Frank Kozlowski ◽  
Hermann Sandmaier ◽  
Walter Lang

ABSTRACTFirst results on light emitting diodes in porous silicon were reported in 1991. They showed a quantum efficiency of 10-7 to 10-5 and an orange spectrum. Over the last year some progress was achieved:- By applying UV-light during the etching blue and green light emitting diodes in porous silicon are fabricated.- When a p/n junction is realized within the porous region, a quantum efficiency of 10-4 is obtained.


2020 ◽  
Vol 8 (3) ◽  
pp. 883-888 ◽  
Author(s):  
Yuan Li ◽  
Zhiheng Xing ◽  
Yulin Zheng ◽  
Xin Tang ◽  
Wentong Xie ◽  
...  

High quantum efficiency LEDs with InGaN/GaN/AlGaN/GaN MQWs have been demonstrated. The proposed GaN interlayer barrier can not only increase the concentration and the spatial overlap of carriers, but also improve the quality of the MQWs.


1991 ◽  
Vol 256 ◽  
Author(s):  
David L. Naylor ◽  
Sung B. Lee ◽  
John C. Pincenti ◽  
Brett E. Bouma

ABSTRACTPhotoluminescence spectra have been measured in porous silicon following electrochemical etching in dilute hydrofluoric acid (HF). The effects of HF concentration during etching on the efficiency and peak wavelength of photoluminescence have been investigated. The effects of temperature between 25°C and 200°C on PL spectra have been recorded. Photoluminescence lifetimes as a function of wavelength have been studied following ultrashort UV photoexcitation. A number of lifetime components in the decay are observed the longest in good agreement over the wavelength range of 500 to 600 nm with a silicon quantum wire model. At longer wavelengths a departure from lifetimes of the wire model is observed and two hypotheses for the discrepancy are presented.


2017 ◽  
Vol 17 (5) ◽  
pp. 115-121
Author(s):  
N.V. Latukhina ◽  
D.A. Pisarenko ◽  
A.V. Volkov ◽  
V.A. Kitaeva

The article presents the results of experimental researches of optoelectric properties of porous silicon. Layers of porous silicon were formed using electrochemical etching process in water-alcohol solutions of hydrofluoric acid on plates with a pre-established microrelief surface. Evaluation of possibility of using of created structure as the artificial retina component was performed based on the results of the research.


1993 ◽  
Vol 316 ◽  
Author(s):  
Lianwei Wang ◽  
Chenglu Lin ◽  
Ping Liu ◽  
Zuyao Zhou ◽  
Shichang Zou

Abstract:The effect of ion implantation on the formation and light emitting properties of porous silicon is reported. Si + , F+ ions were implanted into silicon wafers before electrochemical etching process. The experiments showed that porous structure can be formed on the wafer containing amorphous layer, while the porosity distribution with the depth changed greatly compared with the anodized crystalline Si. The implantation of F+ ions greatly affects the formation mechanism. The creation of point defects leads to red-shift in photoluminescence measurements.


1994 ◽  
Vol 358 ◽  
Author(s):  
S. Lazarouk ◽  
V. Bondarenko ◽  
P. Pershukevich ◽  
S. La Monica ◽  
G. Maiello ◽  
...  

ABSTRACTWe demonstrate current induced visible light emission from Schottky junctions between aluminium electrodes and porous silicon formed by electrochemical etching of degenerate n+ -type silicon. HF concentration and anodizing current were chosen to yield preparation conditions in the transition region between electropolishing and porous silicon formation regimes. The light emitting diodes were formed by magnetron sputtering of aluminum on the porous silicon surface. Visible electroluminescence (EL) was recorded when dc or ac voltages larger than 4 V were applied between the aluminium electrodes. The visible EL appears in the dark, at the edge of the electrodes at a reverse bias of 5-6 V. The intensity of emitted light increases with applied voltage; at applied bias higher than 7 V the light emitted was observable by the naked eye at normal daylight. Compared to forward bias solid state contact porous silicon devices, the structure has an increased stability (after 100 hours of continuous operation under a 7 V reverse bias, no appreciable modification was observed in emission intensity). The main features of this electroluminescence are very similar to the ones observed under avalanche breakdown of silicon p-n junctions.


2021 ◽  
Author(s):  
Veniamin Koshevoi ◽  
Anton Belorus ◽  
Ilya Pleshanov ◽  
Anton Timchenko ◽  
Roman Denisenko ◽  
...  

In this work composite structures based on a porous silicon were obtained and studied. Porous matrices were formed by electrochemical etching in aqueous solutions of hydrofluoric acid. Based on the obtained substrates, por-silicon (Si)/silver (Ag) and por-Si/zinc oxide (ZnO) composite structures were formed. These composites were functionalized by various methods (electro (E)-, thermo (T)-, electrothermal exposure) as a result of which the structures were modified. When studying the samples by scanning electron microscopy (SEM), it was concluded that silver nanoparticles actively diffused into the pores under these technological modes of functionalization. The por-Si/Ag and por-Si/ZnO composite structures were also studied using the following methods: infrared (IR) spectroscopy and Raman ultrasoft X-ray emission spectroscopy. Also, the photoluminescent characteristics of the samples were studied. Based on the obtained results, it was concluded that functionalization methods actively change the phase composition of structures and the optical properties of composites.


