Enabling Bulk Silicon CMOS Technology for Integration, Reliability, and Extended Lifetime at High Temperature

2015 ◽  
Vol 2015 (HiTEN) ◽  
pp. 000020-000026 ◽  
Author(s):  
Rex Lowther ◽  
David Gifford ◽  
Wesley Morris ◽  
Jim Jensen ◽  
Scott Peterson ◽  
...  

Silicon Space Technology has developed a commercial bulk CMOS process technology, HardSIL™, which allows optimization of performance, power, and lifetime at high temperatures. A method for preventing latchup, originally developed for use in the space radiation environment, is presently applied to terrestrial high-temperature environments. With the possibility of latchup eliminated in scaled CMOS technology nodes, further designs specific for high-temperature environments have proceeded well. This novel technology has been applied to our 18Mb synchronous burst SBRAM and our ARM® Cortex® M0 microcontroller, and in two CMOS processes at the 130nm technology node (Texas Instruments and GLOBALFOUNDRIES). Extensive temperature testing on these parts demonstrates that bulk silicon CMOS technology has a practical temperature limit of 250°C or higher. Both the microcontroller and the SBRAM have been tested with clock rates up to 70MHz and at temperatures up to 260°C. Both parts have performed without error and without latchup under these conditions, and with low operating current and low leakage current. For example, the 130 million-transistor 18Mb SBRAM has average core leakage current of 580mA at 250°C and core voltage of 1.5V with test lots and simulations showing further reduction in leakage in the next, terrestrial version of this part. In addition, the 18Mb SBRAM is undergoing an endurance test at 250°C, presently at the 2500 hour milestone. Operation at temperatures beyond the present limit of the testing equipment (260°C) appears possible from extrapolation of current data. Integration levels of greater than 8 million gates on a bulk CMOS device would allow multi-core processors with large on-chip secondary caches. Additional DSP engines or other compute engines can be accommodated for processing high resolution three dimensional images in real time. This would provide substantial distributed processing in drilling or jet engine control. These system-on-chip (SOC) integration levels can substantially reduce mechanical failures in a subsystem by reducing the number of wire bonds from greater than 1000 connections to less than 100 connections. Integration of mixed-signal A/Ds and D/As as well as on-chip power management provides a path to further reduction in mechanical connections in a sub-system.

2016 ◽  
Vol 2016 (HiTEC) ◽  
pp. 000046-000050
Author(s):  
R. Bannatyne ◽  
D. Gifford ◽  
K. Klein ◽  
C. Merritt

Abstract VORAGO Technologies has developed a pair of ARM Cortex M0 MCUs designed from the ground up to be high temperature capable. One of these devices is specifically developed for high temperature applications, the other adds capabilities that make it suitable for use in high radiation environments as well. These devices are fabricated using a modified version of commercial bulk 130nm CMOS technology utilizing our HARDSIL® technology, which provides immunity to the increased effects of latchup and EOS encountered at higher application temperatures. In addition to the processor these devices include features more typical of low temperature SoCs including on-chip memory, timers, and communications peripherals. In addition to the ceramic package and die format typically utilized at high temperature, a new lower-cost plastic package is available that has been characterized at higher temperatures. These devices have been characterized at temperatures up to 200C and results showing the latchup behavior and device performance are provided. Some of the tradeoffs involved in creating such devices are discussed, as well as some of the similarities and tradeoffs in creating a radiation hardened devices vs. a high temperature device.


