Electro-migration Behavior in Micro-joints of Sn-57Bi solder and Cu Post Bumps

2011 ◽  
Vol 2011 (1) ◽  
pp. 000997-001006 ◽  
Author(s):  
Kei Murayama ◽  
Taiji Sakai ◽  
Nobuaki Imaizumi ◽  
Mitsutoshi Higashi

The bonding technique for high density Flip Chip(F.C.) packages requires a low temperature and a low stress process to achieve high reliability of the micro joining. Sn-Bi solder has been noted as a low temperature bonding material. Electromigration behavior of Sn-57wt%Bi flip chip interconnection with Cu post bumps was investigated. The flip chip bumps used for this experiments consisted of Cu post formed with plating and Sn-57wt%Bi solder. Two types of under bump metal(UBM) of organic substrate were studied, that is, electroless Ni(6μm)/Au(0.5μm) on Cu pad and Cu pad. Electron flow to induce the electro-migration was from organic substrate side (Cu pad) to chip side (Cu post) with current density of 40000A/cm2 at 125 degree C. At both types of the UBM, Bi migrated and accumulated to the anode side (Cu post) and Sn migrated to the cathode side (substrate pad). Each interconnect resistance has increased to about 25% and 46% within 100 hours, respectively. However, after more than 3000 hours, they were stabilized. With Ni/Au UBM pad, Cu3Sn/Cu6Sn5 intermetallic compounds (IMCs) were formed at the Cu bump side. And under the Bi layer Cu6Sn5/Ni-Sn compounds were formed. But we didn’t observe the failure like cracks or voids at the Ni layer. With Cu pad, only Cu3Sn IMC at the Cu bump side and under the Bi layer Cu6Sn5/Cu3Sn compounds were formed after 4000 hours. Although the voids were observed at Cu3Sn/Cu interface, good electrical connection was obtained.

2006 ◽  
Vol 21 (3) ◽  
pp. 698-702 ◽  
Author(s):  
Jae-Woong Nah ◽  
Fei Ren ◽  
Kyung-Wook Paik ◽  
K.N. Tu

Effect of electromigration on mechanical shear behavior of flip chip solder joints consisting of 97Pb3Sn and 37Pb63Sn composite solder joints was studied. The under bump metallurgy (UBM) on the chip side was TiW/Cu/electroplated Cu, and the bond pad on the board side was electroless Ni/Au. It was found that the mode of shear failure has changed after electromigration and the mode depends on the direction of electron flow during electromigration. The shear induced fracture occurs in the bulkof 97Pb3Sn solder without current stressing, however, after 10 h current stressing at 2.55 × 104 A/cm2 at 140 °C, it occurs alternately at the cathode interfaces between solder and intermetallic compounds (IMCs). In the downward electron flow, from the chip to substrate, the failure site was at the Cu–Sn IMC/solder interface near the Si chip. However, in the upward electron flow, from the substrate to chip, failure occurred at the Ni–Sn IMC/solder interface near the substrate. The failure mode has a strong correlation to microstructural change in the solder joint. During the electromigration, while Pb atoms moved to the anode side in the same direction as with the electron flow, Sn atoms diffused to the cathode side, opposite the electron flow. In addition, electromigration dissolves and drives Cu or Ni atoms from UBM or bond pad at the cathode side into the solder. These reactions resulted in the large growth of Sn-based IMC at the cathode sides. Therefore, mechanical shear failure occurs predominantly at the cathode interface.