2021 ◽  
Vol 7 (2) ◽  
pp. 550-553
Author(s):  
Benjamin K. Naggay ◽  
Kerstin Frey ◽  
Markus Schneider ◽  
Kiriaki Athanasopulu ◽  
Günter Lorenz ◽  
...  

Abstract Soft lithography, a tool widely applied in biology and life sciences with numerous applications, uses the soft molding of photolithography-generated master structures by polymers. The central part of a photolithography set-up is a mask-aligner mostly based on a high-pressure mercury lamp as an ultraviolet (UV) light source. This type of light source requires a high level of maintenance and shows a decreasing intensity over its lifetime, influencing the lithography outcome. In this paper, we present a low-cost, bench-top photolithography tool based on ninety-eight 375 nm light-emitting diodes (LEDs). With approx. 10 W, our presented lithography set-up requires only a fraction of the energy of a conventional lamp, the LEDs have a guaranteed lifetime of 1000 h, which becomes noticeable by at least 2.5 to 15 times more exposure cycles compared to a standard light source and with costs less than 850 C it is very affordable. Such a set-up is not only attractive to small academic and industrial fabrication facilities who want to enable work with the technology of photolithography and cannot afford a conventional set-up, but also microfluidic teaching laboratories and microfluidic research and development laboratories, in general, could benefit from this cost-effective alternative. With our self-built photolithography system, we were able to produce structures from 6 μm to 50 μm in height and 10 μm to 200 μm in width. As an optional feature, we present a scaled-down laminar flow hood to enable a dust-free working environment for the photolithography process.


Author(s):  
S. Vambol ◽  
V. Vambol ◽  
Y. Suchikova ◽  
I. Bogdanov ◽  
O. Kondratenko

Purpose: The purpose of this study is to establish the quality of tests for determining the chemical composition of the porous surface obtained by the method of electrochemical etching, based on the indicators of convergence and reproducibility of the results. Design/methodology/approach: The method of electrochemical etching was used to obtain layers of porous gallium phosphide, which can be used as buffer layers for nitrides formation on their basis. Por-GaP was formed in a solution of hydrofluoric acid at a current density of j =100 mA/cm2, etching was carried out for 20 minutes. The resulting structures sulfide passivation was carried out, thus avoiding the formation of an oxide film on the samples surfaces. For this purpose, porous gallium phosphide samples were kept in a sulfide solution for 10 minutes and dried in a stream of nitrogen. The chemical composition of the porous GaP surface layers has been investigated. To do this, the method of electronprobe INCA Energy microanalysis was used. The research was carried out on the entire surface of the sample in order to calculate the total spectrum of the elemental composition of the sample under study. Findings: It was established that during anodizing, the stoichiometry of the crystals investigated did not shift significantly towards the excess of gallium atoms. Oxygen is present at an insignificant concentration of 0.3%. This indicates the effectiveness of conducting the sulfide passivation of the sample surface following the electrochemical treatment. The presence of fluorine atoms that appeared on the surface as a result of the reaction with the electrolyte during etching, is observed in extremely low concentration. Experimental studies have shown that the sample chosen can be used as a standard enterprise sample when analyzing the chemical composition of the surface of porous gallium phosphide due to its convergence, reproducibility, homogeneity. In addition, the given method for determining the standard sample can be applied to other porous semiconductors. Conducting such studies is an important technological task that will allow us to create a series of standard samples of porous semiconductors of A3B5 group. Research limitations/implications: The research was carried out for porous gallium phosphide samples synthesized in the solution of hydrofluoric acid, though, carrying out of similar experiments for por-GaP obtained in other conditions, is necessary. Practical implications: The studies of the reproducibility and convergence of the experiment have an important practical significance, since it is the reproducibility of the experiment results that is the main problem to modern material science, all the more to nanoengineering. Therefore, the technique proposed, will allow the synthesis of por-GaP layers with adjustable properties, will facilitate their widespread implementation in the real sectors of industry. The obtained porous layers can be used as standard samples. Originality/value: The main problem in the nanostructures synthesis is the adjustability of properties. The technique presented allows to form stable layers of the porous gallium phosphide with the surface chemical composition known in advance. In addition, carrying out the sulfide passivation allows to stabilize por-GaP properties, which is an important process task. For the first time, a study of the presented technique as to convergence, reproducibility and homogeneity, was conducted.


2010 ◽  
Vol 29-32 ◽  
pp. 566-570
Author(s):  
Xiao Jun Wan ◽  
Hui Xia Jin

The special physicochemical environment caused by sonic-vacating provides an important outlet for the preparation of highly efficient luminescent porous silicon films. Experimental results show that sonic—chemical treatment is an effective technology for the improvement of the microstructure of porous silicon, and the luminescent efficiency and stability thereof. Luminescent porous silicon films, prepared by ultrasonic—enhanced anode electrochemical etching, display better qualities than the samples prepared by conventional methods widely used at present. This ultrasonic—chemical effect roots in sonic—vacating, i.e. the generation, formation and rapid collapse of bubbles in the etching solution. In the process of the porous silicon being etched, the escape rate and caving-in of hydrogen bubbles in the pores is increased as a result of the work of the ultrasonic waves, which is helpful to the vertical etching of the pores.


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