Mass Spectra and Ionization Temperatures in an Argon-Nitrogen Inductively Coupled Plasma

1983 ◽  
Vol 37 (5) ◽  
pp. 425-428 ◽  
Author(s):  
Robert S. Houk ◽  
Akbar Montaser ◽  
Velmer A. Fassel
Keyword(s):  
Inductively Coupled Plasma ◽  
Gas Flow ◽  
Extraction Process ◽  
Outer Flow ◽  
Inductively Coupled ◽  
Ion Extraction ◽  
Axial Channel ◽  
Positive Ions ◽  
Probable Occurrence ◽  
Charge Transfer Reactions

Positive ions were extracted from the axial channel of an inductively coupled plasma (ICP) in which the outer gas flow was Ar, N2, or a mixture of Ar and N2. Addition of N2 to the outer gas decreases the electron number density ( ne) in the axial channel. Ar+2, O2+, and ArH+ react with N-containing species in the plasma and/or during the ion extraction process. Ar+ remains abundant even if there is no Ar in the outer gas, which indicates the probable occurrence of charge transfer reactions between N2+ and Ar. The present work corroborates two general concepts upon which several theories of the origin of suprathermal ionization in ICPs are based: (a) species are physically transported from the induction region to the axial channel; and (b) these species may react with and ionize neutral species in the axial channel. Ionization temperatures ( Tion) measured from the ratio Cd+/I+ were 5750 to 6700 K for a N2 outer flow ICP at a forward power of 1.2 kW. This Tion range is significantly below that obtained for an Ar outer gas ICP under otherwise similar operating parameters.

Kinetic Energy Distributions of Positive Ions in an Inductively Coupled Plasma Mass Spectrometer

1985 ◽  
Vol 39 (6) ◽  
pp. 1070-1077 ◽  
Author(s):  
José A. Olivares ◽  
R. S. Houk
Keyword(s):  
Kinetic Energy ◽  
Mass Spectrometer ◽  
Inductively Coupled Plasma ◽  
Gas Flow ◽  
Mass Analyzer ◽  
Simple Method ◽  
Ion Energy Distribution ◽  
Inductively Coupled ◽  
Positive Ions ◽  
Sampling Interface

A simple method is described for the approximate measurement of the ion energy distribution in an inductively coupled plasma-mass spectrometer (ICP-MS) with a continuum flow sampling interface. The average ion kinetic energy, kinetic energy spread, and maximum kinetic energy are evaluated from a plot of ion signal as a function of retarding voltage applied to the quadrupole mass analyzer. The effects of plasma operating parameters on ion signals and energies are described. In particular, kinetic energy is a sensitive function of aerosol gas flow rate. This behavior is attributed to a nonthermal, possibly electrical, interaction between the plasma and the sampling interface, which is induced by the presence of the axial channel in the ICP.

scholarly journals High-efficiency method for recycling lithium from spent LiFePO4 cathode

2020 ◽  
Vol 9 (1) ◽  
pp. 1586-1593
Author(s):  
Tingting Yan ◽  
Shengwen Zhong ◽  
Miaomiao Zhou ◽  
Xiaoming Guo ◽  
Jingwei Hu ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
High Efficiency ◽  
Optical Emission ◽  
Extraction Process ◽  
Emission Spectrometry ◽  
X Ray Diffraction ◽  
Inductively Coupled ◽  
Moisture Analysis ◽  
Lifepo4 Cathode ◽  
Solid Liquid

Abstract The extraction of Li from the spent LiFePO4 cathode is enhanced by the selective removal using interactions between HCl and NaClO to dissolve the Li+ ion while Fe and P are retained in the structure. Several parameters, including the effects of dosage and drop acceleration of HCl and NaClO, reaction time, reaction temperature, and solid–liquid ratio on lithium leaching, were tested. The Total yields of lithium can achieve 97% after extraction process that lithium is extracted from the precipitated mother liquor, using an appropriate extraction agent that is a mixture of P507 and TBP and NF. The method also significantly reduced the use of acid and alkali, and the economic benefit of recycling is improved. Changes in composition, morphology, and structure of the material in the dissolution process are characterized by inductively coupled plasma optical emission spectrometry, scanning electron microscope, X-ray diffraction, particle size distribution instrument, and moisture analysis.

