scholarly journals Combined Focused Electron Beam-Induced Deposition and Etching for the Patterning of Dense Lines without Interconnecting Material

Micromachines ◽  
2020 ◽  
Vol 12 (1) ◽  
pp. 8
Author(s):  
Sangeetha Hari ◽  
P. H. F. Trompenaars ◽  
J. J. L. Mulders ◽  
Pieter Kruit ◽  
C. W. Hagen
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Secondary Electron ◽  
Direct Write ◽  
Post Processing ◽  
Force Microscopy ◽  
Atomic Force ◽  
Backscattered Electron ◽  
Electron Beam Induced Deposition ◽  
Gaussian Line

High resolution dense lines patterned by focused electron beam-induced deposition (FEBID) have been demonstrated to be promising for lithography. One of the challenges is the presence of interconnecting material, which is often carbonaceous, between the lines as a result of the Gaussian line profile. We demonstrate the use of focused electron beam-induced etching (FEBIE) as a scanning electron microscope (SEM)-based direct-write technique for the removal of this interconnecting material, which can be implemented without removing the sample from the SEM for post processing. Secondary electron (SE) imaging has been used to monitor the FEBIE process, and atomic force microscopy (AFM) measurements confirm the fabrication of well separated FEBID lines. We further demonstrate the application of this technique for removing interconnecting material in high resolution dense lines using backscattered electron (BSE) imaging to monitor the process.

Focused Electron Beam Induced Deposition of High Resolution Magnetic Scanning Probe Tips

2001 ◽  
Vol 706 ◽  
Author(s):  
I. Utke ◽  
F. Cicoira ◽  
G. Jaenchen ◽  
P. Hoffmann ◽  
L. Scandella ◽  
...  
Keyword(s):  
Electron Beam ◽  
Beam Current ◽  
Auger Spectroscopy ◽  
Force Microscopy ◽  
Metal Nanocrystals ◽  
Magnetically Actuated ◽  
Atomic Force ◽  
Magnetic Metal ◽  
Electron Beam Induced Deposition ◽  
Metal Tip

AbstractApexes of commercial pyramidal silicon scanning microscopy tips were magnetically functionalized by means of local focused electron beam induced deposition. High aspect ratio supertips and local tip coatings with varying apex diameters can be produced by varying exposure time, beam current, and scan mode. The carbonyl precursor Co2(CO)8 was used as source of magnetic metal. Tip performance was tested with magnetic force microscopy (tapping / lift-retrace mode) and magnetically actuated cantilever atomic force microscopy. The deposit contains 34±2 at.% Co, dispersed as 2-5 nm metal nanocrystals in a carbonaceous matrix. Specific surface reactions and Boudouard reactions are proposed to explain the resulting deposit composition measured by Auger spectroscopy. The electrical resistivity is 104 higher than bulk Co resistivity.

scholarly journals Nitrogen as a carrier gas for regime control in focused electron beam induced deposition

2014 ◽  
Vol 1 (1) ◽  
Author(s):  
Stefan Wachter ◽  
Marco Gavagnin ◽  
Heinz D. Wanzenboeck ◽  
Mostafa M. Shawrav ◽  
Domagoj Belić ◽  
...  
Keyword(s):  
Growth Rate ◽  
Electron Beam ◽  
Volume Estimation ◽  
Injection System ◽  
Process Conditions ◽  
Force Microscopy ◽  
Atomic Force ◽  
Wide Range ◽  
Electron Beam Induced Deposition ◽  
High Control

AbstractThis work reports on focused electron beam induced deposition (FEBID) using a custom built gas injection system (GIS) equipped with nitrogen as a gas carrier. We have deposited cobalt from Co2(CO)8, which is usually achieved by a heated GIS. In contrast to a heated GIS, our strategy allows avoiding problems caused by eventual temperature gradients along the GIS. Moreover, the use of the gas carrier enables a high control over process conditions and consequently the properties of the synthesized nanostructures. Chemical composition and growth rate are investigated by energy dispersive X-ray spectroscopy (EDX) and atomic force microscopy (AFM), respectively. We demonstrate that the N2 flux is strongly affecting the deposit growth rate without the need of heating the precursor in order to increase its vapour pressure. Particularly, AFM volume estimation of the deposited structures showed that increasing the nitrogen resulted in an enhanced deposition rate. The wide range of achievable precursor fluxes allowed to clearly distinguish between precursor- and electron-limited regime. With the carrier-based GIS an optimized deposition procedure with regards to the desired deposition regime has been enabled

scholarly journals Exploring Intramolecular Methyl–Methyl Coupling on a Metal Surface for Edge-Extended Graphene Nanoribbons

