Deposition of Titanium Nitride Film on Mg-Li Alloys by DC Reactive Magnetron Sputtering

2011 ◽  
Vol 204-210 ◽  
pp. 1685-1690 ◽  
Author(s):  
Yu Qiang Chen ◽  
Fu Yi Gao ◽  
Hong Yan Peng ◽  
Hong Wei Jiang ◽  
Long Cheng Yin ◽  
...  
Keyword(s):  
Corrosion Resistance ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Nitride Film ◽  
X Ray Diffraction ◽  
Tin Coating ◽  
Atomic Force ◽  
Tin Film ◽  
Titanium Nitride Film

A number of studies have shown that TiN film is correlated with corrosion resistance. In this study, we used a reactive direct current magnetron sputtering system to prepare TiN coating on Mg-Li alloys at low temperature. The intermediate TiN layer of thickness was about 1.6 μm from Ti target (99.99% purity). The structures of the resulting nanocatalysts were investigated, using X-ray diffraction analysis (XRD). The surface morphology of the coating was observed by Atomic Force Microscope (AFM). In the corrosive compare experiment the samples of Mg-Li alloys with and without titanium nitride film were put in solution with 5% NaCl respectively. We fund that the Mg-Li alloys with TiN coating has a lower rate of liberation of hydrogen, and the eroded surface morphology was examined by Scanning Electron Microscopy (SEM), it prove that the TiN deposition on the surface of Mg-Li alloys has improved the corrosion resistance performance.

Titanium Nitride Film on Titanium Film by Magnetron Sputtering Method

2018 ◽  
Vol 782 ◽  
pp. 176-181
Author(s):  
Akira Watazu ◽  
Kay Teraoka ◽  
Tsutomu Sonoda
Keyword(s):  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Blood Compatibility ◽  
Pure Titanium ◽  
Titanium Substrate ◽  
Nitride Film ◽  
Tin Coating ◽  
Titanium Film ◽  
Gas Atmosphere ◽  
Ar Gas

Titanium nitride (TiN) film on titanium film (Ti) was formed by magnetron sputtering method. Pure titanium substrates with TiN/Ti multi-layered films deposited using DC sputter-deposition machine in Ar gas atmosphere, in order to improve not only the blood compatibility of pure titanium but also the adhesion between the deposited TiN coating and the pure titanium substrate. The effects of the thickness of a pure titanium interlayer on adhesion of the TiN coating to the pure titanium substrate were investigated. And the effects of the TiN coating obtained in this study on blood compatibility were also investigated. The obtained multi-layered films looked yellow gold and appeared to be uniform and adhesive without any peel-offs. Based on the results of the platelet test, the ratio of the number of adhered platelets for the TiN/Ti film to that for the pure titanium substrate was estimated to be 0.54. Thus it was found that the platelet adhesion of the obtained TiN/Ti film was much smaller than the pure titanium, concluding that the TiN coating improved the blood compatibility.

Modulating phase by metasurfaces with gated ultra-thin TiN films

Nanoscale ◽  
2019 ◽  
Vol 11 (23) ◽  
pp. 11167-11172 ◽  
Author(s):  
Huan Jiang ◽  
Harsha Reddy ◽  
Deesha Shah ◽  
Zhaxylyk A. Kudyshev ◽  
Sajid Choudhury ◽  
...  
Keyword(s):  
Information Processing ◽  
Titanium Nitride ◽  
Phase Modulation ◽  
Carrier Density ◽  
Spectroscopic Imaging ◽  
Nitride Film ◽  
Tin Films ◽  
Tin Film ◽  
Titanium Nitride Film

Deep control over the phase of light is critical to information processing, telecommunication, and spectroscopic imaging. We design an electrically tunable gold strip/TiN film hybrid metasurface with a deep phase modulation of 337°, employing the tunability of carrier density in a 1-nm titanium nitride film.

scholarly journals Microstructure and Oxidation Behavior of Metal V Films Deposited by Magnetron Sputtering

Materials ◽  
2019 ◽  
Vol 12 (3) ◽  
pp. 425 ◽  
Author(s):  
Song Zhang ◽  
Tingting Wang ◽  
Ziyu Zhang ◽  
Jun Li ◽  
Rong Tu ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Oxidation Behavior ◽  
X Ray Diffraction ◽  
X Ray ◽  
Atomic Force ◽  
Transmission Electron ◽  
Influence Of Substrate

Direct-current magnetron sputtering (DCMS) was applied to prepare vanadium (V) films on Si substrate. The influence of substrate temperature (Ts) and target–substrate distance (Dt–s) on phase structure and surface morphology of V films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscope (AFM) and transmission electron microscopy (TEM). The results show that the crystallinity of the V films increases with increasing Ts and decreasing Dt–s. The film deposited at Ts = 400 °C and Dt–s = 60 mm exhibits the best crystallinity and <111> preferred orientation with a regular tetrahedral surface morphology. Oxidation behavior of the V thin films has also been studied by X-ray photoelectron spectroscopy (XPS).

scholarly journals INVESTIGATION INTO THE STRUCTURE AND CORROSION RESISTANCE OF MG-AL AND MG-AL-ZR COATINGS PRODUCED BY MAGNETRON SPUTTERING / MAGNETRONINIŲ MG-AL, MG-AL-ZR IR ZR DANGŲ STRUKTŪROS IR KOROZINIO ATSPARUMO TYRIMAS