2013 ◽  
Vol 2013 (HITEN) ◽  
pp. 000116-000121
Author(s):  
K. Grella ◽  
S. Dreiner ◽  
H. Vogt ◽  
U. Paschen

Standard Bulk-CMOS-technology targets use-temperatures of not more than 175 °C. With Silicon-on-Insulator-technologies (SOI), digital and analog circuitry is possible up to 250 °C and even more, but performance and reliability are strongly affected at these high temperatures. One of the main critical factors is the gate oxide quality and its reliability. In this paper, we present a study of gate oxide capacitor time-dependent dielectric breakdown (TDDB) measurements at temperatures up to 350 °C. The experiments were carried out on gate oxide capacitor structures which were realized in the Fraunhofer 1.0 μm SOI-CMOS process. This technology is based on 200 mm wafers and features, among others, three layers of tungsten metallization with excellent reliability concerning electromigration, voltage independent capacitors, high resistance resistors, and single-poly-EEPROM cells. The gate oxide thickness is 40 nm. Using the data of the TDDB-measurements, the behavior of field and temperature acceleration parameters at temperatures up to 350 °C was evaluated. For a more detailed investigation, the current evolution in time was also studied. An analysis of the oxide breakdown conditions, in particular the field and temperature dependence of the charge to breakdown and the current just before breakdown, completes the study. The presented data provide important information about accelerated oxide reliability testing beyond 250 °C, and make it possible to quickly evaluate the reliability of high temperature CMOS-technologies at use-temperature.


2019 ◽  
Vol 82 (1) ◽  
Author(s):  
Florence Choong ◽  
Mamun Ibne Reaz ◽  
Mohamad Ibrahim Kamaruzzaman ◽  
Md. Torikul Islam Badal ◽  
Araf Farayez ◽  
...  

Digital controlled oscillator (DCO) is becoming an attractive replacement over the voltage control oscillator (VCO) with the advances of digital intensive research on all-digital phase locked-loop (ADPLL) in complementary metal-oxide semiconductor (CMOS) process technology. This paper presents a review of various CMOS DCO schemes implemented in ADPLL and relationship between the DCO parameters with ADPLL performance. The DCO architecture evaluated through its power consumption, speed, chip area, frequency range, supply voltage, portability and resolution. It can be concluded that even though there are various schemes of DCO that have been implemented for ADPLL, the selection of the DCO is frequently based on the ADPLL applications and the complexity of the scheme. The demand for the low power dissipation and high resolution DCO in CMOS technology shall remain a challenging and active area of research for years to come. Thus, this review shall work as a guideline for the researchers who wish to work on all digital PLL.


Author(s):  
Miloš Krstic ◽  
Xin Fan ◽  
Eckhard Grass ◽  
Luca Benini ◽  
M. R. Kakoee ◽  
...  

In this paper the authors present the concept and evaluation results of a complex GALS ASIC demonstrator in 40 nm CMOS process. This chip, named Moonrake, compares synchronous and GALS synchronization technology in a homogeneous experimental setting: same baseline designs, same manufacturing process, same die. The chip validates GALS technology for both point-to-point and network-centric on-chip communications, demonstrating its potentials for different applications. The design analysis, measurement and test results confirm the potential of GALS approach for the scaled technologies, showing the significant benefits in respect to area, power, and EMI when it comes to the complex system implementation. Furthermore, 91% of the tests performed on the GALS network-on-chip test structures completed successfully, validating the timing robustness of new area and latency-efficient synchronization schemes and proving that the design flow for GALS synchronization technology can be implemented by means of mainstream industrial tools.


Optik ◽  
2020 ◽  
Vol 223 ◽  
pp. 165509
Author(s):  
Ritesh Kumar Kushwaha ◽  
P. Karuppanan ◽  
Rupesh Kumar Dewang

2014 ◽  
Vol 31 (5) ◽  
pp. 36-45 ◽  
Author(s):  
Wenjia Zhang ◽  
Bing Wang ◽  
Zhaomin Zhu ◽  
Kenneth Eng Kian Lee ◽  
Jurgen Michel ◽  
...  

2012 ◽  
Vol 2012 (HITEC) ◽  
pp. 000227-000232
Author(s):  
K. Grella ◽  
S. Dreiner ◽  
A. Schmidt ◽  
W. Heiermann ◽  
H. Kappert ◽  
...  

