Nanohardness of CrN Coatings versus Deposition Parameters

2014 ◽  
Vol 606 ◽  
pp. 191-194 ◽  
Author(s):  
Petra Hviščová ◽  
František Lofaj ◽  
Michal Novák
Keyword(s):  
Nitrogen Content ◽  
Negative Bias ◽  
Working Pressure ◽  
Deposition Parameters ◽  
Cr Coating ◽  
Crn Coatings ◽  
Coating Hardness

Nanohardness of chromium nitrid coatings deposited with DC magnetron from Cr target in the reactive atmosphere with various percentual contribution of nitrogen in Ar flow was investigated to determine the influence of nitrogen content and negative bias. The nanohardness of pure Cr coating was between 11 14 GPa and the addition of 50 % of nitrogen into Ar flow resulted in the increase of coating hardness up to ~ 22 GPa. The highest hardness of the studied CrN coatings of ~ 28 GPa was achieved at 700 W power, working pressure of 0.5 Pa with 50 % of nitrogen in Ar flow and negative bias of-30 V . The increase was ascribed to the formation of near-stoichiometric CrN compounds.

Effect of Niobium Film on Corrosion Resistance of AZ91D Magnesium Alloy

2012 ◽  
Vol 525-526 ◽  
pp. 9-12 ◽  
Author(s):  
Er Bao Liu ◽  
Xiu Fang Cui ◽  
Guo Jin ◽  
Qing Fen Li ◽  
Tian Min Shao
Keyword(s):  
Corrosion Resistance ◽  
Elastic Modulus ◽  
Magnesium Alloy ◽  
Substrate Temperature ◽  
Phase Structure ◽  
Film Deposition ◽  
Negative Bias ◽  
Az91d Magnesium Alloy ◽  
Atomic Force ◽  
Deposition Parameters

The niobium film is prepared by magnetron sputtering on the surface of the AZ91D magnesium alloy. The morphology, phase structure, roughness, nanohardness and elastic modulus of the niobium films were studied by filed emission scanning electron microscope, X-ray diffraction, atomic force microscope and nanoindentation respectively. The influences of film deposition parameters, such as substrate temperature, negative bias and power on the properties of films were investigated. The corrosion resistance of niobium films on magnesium alloy was investigated by electrochemical system. Results show that the microstructure, phase structure, roughness, nanohardness and elastic modulus of the niobium films are determined by power, negative bias and substrate temperature. And the corrosion resistance of magnesium alloy improved obviously when coated with the niobium films.

scholarly journals INFLUENCE OF METAL HYDRIDE HOLLOW CATHODE ON PENNING ION SOURCE OPERATION

2021 ◽  
pp. 65-68
Author(s):  
I. Sereda ◽  
D. Ryabchikov ◽  
Ya. Hrechko ◽  
Ie. Babenko
Keyword(s):  
Plasma Density ◽  
Hollow Cathode ◽  
Metal Hydride ◽  
Discharge Current ◽  
Ion Source ◽  
Negative Bias ◽  
Working Pressure ◽  
Discharge Operation ◽  
Source Operation ◽  
Gas Supply

The influence of metal hydride hollow cathode on a Penning ion source operation has been carried out. The feature of investigation is hydrogen injection only due to its desorption from metal hydride under ion-stimulated processes. The regimes of optimal discharge operation in the hollow cathode mode are determined. It has been revealed that the transition to the hollow cathode mode occurs at lower voltages, the discharge works without external gas supply, and the working pressure in the cell is set at the level determined by the discharge current. The supply of a negative bias to the metal hydride hollow cathode weakly affects the features of the emission of axial particles, although it allows the increase of plasma density near the metal hydride hollow cathode.

