An Application of Breakthrough Failure Analysis Techniques in Eliminating Silicon Dislocation Problem in Sub-Micron CMOS Devices

1997 ◽  
Author(s):  
E. H. Yeoh ◽  
W. M. Mak ◽  
H. C. Lock ◽  
S. K. Sim ◽  
C. C. Ooi ◽  
...  
Keyword(s):  
Failure Analysis ◽  
Failure Mechanism ◽  
Packing Density ◽  
Failure Mechanisms ◽  
Potential Solution ◽  
Critical Dimensions ◽  
Functional Failure ◽  
Analysis Techniques ◽  
Root Cause ◽  
First Time

Abstract As device interconnect layers increase and transistor critical dimensions decrease below sub-micron to cater for higher speed and higher packing density, various new and subtle failure mechanisms have emerged and are becoming increasingly prevalent. Silicon dislocation is a new failure mechanism that falls in this category and was for the first time, uncovered in submicron multilayered CMOS devices. This mechanism was responsible for a systematic yield problem; identified as the 'centre GFA wafer' functional failure problem. In this paper, several breakthrough failure analysis techniques used to narrow down and identify this new mechanism will be presented. Root cause determination and potential solution to this problem will also be discussed.

The Application of Novel Failure Analysis Techniques and Defect Modeling in Eliminating Short Poly End-Cap Problem in Submicron CMOS Devices

1996 ◽  
Author(s):  
Y.E. Hong ◽  
M.T.T. We
Keyword(s):  
Failure Analysis ◽  
Failure Mechanism ◽  
Leakage Current ◽  
Packing Density ◽  
Process Change ◽  
Defect Modeling ◽  
Functional Failure ◽  
Analysis Techniques ◽  
Post Process ◽  
First Time

Abstract As transistor dimension shrinks down below submicron to cater for higher speed and higher packing density, it is very important to characterize the shrinkage carefully to avoid unwanted parametric problems. Leakage current across short poly end-cap is a new failure mechanism that falls in this category and was for the first time, uncovered in submicron multilayered CMOS devices. This mechanism was responsible for a systematic yield problem; identified as the 'centre wafer striping' functional failure problem. This paper presents the advanced failure analysis techniques and defect modeling used to narrow down and identify this new mechanism. Post process change by loosening the marginal poly end-cap criteria eliminated the problem completely.

Single Device Characterization by Nano-probing to Identify Failure Root Cause

2005 ◽  
Author(s):  
Chao-Chi Wu ◽  
Jon C. Lee ◽  
Jung-Hsiang Chuang ◽  
Tsung-Te Li
Keyword(s):  
Failure Analysis ◽  
Success Rate ◽  
Failure Mechanism ◽  
Fault Isolation ◽  
Device Characterization ◽  
Nano Technology ◽  
Analysis Techniques ◽  
Root Cause ◽  
Visual Defects ◽  
Lower Success Rate

Abstract In general failure analysis cases, a less invasive fault isolation approach can be utilized to resolve a visual root cause defect. In the case of nano technology, visual defects are not readily resolved, due to an increase in non-visible defects. The nonvisible defects result in a lower success rate since conventional FA methods/tools are not efficient in identifying the failure root cause. For the advanced nanometer process, this phenomenon is becoming more common; therefore the utilization of advanced techniques are required to get more evidence to resolve the failure mechanism. The use of nanoprobe technology enables advanced device characterization h order to obtain more clues to the possible failure mechanism before utilizing the traditional physical failure analysis techniques.

Advanced IR-OBIRCH Analysis Technique for High Isb Failure Analysis

2010 ◽  
Author(s):  
Kuo Hsiung Chen ◽  
Wen Sheng Wu ◽  
Yu Hsiang Shu ◽  
Jian Chan Lin
Keyword(s):  
Failure Analysis ◽  
Failure Mechanisms ◽  
Fault Localization ◽  
Resistance Change ◽  
The Real ◽  
Analysis Techniques ◽  
Analysis Technique ◽  
Leakage Failure ◽  
Failure Site

