scholarly journals Photoluminescence Spectroscopy and Rutherford Backscattering Channeling Evaluation of Various Capping Techniques for Rapid Thermal Annealing of Ion-Implanted ZnSe

1994 ◽  
Vol 340 ◽  
Author(s):  
E.L. Allen ◽  
F.X. Zach ◽  
K.M. Yu ◽  
E.D. Bourret
Keyword(s):  
Optical Properties ◽  
Point Defects ◽  
Room Temperature ◽  
Annealing Temperature ◽  
Rutherford Backscattering Spectrometry ◽  
Liquid Nitrogen Temperature ◽  
Rutherford Backscattering ◽  
Photoluminescence Spectroscopy ◽  
Photoluminescence Spectra ◽  
Ion Implanted

ABSTRACTWe report on the effectiveness of proximity caps and PECVD Si3N4 caps during annealing of implanted ZnSe films. OMVPE ZnSe films were grown using diisopropylselenide (DIPSe) and diethylzinc (DEZn) precursors, then ion-implanted with 1 × 1014 cm−2 N (33 keV) or Ne (45 keV) at room temperature and liquid nitrogen temperature, and rapid thermal annealed at temperatures between 200°C and 850°C. Rutherford backscattering spectrometry in the channeling orientation was used to investigate damage recovery, and photoluminescence spectroscopy was used to investigate crystal quality and the formation of point defects. Low temperature implants were found to have better luminescence properties than room temperature implants, and results show that annealing time and temperature may be more important than capping material in determining the optical properties. The effects of various caps, implant and annealing temperature are discussed in terms of their effect on the photoluminescence spectra.

Photoluminescence Spectra of C+-Implanted GaAs: Experimental Verification on Amphoteric Features of Carbon Impurities in GaAs

1988 ◽  
Vol 100 ◽  
Author(s):  
Yunosuke Makita ◽  
Shigeru Shigetomi ◽  
Masahiko Mori ◽  
Nobukazu Ohnishi ◽  
Paul Phelan ◽  
...  
Keyword(s):  
Point Defects ◽  
Experimental Verification ◽  
Room Temperature ◽  
Low Dose ◽  
Annealing Temperature ◽  
Critical Value ◽  
Photoluminescence Spectra ◽  
Disordered Lattice ◽  
Carbon Impurities ◽  
Scattering Measurements

ABSTRACTC+ ion-implantation was carried out for extremely pure GaAs gown by moleplar Ieam epitaxy. The dose was very widely varied from 1×1015 to 1×1020 cm−3. Photoluminescence and Raman scattering measurements were performed at 2 K and room temperature, respectively, both as functions of dose and annealing temperature. The results revealed that for a dose less than 5×1017 cm−3, where the dominant damages are point defects, annealing at 200°C is sufficient to attain a damage-free lattice. When the dose is above that value, where the principal damage is a highly disordered lattice, annealing, at least above 550°C, is required. Photoluminescence spectra showed that the well-defined near-band-gap emission, [g-g], (exclusively inherent to acceptors), was a dominant emission in the above mentioned low dose region, but was strongly suppressed in the higher region. These observations indicate that ion-implanted C atoms in GaAs behave as amphoteric impurities when the dose exceeds a critical value, of around 5×1017 cm−3.

Electrical and Optical Properties of Si+ and P+ Implanted InP:Fe

1990 ◽  
Vol 201 ◽  
Author(s):  
Honglie Shen ◽  
Genqing Yang ◽  
Zuyao Zhou ◽  
Guanqun Xia ◽  
Shichang Zou
Keyword(s):  
Optical Properties ◽  
Silicon Nitride ◽  
Temperature Dependence ◽  
Optimal Condition ◽  
Room Temperature ◽  
Broad Band ◽  
Photoluminescence Spectra ◽  
Electrical And Optical Properties ◽  
Spectrum Measurement ◽  
Single Implant

AbstractDual implantations of Si+ and P+ into InP:Fe were performed both at 200°C and room temperature. Si+ ions were implanted by 150keV with doses ranging from 5×1013 /cm2 to 1×1015 /cm2, while P+ ions were implanted by 110keV. 160keV and 180keV with doses ranging from 1×l013 /cm2 to 1×1015 /cm2. Hall measurements and photoluminescence spectra were used to characterize the silicon nitride encapsulated annealed samples. It was found that enhanced activation can be obtained by Si+ and P+ dual implantations. The optimal condition for dual implantations is that the atomic distribution of implanted P overlaps that of implanted si with the same implant dose. For a dose of 5×l014 /cm2, the highest activation for dual implants is 70% while the activation for single implant is 40% after annealing at 750°C for 15 minutes. PL spectrum measurement was carried out at temperatures from 11K to 100K. A broad band at about 1.26eV was found in Si+ implanted samples, of which the intensity increased with increasing of the Si dose and decreased with increasing of the co-implant P+ dose. The temperature dependence of the broad band showed that it is a complex (Vp-Sip) related band. All these results indicate that silicon is an amphoteric species in InP.