Zirconia Coatings Deposited by Inductively Coupled Plasma Assisted CVD

1998 ◽  
Vol 555 ◽  
Author(s):  
P. Colpo ◽  
G. Ceccone ◽  
B. Leclercq ◽  
P. Salvatore ◽  
F. Rossi
Keyword(s):  
Thin Films ◽  
Bias Voltage ◽  
Inductively Coupled Plasma ◽  
Gas Mixture ◽  
Negative Bias ◽  
Negative Bias Voltage ◽  
Inductively Coupled ◽  
Deposition Parameters ◽  
Coating Characteristics ◽  
Dc Bias

AbstractThin films of zirconia have been deposited by an Inductively Coupled Plasma Assisted CVD (ICP-PACVD) reactor from tetra (tert-butoxy)-zircon precursor diluted in Ar and O2 gas mixture. An independent RF generator is used to control carefully the substrate negative bias voltage during the deposition. Zirconia thin films, with thickness up to 10 microns were deposited on Si (100) polished wafers under different plasma conditions. Correlation between deposition parameters, and microstructure has been established showing that the ion bombardment has a large influence on the coating characteristics. In particular, the possibility of tailoring mechanical properties of the films by controlling the applied DC bias voltage is discussed.

Structural and Mechanical Properties of Multilayer TiN/CrN Coatings

2007 ◽  
Author(s):  
Manohar S. Konchady ◽  
Sergey Yarmolenko ◽  
Devdas M. Pai ◽  
Jag Sankar
Keyword(s):  
Mechanical Properties ◽  
Layer Thickness ◽  
Single Layer ◽  
Preferred Orientation ◽  
X Ray Diffraction ◽  
Unbalanced Magnetron Sputtering ◽  
Deposition Parameters ◽  
Unbalanced Magnetron ◽  
Crn Coatings ◽  
Modulation Wavelength

Multilayer and superlattice coatings of TiN/CrN coating are deposited on Si(100) substrate at different modulation wavelength by reactive unbalanced magnetron sputtering and characterized using X-ray diffraction, nanoindentation, AFM. Nano-roughness of films is in good correlation with hardness and modulus and this effect has been used for optimization of deposition parameters. Preliminary results have shown slightly better mechanical properties for multilayered TiN/CrN coatings compared to single layer TiN and CrN coatings. The XRD results have shown a preferred orientation in <100> direction for TiN/CrN multilayer coatings at modulation wavelengths below 80 nm. At 100 nm layer thickness, TiN revealed small amount of crystals with <111> orientation and their content significantly increases with increase in layer thickness while CrN layers only show preferred orientation of <100>. Multilayered coatings exhibit better mechanical properties due to presence of large number of interfaces which act as barrier to dislocations. Fracture toughness and tribological properties of these coatings are also expected to show significant improvement and the investigation in this area is under progress.

Adhesion of Cr/CrN Multilayers to Steel Substrates

2015 ◽  
Vol 759 ◽  
pp. 27-35
Author(s):  
Marcin Kot ◽  
Kinga Chronowska-Przywara ◽  
Łukasz Major ◽  
Juergen Lackner
Keyword(s):  
Critical Load ◽  
Scratch Test ◽  
Scratch Resistance ◽  
Scratch Testing ◽  
Track Geometry ◽  
Coating Failure ◽  
Bilayer Period ◽  
Steel Substrates ◽  
Crn Coatings ◽  
Coating Hardness

Cr/CrN multilayers with a bilayer period λ = 62 ÷ 1000nm, were investigated. They were deposited by PLD technique on austenitic and ferritic stainless steel substrates. Coating hardness and adhesion to substrates were measured by nanoindentation and scratch testing. Multilayer properties were compared with single Cr and CrN coatings. The 2xCr/CrN and 4xCr/CrN multilayers exhibited hardness slightly lower than the hardness of a single CrN coating, while the critical load of the 4xCr/CrN multilayer, measured in the scratch test, was two times higher than for CrN. Furthermore, the character of coating failure also indicates the higher fracture toughness of multilayers than ceramic ones. The highest scratch resistance of the hardest multilayer with a bilayer period λ = 250nm is extremely interesting. The measured values of the critical loads LC1and LC2of all coatings were higher for harder ferritic than austenitic substrates. However, analysis of scratch track geometry indicated that coating failure occurred under the same deformation of the coating-substrate system, while the higher values of critical load for coatings on ferrite derived from the higher hardness of the substrate.

