Substrate Surface Effects on the Properties of Sputter-Deposited and Laser-Irradiated Films.

1991 ◽  
Vol 238 ◽  
Author(s):  
A. J. Pedraza ◽  
M. J. Godbole ◽  
L. Romana
Keyword(s):  
Electron Microscopy ◽  
Substrate Surface ◽  
Surface Condition ◽  
Surface Region ◽  
Film Rupture ◽  
Near Surface ◽  
Sapphire Substrates ◽  
Transmission Electron ◽  
Tunnelling Microscopy ◽  
Sputter Deposited

ABSTRACTSapphire substrates, mechanically polished to an optical finish, were annealed for two days at either 1000°C or 1350°C. The near surface condition of as-polished and of the annealed substrates was analyzed by Rutherford backscattering/channeling (RBS-C) and by scanning electron microscopy/channeling (SEM-C), by transmission electron microscopy (TEM), and by scanning tunnelling microscopy (STM). The polished substrates were found to be RBS-amorphous up to 100 nm, and heavily damaged at larger depths. In agreement with these results, no electron channeling was obtained from polished samples. TEM, however, showed that the damaged region was crystalline, and the only defects detected were microtwins. Both RBS-C and SEM-C analyses revealed that the damage is removed when the sapphire substrates are annealed for 48 hrs. at 1350°C. The condition of the near-surface region, viz., as-polished or annealed, is found to strongly affect the morphology of the laser-irradiated copper films deposited on sapphire substrates. A correlation is found between the threshold for film evaporation and for film rupture upon laser irradiation, both being a function of the substrate condition. It is concluded that the near-surface damaged layer acts as a thermal barrier for heat transport across the substrate.

Nanoscale Mechanical Properties of In-Situ Tribofilms Generated from ZDDP and F-ZDDP with and without Antioxidants

2007 ◽  
Vol 7 (12) ◽  
pp. 4378-4390 ◽  
Author(s):  
Anuradha Somayaji ◽  
Ramoun Mourhatch ◽  
Pranesh B. Aswath
Keyword(s):  
Electron Microscopy ◽  
Wear Debris ◽  
Surface Region ◽  
Nucleation And Growth ◽  
Near Surface ◽  
Transmission Electron ◽  
Dialkyl Dithiophosphates ◽  
Wear Tests ◽  
Diphenyl Amine

Tribofilms with thickness ranging from 100–200 nm were developed in-situ during wear tests using a zinc dialkyl dithiophosphates (ZDDP) and fluorinated ZDDP (F-ZDDP). The influence of the antioxidant alkylated diphenyl amine on the formation and properties of these tribofilm is examined. Results indicate that the thickness of the tribofilms formed when F-ZDDP is used is always thicker than the tribofilm formed with ZDDP. In addition, in the presence of antioxidants the tribofilm thickness is increased. The hardness of these tribofilms in the absence of the antioxidants is significantly higher at the near surface region (0–30 nm) when compared to the films formed in the presence of antioxidant. Nanoscratch tests conducted to examine the abrasion resistance of the tribofilms also indicate that the tribofilms formed by F-ZDDP are more resistant to scratch compared to films formed by ZDDP. In the presence of antioxidant, tribofilms formed by F-ZDDP are significantly thicker while both films behave in a similar fashion in nanoscratch tests. Transmission electron microscopy of the wear debris formed during the tests were examined and results indicate the nucleation and growth of nanoparticles of Fe3O4 with an approximate size of 5–10 nm embedded within an otherwise amorphous tribofilm.

Electrical and Structural Characterization of Boron Implanted Silicon Following Laser Thermal Processing

2002 ◽  
Vol 717 ◽  
Author(s):  
K. A. Gable ◽  
K. S. Jones ◽  
M. E. Law ◽  
L. S. Robertson ◽  
S. Talwar
Keyword(s):  
Melting Temperature ◽  
Thermal Processing ◽  
Laser Annealing ◽  
Substrate Surface ◽  
Surface Region ◽  
Process Window ◽  
Near Surface ◽  
Dopant Activation ◽  
Transmission Electron ◽  
Laser Thermal Processing

AbstractOne alternative to conventional rapid thermal annealing (RTA) of implants for ultra-shallow junction formation is that of laser annealing. Laser thermal processing (LTP) incorporates an excimer pulsed laser capable of melting the near surface region of the silicon (Si) substrate. The melt depth is dependent upon the energy density supplied by the irradiation source and the melting temperature of the substrate surface. A process window associated with this technique is able to produce similar junction depths over a range of energy densities due to the melting temperature depression established with pre-amorphization of the substrate surface prior to dopant incorporation. The process window of germanium (Ge) preamorphized, boron (B) doped Si was investigated. 200 mm (100) n-type Si wafers were preamorphized via 18 keV Ge+ implantation to 1x1015/cm2 and subsequently implanted with 1 keV B+ to doses of 1x1015/cm2, 3x1015/cm2, 6x1015/cm2, and 9x1015/cm2. The wafers were laser annealed from 0.50 J/cm2 to 0.88 J/cm2 using a 308 nm XeCl excimer irradiation source. Transmission electron microscopy (TEM) was used to determine the process window for each implant condition, and correlations between process window translation and impurity concentration were made. Four-point probe quantified dopant activation and subsequent deactivation upon post-LTP furnace annealing.

