scholarly journals Tribological Behavior of Reinforced PTFE Composites and Un-Reinforced Polyketone-Based Materials against Coated Steel

Lubricants ◽  
2021 ◽  
Vol 10 (1) ◽  
pp. 5
Author(s):  
Federica Amenta ◽  
Giovanni Bolelli ◽  
Stefano De Lorenzis ◽  
Alessandro Bertarini ◽  
Luca Lusvarghi
Keyword(s):  
Matrix Composite ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Tribological Behavior ◽  
Glass Fibers ◽  
Chemical Vapor ◽  
Polymeric Materials ◽  
Oxide Coating ◽  
Deposition Process ◽  
Wear Rates

In this study, two polymeric materials were tested in a dry rotating “pin-on-disc” configuration against differently coated surfaces, to evaluate their tribological response under conditions, such as those of rotary lip seals, and to identify the wear mechanism of each coupling. A PTFE based material, reinforced with glass fibers and a solid lubricant, and unreinforced polyketone were tested against a chromium oxide coating deposited by plasma thermal spraying, a CrN/NbN superlattice coating deposited by Physical Vapor Deposition (PVD), and a Diamond-Like Carbon (DLC) coating obtained through a hybrid PVD/PECVD (Plasma-Enhanced Chemical Vapor Deposition) process. The PTFE matrix composite offers better overall performance, in terms of specific wear rates and friction coefficients than polyketone. Although the tribological behavior of this material is generally worse than that of the PTFE matrix composite, it can be used without reinforcing fillers. Our analysis demonstrates the importance of transfer-film formation on the counter-surfaces, which can prevent further wear of the polymer if it adheres well to the counterpart. However, the tribofilm has opposing effects on the friction coefficient for the two materials: its formation leads to lower friction for PTFE and higher friction for polyketone.

scholarly journals CVD and PVD coating process modelling by using artificial neural networks

2012 ◽  
Vol 1 (1) ◽  
pp. 46 ◽  
Author(s):  
Amir Mahyar Khorasani ◽  
Mohammad Reza Solymany yazdi ◽  
Mehdi Faraji ◽  
Alex Kootsookos
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor ◽  
Film Coating ◽  
Deposition Process ◽  
Thin Film Coating ◽  
Mlp Neural Network ◽  
Titanium Thin Film ◽  
Pvd Coating

Thin-film coating plays a prominent role on the manufacture of many industrial devices. Coating can increase material performance due to the deposition process. Having adequate and precise model that can predict the hardness of PVD and CVD processes is so helpful for manufacturers and engineers to choose suitable parameters in order to obtain the best hardness and decreasing cost and time of industrial productions. This paper proposes the estimation of hardness of titanium thin-film layers as protective industrial tools by using multi-layer perceptron (MLP) neural network. Based on the experimental data that was obtained during the process of chemical vapor deposition (CVD) and physical vapor deposition (PVD), the modeling of the coating variables for predicting hardness of titanium thin-film layers, is performed. Then, the obtained results are experimentally verified and very accurate outcomes had been attained.

The Application of Wear Resistant Thin Layers for Cold Forming Tools

2014 ◽  
Vol 782 ◽  
pp. 619-622 ◽  
Author(s):  
Pavol Beraxa ◽  
Lucia Domovcová ◽  
Ľudovít Parilák
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Operating Conditions ◽  
Thin Layers ◽  
Treatment Technology ◽  
Cold Forming ◽  
Forming Tools

Along with technologies development rise demands on the technical level of new machinery and equipment and also the reliability and efficiency of tools used in the production processes. One of the options for increasing tool life and wear resistance is the use of tools surface treatment technology called as CVD (chemical vapor deposition) and PVD (Physical Vapor Deposition) process. Chemical vapor deposition is a widely used materials-processing. CVD is an atomistic surface modification process, where a thin solid coating is deposited on an underlying heated substrate via a chemical reaction from the vapor or gas phase, PVD process is atomistic deposition process in which material is vaporized from a solid or liquid source in the form of atoms or molecules, transported in the form of a vapor through a vacuum or low pressure gaseous (or plasma) environment to the substrate where it condenses. The paper introduces the possibilities of application of these processes for cold forming tools used at operating conditions of Železiarne Podbrezová, a.s. Tools (formers and straightening rolls) are evaluated in terms of CVD and PVD coating thickness, microstructure and microhardness of tool material and coating.

scholarly journals Application of Physical Vapor Deposition in Textile Industry

2020 ◽  
Vol 0 (0) ◽  
Author(s):  
Pamela Miśkiewicz ◽  
Iwona Frydrych ◽  
Agnieszka Cichocka
Keyword(s):  
Vapor Deposition ◽  
Textile Industry ◽  
Physical Vapor Deposition ◽  
Chemical Properties ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Knitted Fabrics ◽  
Textile Materials ◽  
Almost All ◽  
Physical And Chemical

AbstractCurrently, scientists are striving to produce innovative textile materials characterized by special properties. Therefore, attempts have been made to use physical and chemical vapor deposition techniques to modify the surface of textile materials, i.e., nonwovens, fabrics, and knitted fabrics. By using these techniques for modifying the basic materials, researchers have obtained textiles with novel properties, which are used in shielding materials, textronics, or clothing, as well as in specialized accessories. The PVD process can be applied for almost all materials. The physical vapor deposition process allows for obtaining layers of different thicknesses and with various physical and chemical properties. This article is a review of the latest state of the art on the use of various methods of physical vapor deposition in textiles destined for different purposes.

scholarly journals Deposition Methods for Microstructured and Nanostructured Coatings on Metallic Bone Implants: A Review