Electrical and Structural Properties of Al-Implanted and Annealed 4H-SiC

2007 ◽  
Vol 556-557 ◽  
pp. 343-346 ◽  
Author(s):  
M. Obernhofer ◽  
Michael Krieger ◽  
Frank Schmid ◽  
Heiko B. Weber ◽  
Gerhard Pensl ◽  
...  
Keyword(s):  
Hall Effect ◽  
Structural Properties ◽  
Room Temperature ◽  
Annealing Temperature ◽  
Rutherford Backscattering ◽  
Electrical Activation ◽  
Implantation Damage ◽  
Aluminum Ions

Aluminum ions (Al+) were implanted at room temperature or at 500°C into n-type 4HSiC. The implantation damage (displaced Si atoms) and the electrical activation of Al+ ions (concentration of Al acceptors) were determined by Rutherford backscattering in channeling mode and Hall effect, respectively, as a function of the annealing temperature.

Doping of GaN by ion implantation

2000 ◽  
Vol 650 ◽  
Author(s):  
Eduardo J. Alves ◽  
C. Liu ◽  
Maria F. da Silva ◽  
José C. Soares ◽  
Rosário Correia ◽  
...  
Keyword(s):  
Optical Properties ◽  
Ion Implantation ◽  
Room Temperature ◽  
Lattice Site ◽  
Helium Temperature ◽  
Site Location ◽  
Structural And Optical Properties ◽  
X Ray ◽  
Er Doped ◽  
Ion Implanted

ABSTRACTIn this work we report the structural and optical properties of ion implanted GaN. Potential acceptors such as Ca and Er were used as dopants. Ion implantation was carried out with the substrate at room temperature and 550 °C, respectively. The lattice site location of the dopants was studied by Rutherford backscattering/channeling combined with particle induced X-ray emission. Angular scans along both [0001] and [1011] directions show that 50% of the Er ions implanted at 550 oC occupy substitutional or near substitutional Ga sites after annealing. For Ca we found only a fraction of 30% located in displaced Ga sites along the [0001] direction. The optical properties of the ion implanted GaN films have been studied by photoluminescence measurements. Er- related luminescence near 1.54 μm is observed under below band gap excitation at liquid helium temperature. The spectra of the annealed samples consist of multiline structures with the sharpest lines found in GaN until now. The green and red emissions were also observed in the Er doped samples after annealing.

Influence of the Annealing Ambient on Structural and Optical Properties of Rare Earth Implanted GaN

2005 ◽  
Vol 892 ◽  
Author(s):  
Katharina Lorenz ◽  
E. Nogales ◽  
R. Nédélec ◽  
J. Penner ◽  
R. Vianden ◽  
...  
Keyword(s):  
Optical Properties ◽  
Rare Earth ◽  
Room Temperature ◽  
Rutherford Backscattering Spectrometry ◽  
Strong Increase ◽  
Structural And Optical Properties ◽  
Nitrogen Gas ◽  
Higher Temperature ◽  
The Eu ◽  
The Rare Earth

AbstractGaN films were implanted with Er and Eu ions and rapid thermal annealing was performed at 1000, 1100 and 1200 °C in vacuum, in flowing nitrogen gas or a mixture of NH3 and N2. Rutherford backscattering spectrometry in the channeling mode was used to study the evolution of damage introduction and recovery in the Ga sublattice and to monitor the rare earth profiles after annealing. The surface morphology of the samples was analyzed by scanning electron microscopy and the optical properties by room temperature cathodoluminescence (CL). Samples annealed in vacuum and N2 already show the first signs of surface dissociation at 1000 °C. At higher temperature, Ga droplets form at the surface. However, samples annealed in NH3 + N2 exhibit a very good recovery of the lattice along with a smooth surface. These samples also show the strongest CL intensity for the rare earth related emissions in the green (for Er) and red (for Eu). After annealing at 1200 °C in NH3+N2 the Eu implanted sample reveals the channeling qualities of an unimplanted sample and a strong increase of CL intensity is observed.

