scholarly journals Labmade Metallizer: Deposition of Aluminum Film on Glass Substrate and Subsequent Anodization to obtain Aluminum Oxide

2021 ◽  
Author(s):  
Uanderson Mezavila-Garcia ◽  
Janaina S. Santos ◽  
Elidiane C. Rangel ◽  
Nilson C. Cruz ◽  
Francisco Trivinho-Strixino
Keyword(s):  
Aluminum Oxide ◽  
Glass Substrate ◽  
Physical Vapor Deposition ◽  
Low Cost ◽  
Aluminum Film ◽  
Metallic Film ◽  
Sample Holder ◽  
Substrate Roughness ◽  
Nanostructured Oxide ◽  
Sample Position

In this work, the assembly of a low-cost metallizer is presented, based on physical vapor deposition, to obtain metallic aluminum film deposited over a glass substrate. Later, the Al film is anodized and converted into a porous nanostructured oxide film. The metallic film thickness was measured by profilometry, and the sample position inside the chamber was evaluated. Samples positioned at the center of the sample holder showed considerable thickness and best homogeneity compared to those samples positioned at the edges of the sample holder. A thick metallic film of Al (6 to 7 µm) was deposited over the glass substrate for subsequent anodizing treatment. Mild anodization allowed the total conversion of metallic Al after 7000 s, producing a transparent anodic aluminum oxide (AAO) film adhered to the glass substrate. The AAO morphology was investigated by SEM. Some factors have been listed to describe the low regularity and homogeneity of nanopores in the outer layer of AAO, such as internal defects, compaction of deposited Al film layers and the glass substrate roughness.

OPTICALLY TRANSPARENT GLASS WITH VERTICALLY ALIGNED SURFACE Al2O3 NANOWIRES HAVING SUPERHYDROPHOBIC CHARACTERISTICS

NANO ◽  
2010 ◽  
Vol 05 (02) ◽  
pp. 89-95 ◽  
Author(s):  
JIN-YEOL KIM ◽  
KUNBAE NOH ◽  
CHULMIN CHOI ◽  
KARLA S. BRAMMER ◽  
MARIANA LOYA ◽  
...  
Keyword(s):  
Aluminum Oxide ◽  
Glass Substrate ◽  
Glass Surface ◽  
Nanowire Array ◽  
Aluminum Film ◽  
Film Deposition ◽  
Large Area ◽  
Potential Applications ◽  
Vertically Aligned ◽  
Spectrum Region

We have shown in this paper that the self-ordered pore structure of anodic aluminum oxide (AAO) can be utilized as a basis to conveniently form large-area Al2O3 nanowire arrays on a glass surface. An aluminum oxide nanowire array has been produced by aluminum film deposition on glass followed by anodization, then simple chemical etching. The glass surface as prepared is highly superhydrophobic, with a contact angle as high as 169°. The thinness (~ 340 nm) and vertical alignment of the aluminum oxide nanowires with empty spaces in-between essentially contribute to maintaining the optical transparency of the glass substrate. Interestingly, substantially suppressed UV transmission in the ~ 300–400 nm spectrum region was observed with the presence of the Al2O3 nanowires on the glass substrate. Such a durable surface ceramic nanowire structure can be useful for producing superhydrophobic, self-cleaning glasses with a variety of potential applications such as UV protecting glass windows for high rise buildings with reduced consumption of water and cleaning chemicals for positive environmental effects.

scholarly journals Variations in Optical Properties of ZnS/Cu/ZnS Nanostructures Due to Thickness Change of ZnS Cap Layer

2016 ◽  
Vol 2 (1) ◽  
pp. 25-30 ◽  
Author(s):  
Haidar Howari ◽  
Islam Uddin
Keyword(s):  
Thermal Stability ◽  
Optical Properties ◽  
Glass Substrate ◽  
Physical Vapor Deposition ◽  
Low Cost ◽  
High Refractive Index ◽  
Thickness Change ◽  
Good Thermal Stability ◽  
Vapor Deposition Technique ◽  
Physical Vapor Deposition Technique

Nanostructures of ZnS/Cu/ZnS were deposited on glass substrate using physical vapor deposition technique. The thickness of the first and last ZnS layers was altered, while the thickness of the embedded Cu layer was fixed at 50 nm. The produced nanostructures were of good quality. Spectrophotometric measurements were carried out on the nanostructures to investigate the optical properties. The transmission and reflectivity spectra were recorded and studied in details. ZnS was selected due to its high refractive index, ease of deposition, and low cost. The copper layer was used because of its low absorption in the visible part of the spectrum and its thermal stability. The ZnS layer was found not only to anti-reflective the Cu layer, but also to stabilize the nanostructure, improve its adherence on glass substrate, and increase the film thermal resistance up to 240 °C. Furthermore, all the samples exhibit good thermal stability up to 240 °C upon annealing for two hours.