Epitaxy and Monolayer Patterning of Solution-Derived LiNbO3 Thin Layers

1995 ◽  
Vol 401 ◽  
Author(s):  
P.G. Clem ◽  
Z. Xu ◽  
D. A. Payne
Keyword(s):  
Electron Microscopy ◽  
Lattice Mismatch ◽  
Substrate Surface ◽  
Optical Amplifier ◽  
Thin Layers ◽  
Sapphire Substrates ◽  
Transmission Electron ◽  
Low Temperature Processing ◽  
Processing Control ◽  
Uniform Doping

AbstractIntegrated lithium niobate (LiNbO3) thin layers show promise for efficient electrooptic, nonlinear optic, and optical amplifier applications. Solution-derived LiNbO3 thin layers have been deposited on sapphire substrates, allowing low temperature processing, control of stoichiometry, uniform doping and heteroepitaxy. Transmission electron microscopy of the LiNbO3/substrate interface suggests the structure consists of highly oriented grains with slight rotational variance to accommodate lattice mismatch. For use of such films as devices, the ability to pattern waveguides and other structures is desired. Modification of the substrate surface with patterns of hydrophobic monolayers allows control of deposition of solution precursors. Ambient, selective deposition of (00.1) oriented LiNbO3 heteroepitaxial strip waveguides with lateral dimensions as small as 4μm is demonstrated.

Synthesis of MOS2 Phase in the Near Surface Region of Al2O3 and ZrO2 by Ion Implantation

1989 ◽  
Vol 157 ◽  
Author(s):  
A.K. Rai ◽  
R.S. Bhattacharya ◽  
S.C. Rung ◽  
D. Patrizio
Keyword(s):  
Electron Microscopy ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Surface Region ◽  
Furnace Annealing ◽  
Near Surface ◽  
Depth Profiles ◽  
Annealing Conditions ◽  
Transmission Electron ◽  
Experimental Findings

ABSTRACTAl2O3 and ZrO2 substrates were coimplanted with 175 keV Mo+ and 74 keV S+ at doses of 1×10 cm−2 and 2×1017 cm−2 respectively. The energies of Mo+ and S+ ions were chosen to provide a nearly overlapping depth profiles in both substrates. Rutherford backscattering (RBS), Auger electron spectroscopy (AES) and transmission electron microscopy (TEM) techniques were used for characterization. The as implanted surface of Al2O3 became amorphous while as implanted ZrO2 surface remained crystalline. The MoS2 phase was observed in the as implanted ZrO2. The MoS2 phase was observed in the implanted region of Al2O3 and ZrO2 after furnace annealing at 700°C. Thermodynamic calculations were performed to predict the equilibrium binary phase formed in Al2O3 and ZrO2 under the present implant and annealing conditions. The predictions agree with the experimental findings.

Tin-Doping Induced Defects in GaAs Films Grown by Molecular Beam Epitaxy

1984 ◽  
Vol 41 ◽  
Author(s):  
S. H. Chen ◽  
P. Enquist ◽  
C. B. Carter
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Surface Region ◽  
Growth Conditions ◽  
Near Surface ◽  
Transmission Electron ◽  
Gaas Films ◽  
Induced Defects

AbstractHeavily Sn-doped GaAs films have been grown by molecular-beam epitaxy and found to contain single-crystal Sn particles situated in the near-surface region of the epilayer GaAs. The morphology and chemical composition of the particles have been examined by using cross-section transmission electron microscopy combined with energy-dispersive x-ray spectroscopy. Different growth conditions were used to study the Sn-particle formation and high-resolution transmission electron microscopy was used to investigate microstructures. The observations are discussed in terms of several models previously proposed for these phenomena.

