Interfacial Morphology and Shear Deformation of Flip Chip Solder Joints

2000 ◽  
Vol 15 (8) ◽  
pp. 1679-1687 ◽  
Author(s):  
J. W. Jang ◽  
C. Y. Liu ◽  
P. G. Kim ◽  
K. N. Tu ◽  
A. K. Mal ◽  
...  

We examined the interfacial morphology and shear deformation of flip chip solder joints on an organic substrate (chip-on-board). The large differences in the coefficients of thermal expansion between the board and the chip resulted in bending of the 1-cm2 chip with a curvature of 57 ± 12 cm. The corner bump pads on the chip registered a relative misalignment of 10 μm with respect to those on the board, resulting in shear deformation of the solder joints. The mechanical properties of these solder joints were tested on samples made by sandwiching two Si chips with electroless Ni(P) as the under-bump metallization and 25 solder interconnects. Joints were sheared to failure. Fracture was found to occur along the solder/Ni3Sn4 interface. In addition, cracking and peeling damages of the SiO2 dielectric layer were observed in the layer around the solder balls, indicating that damage to the dielectric layer may have occurred prior to the fracture of the solder joints due to a large normal stress. The failure behavior of the solder joints is characterized by an approximate stress analysis.

2004 ◽  
Vol 127 (2) ◽  
pp. 120-126 ◽  
Author(s):  
Daijiao Wang ◽  
Ronald L. Panton

Understanding the formation of voids in solder joints is important for predicting the long-term reliability of solder interconnects. This paper reports experimental research on the formation of void bubbles within molten solder bumps in flip-chip connections. For flip-chip-soldered electronic components, which have small solder volume, voids can be more detrimental to reliability. A previous theory based on thermocapillary flow reveals that the direction of heating influences void formation. Using different heating profiles, 480 solder joints of flip-chip assemblies were processed. A high-lead 90Pb∕8Sn∕2Ag solder was employed in the experiments. The solder samples were microsectioned to determine the actual size or diameter of the voids. A database on sizes and locations of voids was then constructed. More defective bumps, 80%, and higher void volume were found when the solder was melted from top (flip-chip side) to bottom (test board side). The observation on cases with melting direction from bottom to top had 40% defective bumps. The results show that a single big void is near the solder bump center with a few small voids near the edge. This supports the numerical study based on the thermocapillary theory. When the melting direction was reversed, many small voids appear near the edge. Big and middle-size voids tend to stay in the middle and outer regions from top towards middle layer of the bump. This experimental finding does not completely agree with the interpretation on the formation of voids by thermocapillary theory, however, the results do show that heat flux direction plays significant role in the formation and distribution of void bubbles in molten solder.


2014 ◽  
Vol 2014 (1) ◽  
pp. 000612-000617 ◽  
Author(s):  
Shota Miki ◽  
Takaharu Yamano ◽  
Sumihiro Ichikawa ◽  
Masaki Sanada ◽  
Masato Tanaka

In recent years, products such as smart phones, tablets, and wearable devices, are becoming miniaturized and high performance. 3D-type semiconductor structures are advancing as the demand for high-density assembly increases. We studied a fabrication process using a SoC die and a memory die for 3D-SiP (System in Package) with TSV technology. Our fabrication is comprised of two processes. One is called MEOL (Middle End of Line) for exposing and completing the TSV's in the SoC die, and the other is assembling the SoC and memory dice in a 3D stack. The TSV completion in MEOL was achieved by SoC wafer back-side processing. Because its final thickness will be a thin 50μm (typical), the SoC wafer (300 mm diameter) is temporarily attached face-down onto a carrier-wafer. Careful back-side grinding reveals the “blind vias” and fully opens them into TSV's. A passivation layer is then grown on the back of the wafer. With planarization techniques, the via metal is accessed and TSV pads are built by electro-less plating without photolithography. After the carrier-wafer is de-bonded, the thin wafer is sawed into dice. For assembling the 3D die stack, flip-chip technology by thermo-compression bonding was the method chosen. First, the SoC die with copper pillar bumps is assembled to the conventional organic substrate. Next the micro-bumps on the memory die are bonded to the TSV pads of the SoC die. Finally, the finished assembly is encapsulated and solder balls (BGA) are attached. The 3D-SiP has passed both package-level reliability and board-level reliability testing. These results show we achieved fabricating a 3D-SiP with high interconnect reliability.


