Deposition Methods for Microstructured and Nanostructured Coatings on Metallic Bone Implants: A Review

A review of current deposition processes is presented as they relate to osseointegration of metallic bone implants. The objective is to present a comprehensive review of different deposition processes used to apply microstructured and nanostructured osteoconductive coatings on metallic bone implants. Implant surface topography required for optimal osseointegration is presented. Five of the most widely used osteoconductive coating deposition processes are reviewed in terms of their microstructure and nanostructure, usable thickness, and cost, all of which are summarized in tables and charts. Plasma spray techniques offer cost-effective coatings but exhibit deficiencies with regard to osseointegration such as high-density, amorphous coatings. Electrodeposition and aerosol deposition techniques facilitate the development of a controlled-microstructure coating at a similar cost. Nanoscale physical vapor deposition and chemical vapor deposition offer an alternative approach by allowing the coating of a highly structured surface without significantly affecting the microstructure. Various biomedical studies on each deposition process are reviewed along with applicable results. Suggested directions for future research include further optimization of the process-microstructure relation, crystalline plasma spray coatings, and the deposition of discrete coatings by additive manufacturing.

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Characterization of Thin Chromium Coatings Produced by PVD Sputtering for Optical Applications

Coatings ◽

10.3390/coatings11020215 ◽

2021 ◽

Vol 11 (2) ◽

pp. 215

Author(s):

Andreia A. Ferreira ◽

Francisco J. G. Silva ◽

Arnaldo G. Pinto ◽

Vitor F. C. Sousa

Keyword(s):

Automotive Industry ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Early Stage ◽

Chemical Vapor ◽

Experimental Tests ◽

Scratch Test ◽

Industrial Sectors ◽

Deposition Processes ◽

Optical Applications

PVD (physical vapor deposition) and CVD (chemical vapor deposition) have gained greater significance in the last two decades with the mandatory shift from electrodeposition processes to clean deposition processes due to environmental, public safety, and health concerns. Due to the frequent use of coatings in several industrial sectors, the importance of studying the chromium coating processes through PVD–sputtering can be realized, investing in a real alternative to electroplated hexavalent chromium, usually denominated by chromium 6, regularly applied in electrodeposition processes of optical products in the automotive industry. At an early stage, experimental tests were carried out to understand which parameters are most suitable for obtaining chromium coatings with optical properties. To study the coating in a broad way, thickness and roughness analysis of the coatings obtained using SEM and AFM, adhesion analyzes with the scratch-test and transmittance by spectrophotometry were carried out. It was possible to determine that the roughness and transmittance decreased with the increase in the number of layers, the thickness of the coating increased linearly, and the adhesion and resistance to climatic tests remained positive throughout the study. Thus, this study allows for the understanding that thin multilayered Cr coatings can be applied successfully to polymeric substrates regarding optical applications in the automotive industry.

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CVD and PVD coating process modelling by using artificial neural networks

Artificial Intelligence Research ◽

10.5430/air.v1n1p46 ◽

2012 ◽

Vol 1 (1) ◽

pp. 46 ◽

Cited By ~ 2

Author(s):

Amir Mahyar Khorasani ◽

Mohammad Reza Solymany yazdi ◽

Mehdi Faraji ◽

Alex Kootsookos

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Chemical Vapor ◽

Film Coating ◽

Deposition Process ◽

Thin Film Coating ◽

Mlp Neural Network ◽

Titanium Thin Film ◽

Pvd Coating

Thin-film coating plays a prominent role on the manufacture of many industrial devices. Coating can increase material performance due to the deposition process. Having adequate and precise model that can predict the hardness of PVD and CVD processes is so helpful for manufacturers and engineers to choose suitable parameters in order to obtain the best hardness and decreasing cost and time of industrial productions. This paper proposes the estimation of hardness of titanium thin-film layers as protective industrial tools by using multi-layer perceptron (MLP) neural network. Based on the experimental data that was obtained during the process of chemical vapor deposition (CVD) and physical vapor deposition (PVD), the modeling of the coating variables for predicting hardness of titanium thin-film layers, is performed. Then, the obtained results are experimentally verified and very accurate outcomes had been attained.