2012 ◽  
Vol 3 (6) ◽  
pp. 34-38
Author(s):  
Raimonda Lukauskaitė ◽  
Algirdas Vaclovas Valiulis
Keyword(s):  
Corrosion Resistance ◽  
Magnetron Sputtering ◽  
Nacl Solution ◽  
X Ray Diffraction ◽  
Solution Ph ◽  
X Ray ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Zr Alloys

Thin cathode layers of 200 nm thickness of Mg-Al and Mg-Al-Zr alloys and pure Zr were formed on glass substrates using a magnetron sputtering technique. X-ray diffraction and atomic force microscopy were used for structure and morphology analysis of magnetron sputtered alloys. The corrosion resistance of the sputtered Mg-Al and Mg-Al-Zr coatings in 0.1 M (NH4)3BO3 and 0.1 M NaCl solution (pH = 8.6), was evaluated according to anodic polarization behavior. Santrauka Plonos, 1–2 μm storio, Mg-Al ir Mg-Al-Zr lydinių ir gryno Zr dangos buvo suformuotos ant stiklinių padėklų magnetroninio nusodinimo metodu. Šių dangų struktūra ir morfologija tirta fizikiniais analizės metodais: rentgeno spindulių difrakcija (toliau – RSD) ir atominės jėgos mikroskopija (toliau – AJM). Korozinis dangų atsparumas vertintas veikiant 0,1 M NH4BO3 ir 0,1 M NaCl tirpalu (pH = 8,6), be to, atlikti anodinės poliarizacijos tyrimai. Magnetroniniu būdu nusodintų dangų korozinis atsparumas lygintas su tradiciniais metalurginiais metodais pagamintų cirkonio ir Mg-Al lydinių koroziniu atsparumu. Nustatytos koreliacijos tarp lydinių struktūros ir korozinio atsparumo.

ADHERENT NANO-SUPERHARD TITANIUM NITRIDE FILM AND ITS FORMING MECHANISM IN MULTI-ARC ION-PLATING SYSTEM

2007 ◽  
Vol 14 (04) ◽  
pp. 789-793
Author(s):  
XIANG YU ◽  
CHENGBIAO WANG ◽  
MENG HUA ◽  
PUILAM TAM ◽  
YANG LIU ◽  
...  
Keyword(s):  
Titanium Nitride ◽  
High Speed ◽  
High Speed Steel ◽  
Nitride Film ◽  
Arc Ion Plating ◽  
Forming Mechanism ◽  
Ion Plating ◽  
Substrate Adhesion ◽  
Tin Film ◽  
Titanium Nitride Film

An adherent nano-superhard titanium nitride ( TiN ) film on the substrate of Cr 12 Mo 4 V high speed steel was prefabricated in a vacuum cathode multi-arc ion-plating system. Microhardness, film-to-substrate adhesion, and microstructure of the film were investigated typically using Vickers hardometer, scratch tester, and X-ray diffractometer. Results show that: (i) the achievable film microhardness is in the range of 35–45 GPa; (ii) the critical load (Lc) of the superhard TiN film is approximately 64 N; (iii) the nm scale mean main grain sizes of the film are approximately of 12.7 nm for TiN 111, 19.7 nm for TiN 200, and 9.6 nm for TiN 220; and (iv) compared with the standard TiN film with the hardness of 22 GPa, the accomplishment of the nano-superhard TiN film may be due to (a) the ion bombardment induced residual stress within the film, and (b) the combined effect of the decrease of crystalline size and preferred orientation in the plane (111).

CORROSION PROTECTION OF ELECTROLESS PLATING Ni-P INCLUDING TiN NANOPARTICLES FOR BIPOLAR PLATES OF PEMFCs

2018 ◽  
Vol 25 (02) ◽  
pp. 1850052 ◽  
Author(s):  
GAO PINGPING ◽  
OUYANG CHUN ◽  
XIE ZHIYONG ◽  
TAO TAO
Keyword(s):  
Corrosion Resistance ◽  
Surface Morphology ◽  
Electroless Plating ◽  
Shell Structure ◽  
Compact Surface ◽  
Proton Exchange ◽  
Core Shell ◽  
Tin Coating ◽  
Sem Images ◽  
Core Shell Structure

The Ni-P/TiN coating was used as bipolar plate by electroless plating on Ti. Surface morphology and phase structure of the coatings were characterized by SEM and XRD, respectively. Corrosion resistance of Ni-P and Ni-P/TiN coating was measured in the simulated solution of Proton exchange membrane fuel cells (PEMFCs). The interfacial contact resistance (ICR) was conducted by applied different forces. SEM images indicated that the particles of core–shell structure were formed on the surface of coating on Ti substrate. The core–shell structure was composed of TiN core and Ni-P electroless plating shell. Compared with Ni-P coatings, the Ni-P/TiN coating showed better corrosion resistance behaviors and low ICR (below 10[Formula: see text]m[Formula: see text][Formula: see text] cm[Formula: see text] under pressure of 200 N/cm[Formula: see text]. TiN particles and distribution of core–shell were in favor of the formation of coating and compact surface morphology. The good conductivity was attributed to the compact surface morphology of coating. The Ni-P/TiN coating showed excellent interfacial conductivity and good corrosion resistance at applied high potential in simulated solution of PEMFCs.

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