2017 ◽  
Vol 2017 (1) ◽  
pp. 000754-000760 ◽  
Author(s):  
Adrien Morard ◽  
Jean-Christophe Riou ◽  
Gabriel Pares

Abstract The first part of this work is dedicated to the study of “system in package” (SiP) solutions based on different substrates, namely organic or silicon. Generally speaking a SIP is composed by several active and passive components stacked on an interposer. Benchmarks done by Safran have demonstrated that in terms of substrate, embedded die technology leads to several advantages compared to 3D TSV or TGV based packaging approaches. The benefits leaded by this substrate is the possibility to embed some Surface Mount Technologies, bare chips or integrated passives devices (IPD) banks directly above or below the stacked active components. This way, top and bottom surface of the substrate can be used to integrate several heterogeneous dies side by side while using low profile flip-chip assemblies on the C4 side. Finally, in this kind of 3D architecture, this embedded technology enable a gain of integration, without using costly TSV connections. Substrates of high quality allow a reduction of interconnection pitches leading to very aggressive integration. Secondly, a 3D stack with 3 levels of components, as described above, means to, at least, 2 or 3 REACH compliant sequential assembly processes, depending on the needs. In order to consider all the solutions for an optimized integration and a high reliability, this work focused on the study of a simple SIP, which includes the top die assembled by flip-chip. For the flip chip hybridization, copper-pillars technologies are studied in the case of both organic and silicon interposers. The aim of this study is to understand in depth both processes and to obtain information on the reliability aspect after thermal cycling stress of the flip chip assembly. Thirdly, we built many silicon test chips with different characteristics with a dedicated daisy chain test vehicle. The different parameters are: chips' thicknesses (50 to 200 μm), chips' sizes (2 to 8 mm), bump structures (diameter), and the pitches of the interconnection (from 50 to 250 μm) and the number of interconnection rows. Designs were chosen in order to fit real operational configurations. Moreover, these configurations are interesting to build a comprehensive model in order to understand the failure mechanisms. These chips are then stacked by flip-chip on the silicon and on the organic substrate. We are also designing the two configurations of substrates. Only the production of the organics part is outsourced. Fourth, with all these configurations we will be able to fit the thermo-cycling test results with thermos-mechanical simulations done by finite elements. 3D models will take into account the different geometries in order to understand and quantify the various key parameters. The analysis will mainly focus on 3D interconnections. Design rules based on the results will be derivate. The aim is to obtain dimensional criteria based on stress versus deformation responses. Information obtained will be exploited for designing the future functional SIP. Fifth, in order to assess the electrical behaviors of this 3D architecture, signal integrity aspect will be considered as well. As for the design, the migration from an existing 2D electrical design to a 3D architecture design will be studied keeping the signal transmission without any degradation. The ultimate aim of this work is to define mechanical and electrical design rules that can then be used in functional SiP modules.


2010 ◽  
Vol 2010 (1) ◽  
pp. 000792-000797 ◽  
Author(s):  
Kiju Lee ◽  
Keun-Soo Kim ◽  
Kimihiro Yamanaka ◽  
Yutaka Tsukada ◽  
Soichi Kuritani ◽  
...  

Electromigration behavior of SAC flip-chip joints with respect to the crystallographic orientation of Sn grains was investigated. The test sample had direct contact of Sn-3.0wt% Ag-0.5wt% Cu on Cu-OSP (organic surface preservative) and the applied current density was 15 kA/cm2 at 160 °C. Without current stressing, no microstructural change depending on the crystallographic orientation of Sn was observed. With current stressing, however, the bumps showed the substantial microstructural changes with respect to the crystallographic orientation of Sn. When the orientation of the current flow was parallel to the c-axis, fast failure of the bumps occurred due to the massive dissolution of the Cu electrode on the cathode side caused by the fast diffusion of Cu atoms along the c-axis of Sn grains while only a slight microstructural change was observed when the c-axis of Sn grains was perpendicular to the electron flow.


1996 ◽  
Vol 445 ◽  
Author(s):  
K. Sumita ◽  
K. Kumagae ◽  
K. Dobashi ◽  
T. Shiobara ◽  
M. Kuroda