Deposition of CrN Coatings by Filtered Cathodic Vacuum Arc

2008 ◽  
Vol 373-374 ◽  
pp. 130-133 ◽  
Author(s):  
Ji Liang Mo ◽  
Min Hao Zhu ◽  
J. An ◽  
H. Sun ◽  
Yong Xiang Leng ◽  
...  
Keyword(s):  
Partial Pressure ◽  
Bias Voltage ◽  
Vacuum Arc ◽  
Substrate Bias ◽  
Nitrogen Partial Pressure ◽  
Substrate Bias Voltage ◽  
Crn Coating ◽  
Deposition Parameters ◽  
Filtered Cathodic Vacuum Arc ◽  
Crn Coatings

CrN coatings were deposited on cemented carbide substrates by filtered cathodic vacuum arc technique (FCVA). The effect of different deposition parameters: nitrogen partial pressure, substrate-bias voltage and preheating of the substrate, on the structural and mechanical properties of the coating was investigated. X-ray diffraction analysis was used to determine the structure and composition of the coatings. The tribological behaviour and wear properties of the coatings against Si3N4 ball at different normal loads were studied under reciprocating sliding condition. The results showed that a smooth and dense CrN coating with good properties can be obtained provided a pure Cr interlayer was pre-deposited. The optimal deposition parameters were the nitrogen partial pressure of 0.1 Pa, substrate-bias voltage of -100 V. Preheating of the substrate was no good for improving the properties of the coating. The FCVA CrN coating showed high hardness and good wear resistance, which was probably attributed to its smooth surface and dense microstructure. The wear mechanism of the CrN coating was a combination of abrasion and oxidation. However, the coating flaked off at high normal load due to the deficient adhesion strength of the coating to the substrate.

Influence of Deposition Parameters on Surface Texturing of ZnO:Al Films Prepared by In-line RF Magnetron Sputtering

2009 ◽  
Vol 1210 ◽  
Author(s):  
Jun-Sik Cho ◽  
Young-Jin Kim ◽  
Jeong Chul Lee ◽  
Sang-Hyun Park ◽  
Kyung Hoon Yoon
Keyword(s):  
Magnetron Sputtering ◽  
Scattered Light ◽  
Incident Light ◽  
Rf Magnetron Sputtering ◽  
Wet Etching ◽  
Visible Range ◽  
Silicon Thin Film ◽  
Working Pressure ◽  
Deposition Parameters ◽  
Deposited Films

AbstractA systematic study on the effect of sputtering deposition parameters on material properties of Al doped ZnO (ZnO:Al) films prepared by an in-line rf magnetron sputtering and on surface morphology of the films after wet etching process was carried out. For application to silicon thin film solar cells as a front electrode, the as-deposited films were surface-textured by a dilute HCl solution to improve the light scattering properties such as haze and angle resolved distribution of scattered light on the film surfaces. The microstructure of as-deposited films is affected significantly by the working pressure and film compactness decreases with increasing working pressure from 1.5 mTorr to 10 mTorr. High quality ZnO:Al films with electrical resistivity of 4.25 × 10-4 Ω cm and optical transmittance of 80% in a visible range are obtained at low working pressure of 1.5 mTorr and substrate temperature of 100℃. Crater-like surface morphologies are observed on the textured ZnO:Al films after wet etching. The size and shape of craters are closely dependent on the microstructure and film compactness of as-deposited films. Haze values of the textured ZnO:Al films are improved in a whole wavelength of 300 – 1100 nm compared to commercial SnO2:F films (Asahi U type) and incident light on the textured films is scattered effectively with 30° angle.