Abstract IR-OBIRCH (Infrared Ray – Optical Beam Induced Resistance Change) is one of the main failure analysis techniques [1] [2] [3] [4]. It is a useful tool to do fault localization on leakage failure cases such as poor Via or contact connection, FEoL or BEoL pattern bridge, and etc. But the real failure sites associated with the above failure mechanisms are not always found at the OBIRCH spot locations. Sometimes the real failure site is far away from the OBIRCH spot and it will result in inconclusive PFA Analysis. Finding the real failure site is what matters the most for fault localization detection. In this paper, we will introduce one case using deep sub-micron process generation which suffers serious high Isb current at wafer donut region. In this case study a BEoL Via poor connection is found far away from the OBIRCH spots. This implies that layout tracing skill and relation investigation among OBIRCH spots are needed for successful failure analysis.

Strategies to Address Low DPPM Failure Mechanisms on Automotive Grade Wi-Fi Radio Frequency Devices

2015 ◽  
Author(s):  
Kai Wang ◽  
Sadia Lone ◽  
Colin Thomas ◽  
Rhys Weaver
Keyword(s):  
Failure Analysis ◽  
Continuous Improvement ◽  
Failure Mechanisms ◽  
Time Frame ◽  
Cause Analysis ◽  
Automotive Market ◽  
Root Cause ◽  
Rigorous Testing ◽  
Additional Demand

Abstract System suppliers in the automotive market have an expectation that their IC suppliers provide products with low defective parts per million (DPPM) and have methodologies in place to drive towards 0ppm (Zero Parts Per Million). IC suppliers to the automotive market have supply chains and test methodologies in place to achieve such low DPPMs, but the systems suppliers will still require root cause analysis on every failure. The IC supplier is expected to demonstrate a containment, corrective action and continuous improvement in a very tight time frame. This additional demand of automotive customers poses a challenge to the quality of IC devices and the concept of cross departmental failure analysis. In this paper, we look at a complex Wi-Fi design with multiple IEEE specific radios, and how to address the few parts that escape the rigorous testing by IC supplier to improve the quality for the automotive IC.

Semiconductor Wear Out at Nuclear Power Plants

2000 ◽  
Author(s):  
James B. Riddle
Keyword(s):  
Failure Analysis ◽  
Case Studies ◽  
Nuclear Power ◽  
Power Plants ◽  
Nuclear Power Plants ◽  
Light Output ◽  
Analysis Techniques ◽  
Root Cause ◽  
Corrective Actions ◽  
Control Circuits

Abstract This paper will examine semiconductor wear out at San Onofre Nuclear Generation Station (SONGS). The topics will include case studies, failure mechanisms, diagnostic techniques, failure analysis techniques and root cause corrective actions. Nuclear power plants are unique in that instrumentation and control circuits are continuously energized, are periodically tested, and have been in operation for greater than 25 years. Root cause evaluations at SONGS have identified numerous semiconductor failures due to wear out. Case studies include light output deterioration in opto-isolators, junction alloying failures of transistors and integrated circuits and parametric shifts in operational amplifiers. In most cases the devices do not fail catastrophically but degraded to the point of circuit level functional failure. Failure analysis techniques include circuit analysis, board level troubleshooting to identify the degraded components. Intermittent failures require power cycling, thermal cycling, and long term monitoring to identify the responsible components. Corrective actions for semiconductor wear out at SONGS include enhanced monitoring and proactive change out of identified part types.

Coupling C-AFM with Nanoprobing Technique for Further Junction Leakage Analysis

2006 ◽  
Author(s):  
Cha-Ming Shen ◽  
Tsan-Chen Chuang ◽  
Chen-May Huang ◽  
Shi-Chen Lin ◽  
Jie-Fei Chang
Keyword(s):  
Failure Analysis ◽  
Atomic Force Microscope ◽  
Failure Modes ◽  
Electrical Characteristic ◽  
Failure Mechanisms ◽  
Gate Leakage ◽  
Process Technology ◽  
Analysis Techniques ◽  
Atomic Force ◽  
Or Gate

Abstract With the evolution of advanced process technology, failure analysis has become more and more difficult because more defects are of the non-visual type (very tiny or even invisible defects) from new failure mechanisms. In this article, a novel and effective methodology which couples the conductive atomic force microscope (C-AFM) with nano-probing technique is proposed to reveal some particular failure modes which were not observable and difficult to identify with traditional physical failure analysis techniques. The capability of coupling C-AFM with nano-probing technique is used to distinguish cases which suffer general junction leakage or gate leakage from those that form the fake junction leakage or gate leakage cases. C-AFM can detect the abnormal contacts quickly, and nano-probing could provide the precise electrical characteristic further. Then, combining these variant measuring results, the favorable tactics can be adopted to deal with different states.