AbstractA new underfill was developed for a flip chip application with a large VLSI die. The new underfill is resistant to hydrolysis, exhibits a significantly lower moisture saturation level than widely used carboxylic anhydride cured underfills, demonstrates superb penetration capability between such a large die and an organic substrate without void formation, and delivers excellent adhesion characteristics and reliability performance during temperature cycling test and PCT (pressure cooker test).The new underfill utilizes amine catalyzed ring opening polymerization of epoxides, forms ether linkages during cure rather than ester linkages which anhydride cured underfills form, and strongly resists to hydrolysis. The underfill is less sensitive to moisture contamination and provides improved floor life as well as storage life in contrast to anhydride cured underfills as well. Unique low stress performance and penetration capability of the underfill are attributed to the use of proprietary silicone modified epoxy resin as well as highly loaded filler of optimized size, shape and size distribution in reference to the gap between a die and an organic substrate.An optimum cure schedule and a desirable viscosity range have also been identified for the new underfill to minimize filler segregation. Proper preheating of a die‐substrate has effectively reduced void formation while facilitating the removal of volatile from an organic substrate.


2000 ◽  
Vol 15 (8) ◽  
pp. 1679-1687 ◽  
Author(s):  
J. W. Jang ◽  
C. Y. Liu ◽  
P. G. Kim ◽  
K. N. Tu ◽  
A. K. Mal ◽  
...  

We examined the interfacial morphology and shear deformation of flip chip solder joints on an organic substrate (chip-on-board). The large differences in the coefficients of thermal expansion between the board and the chip resulted in bending of the 1-cm2 chip with a curvature of 57 ± 12 cm. The corner bump pads on the chip registered a relative misalignment of 10 μm with respect to those on the board, resulting in shear deformation of the solder joints. The mechanical properties of these solder joints were tested on samples made by sandwiching two Si chips with electroless Ni(P) as the under-bump metallization and 25 solder interconnects. Joints were sheared to failure. Fracture was found to occur along the solder/Ni3Sn4 interface. In addition, cracking and peeling damages of the SiO2 dielectric layer were observed in the layer around the solder balls, indicating that damage to the dielectric layer may have occurred prior to the fracture of the solder joints due to a large normal stress. The failure behavior of the solder joints is characterized by an approximate stress analysis.


2018 ◽  
Vol 2018 (1) ◽  
pp. 000029-000036 ◽  
Author(s):  
Adrien Morard ◽  
Jean-Christophe Riou ◽  
Gabriel Pares

Abstract In the aeronautical field, the electronic integration roadmaps show that the weight and the volume dedicated to on-board electronics must be reduced by a factor of 4 to 10 compared to the existing ones for the most recurrent functions in the next years. This work is an opening to new technological solutions to increase our ability to save space while improving the overall reliability of the system. The first part of this work is dedicated to the study of “system in package” (SiP) solutions based on different substrates, namely organic or silicon. Generally speaking a SIP is composed by several active and passive components stacked on an interposer. Benchmarks done by our laboratory have demonstrated that in terms of substrate, embedded die technology leads to several advantages compared to 3D TSV or TGV based packaging approaches. The benefits provided by this substrate is the possibility to embed some surface mount technologies (SMT), some bare chips or some integrated passives devices (IPD) banks directly above or below the stacked active components. This way, top and bottom surface of the substrate can be used to integrate several heterogeneous dies side by side while using low profile flip-chip assemblies on the C4 side. Finally, in this kind of 3D architecture, this embedded technology enable a gain of integration, without using costly TSV connections. Substrates of high quality allow a reduction of I/Os interconnection pitches leading to very aggressive integration down to 50μm. Secondly, a 3D stack with 3 levels of components, as described above, leads to 2 or 3 REACH compliant sequential assembly processes, depending of the needs. In order to consider all the solutions for an optimized overall integration with high reliability, this work focuse on the study one simple SIP which includes the top die assembled by flip-chip. For the flip chip hybridization on organic interposers copper pillars technologies will be studied. The objective is to understand in depth the processes and to obtain information on the reliability aspect after thermal cycling stress of the flip chip assembly. Thirdly, we built many silicon test chips with different characteristics with a dedicated daisy chain test vehicle. The different parameters are: chip's thicknesses (50 to 200 μm), chip's sizes (2 to 8 mm), bump structures (diameter), the pitches of the interconnection (from 50 to 250 μm) and the number of interconnection rows. Designs were chosen in order to fit real operational configurations. Moreover, these configurations are interesting to build a comprehensive model in order to understand the failure mechanisms. These chips are then stacked by flip chip on the silicon and on the organic substrate. We are also designing the both configurations of substrates. Only the production of the organics part is outsourced. Fourth, for all assemblies thermos-cycling test results will be evaluated with thermo mechanical simulations done by finite elements. 3D models will take into account the different geometries in order to understand and quantify the various key parameters. The analysis will mainly focus on 3D interconnections. Design rules based on the results will be derivated. The aim is to obtain dimensional criteria based on stress versus deformation responses. Lastly intermetallic formation will be evaluated using EBSD analysis to obtain better understanding of copper pillar failures for this specific bumps size. Issued information's will be exploited for designing the future functional SIP. The ultimate goal of this work is finally to define mechanical design rules that can then be used in functional SiP modules.


