Effect of Microstructure on the Dissolution Kinetics of Copper Thin Films in Dilute Aqueous Solutions of Cupric Chloride
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ABSTRACTMicrostructural differences in copper deposited by four techniques commonly used in the microelectronics industry were previously reported. [1] The reaction rates were predicted using either grain size or grain orientation as the dominant microstructure characteristic. A practical method to monitor copper speciation was developed.[2] This technique was used to measure the reaction rates for the different copper films under two different etching conditions. The results are explained using grain size, grain orientation and near surface region composition.
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2020 ◽
Vol 29
(12)
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pp. 8060-8069
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2011 ◽
Vol 465
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pp. 411-414
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1987 ◽
Vol 45
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pp. 380-381
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1985 ◽
Vol 43
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pp. 288-289
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1994 ◽
Vol 52
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pp. 636-637