scholarly journals Studies and Research on Obtaining Multifunctional Thin Films by Magnetron-Assisted PVD Process

Author(s):  
Simona BOICIUC

The paper aims to obtain thin films of nickel and zinc through the magnetron-assisted spraying process and their characterization from a structural point of view, of electrical, optical properties and corrosion resistance. It was found that as the intensity and discharge power increase, changes occur in the structure and properties of the deposited films.

2013 ◽  
Vol 829 ◽  
pp. 917-921
Author(s):  
Saber Ghannadi ◽  
Hossein Abdizadeh ◽  
Mohammad Reza Golobostanfard

Titania thin films were prepared by electrophoretic deposition at various deposition times (1, 5 and 10 min) in constant applied potential (5 V). For this purpose, modified titania sol was prepared as a colloidal suspension. The influence of deposition time on the thickness and optical properties of titania films was investigated. Scanning electron microscope images illustrate compact and homogeneous titania films deposited on FTO substrates. The results show that the film thickness increases with increasing the deposition time. It could be inferred from UV-Vis spectroscopy that increasing the thickness of deposited film causes higher absorbance at UV region. Also, increasing the deposition time from 1 to 5 min leads to increase in optical band gap of the deposited films.


2022 ◽  
Vol 1048 ◽  
pp. 189-197
Author(s):  
Tippasani Srinivasa Reddy ◽  
M.C. Santhosh Kumar

In this study report the structural and optical properties of Copper Tin Sulfide (Cu2SnS3) thin films on indium tin oxide (ITO) substrate using co-evaporation technique. High purity of copper, tin and sulfur were taken as source materials to deposit Cu2SnS3 (CTS) thin films at different substrate temperatures (200-350 °C). Further, the effect of different substrate temperature on the crystallographic, morphological and optical properties of CTS thin films was investigated. The deposited CTS thin films shows tetragonal phase with preferential orientation along (112) plane confirmed by X-ray diffraction. Micro-Raman studies reveled the formation of CTS thin films. The surface morphology, average grain size and rms values of the deposited films are examined by Scanning electron spectroscopy (SEM) and Atomic Force Microscopy (AFM). The Energy dispersive spectroscopy (EDS) shows the presence of copper, tin and sulfur with a nearly stoichiometric ratio. The optical band gap (1.76-1.63 eV) and absorption coefficient (~105 cm-1) of the films was calculated by using UV-Vis-NIR spectroscopy. The values of refractive index, extinction coefficient and permittivity of the deposited films were calculated from the optical transmittance data.


2014 ◽  
Vol 904 ◽  
pp. 205-208
Author(s):  
J.H. Gu ◽  
Z.Y. Zhong ◽  
S.B. Chen ◽  
C.Y. Yang ◽  
J. Hou

Zinc oxide (ZnO) thin films were deposited by radio frequency (RF) magnetron sputtering technique on glass substrates in pure argon gas. The optical transmission stectra of the films were measured by ultraviolet-visible spectrophotometer. The effects of argon gas pressure on optical properties of the deposited films were investigated. The optical band-gap of the films was evaluated in terms of the Taucs law. The results show that the argon gas pressure has slightly affected the optical band-gap of the deposited films. Furthermore, the refractive index and extinction coefficient of the films were determined by means of the optical characterization methods. Meanwhile, the dispersion behavior of the refractive index was studied by the single-oscillator model of Wemple and DiDomenico, and the physical parameters of the average oscillator strength, average oscillator wavelength, oscillator energy, the refractive index dispersion parameter and the dispersion energy were obtained.


2008 ◽  
Vol 135 ◽  
pp. 99-102 ◽  
Author(s):  
Badrul Munir ◽  
Rachmat Adhi Wibowo ◽  
Kyoo Ho Kim

Cu(In0.75Al0.25)Se2 thin films were prepared using both one-step sputtering and two-stage process involving sputtering and selenization. Structure and properties of the films were analyzed and compared between the methods. All films had good adhesion to the substrate and showed strong (112), (220)/(204) peaks while minor secondary phase CuxSe was observed in the films from selenization. This paper compares the visibility of one step sputtering process and selenization of sputtered binary selenides layers to produce Cu(InAl)Se2 thin films (CIAS) for solar cell absorber applications. One step sputtering deposition from binary selenides powder compacted targets can produces CIAS films with better structural and optical properties compared to films produced by selenization of sputtered precursors.


1996 ◽  
Vol 03 (01) ◽  
pp. 1095-1100 ◽  
Author(s):  
S. HAYASHI ◽  
M. KATAOKA ◽  
H. KOSHIDA ◽  
K. YAMAMOTO

Raman spectra were measured for carbon-doped SiO 2 thin films prepared by an rf cosputtering method. The changes in the spectra were systematically studied as a function of the annealing temperature. From a detailed analysis of the spectra, the following conclusions were drawn. In the as-deposited films, very small carbon clusters are embedded in the SiO 2 matrices. When the films are annealed at 600°C, graphite-like sp 2 bonds begin to develop in the clusters. Upon annealing with higher temperatures, the size of sp 2 bond clusters increases. However, the growth of graphite microcrystals can be ruled out, since high-resolution transmission electron microscopic images of the samples annealed at 1000°C do not show lattice fringes due to graphite microcrystals. The samples annealed at 1000°C were found to exhibit an extinction hump around 220 nm, very similar to that seen in the interstellar extinction spectra.