2021 ◽  
Vol 03 (02) ◽  
pp. 128-133
Author(s):  
Zijie Qiu ◽  
Qiang Sun ◽  
Shiyong Wang ◽  
Gabriela Borin Barin ◽  
Bastian Dumslaff ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Atomic Force Microscopy ◽  
High Resolution ◽  
Graphene Nanoribbons ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Force Microscopy ◽  
Methyl Methyl ◽  
Atomic Force ◽  
Edge Extension

Intramolecular methyl–methyl coupling on Au (111) is explored as a new on-surface protocol for edge extension in graphene nanoribbons (GNRs). Characterized by high-resolution scanning tunneling microscopy, noncontact atomic force microscopy, and Raman spectroscopy, the methyl–methyl coupling is proven to indeed proceed at the armchair edges of the GNRs, forming six-membered rings with sp3- or sp2-hybridized carbons.

Imaging of Xenopus laevis Oocyte Plasma Membrane in Physiological-Like Conditions by Atomic Force Microscopy

2013 ◽  
Vol 19 (5) ◽  
pp. 1358-1363 ◽  
Author(s):  
Massimo Santacroce ◽  
Federica Daniele ◽  
Andrea Cremona ◽  
Diletta Scaccabarozzi ◽  
Michela Castagna ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Plasma Membrane ◽  
High Resolution ◽  
Membrane Proteins ◽  
Xenopus Laevis ◽  
Functional Study ◽  
Xenopus Laevis Oocyte ◽  
Force Microscopy ◽  
Atomic Force ◽  
Afm Imaging

AbstractXenopus laevis oocytes are an interesting model for the study of many developmental mechanisms because of their dimensions and the ease with which they can be manipulated. In addition, they are widely employed systems for the expression and functional study of heterologous proteins, which can be expressed with high efficiency on their plasma membrane. Here we applied atomic force microscopy (AFM) to the study of the plasma membrane of X. laevis oocytes. In particular, we developed and optimized a new sample preparation protocol, based on the purification of plasma membranes by ultracentrifugation on a sucrose gradient, to perform a high-resolution AFM imaging of X. laevis oocyte plasma membrane in physiological-like conditions. Reproducible AFM topographs allowed visualization and dimensional characterization of membrane patches, whose height corresponds to a single lipid bilayer, as well as the presence of nanometer structures embedded in the plasma membrane and identified as native membrane proteins. The described method appears to be an applicable tool for performing high-resolution AFM imaging of X. laevis oocyte plasma membrane in a physiological-like environment, thus opening promising perspectives for studying in situ cloned membrane proteins of relevant biomedical/pharmacological interest expressed in this biological system.

A Robust Process for Ion Implant Annealing of SiC in a Low-Pressure Silane Ambient

2004 ◽  
Vol 815 ◽  
Author(s):  
S. Rao ◽  
S.E. Saddow ◽  
F. Bergamini ◽  
R. Nipoti ◽  
Y. Emirov ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Atomic Force Microscopy ◽  
Secondary Electron ◽  
High Dose ◽  
Rf Power ◽  
Plan View ◽  
Force Microscopy ◽  
Atomic Force ◽  
Process Pressure ◽  
Robust Process

AbstractHigh-dose Al implants in n-type epitaxial layers have been successfully annealed at 1600°C without any evidence of step bunching. Anneals were conducted in a silane ambient and at a process pressure of 150 Torr. Silane, 3% premixed in 97% UHP Ar, was further diluted in a 6 slm Ar carrier gas and introduced into a CVD reactor where the sample was heated via RF induction. A 30 minute anneal was performed followed by a purge in Ar at which time the RF power was switched off. The samples were then studied via plan-view secondary electron microscopy (SEM) and atomic force microscopy (AFM). The resulting surface morphology was step- free and flat.

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