scholarly journals Computational Fluid Dynamics (CFD) Simulations and Experimental Measurements in an Inductively-Coupled Plasma Generator Operating at Atmospheric Pressure: Performance Analysis and Parametric Study

Processes ◽  
2019 ◽  
Vol 7 (3) ◽  
pp. 133 ◽  
Author(s):  
Sangeeta Punjabi ◽  
Dilip Barve ◽  
Narendra Joshi ◽  
Asoka Das ◽  
Dushyant Kothari ◽  
...  
Keyword(s):  
Fluid Dynamics ◽  
Atmospheric Pressure ◽  
Inductively Coupled Plasma ◽  
Gas Flow ◽  
Rf Power ◽  
Gas Flow Rate ◽  
Inductively Coupled ◽  
Plasma Resistance ◽  
Computational Fluid Dynamics Cfd ◽  
Icp Torch

In this article, electrical characteristics of a high-power inductively-coupled plasma (ICP) torch operating at 3 MHz are determined by direct measurement of radio-frequency (RF) current and voltage together with energy balance in the system. The variation of impedance with two parameters, namely the input power and the sheath gas flow rate for a 50 kW ICP is studied. The ICP torch system is operated at near atmospheric pressure with argon as plasma gas. It is observed that the plasma resistance increases with an increase in the RF-power. Further, the torch inductance decreases with an increase in the RF-power. In addition, plasma resistance and torch inductance decrease with an increase in the sheath gas flow rate. The oscillator efficiency of the ICP system ranges from 40% to 80% with the variation of the Direct current (DC) powers. ICP has also been numerically simulated using Computational Fluid Dynamics (CFD) to predict the impedance profile. A good agreement was found between the CFD predictions and the impedance experimental data published in the literature.

Feature Evolution During Sub 100NM Gap-Fill and Etch

2005 ◽  
Author(s):  
Hemant Mungekar ◽  
Young S. Lee ◽  
Shankar Venkataraman
Keyword(s):  
Inductively Coupled Plasma ◽  
Scale Up ◽  
High Plasma ◽  
Inductively Coupled ◽  
Positive Ions ◽  
Aspect Ratios ◽  
High Plasma Density ◽  
Semiconductor Fabrication ◽  
Wafer Size ◽  
Feature Evolution

Inductively coupled plasma (ICP) reactors are being used at low gas pressure (<100mTorr) and high plasma density ([e] > 1013/cm2) processes in semiconductor fabrication. In these reactors plasma is generated by inductively coupled electric field while positive ions are accelerated anisotropically by applying a negative bias RF to the substrate. Semiconductor manufacturers face many challenges as wafer size increases while device geometries decrease. Two key challenges for both process design and electronics processing equipment design are (a) scale up of process from 200mm to 300mm diameter substrate, and (b) deposition and etching features with high aspect ratios. A unified phenomenological model to explain profile evolution trend as a function of aspect ratio for deposition (gap fill) and trench etch using ICP reactors is presented. Trends for feature evolution as a function of pressure for gap fill and trench etch are reviewed and explained. The article emphasizes importance of low pressure for sub-100nm gap-fill and trench-etch applications in ICP processing reactors.

Description and Characterization of a Linear-Flow Outer Gas Flow Torch for Inductively Coupled Plasma Emission Spectroscopy

1992 ◽  
Vol 46 (8) ◽  
pp. 1245-1250 ◽  
Author(s):  
Gary D. Rayson ◽  
Daniel Yang Shen
Keyword(s):  
Inductively Coupled Plasma ◽  
Emission Spectroscopy ◽  
Gas Flow ◽  
Gas Flows ◽  
Linear Flow ◽  
Inductively Coupled ◽  
Consumption Rates ◽  
Gas Consumption ◽  
Plasma Emission Spectroscopy

An inductively coupled plasma torch has been developed which utilizes linear coolant gas flows and is operated at reduced applied power levels and argon gas consumption rates. The linear flow torch (LiFT) is constructed by the addition of a machined insert between the outer and intermediate tubing of a conventional tangential flow torch (TaFT). This LiFT configuration has been demonstrated to be capable of providing improved detection limits, in comparison to a TaFT, at conditions of lower power and gas flow. Under those conditions the LiFT was also demonstrated to produce less severe interferences to analyte emission in the presence of an easily ionizable element.

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