Ion thinning of integrated circuit transverse specimens for transmission electron microscopy

1992 ◽  
Vol 50 (2) ◽  
pp. 1426-1427
Author(s):  
F. Shaapur
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Integrated Circuit ◽  
Substrate Surface ◽  
Homogeneous Material ◽  
Material System ◽  
Ion Milling ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Motion Profile

Non-uniform ion-thinning of heterogenous material structures has constituted a fundamental difficulty in preparation of specimens for transmission electron microscopy (TEM). A variety of corrective procedures have been developed and reported for reducing or eliminating the effect. Some of these techniques are applicable to any non-homogeneous material system and others only to unidirectionalfy heterogeneous samples. Recently, a procedure of the latter type has been developed which is mainly based on a new motion profile for the specimen rotation during ion-milling. This motion profile consists of reversing partial revolutions (RPR) within a fixed sector which is centered around a direction perpendicular to the specimen heterogeneity axis. The ion-milling results obtained through this technique, as studied on a number of thin film cross-sectional TEM (XTEM) specimens, have proved to be superior to those produced via other procedures.XTEM specimens from integrated circuit (IC) devices essentially form a complex unidirectional nonhomogeneous structure. The presence of a variety of mostly lateral features at different levels along the substrate surface (consisting of conductors, semiconductors, and insulators) generally cause non-uniform results if ion-thinned conventionally.

Influence of Modulation Wavelength Induced Order on the Physical Properties of Nb/Rare Earth Superlattices

1984 ◽  
Vol 37 ◽  
Author(s):  
L. H. Greene ◽  
W. L. Feldmann ◽  
J. M. Rowell ◽  
B. Batlogg ◽  
R. Hull ◽  
...  
Keyword(s):  
Rare Earth ◽  
Room Temperature ◽  
Room Temperature Resistivity ◽  
Residual Resistance ◽  
Sapphire Substrates ◽  
Transmission Electron ◽  
Sputter Deposited ◽  
Residual Resistance Ratio ◽  
Temperature Resistivity ◽  
Modulation Wavelength

AbstractWe report the observation of a higher degree of preferred crystalline orientation in Nb/rare earth superlattices for modulation wavelengths in the range of 200 Å to 500 Å than that exhibited by single component films. All films and multilayers are sputter deposited onto room temperature sapphire substrates. Electronic transport measurements also show that the residual resistance ratio is higher and the room temperature resistivity is lower than for multilayers of either greater or lower periodicities. Transmission electron micrographs (TEM) showing excellent layering, grain size comparable to the layer thickness, and evidence of some degree of epitaxy are presented.

scholarly journals Site Specific Three-dimensional Structural Analysis in Tissues and Cells Using Automated DualBeam Slice &View

2007 ◽  
Vol 15 (2) ◽  
pp. 26-31 ◽  
Author(s):  
Ben Lich
Keyword(s):  
Electron Microscopy ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Three Dimensional ◽  
Surface Region ◽  
Dimensional Structure ◽  
Near Surface ◽  
Imaging Capability ◽  
Fluorescent Markers ◽  
Confocal And Electron Microscopy

DualBeam instruments that combine the imaging capability of scanning electron microscopy (SEM) with the cutting and deposition capability of a focused ion beam (FIB) provide biologists with a powerful tool for investigating three-dimensional structure with nanoscale (1 nm-100 nm) resolution. Ever since Van Leeuwenhoek used the first microscope to describe bacteria more than 300 years ago, microscopy has played a central role in scientists' efforts to understand biological systems. Light microscopy is generally limited to a useful resolution of about a micrometer. More recently the use of confocal and electron microscopy has enabled investigations at higher resolution. Used with fluorescent markers, confocal microscopy can detect and localize molecular scale features, but its imaging resolution is still limited. SEM is capable of nanometer resolution, but is limited to the near surface region of the sample.

scholarly journals High Resolution Transmission Electron Microscopy of Metallic Film/Laser-Irradiated Alumina Couples.

1994 ◽  
Vol 357 ◽  
Author(s):  
A. J. Pedraza ◽  
Siqi Cao ◽  
L. F. Allard ◽  
D. H. Lowndes
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Copper Film ◽  
Interfacial Structure ◽  
Diffuse Interface ◽  
Cross Sectional ◽  
Polycrystalline Alumina ◽  
Near Surface ◽  
Transmission Electron

AbstractA near-surface thin layer is melted when single crystal alumina (sapphire) is pulsed laserirradiated in an Ar-4%H2 atmosphere. γ-alumina grows epitaxially from the (0001) face of axalumina (sapphire) during the rapid solidification of this layer that occurs once the laser pulse is over. Cross sectional high resolution transmission electron microscopy (HRTEM) reveals that the interface between unmelted sapphire and γ-alumina is atomistically flat with steps of one to a few close-packed oxygen layers; however, pronounced lattice distortions exist in the resolidified γ-alumina. HRTEM also is used to study the metal-ceramic interface of a copper film deposited on a laser-irradiated alumina substrate. The observed changes of the interfacial structure relative to that of unexposed substrates are correlated with the strong enhancement of film-substrate bonding promoted by laser irradiation. HRTEM shows that a thin amorphous film is produced after irradiation of 99.6% polycrystalline alumina. Formation of a diffuse interface and atomic rearrangements that can take place in metastable phases contribute to enhance the bonding strength of copper to laser-irradiated alumina.

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