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Production of Y‐Ba‐Cu‐0 Superconducting Thin Films by an Aerosol Chemical Vapor Deposition Process

MRS Proceedings ◽

10.1557/proc-169-601 ◽

1989 ◽

Vol 169 ◽

Cited By ~ 5

Author(s):

A. Driessen ◽

Q. Tang ◽

L. Hilderink ◽

Th.J.A. Popma

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Aerosol Deposition ◽

Deposition Process ◽

Superconducting Film ◽

Superconducting Thin Films ◽

Metal Organic ◽

Vacuum Method

AbstractThin film production by aerosol deposition is a simple, non‐vacuum method, which under certain conditions of the process parameters, can be considered as a chemical vapor deposition (CVD) process. In this paper we describe the formation of superconducting thin films by aerosol deposition in the CVD regime by using metal‐organic precursors. The best results were obtained with the metal β‐diketonates of Y, Ba and Cu dissolved in butylacetate. This solution was nebulized and sprayed on a heated Si‐substrate with a Zr02‐buffer layer at a temperature of 450 C. After deposition a final heat treatment at a temperature of 800 C was applied. The resulting superconducting film has a Tc>2ero of 75 K.

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Nanotopographical control of surfaces using chemical vapor deposition processes

Beilstein Journal of Nanotechnology ◽

10.3762/bjnano.8.126 ◽

2017 ◽

Vol 8 ◽

pp. 1250-1256 ◽

Cited By ~ 6

Author(s):

Meike Koenig ◽

Joerg Lahann

Keyword(s):

Vapor Deposition ◽

Three Dimensional ◽

Chemical Vapor ◽

Deposition Process ◽

Polymer Coatings ◽

Oblique Angle ◽

Concise Review ◽

Deposition Processes ◽

Deposition Techniques ◽

Post Deposition

In recent years much work has been conducted in order to create patterned and structured polymer coatings using vapor deposition techniques – not only via post-deposition treatment, but also directly during the deposition process. Two-dimensional and three-dimensional structures can be achieved via various vapor deposition strategies, for instance, using masks, exploiting surface properties that lead to spatially selective deposition, via the use of additional porogens or by employing oblique angle polymerization deposition. Here, we provide a concise review of these studies.

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The Application of Wear Resistant Thin Layers for Cold Forming Tools

Materials Science Forum ◽

10.4028/www.scientific.net/msf.782.619 ◽

2014 ◽

Vol 782 ◽

pp. 619-622 ◽

Cited By ~ 1

Author(s):

Pavol Beraxa ◽

Lucia Domovcová ◽

Ľudovít Parilák

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Operating Conditions ◽

Thin Layers ◽

Treatment Technology ◽

Cold Forming ◽

Forming Tools

Along with technologies development rise demands on the technical level of new machinery and equipment and also the reliability and efficiency of tools used in the production processes. One of the options for increasing tool life and wear resistance is the use of tools surface treatment technology called as CVD (chemical vapor deposition) and PVD (Physical Vapor Deposition) process. Chemical vapor deposition is a widely used materials-processing. CVD is an atomistic surface modification process, where a thin solid coating is deposited on an underlying heated substrate via a chemical reaction from the vapor or gas phase, PVD process is atomistic deposition process in which material is vaporized from a solid or liquid source in the form of atoms or molecules, transported in the form of a vapor through a vacuum or low pressure gaseous (or plasma) environment to the substrate where it condenses. The paper introduces the possibilities of application of these processes for cold forming tools used at operating conditions of Železiarne Podbrezová, a.s. Tools (formers and straightening rolls) are evaluated in terms of CVD and PVD coating thickness, microstructure and microhardness of tool material and coating.