Fabrication of Anodic Aluminum Oxide Film on Large-Area Glass Substrate

2007 ◽  
Vol 10 (12) ◽  
pp. C69 ◽  
Author(s):  
Ching-Jung Yang ◽  
Shih-Wei Liang ◽  
Pu-Wei Wu ◽  
Chih Chen ◽  
Jia-Min Shieh
Keyword(s):  
Oxide Film ◽  
Aluminum Oxide ◽  
Glass Substrate ◽  
Anodic Aluminum Oxide ◽  
Large Area ◽  
Anodic Aluminum Oxide Film ◽  
Aluminum Oxide Film ◽  
Anodic Aluminum

Study the Heat Transfer Process From Electron-Phonon Nonequilibrium in Thin Gold Film to Glass Substrate Through Transient Thermoreflectance Measurements

2010 ◽  
Author(s):  
Weigang Ma ◽  
Haidong Wang ◽  
Xing Zhang ◽  
Wei Wang
Keyword(s):  
Heat Transfer ◽  
Transfer Process ◽  
Borosilicate Glass ◽  
Glass Substrate ◽  
Physical Vapor Deposition ◽  
Gold Film ◽  
Coupling Factor ◽  
Heat Transfer Process ◽  
Thin Gold Film ◽  
Open Question

How the energy transfers during electron-phonon nonequilibrium in thin metal films is still an open question, and how to measure the intrinsic thermal transport properties of the material under the covering layer is another challenge. In this paper, the heat transfer process from electron-phonon nonequilibrium in thin gold film to borosilicate glass substrate has been studied by resorting to different segments of the transient thermoreflectance signal, which is obtained from the rear-pump front-probe transient thermoreflectance technique. The gold film, which has a thickness of 23.1 nm, is deposited on the borosilicate glass substrate using using a physical vapor deposition (PVD) approach. Within the framework of the two-temperature model (TTM), the electron-phonon (e-ph) coupling factors of the gold film, which reflect the strength of heat flow from hot electrons to cold phonons, are derived from the signal taken after the first several picoseconds with different pump fluences, and the measured value is (1.95–2.05)×1016 W m−3 K−1. The electron-phonon coupling factor does not significantly change in response to the pump pulse fluence variation and exhibits little change compared to the bulk gold value 2.4×1016 W m−3 K−1. Furthermore, the thermal conductivity of the glass substrate is obtained through the thermoreflectance signal between 20 to 140 picoseconds and the value is W m−1 K−1.

scholarly journals Recovery of FTO coated glass substrate via environment-friendly facile recycling perovskite solar cells

RSC Advances ◽  
2021 ◽  
Vol 11 (24) ◽  
pp. 14534-14541
Author(s):  
M. S. Chowdhury ◽  
Kazi Sajedur Rahman ◽  
Vidhya Selvanathan ◽  
A. K. Mahmud Hasan ◽  
M. S. Jamal ◽  
...  
Keyword(s):  
Solar Cells ◽  
Glass Substrate ◽  
Large Scale ◽  
Low Cost ◽  
Perovskite Solar Cells ◽  
Potential Candidate ◽  
Photovoltaic Devices ◽  
Coated Glass Substrate ◽  
Environment Friendly ◽  
Coated Glass

Organic–inorganic perovskite solar cells (PSCs) have recently emerged as a potential candidate for large-scale and low-cost photovoltaic devices.

scholarly journals Growth of high-quality semiconducting tellurium films for high-performance p-channel field-effect transistors with wafer-scale uniformity

2022 ◽  
Vol 6 (1) ◽  
Author(s):  
Taikyu Kim ◽  
Cheol Hee Choi ◽  
Pilgyu Byeon ◽  
Miso Lee ◽  
Aeran Song ◽  
...  
Keyword(s):  
Field Effect ◽  
Physical Vapor Deposition ◽  
High Performance ◽  
Supply Voltage ◽  
Field Effect Transistors ◽  
Low Cost ◽  
Three Dimensional ◽  
Cmos Technology ◽  
Oxide Semiconductor ◽  
Wafer Scale

