Density of Deep Bandgap States in Amorphous Silicon From the Temperature Dependence of Thin Film Transistor Current

1994 ◽  
Vol 336 ◽  
Author(s):  
T. Globus ◽  
H. C. Slade ◽  
M. Shur ◽  
M. Hack
Keyword(s):  
Thin Film ◽  
Activation Energy ◽  
Amorphous Silicon ◽  
Conduction Band ◽  
Energy Gap ◽  
Localized States ◽  
Flat Band ◽  
Gate Bias ◽  
Density Of Localized States ◽  
Wide Range

ABSTRACTWe have measured the current-voltage characteristics of amorphous silicon thin film transistors (a-Si TFTs) over a wide range of temperatures (20 to 160°C) and determined the activation energy of the channel current as a function of gate bias with emphasis on the leakage current and subthreshold regimes. We propose a new method for estimating the density of localized states (DOS) from the dependence of the derivative of activation energy with respect to gate bias. This differential technique does not require knowledge of the flat-band voltage (VFB) and does not incorporate integration over gate bias. Using this Method, we have characterized the density of localized states with energies in the range 0.15–1.2 eV from the bottom of the conduction band and have found a wide peak in the DOS in the range of 0.8–0.95 eV below the conduction band. We have also observed that the DOS peak in the lower half of the bandgap increases in magnitude and shifts towards the conduction band as a result of thermal and bias stress. We also measured an overall increase in the DOS in the upper half of the energy gap and an additional peak, centered at 0.2 eV below the conduction band, which appear due to the applied stress. These results are in qualitative agreement with the defect pool Model [1,2].

Determination of Density of Localized States in Amorphous Silicon Alloys From the Low Field Conductance of Thin N-I-N Diodes

1985 ◽  
Vol 49 ◽  
Author(s):  
Michael Shur ◽  
Michael Hack
Keyword(s):  
Temperature Dependence ◽  
Amorphous Silicon ◽  
Bulk Density ◽  
Density Of States ◽  
Energy Gap ◽  
Localized States ◽  
New Technique ◽  
Silicon Alloys ◽  
Low Field ◽  
Density Of Localized States

AbstractWe describe a new technique to determine the bulk density of localized states in the energy gap of amorphous silicon alloys from the temperature dependence of the low field conductance of n-i-n diodes. This new technique allows us to determine the bulk density of states in the centre of a device, and is very straightforward, involving fewer assumptions than other established techniques. Varying the intrinsic layer thickness allows us to measure the,density of states within approximately 400 meV of midgap.We measured the temperature dependence of the low field conductance of an amorphous silicon alloy n-i-n diode with an intrinsic layer thjckness of 0.45 microns and deduced the density of localised states to be 3xlO16cm−3 eV−1 at approximately 0.5 eV below the bottom of the conduction band. We have also considered the high bias region (the space charge limited current regime) and proposed an interpolation formula which describes the current-voltage characteristics of these structures at all biases and agrees well with our computer simulation based on the solution of the complete system of transport equations.

Characteristics of Amorphous Silicon Based Alloy Field Effect Transistors

1984 ◽  
Vol 33 ◽  
Author(s):  
M. Shur ◽  
M. Hack ◽  
C. Hyun
Keyword(s):  
Amorphous Silicon ◽  
Field Effect ◽  
Energy Gap ◽  
Field Effect Transistors ◽  
Localized States ◽  
Flat Band ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
A New Technique ◽  
Silicon Based

ABSTRACTWe have developed a new theory to describe the current-voltage characteristics of amorphous silicon based alloy field effect transistors. We show that the transition from below to above threshold operation occurs when the Fermi level in the accumulation region moves from the deep to tail localized states in the energy gap and that the field effect mobility is dependent on gate voltage. We also propose a new technique to determine the flat-band voltage from the I-V characteristics in the below threshold regime.