Standard Bulk-CMOS-technology targets use-temperatures of not more than 175 °C. Silicon-on-Insulator-technologies are commonly used up to 250 °C. In this work we evaluate the limit for electronic circuit function realized in thin film SOI-technologies for even higher temperatures. At Fraunhofer IMS a versatile 1.0 μm SOI-CMOS process based on 200 mm wafers is available. It features three layers of tungsten metalization with excellent reliability concerning electromigration, voltage independent capacitors, various resistors, and single-poly-EEPROMs. We present a study of the temperature dependence of MOSFETs and basic circuits produced in this process. The electrical characteristics of NMOSFET- and PMOSFET-transistors were studied up to 450 °C. In a second step we investigated the functionality of ring oscillators, representing digital circuits, and bandgap references as examples of simple analog components. The frequency and the current consumption of ring oscillators and the output voltage of bandgap references were also characterized up to 450 °C. We found that the ring oscillator still functions at this high temperature with a frequency of about one third of the value at room temperature. The output voltage of the bandgap reference is in the specified range up to 250 °C. The deviations above this temperature are analyzed and measures to improve the circuit are discussed. The acquired data provide an important foundation to extend the application of CMOS-technology to its real maximum temperature limits.


2017 ◽  
Vol 2017 ◽  
pp. 1-6 ◽  
Author(s):  
Munir A. Al-Absi

This paper presents a new compact controllable impedance multiplier using CMOS technology. The design is based on the use of the translinear principle using MOSFETs in subthreshold region. The value of the impedance will be controlled using the bias currents only. The impedance can be scaled up and down as required. The functionality of the proposed design was confirmed by simulation using BSIM3V3 MOS model in Tanner Tspice 0.18 μm TSMC CMOS process technology. Simulation results indicate that the proposed design is functioning properly with a tunable multiplication factor from 0.1- to 100-fold. Applications of the proposed multiplier in the design of low pass and high pass filters are also included.


Author(s):  
Joakim Nilsson ◽  
Johan Borg ◽  
Jonny Johansson

AbstractThis paper presents a theory for the power transfer efficiency of printed circuit board coils to integrated circuit coils, with focus on load-dependence for low-power single-chip systems. The theory is verified with electromagnetic simulations modelled on a 350 nm CMOS process which in turn are verified by measurements on manufactured integrated circuits. The power transfer efficiency is evaluated by on-chip rectification of a 151 MHz signal transmitted by a spiral coil on a printed circuit board at 10 mm of separation to an on-chip coil. Such an approach avoids the influence of off-chip parasitic elements such as bond wires, which would reduce the accuracy of the evaluation. It is found that there is a lower limit for the load below which reducing the power consumption of on-chip circuits yield no increase in voltage generated at the load. For the examined process technology, this limit appears to lie around 56 k$$\Omega$$ Ω . The paper is focused on the analysis and verification of the theory behind this limit. We relate the results presented in this work to the application of wireless single-chip temperature monitoring of power semiconductors and conclude that such a system would be compatible with this limit.


2017 ◽  
Author(s):  
Emmanuel Seaman ◽  
Jason Du

With the ultra-scaling of CMOS technology, high-speed and low-power millimeter-wave communication systems for network-on-chip have been attracting more and more attentions due to the wider bandwidth and higher data rate that can meet the ever-increasing needs for multimedia, massive external data storage, or even biomedical applications. However, from manufacturing’s perspective, the circuits implementations are increasingly susceptible to fabrication process variations with the scaling of CMOS technology, which results in loss of yield rate. To solve this issue, a sensor-fusion solution is proposed in this paper by adding multiple on-chip sensors, including power detectors, temperature sensors, information envelope detectors and related filters, instrumentation amplifiers using a standard CMOS process. These sensors and detectors aim to collect critical system performance and environmental parameters, which will be utilized by a self-healing and optimization algorithm to adjust the state of system components by digitized control knobs.


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