Author(s):  
Subramanya Sadasiva ◽  
Ganesh Subbarayan ◽  
Lei Jiang ◽  
Daniel Pantuso

Increasing miniaturization has led a significant increase in the current densities seen in flip-chip solder joints. This has made the study of failure in solder joints by void propagation due to electromigration and stress migration more important. In this study, we develop a phase field model for the motion of voids through a flip chip solder interconnect. We derive equations of motion for the void accounting for energetic contributions from the active factors of surface energy, stress and electric potential, taking into account both surface diffusion and transfer of the material through the bulk of the material. We describe the implementation of this model using finite elements, coupled with a commercial finite element solver to solve for the fields driving the void motion.


2011 ◽  
Vol 2011 (1) ◽  
pp. 000997-001006 ◽  
Author(s):  
Kei Murayama ◽  
Taiji Sakai ◽  
Nobuaki Imaizumi ◽  
Mitsutoshi Higashi

The bonding technique for high density Flip Chip(F.C.) packages requires a low temperature and a low stress process to achieve high reliability of the micro joining. Sn-Bi solder has been noted as a low temperature bonding material. Electromigration behavior of Sn-57wt%Bi flip chip interconnection with Cu post bumps was investigated. The flip chip bumps used for this experiments consisted of Cu post formed with plating and Sn-57wt%Bi solder. Two types of under bump metal(UBM) of organic substrate were studied, that is, electroless Ni(6μm)/Au(0.5μm) on Cu pad and Cu pad. Electron flow to induce the electro-migration was from organic substrate side (Cu pad) to chip side (Cu post) with current density of 40000A/cm2 at 125 degree C. At both types of the UBM, Bi migrated and accumulated to the anode side (Cu post) and Sn migrated to the cathode side (substrate pad). Each interconnect resistance has increased to about 25% and 46% within 100 hours, respectively. However, after more than 3000 hours, they were stabilized. With Ni/Au UBM pad, Cu3Sn/Cu6Sn5 intermetallic compounds (IMCs) were formed at the Cu bump side. And under the Bi layer Cu6Sn5/Ni-Sn compounds were formed. But we didn’t observe the failure like cracks or voids at the Ni layer. With Cu pad, only Cu3Sn IMC at the Cu bump side and under the Bi layer Cu6Sn5/Cu3Sn compounds were formed after 4000 hours. Although the voids were observed at Cu3Sn/Cu interface, good electrical connection was obtained.


Author(s):  
Jordan C. Roberts ◽  
Mohammad Motalab ◽  
Safina Hussain ◽  
Jeffrey C. Suhling ◽  
Richard C. Jaeger ◽  
...  

Microprocessor packaging in modern workstations and servers often consists of one or more large flip chip die that are mounted to a high performance ceramic chip carrier. The final assembly configuration features a complex stack up of flip chip area array solder interconnects, underfill, ceramic substrate, lid, heat sink, thermal interface materials, second level CBGA solder joints, organic PCB, etc., so that a very complicated set of loads is transmitted to the microprocessor chip. Several trends in the evolution of this packaging architecture have exacerbated die stress levels including the transition to larger die, high CTE ceramic substrates, lead free solder joints, higher levels of power generation, and larger heat sinks with increased clamping forces. Die stress effects are of concern due to several reasons including degradation of silicon device performance (mobility/speed), damage that can occur to the copper/low-k top level interconnect layers, and potential mechanical failure of the silicon in extreme cases. In this work, we have used test chips containing piezoresistive sensors to measure the buildup of mechanical stresses in a microprocessor die after various steps of the CBGA assembly process, as well as due to heat sink clamping. The developed normal stresses are compressive (triaxial compression) across the die surface, with significant in-plane and out-of-plane (interfacial) shear stresses also present at the die corners. The compressive stresses have been found to increase with each assembly step (flip chip solder joint reflow, underfill dispense and cure, lid attachment, CBGA assembly to PCB, and heat sink clamping). Levels exceeding 500 MPa have been observed for extremely high heat sink clamping forces. The utilized (111) silicon test chips were able to measure the complete three-dimensional stress state (all 6 stress components) at each sensor site being monitored by the data acquisition hardware. The test chips had dimensions of 20 × 20 mm, and 3600 lead free solder interconnects (full area array) were used to connect the chips to the high CTE ceramic chip carriers. Before packaging, the sensor resistances were measured by directly probing the individual test chip wafers. The chips were then diced, reflowed to the ceramic substrate, and then underfilled and cured. A metallic lid and second level solder balls were attached to complete the flip chip ceramic BGA components. After every packaging step (flip chip solder ball reflow, underfill dispense and cure, lid attachment and adhesive cure), the sensor resistances were re-measured, so that the die stresses induced by each assembly operation could be characterized. Finally, CBGAs with the stress sensing chips were soldered to organic PCB test boards. A simulated heat sink loading was then applied, and the stresses were measured as a function of the clamping force. The heat sink clamping pressure distribution was monitored using in-situ resistive sensors in the TIM2 position between the lid and heat sink. The measured stress changes due to heat sink clamping where correlated with finite element simulations. With suitable detail in the models, excellent correlation has been obtained.