The Meyer-Neldel Relation and Analysis of the Field-Effect In Amorphous Silicon

1986 ◽  
Vol 70 ◽  
Author(s):  
Ruud E. I. Schropp ◽  
Jan Snijder ◽  
Jan F. Verwey
Keyword(s):  
Thin Film ◽  
Activation Energy ◽  
Density Of States ◽  
Thin Film Transistors ◽  
Field Effect ◽  
Flat Band ◽  
Gate Bias ◽  
Flat Band Voltage ◽  
Conventional Analysis ◽  
First Time

ABSTRACTThe dependence of the conductance prefactor on the activation energy in accordance with the Meyer-Neldel relation has been observed in a-Si:H, by measuring the temperature dependence of the field-effect in a-Si:H thin-film transistors. The Meyer-Neldel rule is for the first time properly taken into account in the analysis of the field-effect, thereby considering the non-uniform shift of the Fermi-level as induced by the gate bias. The analysis also yields the flat-band voltage, which is an important parameter in the density of states evaluation. The density of states is shown to be considerably overestimated in conventional analysis.

Mechanisms for Defect Creation and Removal in Hydrogenated and Deuterated Amorphous Silicon Studied using Thin Film Transistors

2006 ◽  
Vol 910 ◽  
Author(s):  
Andew Flewitt ◽  
Shufan Lin ◽  
William I Milne ◽  
Ralf B Wehrspohn ◽  
Martin J Powell
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Threshold Voltage ◽  
Thin Film Transistors ◽  
Elevated Temperatures ◽  
Chemical Vapour ◽  
Rf Plasma ◽  
Gate Bias ◽  
Removal Process ◽  
Defect Creation

AbstractIt has been widely observed that thin film transistors (TFTs) incorporating an hydrogenated amorphous silicon (a-Si:H) channel exhibit a progressive shift in their threshold voltage with time upon application of a gate bias. This is attributed to the creation of metastable defects in the a-Si:H which can be removed by annealing the device at elevated temperatures with no bias applied to the gate, causing the threshold voltage to return to its original value. In this work, the defect creation and removal process has been investigated using both fully hydrogenated and fully deuterated amorphous silicon (a-Si:D) TFTs. In both cases, material was deposited by rf plasma enhanced chemical vapour deposition over a range of gas pressures to cover the a-g transition. The variation in threshold voltage as a function of gate bias stressing time, and annealing time with no gate bias, was measured. Using the thermalisation energy concept, it has been possible to quantitatively determine the distribution of energies required for defect creation and removal as well as the associated attempt-to-escape frequencies. The defect creation and removal process in a-Si:H is then discussed in the light of these results.

40 Years Trajectory of Amorphous Semiconductor Research

2000 ◽  
Vol 609 ◽  
Author(s):  
Yoshihiro Hamakawa
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Energy Gap ◽  
Early Period ◽  
Basic Research ◽  
Amorphous Semiconductor ◽  
Film Deposition ◽  
Terrestrial Environment ◽  
Heterojunction Solar Cells ◽  
Wide Range

ABSTRACTA review is given on a research trajectory of amorphous and microcrystalline semiconductors and their device applications proceeded since 1970. A brief explanation on the motivation to start amorphous semiconductor research is given to produce a new kind of synthetic semiconductor having continuous energy gap controllability with valency electron controllability through our experience of modulation spectroscopy in semiconductors.The first material we have challenged is Si-As-Te chalcogenide semiconductor which has a very wide vitreous region in Gibb's Triangle. A series of systematic experiments has been carried out in the terrestrial environment since 1971, and also within the TT-500A rocket experiment in 1980, and the Spacelab. J experiments FMPT (First Material Processing Test) project in 1992. The second material is hydrogenated amorphous silicon (a-Si:H) and its alloys started in 1976 just after the Garmisch Partenkirchen ICALS-6. With some basic research on the a-Si:H film deposition technology and film quality improvement, our continuous effort to improve the efficiency bore the tandem type solar cells in 1979, and also new products of a-SiC:H and a-SiGe:H in the early period of 1980s are described. These innovative device structures and materials have bloomed in the middle of 1980s in R & D phase such as a-SiC/a-Si heterojunction solar cells, a-Si/a-SiGe and also a-Si/poly-Si tandem type solar cells, and industrialized in recent few years. New kind of trials on full-color thin film light emitting devices has also been recently initiated with wide range of band gap controllability of a-SiC:H.The third material is microcrystalline silicon (µc-Si) and their alloys which gathers a tremendous R & D effort as a promised candidate for the bottom cell of the a-Si/µc-Si tandem solar cells aimed for the all-round plasma CVD process for the next age thin film photovoltaic devices. In the final part of presentation, a brief discussion will be given on a technological evolution from “bulk crystalline age” to “multilayered thin film age” in the semiconductor optoelectronics toward 21 century.

