scholarly journals Comparative Study of Radiative Heating Techniques for Fast Processing of Functional Coatings for Sustainable Energy Applications

2021 ◽  
Author(s):  
Rebecca Griffin ◽  
Katherine Hooper ◽  
Cecile Charbonneau ◽  
Jenny Baker
Keyword(s):  
Thin Film ◽  
Chemical Reactions ◽  
Short Wavelength ◽  
Near Infrared ◽  
Radiative Heating ◽  
Intense Pulse Light ◽  
Functional Coatings ◽  
Binder Removal ◽  
Energy Applications ◽  
Fast Processing

This study assesses the use of short wavelength radiative heating techniques such as near infrared, intense pulse light and ultraviolet heating for processing coatings in energy applications. Concentrating on the importance of investigating different radiative wavelengths to advance these technologies as scalable processes via reduced heating times. It illustrates the mechanisms by which these techniques can transform thin film materials: sintering, binder removal, drying and chemical reactions. It focuses on successful research applications and the methods used to apply these radiative mechanisms in solar energy, battery storage and fuel cells, whilst considering the materials suitable for such intentions. The purpose of this paper is to highlight to academics as well as industrialists some of the potential advantages and applications of radiative heating technologies.

Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra

2010 ◽  
Vol 162 (2) ◽  
pp. 210-214 ◽  
Author(s):  
M. Laamanen ◽  
M. Blomberg ◽  
R.L. Puurunen ◽  
A. Miranto ◽  
H. Kattelus
Keyword(s):  
Thin Film ◽  
Infrared Spectra ◽  
Short Wavelength ◽  
Near Infrared

scholarly journals Thin film absorbers for visible, near-infrared, and short-wavelength infrared spectra

2009 ◽  
Vol 1 (1) ◽  
pp. 393-396 ◽  
Author(s):  
M. Laamanen ◽  
M. Blomberg ◽  
R.L. Puurunen ◽  
A. Miranto ◽  
H. Kattelus
Keyword(s):  
Thin Film ◽  
Infrared Spectra ◽  
Short Wavelength ◽  
Near Infrared

scholarly journals Plasmon-Enhanced Sunlight Harvesting in Thin-Film Solar Cell by Randomly Distributed Nanoparticle Array

Materials ◽  
2021 ◽  
Vol 14 (6) ◽  
pp. 1380
Author(s):  
Marwa M. Tharwat ◽  
Ashwag Almalki ◽  
Amr M. Mahros
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Solar Cell ◽  
Near Infrared ◽  
Structural Parameters ◽  
Visible Region ◽  
Nanoparticle Array ◽  
Solar Energy Harvesting ◽  
Infra Red ◽  
Crucial Parameter

In this paper, a randomly distributed plasmonic aluminum nanoparticle array is introduced on the top surface of conventional GaAs thin-film solar cells to improve sunlight harvesting. The performance of such photovoltaic structures is determined through monitoring the modification of its absorbance due to changing its structural parameters. A single Al nanoparticle array is integrated over the antireflective layer to boost the absorption spectra in both visible and near-infra-red regimes. Furthermore, the planar density of the plasmonic layer is presented as a crucial parameter in studying and investigating the performance of the solar cells. Then, we have introduced a double Al nanoparticle array as an imperfection from the regular uniform single array as it has different size particles and various spatial distributions. The comparison of performances was established using the enhancement percentage in the absorption. The findings illustrate that the structural parameters of the reported solar cell, especially the planar density of the plasmonic layer, have significant impacts on tuning solar energy harvesting. Additionally, increasing the plasmonic planar density enhances the absorption in the visible region. On the other hand, the absorption in the near-infrared regime becomes worse, and vice versa.

ELASTIC PROPERTIES OF METAL SUPERLATTICES

1985 ◽  
Vol 56 ◽  
Author(s):  
A.F. JANKOWSKI ◽  
T. TSAKALAKOS
Keyword(s):  
Thin Film ◽  
Elastic Properties ◽  
Elastic Constants ◽  
Vapor Deposition ◽  
Short Wavelength ◽  
Plastic Behavior ◽  
Average Composition ◽  
Strain Effects ◽  
Modulated Structure ◽  
Appreciable Increase

AbstractThe elastic properties of modulated structure materials are presented. An enhanced modulus effect has been observed in several composition modulated thin film systems containing short wavelength modulations.8-10nm. The foils were produced by vapor deposition using two or three source evaporator. As compared with homogeneous foils of the same average composition, the modulated foils exhibited an appreciable increase (up to 300%) in modulus. The dependence of various moduli on the modulation parameters (wavelength, composition and amplitude) are described. The plastic behavior, breaking and microhardness of these foils are also presented as a function of the modulation parameters. Current theories based on electronic and strain effects on the elastic constants of metals are also presented to explain the origin of the supermodulus effect.