Leveraging Root Cause Deconvolution Analysis for Logic Yield Ramping

2013 ◽  
Author(s):  
Yan Pan ◽  
Atul Chittora ◽  
Kannan Sekar ◽  
Goh Szu Huat ◽  
You Guo Feng ◽  
...  
Keyword(s):  
Failure Analysis ◽  
Comprehensive Analysis ◽  
Paper Briefly ◽  
Yield Improvement ◽  
Deconvolution Analysis ◽  
Analysis Techniques ◽  
Root Cause ◽  
Conventional Analysis ◽  
Analysis System ◽  
Over Time

Abstract The root cause deconvolution (RCD) provides an easy-to-understand defect Pareto, together with targeted physical failure analysis candidates. Unfortunately, even the RCD analysis also has some assumptions and limitations, and its result cannot always be interpreted literally. This calls for a variety of conventional yield analysis techniques to be adopted in parallel to improve the confidence in the RCD results. This paper briefly introduces the RCD analysis and explains how it distinguishes itself from other conventional volume diagnosis analysis techniques. Its typical inputs and outputs are discussed as well. Next, the paper focuses on two case studies where the authors leverage RCD for logic yield improvement together with other conventional analysis techniques. It then proposes a comprehensive analysis system that is backed up by accumulating RCD results over time and across different design IPs.

Several Failure Analysis Cases of Pressure Equipment Under the Conditions of Complex Medium Environment

2011 ◽  
Author(s):  
Xuedong Chen ◽  
Zhibin Ai ◽  
Tiecheng Yang ◽  
Zhichao Fan ◽  
Weihe Guan
Keyword(s):  
Failure Analysis ◽  
Failure Mechanism ◽  
Preventive Measures ◽  
Effective Means ◽  
Failure Mechanisms ◽  
Pressure Vessels ◽  
Influential Factors ◽  
Complex Medium ◽  
Complex Environment ◽  
Failure Prevention

There are several hundred of failure cases of pressure vessels and piping in China every year. The causes for part of accidents have been clearly analyzed, and preventive measures have been taken making the similar accidents substantially reduced, but the causes for quite a few failure accidents are still not found effectively, the similar accidents is still taking place. Through study, the authors find that the major reason for deviation of failure analysis lies in that equipments are mostly operating in complex medium environment, and mutual competition may exist among multiple failure mechanisms. Sometimes changes of some influential factors may cause the dominant failure mechanism change, even leads to totally different analysis conclusions. Combining with the analysis and verification of several failure cases of pressure vessels and piping in petrochemical enterprises, the judgment method for the dominant failure mechanism under multiple failure mechanisms is discussed in this paper, which may be helpful to provide some effective means for failure prevention of pressure equipment under complex environment.

Two Unique Case Studies Performed With Photoemission Microscopy (PEM)

1996 ◽  
Author(s):  
G.F. Shade
Keyword(s):  
Failure Analysis ◽  
Failure Mechanism ◽  
Case Studies ◽  
Current Flow ◽  
Failure Mechanisms ◽  
Analysis Time ◽  
Unique Case ◽  
Qualitative Evidence ◽  
Leakage Path

Abstract Two cases are presented where photoemission microscopy (PEM) quickly reduced the analysis time by providing qualitative evidence of the suspected failure mechanisms. In both cases, the failures were delaying product shipments and the PEM technique was a "last hope" approach where other proposals were either not successful, or were not available to the analysts. In case one, package residue caused a leakage path that was located and confirmed by PEM. The second case required the use of PEM to observe uniformity of current flow within a polysilicon region. This second analysis provided absolute evidence that the current flow was nonuniform which supported the suspected failure mechanism. It is believed that this is the first reported observation of these two emission mechanisms during a failure analysis.

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