Author(s):  
Sabah M. Ahmed ◽  
Raghad Y. Mohammed ◽  
Sedki O. Yousif

Introduction: CdSe is an important II–VI semiconducting material due to its typical optical properties such as small direct band gap (1.7 eV) and a high refractive index and, thus, a major concern is focused on the investigation of optical properties of CdSe thin films which is important to promote the performances of the devices of solid -state such as SC (solar cells), thin film transistors, LED (light-emitting diodes), EBPL (electron–beam pumped lasers) and electroluminescent devices. In the present work, CdSe thin films were deposited by thermal evaporation method and the results have been analysed and presented. Materials and Methods: CdSe thin films has been deposited on glass microscopic slides as substrates of (75×25×1 mm) under room temperature using PVD technique. CdSe blended powders gets evaporated and condensed on the substrate. The film thickness (t = 100 ± 5 nm) which is measured using Michelson interferometry method. Transmission spectrum, from 200-1100 nm, are scanned using two beams UV–VIS Spectrophotometer (6850 UV/Vis. Spectrophotometer-JENWAY). The deposited films then were annealed at temperature range of (1500C to 3500C) under vacuum to have a stable phase of the material and prevent surface oxidization. Results and Discussion: A transmittance spectrum of CdSe thin film is scanned over wavelength range 200 to 1100 nm using a (6850 UV/Vis. Spectrophotometer-JENWAY) at room temperature. The transmittance percentage between the as-deposited film and the annealed films change varies from (17.0%) to (47.0%). It is clearly seen that there is a shift toward higher energy (Blue Shift) in the transmittance spectrum. As annealing temperature increased the transmittance edge is shifted to the longer wavelength (i.e., after annealing the CdSe films shows red shifts in their optical spectra). The band gap was found within the range 1.966-1.7536 eV for CdSe thin film. As annealing temperature increases, the Eg continuously decreases. Conclusions: CdSe thin films have been deposited using Physical Vapor Deposition (PVD) Technique. It is found that the transmission for as- deposited films is (17%) and increases to (47%) as annealing temperature increases. Beside this the energy gap for as- deposited CdSe film is (1.966eV) and decreased from (1.909 eV) to (1.7536eV) as the annealing temperature increases. There is a strong red shift in the optical spectrum of the annealed CdSe films. There is a gradual shift of the annealed films thin film spectra as compared of bulk CdSe films.


2013 ◽  
Vol 441 ◽  
pp. 11-14
Author(s):  
Rong Bin Liu ◽  
Kai Liang Zhang ◽  
Yu Jie Yuan ◽  
Fang Wang ◽  
Juan Xu

In this paper, Al-doped ZnO thin films were deposited on glass substrates by RF magnetron sputtering and subsequently rapid thermal processing was executed under temperature range from 300°C to 600°C in order to investigate the microstructure, electrical, and optical properties of AZO films. XRD and AFM microscopy results showed that all the samples were of poly-crystalline and the grain size became larger with the increasing processing temperature. Compared with the sample as-deposited, it was shown that resistivity decreased from 1.9×10-2 to 1.48×10-3Ωcm and carrier concentration increased from 1.48×1020 to 5.59×1020 cm3 when the sample was processed at 600°C in pure nitrogen for 1 min. The highest transmittance of the samples processed at 500°C improves to 90.35% compared with the as-deposited films (68.2% ) as the wavelength varied between 400 and 900 nm.


2013 ◽  
Vol 734-737 ◽  
pp. 2124-2127
Author(s):  
T. Zhang ◽  
H. Wang ◽  
Z.Y. Zhong ◽  
C.Y. Yang

Titanium and gallium co-doped zinc oxide (TGZO) thin films with highly (002)-preferred orientation were grown on glass substrates by magnetron sputtering. The effect of thickness on structure and optical properties of the deposited films were investigated by X-ray diffractometer and spectrophotometer. The results show that the polycrystalline TGZO films consist of the hexagonal crystal structures with c-axis as the preferred growth orientation normal to the substrate, and that the thickness significantly affects the crystal structure and optical properties of the thin films. It is observed that the average transmitance in the wavelength range of the visible spectrum decreases with the increase of thickness. The TGZO thin film with about 900 nm thickness exhibits the maximum grain size, the lowest dislocation density and the minimum micro strain.


2020 ◽  
pp. 1-11
Author(s):  
Sofiane Sedira ◽  
Bilel Mendaci

BACKGROUND: Titanium nitride (TiN), titanium carbide (TiC) and titanium carbonitride (TiNC) thin films show promising practical applications due to their photoelectric properties and corrosion behaviour. OBJECTIVE: In this work, we investigated the factors which may affect the optical properties and the corrosion behaviour of these coatings. METHODS: The titanium coatings were carried out by sputtering using the target of Ti6Al4V (purity 99.96%) with different N2, CH4 and Ar partial pressures. XRD, FTIR, Raman and SEM with EDX studies show the formation of titanium nitride, titanium carbide coatings. Uv-vis spectroscopy was carried out to estimate the optical properties using the numerical Swanepoel method. Potentiodynamic polarization studies in Hank’s solution show that the corrosion resistance is found to be in the order of C-TiN(2) > C-TiN(1) > TiN > TiC. RESULTS: A high protective efficiency was determined (60%) when comparing TiNC(2) and TiC corrosion current densities, which confirms the lower corrosion velocity and the higher passivation stability of the coatings composed with TiN and TiC phases. Electrochemical impedance spectroscopy studies show that the Rct increases in the following order: TiC < TiN < C-TiN(1) < C-TiN(2), highlighting the fact that C-TiN(2) coating has the higher corrosion resistance.


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