Near-Infrared Light Emission from of Er-Doped ZnO Thin Film in Micropits Processed on Si Substrate

2006 ◽  
Vol 320 ◽  
pp. 113-116
Author(s):  
Shigeru Tanaka ◽  
Yukari Ishikawa ◽  
Naoki Ohashi ◽  
Junichi Niitsuma ◽  
Takashi Sekiguchi ◽  
...  
Keyword(s):  
Thin Film ◽  
Near Infrared ◽  
Light Emission ◽  
Infrared Light ◽  
Zno Thin Film ◽  
Si Substrate ◽  
Near Infrared Light ◽  
Transmission Electron ◽  
Doped Zno ◽  
Er Doped

We have obtained Er-doped ZnO thin film in a micropattern of reverse trapezoids processed on Si substrate by sputtering and ultrafine polishing techniques. Near-infrared light emission was detected successfully from the thin film filling a single micropit with 10 μm square. Transmission electron microscopy (TEM) observation showed epitaxial growth of ZnO crystals along the curvature of the micropit.

Epitaxy and Chemical Reactions During Thin Film Formation from Low Energy Ions New Kinetic Pathways, New Phases and New Properties

1991 ◽  
Vol 236 ◽  
Author(s):  
Nicole Herbots ◽  
O.C. Hellman ◽  
O. Vancauwenberghe
Keyword(s):  
Thin Film ◽  
Chemical Reactions ◽  
Degrees Of Freedom ◽  
Film Growth ◽  
Film Formation ◽  
Chemical Reactivity ◽  
Ion Beam ◽  
Low Energy ◽  
Low Energy Ions ◽  
Beam Deposition

AbstractThree important effects of low energy direct Ion Beam Deposition (IBD) are the athermal incorporation of material into a substrate, the enhancement of atomic mobility in the subsurface, and the modification of growth kinetics it creates. All lead to a significant lowering of the temperature necessary to induce epitaxial growth and chemical reactions. The fundamental understanding and new applications of low temperature kinetics induced by low energy ions in thin film growth and surface processing of semiconductors are reviewed. It is shown that the mechanism of IBD growth can be understood and computed quantitatively using a simple model including ion induced defect generation and sputtering, elastic recombination, thermal diffusion, chemical reactivity, and desorption The energy, temperature and dose dependence of growth rate, epitaxy, and chemical reaction during IBD is found to be controlled by the net recombination rate of interstitials at the surface in the case of epitaxy and unreacted films, and by the balance between ion beam decomposition and phase formation induced by ion beam generated defects in the case of compound thin films. Recent systematic experiments on the formation of oxides and nitrides on Si, Ge/Si(100), heteroepitaxial SixGe1−x/Si(100) and GaAs(100) illustrate applications of this mechanism using IBD in the form of Ion Beam Nitridation (IBN), Ion Beam Oxidation (IBO) and Combined Ion and Molecular beam Deposition (CIMD). It is shown that these techniques enable (1) the formation of conventional phases in conditions never used before, (2) the control and creation of properties via new degrees of freedom such as ion energy and lowered substrate temperatures, and (3) the formation of new metastable heterostructures that cannot be grown by pure thermal means.

Growth, Structural and Mechanical Characterization and Reliability of Chemical Vapor Deposited Co and Co3O4 Thin Films as Candidate Materials for Sensing Applications

2011 ◽  
Vol 495 ◽  
pp. 108-111 ◽  
Author(s):  
Vasiliki P. Tsikourkitoudi ◽  
Elias P. Koumoulos ◽  
Nikolaos Papadopoulos ◽  
Costas A. Charitidis
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Elastic Modulus ◽  
Data Storage ◽  
Mechanical Stability ◽  
Chemical Vapor ◽  
Magnetic Sensors ◽  
Functional Coatings ◽  
Sensing Applications ◽  
Chemical Vapor Deposited

The adhesion and mechanical stability of thin film coatings on substrates is increasingly becoming a key issue in device reliability as magnetic and storage technology driven products demand smaller, thinner and more complex functional coatings. In the present study, chemical vapor deposited Co and Co3O4thin films on SiO2and Si substrates are produced, respectively. Chemical vapor deposition is the most widely used deposition technique which produces thin films well adherent to the substrate. Co and Co3O4thin films can be used in innovative applications such as magnetic sensors, data storage devices and protective layers. The produced thin films are characterized using nanoindentation technique and their nanomechanical properties (hardness and elastic modulus) are obtained. Finally, an evaluation of the reliability of each thin film (wear analysis) is performed using the hardness to elastic modulus ratio in correlation to the ratio of irreversible work to total work for a complete loading-unloading procedure.

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