Microstructure and Optical Properties of Au–Y2O3-stabilized ZrO2 Nanocomposite Films

2005 ◽  
Vol 20 (9) ◽  
pp. 2516-2522 ◽  
Author(s):  
George Sirinakis ◽  
Rezina Siddique ◽  
Christos Monokroussos ◽  
Michael A. Carpenter ◽  
Alain E. Kaloyeros
Keyword(s):  
Optical Properties ◽  
Au Nanoparticles ◽  
Annealing Temperature ◽  
Rutherford Backscattering Spectrometry ◽  
Nanocomposite Films ◽  
Au Nanoparticle ◽  
X Ray Diffraction ◽  
Working Pressure ◽  
Optical Absorption Band ◽  
Size Dependent

Nanocomposite films consisting of gold nanoparticles embedded in an yttria stabilized zirconia (YSZ) matrix were synthesized at room temperature by radio-frequency co-sputtering from YSZ and Au targets at a 5 mTorr working pressure. The films were subsequently annealed for 2 h in 1 atm argon, with the annealing temperature varied from 600 to 1000 °C in steps of 100 °C. The composition, microstructure, and optical properties of the films were characterized as a function of annealing temperature by Rutherford backscattering spectrometry, scanning electron microscopy, Auger electron spectroscopy, x-ray diffraction, and absorption spectroscopy. An optical absorption band due to the surface plasmon resonance (SPR) of the Au nanoparticles was observed around a wavelength of 600 nm. Furthermore, the SPR band full width at half-maximum exhibited an inverse linear dependence on the radius of the Au nanoparticle, with a slope parameter A = 0.18, indicating a weak interaction between the YSZ matrix and the Au nanoparticles. The experimentally observed SPR dependence on nanoparticle size is discussed within the context of the Mie theory and its size-dependent optical constants.

scholarly journals Optical properties of CuSe thin films - band gap determination

2017 ◽  
Vol 49 (2) ◽  
pp. 167-174 ◽  
Author(s):  
Milica Petrovic ◽  
Martina Gilic ◽  
Jovana Cirkovic ◽  
Maja Romcevic ◽  
Nebojsa Romcevic ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Band Gap ◽  
Room Temperature ◽  
Nir Spectroscopy ◽  
Copper Selenide ◽  
Photoluminescence Spectra ◽  
Indirect Transition ◽  
Direct Transition ◽  
Scanning Electron

Copper selenide thin films of three different thicknesses have been prepared by vacuum evaporation method on a glass substrate at room temperature. The optical properties of the films were investigated by UV-VIS-NIR spectroscopy and photoluminescence spectroscopy. Surface morphology was investigated by field-emission scanning electron microscopy. Copper selenide exhibits both direct and indirect transitions. The band gap for direct transition is found to be ~2.7 eV and that for indirect transition it is ~1.70 eV. Photoluminescence spectra of copper selenide thin films have also been analyzed, which show emission peaks at 530, 550, and 760 nm. The latter corresponds to indirect transition in investigated material.

Doping of GaN by ion implantation

2000 ◽  
Vol 647 ◽  
Author(s):  
Eduardo J. Alves ◽  
C. Liu ◽  
Maria F. da Silva ◽  
José C. Soares ◽  
Rosário Correia ◽  
...  
Keyword(s):  
Optical Properties ◽  
Ion Implantation ◽  
Room Temperature ◽  
Lattice Site ◽  
Helium Temperature ◽  
Site Location ◽  
Structural And Optical Properties ◽  
X Ray ◽  
Er Doped ◽  
Ion Implanted

AbstractIn this work we report the structural and optical properties of ion implanted GaN. Potential acceptors such as Ca and Er were used as dopants. Ion implantation was carried out with the substrate at room temperature and 550 °C, respectively. The lattice site location of the dopants was studied by Rutherford backscattering/channeling combined with particle induced X-ray emission. Angular scans along both [0001] and [1011] directions show that 50% of the Er ions implanted at 550 °C occupy substitutional or near substitutional Ga sites after annealing. For Ca we found only a fraction of 30% located in displaced Ga sites along the [0001] direction. The optical properties of the ion implanted GaN films have been studied by photoluminescence measurements. Er- related luminescence near 1.54 µm is observed under below band gap excitation at liquid helium temperature. The spectra of the annealed samples consist of multiline structures with the sharpest lines found in GaN until now. The green and red emissions were also observed in the Er doped samples after annealing.

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