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Monte Carlo simulation of column growth in plasma spray physical vapor deposition process

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2017.12.023 ◽

2018 ◽

Vol 335 ◽

pp. 188-197 ◽

Cited By ~ 7

Author(s):

P. Wang ◽

W. He ◽

G. Mauer ◽

R. Mücke ◽

R. Vaßen

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Plasma Spray ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Deposition Process ◽

Physical Vapor Deposition Process ◽

Vapor Deposition Process

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Thermodynamic Constraints for the In Situ MOCVD Growth of Superconducting Tl-Ba-Ca-Cu-O Thin Films

MRS Proceedings ◽

10.1557/proc-335-165 ◽

1993 ◽

Vol 335 ◽

Author(s):

William L. Holstein

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Mocvd Growth ◽

Metal Organic ◽

Deposition Processes ◽

Organic Chemical Vapor Deposition

AbstractIn spite of several attempts, superconducting Tl-Ba-Ca-Cu-O thin films have not been successfully prepared in situ by metal organic chemical vapor deposition (MOCVD). Preparation of a phase by MOCVD requires that it be thermodynamically stable with respect to its decomposition into volatile species and other condensed phases. For MOCVD growth of Tl-Ba- Ca-Cu-O compounds in the presence of oxygen from reagents containing only C-H or C-H-O ligands, Tl2O(g) and TIOH(g) exhibit appreciable volatility. If reagents with ligands containing fluorine are used, the formation of volatile TIF(g) must also be considered. Thermodynamic data for these materials are compiled, and thermodynamic relationships between these gases, H2O(g) and HF(g) are established. The thermodynamic stability of TIOH(g) and TIF(g) makes the in situ growth of Tl-Ba-Ca-Cu-O compounds by MOCVD more difficult than their in situ growth by physical vapor deposition processes, for which Tl2O(g) is the only volatile TI-containing species present.

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Application of Physical Vapor Deposition in Textile Industry

Autex Research Journal ◽

10.2478/aut-2020-0004 ◽

2020 ◽

Vol 0 (0) ◽

Author(s):

Pamela Miśkiewicz ◽

Iwona Frydrych ◽

Agnieszka Cichocka

Keyword(s):

Vapor Deposition ◽

Textile Industry ◽

Physical Vapor Deposition ◽

Chemical Properties ◽

Chemical Vapor ◽

Deposition Process ◽

Knitted Fabrics ◽

Textile Materials ◽

Almost All ◽

Physical And Chemical

AbstractCurrently, scientists are striving to produce innovative textile materials characterized by special properties. Therefore, attempts have been made to use physical and chemical vapor deposition techniques to modify the surface of textile materials, i.e., nonwovens, fabrics, and knitted fabrics. By using these techniques for modifying the basic materials, researchers have obtained textiles with novel properties, which are used in shielding materials, textronics, or clothing, as well as in specialized accessories. The PVD process can be applied for almost all materials. The physical vapor deposition process allows for obtaining layers of different thicknesses and with various physical and chemical properties. This article is a review of the latest state of the art on the use of various methods of physical vapor deposition in textiles destined for different purposes.

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Laser Chemical Vapor Deposition of Thick Oxide Coatings

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.317-318.495 ◽

2006 ◽

Vol 317-318 ◽

pp. 495-500 ◽

Cited By ~ 6

Author(s):

Takashi Goto ◽

Teiichi Kimura

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Physical Vapor Deposition ◽

High Speed ◽

Chemical Vapor ◽

Oxide Coatings ◽

Laser Chemical Vapor Deposition ◽

Deposition Rates ◽

Thin Film Coatings ◽

Deposition Processes

Thick oxide coatings have wide-ranged applications typically thermal barrier coatings. Although high speed deposition processes, often plasma spray or electron-beam physical vapor deposition, have been employed for these applications, another route has been pursued to improve the performance of coatings. We have proposed laser chemical vapor deposition (LCVD) for high-speed and thick oxide coatings. Conventional CVD can fabricate coatings at deposition rates of several to several 10 μm/h, and conventional LCVD has been mainly focused on thin film coatings and low temperature deposition. In the present LCVD, high-speed deposition rates ranging from 300 to 3000 μm/h have been achieved for several oxide coatings such as yttria stabilized zirconia (YSZ), TiO2, Al2O3 and Y2O3. This paper describes the effect of deposition conditions on the morphology and deposition rates for the preparation of YSZ and TiO2 by LCVD.

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