Author(s):  
Andrew J. Komrowski ◽  
N. S. Somcio ◽  
Daniel J. D. Sullivan ◽  
Charles R. Silvis ◽  
Luis Curiel ◽  
...  

Abstract The use of flip chip technology inside component packaging, so called flip chip in package (FCIP), is an increasingly common package type in the semiconductor industry because of high pin-counts, performance and reliability. Sample preparation methods and flows which enable physical failure analysis (PFA) of FCIP are thus in demand to characterize defects in die with these package types. As interconnect metallization schemes become more dense and complex, access to the backside silicon of a functional device also becomes important for fault isolation test purposes. To address these requirements, a detailed PFA flow is described which chronicles the sample preparation methods necessary to isolate a physical defect in the die of an organic-substrate FCIP.


2006 ◽  
Vol 527-529 ◽  
pp. 999-1002
Author(s):  
Junji Senzaki ◽  
Atsushi Shimozato ◽  
Kenji Fukuda

Low-temperature post-oxidation annealing (POA) process of high-reliability thermal oxides grown on 4H-SiC using new apparatus that generates atomic hydrogen radicals by high-temperature catalyzer has been investigated. Atomic hydrogen radicals were generated by thermal decomposition of H2 gas at the catalyzer surface heated at high temperature of 1800°C, and then exposed to the sample at 500°C in reactor pressure of 20 Pa. The mode and maximum values of field-to-breakdown are 11.0 and 11.2 MV/cm, respectively, for the atomic hydrogen radical exposed sample. In addition, the charge-to-breakdown at 63% cumulative failure of the thermal oxides for atomic hydrogen radical exposed sample was 0.51 C/cm2, which was higher than that annealed at 800°C in hydrogen atmosphere (0.39 C/cm2). Consequently, the atomic hydrogen radical exposure at 500°C has remarkably improved the reliability of thermal oxides on 4H-SiC wafer, and is the same effect with high-temperature hydrogen POA at 800°C.


Machines ◽  
2020 ◽  
Vol 9 (1) ◽  
pp. 1
Author(s):  
Jing Wang ◽  
Zhihua Wan ◽  
Zhurong Dong ◽  
Zhengguo Li

The harmonic reducer, with its advantages of high precision, low noise, light weight, and high speed ratio, has been widely used in aerospace solar wing deployment mechanisms, antenna pointing mechanisms, robot joints, and other precision transmission fields. Accurately predicting the performance of the harmonic reducer under various application conditions is of great significance to the high reliability and long life of the harmonic reducer. In this paper, a set of automatic harmonic reducer performance test systems is designed. By using the CANOpen bus interface to control the servo motor as the drive motor, through accurately controlling the motor speed and rotation angle, collecting the angle, torque, and current in real time, the life cycle test of space harmonic reducer was carried out in high vacuum and low temperature environment on the ground. Then, the collected data were automatically analyzed and calculated. The test data of the transmission accuracy, backlash, and transmission efficiency of the space harmonic reducer were obtained. It is proven by experiments that the performance data of the harmonic reducer in space work can be more accurately obtained by using the test system mentioned in this paper, which is convenient for further research on related lubricating materials.


Sign in / Sign up

Export Citation Format

Share Document