Oscillatory non-resonant interband Faraday rotation in InSb and PbTe—a new magneto-optical effect

1971 ◽  
Vol 321 (1546) ◽  
pp. 303-320 ◽  
Keyword(s):  
Magnetic Field ◽  
Conduction Band ◽  
Field Dependence ◽  
Faraday Rotation ◽  
Magnetic Field Dependence ◽  
Energy Gap ◽  
Landau Levels ◽  
Wide Range ◽  
Magneto Optical Effect ◽  
The Magnetic Field

Oscillations in the magnetic field dependence of interband Faraday rotation in degenerate samples of InSb and PbTe at low temperatures have been observed for photons having a wide range of energies which are less than that corresponding to the forbidden energy gap. These oscillations are attributed to the imbalance of contributions from right and left circularly polarized modes to the total rotation, caused by the blocking of certain interband absorptions by conduction-band electrons. The perturbing effect of the variation of carrier concentration is used as an experimental variable. The relative strengths of the oscillations have been reasonably well accounted for by analysis of the interband selection rules and transition strengths given by a theory due to Boswarva & Lidiard. The positions of the oscillations, which depend on the population of Landau levels in the conduction band, have a reciprocal magnetic field dependence as for the de Haas-van Alphen effect, and have yielded quantitative determinations of energy-band parameters.

Photoconductivity study of amorphous CdTe

1977 ◽  
Vol 55 (3) ◽  
pp. 265-269 ◽  
Author(s):  
R. T. S. Shiah ◽  
D. E. Brodie ◽  
P. C. Eastman
Keyword(s):  
Light Intensity ◽  
Fermi Level ◽  
Conduction Band ◽  
Localized States ◽  
Effective Density ◽  
Transition Rates ◽  
Mobility Edge ◽  
Energy Parameters ◽  
Density Of Localized States ◽  
Mobility Gap

Photoconductivity measurements as a function of light intensity and temperature for amorphous CdTe are analyzed on the basis of the Mott and Davis model and some ideas of the Arnoldussen, Bube, Fagen, and Holmberg model. Energy parameters within the mobility gap of amorphous CdTe were evaluated. The effective density of localized states is found to be 1017and 1019 per cm3 per eV near the valence and conduction band edges respectively. The localized-to-localized recombination transition rates are also given. The dark Fermi level is found to be 0.54 eV above the valence mobility edge. Localized states extend into the mobility gap 0.37 eV from the valence mobility edge. These results are consistent with earlier measurements by Ng, Webb, and Brodie.

Electron transport and conduction band structure of GaSb

1981 ◽  
Vol 59 (12) ◽  
pp. 1844-1850 ◽  
Author(s):  
Hyung Jae Lee ◽  
John C. Woolley
Keyword(s):  
Magnetic Field ◽  
Experimental Data ◽  
Electrical Conductivity ◽  
Conduction Band ◽  
Room Temperature ◽  
Energy Gap ◽  
Band Model ◽  
Scattering Coefficients ◽  
Wide Range ◽  
Different Temperatures

Calculations have been made using the Fletcher and Butcher method in a three conduction band model to fit a wide range of experimental transport data for n-type samples of GaSb: viz. Hall coefficient and electrical conductivity as a function of temperature and as a function of pressure at room temperature, magnetoresistance as a function of magnetic field at different temperatures, and Nernst–Ettingshausen coefficients as a function of magnetic field. Various energy gap parameters and scattering coefficients have been taken as adjustable and values determined for these which give good fits to all of the experimental data. Values of mobility for each of the Γ, L, and X bands have then been calculated as a function of temperature.

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