scholarly journals Multi-component nitrated ion-plasma Ni-Cr coating

2021 ◽  
Vol 29 (1) ◽  
pp. 61-64
Author(s):  
V. Nadtoka ◽  
M. Kraiev ◽  
A. Borisenko ◽  
V. Kraieva
Keyword(s):  
Wear Resistance ◽  
Nitrogen Content ◽  
Uniform Distribution ◽  
Vacuum Chamber ◽  
Plasma Deposition ◽  
Nitrogen Pressure ◽  
Nitrogen Gas ◽  
Ion Plasma ◽  
Gas Atmosphere ◽  
Cr Coating

Method for ion-plasma deposition is applied for covering of heat-resistant Ni-Cr alloy XH78T. Coating deposition is performed under nitrogen gas atmosphere at the pressure from 3×10-5 to 1×10-2 Torr. The nitrogen content in the coating is reached up to 2,7 %. Nitrated coatings with a thickness of 184-222 μm is obtained without embrittlement and with a uniform distribution of microhardness. The effect of the nitrogen pressure in a vacuum chamber on the structure of the coatings, which changes from homogeneous to columnar with conical crystallites, is presented. Nitration increases microhardness of the coatings from 3669 to 7575 HV, the wear resistance of the coatings increases by 6-8 times. The received coatings can be used to increase the durability of metallurgical equipment parts.

Stresses in Amorphous Gd-Fe Alloy Thin Films Deposited by Magnetron Sputtering

1990 ◽  
Vol 188 ◽  
Author(s):  
Zhi-Feng Zhou ◽  
Qi-Gang Zhou ◽  
Yu-Dian Fan
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Compressive Stress ◽  
Bias Voltage ◽  
Negative Bias ◽  
Negative Bias Voltage ◽  
Working Pressure ◽  
Planar Magnetron ◽  
Very High ◽  
High Working Pressure

ABSTRACTAmorphous Gd-Fe alloy thin films were made by D.C. planar magnetron sputtering under various deposition conditions (e.g., film thickness, composition, working pressure of Ar, negative bias voltage and deposition rate). The stress, the film composition and the content of entrapped Ar in the films were measured respectively. The experimental results showed that in this case the working pressure of Ar and the negative bias voltage did not change the composition of the films, and the stresses were all compressive except for the films deposited in a very high working pressure of Ar. The origin of the compressive stress can be attributed to the atomic peening effect produced by fast neutral working gas atoms rebounded from the sputtering target. The magnitude of the compressive stress depends not only on the amount of Ar atoms incorporated in the films but also on the film microstructure such as the packing density.

Nitrogen Content Influence on Optical Properties of DC Magnetron Sputtered Copper Nitride Films

2013 ◽  
Vol 562-565 ◽  
pp. 1001-1007
Author(s):  
Shu Yong Wang ◽  
Ning Yi Yuan ◽  
Jian Ning Ding
Keyword(s):  
Optical Properties ◽  
Nitrogen Content ◽  
Gas Flow ◽  
X Ray Diffraction ◽  
Working Pressure ◽  
Copper Nitride ◽  
Storage Devices ◽  
Glass Substrates ◽  
Atomic Force ◽  
Nitrogen Contents

In this paper, influence of nitrogen content on growth mode, surface morphology and the optical properties of copper nitride (CuxN) films was investigated. CuxN films were prepared on glass substrates by direct current (DC) magnetron sputtering at various nitrogen contents. X-ray diffraction (XRD), profilometer, atomic force microscope (AFM) and spectrophotometer were used to analyze the characteristics. The XRD measurements showed the films were composed of Cu and Cu4N crystallites at working pressure with a low nitrogen content, while the structure of the films were conformed to anti-ReO3 structure at a high nitrogen content and the preferred growth orientations of the Cu3N films changed from (111) to (100). The transmittances of CuxN films increased with the increase of nitrogen content (r) in working gas flow from 0 to 0.6, while decreased when r increased from 0.6 to 0.9. Additionally, the lowest reflectivity and the maximum band gap of 1.35 eV for CuxN film were obtained at r = 0.6. The CuxN films deposited at various nitrogen contents have large differences on optical properties which provide a potential application in optical storage devices.

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