2017 ◽  
Vol 2017 ◽  
pp. 1-9 ◽  
Author(s):  
Bailey Moore ◽  
Ebrahim Asadi ◽  
Gladius Lewis
Keyword(s):  
Plasma Spray ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor ◽  
Aerosol Deposition ◽  
Deposition Process ◽  
Future Research ◽  
Bone Implants ◽  
Implant Surface ◽  
Deposition Processes

A review of current deposition processes is presented as they relate to osseointegration of metallic bone implants. The objective is to present a comprehensive review of different deposition processes used to apply microstructured and nanostructured osteoconductive coatings on metallic bone implants. Implant surface topography required for optimal osseointegration is presented. Five of the most widely used osteoconductive coating deposition processes are reviewed in terms of their microstructure and nanostructure, usable thickness, and cost, all of which are summarized in tables and charts. Plasma spray techniques offer cost-effective coatings but exhibit deficiencies with regard to osseointegration such as high-density, amorphous coatings. Electrodeposition and aerosol deposition techniques facilitate the development of a controlled-microstructure coating at a similar cost. Nanoscale physical vapor deposition and chemical vapor deposition offer an alternative approach by allowing the coating of a highly structured surface without significantly affecting the microstructure. Various biomedical studies on each deposition process are reviewed along with applicable results. Suggested directions for future research include further optimization of the process-microstructure relation, crystalline plasma spray coatings, and the deposition of discrete coatings by additive manufacturing.

Crystallographic Texture and Phase Formation in Blanket TifriN/AICu Films

1998 ◽  
Vol 514 ◽  
Author(s):  
P. W. DeHaven ◽  
L. A. Clevenger ◽  
R. F. Schnabe ◽  
S. J. Weber ◽  
R. C. Iggulden ◽  
...  
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Alloy Film ◽  
Al Alloy ◽  
Area Detector ◽  
Deposition Parameters ◽  
Temperature Deposition ◽  
20 Nm

ABSTRACTInterconnection metallization uses film stacks, often composed of thin (<10 nm) Ti, TiN, or Ti/TiN underlayer(s) with a thick (200–1000 nm) Al-alloy film deposited on top. The texture or preferred orientation in such film stacks has important implications for both processing and reliability. Earlier studies' have demonstrated the importance of the underlayers on Al texture; however, to date no systematic work has been done on the effect of processing conditions on underlayer texture. This study examines the effect of deposition parameters on the underlayer texture development as well as the effect of this underlayer texture on subsequently deposited Al-alloy films. Fiber plots were obtained for Ti <002> and <101> and Al <111> reflections for a series of 20 nm Ti/ 10 nm TiN/400 nm AlCu films using both a conventional Siemens D500 diffractometer with a pole figure attachment and a Siemens HI-STAR Area Detector system using Cu radiation from a rotating anode source. Because of overlap between the Al <111> and Ti <101> reflections, the Al was removed with a subtractive etch. In this way both the Al and underlayer film textures could be quantified. It was found that the Ti and Al-alloy film textures vary depending on the deposition temperature, deposition method and final film thickness. For example, an increase in the substrate temperature from 300° to 500°C caused the Ti film texture to change from <002> to <101>. Additionally, switching the TiN deposition process from physical vapor deposition (PVD) sputtering to chemical vapor deposition (CVD) in a Ti/TiN/AlCu film stack caused a degradation in the AlCu <111 > texture.

Improve the Wear Resistant Life of the Sprag Clutch by Used the Chemical Vapor Deposition Technology

2011 ◽  
Vol 86 ◽  
pp. 260-262
Author(s):  
Yan Ying Jiang ◽  
Zhen Rong Yang ◽  
Kai Hong Shi
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Adhesion Force ◽  
Low Cycle Fatigue ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Wear Resistant ◽  
Deposition Technology ◽  
Vapor Deposition Process

In order to improve the wear resistance of the sprag clutch under the work condition, the chemical vapor deposition technology is used on the surface of sprag. The hardness of surface is HV0.11700~2300, the thickness is 5~8μm, and the adhesion force isn’t less than 65N. In the end, the wear resistant life of the sprag surface used the chemical vapor deposition process is improved 5 times than that of the sprag surface used the physical vapor deposition process by the low cycle fatigue test. The life of the sprag clutch is effectively improved.

Reaction couples of ceramic thin films prepared by CVD

1988 ◽  
Vol 46 ◽  
pp. 798-799
Author(s):  
D.W. Susnitzky ◽  
S.R. Summerfelt ◽  
C.B. Carter
Keyword(s):  
Thin Film ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Solid State Reactions ◽  
Spatial Distributions ◽  
Diffusion Couples ◽  
Kinetics Studies ◽  
Ceramic Thin Films ◽  
Initial Stage

Solid-state reactions have traditionally been studied in the form of diffusion couples. This ‘bulk’ approach has been modified, for the specific case of the reaction between NiO and Al2O3, by growing NiAl2O4 (spinel) from electron-transparent Al2O3 TEM foils which had been exposed to NiO vapor at 1415°C. This latter ‘thin-film’ approach has been used to characterize the initial stage of spinel formation and to produce clean phase boundaries since further TEM preparation is not required after the reaction is completed. The present study demonstrates that chemical-vapor deposition (CVD) can be used to deposit NiO particles, with controlled size and spatial distributions, onto Al2O3 TEM specimens. Chemical reactions do not occur during the deposition process, since CVD is a relatively low-temperature technique, and thus the NiO-Al2O3 interface can be characterized. Moreover, a series of annealing treatments can be performed on the same sample which allows both Ni0-NiAl2O4 and NiAl2O4-Al2O3 interfaces to be characterized and which therefore makes this technique amenable to kinetics studies of thin-film reactions.

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