AbstractAchieving high-performance p-type semiconductors has been considered one of the most challenging tasks for three-dimensional vertically integrated nanoelectronics. Although many candidates have been presented to date, the facile and scalable realization of high-mobility p-channel field-effect transistors (FETs) is still elusive. Here, we report a high-performance p-channel tellurium (Te) FET fabricated through physical vapor deposition at room temperature. A growth route involving Te deposition by sputtering, oxidation and subsequent reduction to an elemental Te film through alumina encapsulation allows the resulting p-channel FET to exhibit a high field-effect mobility of 30.9 cm2 V−1 s−1 and an ION/OFF ratio of 5.8 × 105 with 4-inch wafer-scale integrity on a SiO2/Si substrate. Complementary metal-oxide semiconductor (CMOS) inverters using In-Ga-Zn-O and 4-nm-thick Te channels show a remarkably high gain of ~75.2 and great noise margins at small supply voltage of 3 V. We believe that this low-cost and high-performance Te layer can pave the way for future CMOS technology enabling monolithic three-dimensional integration.

scholarly journals Hygroexpansion and Surface Roughness Cause Defects and Increase the Electrical Resistivity of Physical Vapor Deposited Aluminum Coatings on Paper

Coatings ◽  
2019 ◽  
Vol 9 (1) ◽  
pp. 33 ◽  
Author(s):  
Martina Lindner ◽  
Julia Heider ◽  
Matthias Reinelt ◽  
Horst-Christian Langowski
Keyword(s):  
Surface Roughness ◽  
Relative Humidity ◽  
Moisture Content ◽  
Inductively Coupled Plasma ◽  
Physical Vapor Deposition ◽  
Eddy Currents ◽  
Unit Area ◽  
Substrate Roughness ◽  
Aluminum Coatings ◽  
Inductively Coupled

Aluminum coatings, which are applied by physical vapor deposition (PVD), have to be virtually defect-free in barrier applications for the packaging industry. When aluminum is applied to paper, hygroexpansion and substrate roughness can impair the aluminum coating. Neither effect is easy to detect by microscopy, but both can manifest as an increase in electrical resistance. Here, we quantified the effect of substrate paper hygroexpansion and surface roughness on the effective resistivity ρEFF of aluminum coatings. The sheet resistance of aluminum coated onto four different rough paper surfaces was measured via eddy currents at different relative humidity (0%–95%). The mass of aluminum per unit area was determined by inductively-coupled plasma mass spectrometry (ICP–MS). We calculated ρEFF based on the measured resistance and aluminum mass per unit area, combined with a value for aluminum density from the literature. The substrate roughness was proportional to ρEFF. Relative humidity correlated with the moisture content of the paper substrate according to the Guggenheim, Anderson, and De Boer (GAB) equation, whereas the moisture content showed a linear correlation with hygroexpansion. At relative humidity of up to 50%, hygroexpansion was linearly correlated with the increase in ρEFF, which is related to the mechanical straining and deformation of aluminum. At higher humidity, aluminum started to crack first on rough substrates and later on smooth substrates. The increase in ρEFF was larger on rough substrates. The findings highlight the need for information about substrate roughness, humidity, and hygroexpansion when eddy current measurement results are compared, and will help to ensure that aluminum coatings, applied by PVD, are defect-free.

scholarly journals Fabrication of temperature sensor based on copper oxide nanowires grown on titanium coated glass substrate

2018 ◽  
Vol 36 (3) ◽  
pp. 460-468 ◽  
Author(s):  
Ali A. Aljubouri ◽  
Abdulqader D. Faisal ◽  
Wafaa K. Khalef
Keyword(s):  
Copper Oxide ◽  
Temperature Sensor ◽  
Glass Substrate ◽  
Physical Vapor Deposition ◽  
Copper Film ◽  
High Sensitivity ◽  
Infrared Thermal Imaging ◽  
Oxide Nanowires ◽  
Vapor Deposition Technique ◽  
Physical Vapor Deposition Technique

AbstractSingle phase, adherent films of copper oxide nanowires (CuO NWs) were successfully grown on a glass substrate. Titanium nanofilm was pre-coated on the glass substrate to assist the growth of a layer adherent to the substrate. The copper film of 1.5 μm thickness was deposited via physical vapor deposition technique followed by thermal oxidation in air at various temperatures for 4 h. The product was characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), ultraviolet-visible (UV-Vis) and Fourier transformation infrared (FT-IR) spectroscopy to find the crystal structure, morphology, phases, and optical properties of the deposited films. The CuO NWs film with 60% transmittance at wavelengths greater than 800 nm was obtained. It can be used as an infrared thermal imaging filter and in optoelectronic devices. The fabricated temperature sensor exhibited high sensitivity in the temperature range of 20 °C to 180 °C.

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