2007 ◽  
Vol 353-358 ◽  
pp. 2932-2935
Author(s):  
Yong Cheng Lin ◽  
Xu Chen ◽  
Xing Shen Liu ◽  
Guo Quan Lu

The reliability of solder joints in flip chip assemblies with both compliant (flex) and rigid (PCB) substrates was studied by accelerated temperature cycling tests and finite element modeling (FEM). In-process electrical resistance measurements and nondestructive evaluations were conducted to monitor solder joint failure behavior, hence the fatigue failure life. Meanwhile, the predicted fatigue failure life of solder joints was obtained by Darveaux’s crack initiation and growth models. It can be concluded that the solder joints in flip chip on flex assembly (FCOF) have longer fatigue life than those in flip chip on rigid board assembly (FCOB); the maximum von Mises stress/strain and the maximum shear stress/strain of FCOB solder joints are much higher than those of FCOF solder joints; the thermal strain and stress in solder joints is reduced by flex buckling or bending and flex substrate could dissipate energy that otherwise would be absorbed by solder joint. Therefore, the substrate flexibility has a great effect on solder joint reliability and the reliability improvement was attributed to flex buckling or bending during temperature cycling.


2015 ◽  
Vol 44 (10) ◽  
pp. 3957-3961 ◽  
Author(s):  
J. W. Jang ◽  
S. J. Yoo ◽  
H. I. Hwang ◽  
S. Y. Yuk ◽  
C. K. Kim ◽  
...  

2006 ◽  
Vol 21 (3) ◽  
pp. 698-702 ◽  
Author(s):  
Jae-Woong Nah ◽  
Fei Ren ◽  
Kyung-Wook Paik ◽  
K.N. Tu

Effect of electromigration on mechanical shear behavior of flip chip solder joints consisting of 97Pb3Sn and 37Pb63Sn composite solder joints was studied. The under bump metallurgy (UBM) on the chip side was TiW/Cu/electroplated Cu, and the bond pad on the board side was electroless Ni/Au. It was found that the mode of shear failure has changed after electromigration and the mode depends on the direction of electron flow during electromigration. The shear induced fracture occurs in the bulkof 97Pb3Sn solder without current stressing, however, after 10 h current stressing at 2.55 × 104 A/cm2 at 140 °C, it occurs alternately at the cathode interfaces between solder and intermetallic compounds (IMCs). In the downward electron flow, from the chip to substrate, the failure site was at the Cu–Sn IMC/solder interface near the Si chip. However, in the upward electron flow, from the substrate to chip, failure occurred at the Ni–Sn IMC/solder interface near the substrate. The failure mode has a strong correlation to microstructural change in the solder joint. During the electromigration, while Pb atoms moved to the anode side in the same direction as with the electron flow, Sn atoms diffused to the cathode side, opposite the electron flow. In addition, electromigration dissolves and drives Cu or Ni atoms from UBM or bond pad at the cathode side into the solder. These reactions resulted in the large growth of Sn-based IMC at the cathode sides. Therefore, mechanical shear failure occurs predominantly at the cathode interface.


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