p-Type electrical conduction and wide optical band gap in Mg-doped CuAlS2

2008 ◽  
Vol 58 (11) ◽  
pp. 1002-1005 ◽  
Author(s):  
Min-Ling Liu ◽  
Fu-Qiang Huang ◽  
Li-Dong Chen
Keyword(s):  
Band Gap ◽  
Electrical Conduction ◽  
Optical Band Gap ◽  
P Type ◽  
Mg Doped

Absorber Films of Antimony Chalcogenides via Chemical Deposition for Photovoltaic Application

2004 ◽  
Vol 836 ◽  
Author(s):  
M. T. S. Nair ◽  
Y. Rodríguez-Lazcano ◽  
Y. Peña ◽  
S. Messina ◽  
J. Campos ◽  
...  
Keyword(s):  
Thin Films ◽  
Band Gap ◽  
Optical Band Gap ◽  
Chemical Deposition ◽  
Dark Conductivity ◽  
Glass Substrates ◽  
Photovoltaic Application ◽  
Sodium Selenosulfate ◽  
P Type ◽  
Antimony Chalcogenides

ABSTRACTAntimony sulfide thin films (300 nm) have been deposited on glass substrates at 1–10°C from chemical bath. When heated these become crystalline and photoconductive with optical band gap (direct) of 1.7 eV. Thin films formed from chemical baths containing SbCl3 and sodium selenosulfate are of mixed phase Sb2O3/Sb2Se3, which when heated in the presence of Se-vapor converts to single phase Sb2Se3 film with optical band gap of 1.1 eV. Such films possess dark conductivity of 10-8 ohm-1cm-1 and show photosensitivity of two orders. Reaction of Sb2S3-CuS in nitrogen at 400°C produces crystalline, photoconductive p-type CuSbS2 with optical band gap (direct) of 1.5 eV. By controlling the deposition and heating condition, (i)Sb2S3-(p)CuSbS2 layer is formed, which is utilized in a photovoltaic structure, (n)CdS:In-(i)Sb2S3-(p)CuSbS2, with a Voc of 345 mV and Jsc 0.18 mA/cm2 under 1 kW m-2 tungsten halogen illumination. In the case of a structure, CdS:Cl-Sb2S3-Cu2-xSe, Voc of 350 mV and Jsc of 0.5 mA/cm2 are observed.

scholarly journals Effects of Sintering Atmosphere on the Optical, Thermal and Electrical Properties of Inkjet Printed ZnxCu(1-x)Fe2O4 Thin Films

2021 ◽  
Vol 81 (2) ◽  
pp. 25-35
Author(s):  
Lim Joon Hoong
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Seebeck Coefficient ◽  
Band Gap ◽  
Optical Band Gap ◽  
Electronic Band Structure ◽  
Copper Ferrite ◽  
Electronic Band ◽  
Sintering Atmosphere ◽  
P Type

The effects of sintering atmosphere on the optical, thermal and electric properties of inkjet printed ZnxCu(1-x)Fe2O4 thin films have been investigated. The thin film samples were sintered separately in vacuum and oxygen. The obtained samples were then characterized by X-ray diffraction (XRD), optical band gap, electrical conductivity, Seebeck coefficient and thermal conductivity. XRD analysis showed that the fabricated samples have a cubic spinel structure of zinc copper ferrite regardless of the sintering atmosphere. The electrical conductivity of ZnxCu(1-x)Fe2O4 thin films sintered in oxygen was about 5 % higher compared to ZnxCu(1-x)Fe2O4 thin films sintered in vacuum. The optical band gap shows that the samples sintered in oxygen had smaller band gap compared to samples sintered in vacuum. The electronic band structure simulated through ABINIT shows ZnxCu(1-x)Fe2O4 is an indirect band gap material. A smaller electronic band gap was observed in O2 rich condition and was in agreement with the optical band gap and electrical conductivity test results. Seebeck coefficient of ZnxCu(1-x)Fe2O4 thin films sintered in oxygen remained positive , confirming charge transport by hole carries as p-type semiconductors. A change from p-type to n-type semiconductors was observed when ZnxCu(1-x)Fe2O4 thin films sintered in vacuum.

Valency control of P-type a-SiC:H having the optical band gap more than 2.5 eV by electron-cyclotron resonance CVD (ECR CVD)

1987 ◽  
Vol 97-98 ◽  
pp. 1079-1082 ◽  
Author(s):  
Yutaka Hattori ◽  
Dusit Kruangam ◽  
Toshihiko Toyama ◽  
Hiroaki Okamoto ◽  
Yoshihiro Hamakawa
Keyword(s):  
Band Gap ◽  
Cyclotron Resonance ◽  
Optical Band Gap ◽  
Electron Cyclotron Resonance ◽  
Type A ◽  
Electron Cyclotron ◽  
P Type

THE INFLUENCE OF CARBON AND BORON ATOMS ON THE OPTICAL AND ELECTRICAL PROPERTIES OF THIN FILM a-Si:H

2006 ◽  
Vol 20 (25) ◽  
pp. 1591-1596 ◽  
Author(s):  
ISIK KARABAY
Keyword(s):  
Band Gap ◽  
Optical Band Gap ◽  
Chemical Vapor ◽  
Dark Conductivity ◽  
Window Layer ◽  
Optical And Electrical Properties ◽  
Research Plan ◽  
P Type ◽  
Gas Ratio ◽  
Made In

A series of undoped and p-doped a-SiC:H samples have been made in the framework of a research plan for obtaining high quality p-type window layers by "Plasma Enhanced Chemical Vapor Deposition (PECVD)" technique from the mixtures of silane ( SiH 4), methane ( CH 4) and diborane ( B 2 H 6) gases. For the optimization of the window layer, the dependence of the electrical (conductivity) and optical (band gap) properties due to altered ratios of methane and diborane gases were investigated. When the diborane gas ratio was changed from Y = 0.06 to Y = 0.24 with an increase of 0.06 steps at a constant of X = 0.948 methane gas ratio, the dark conductivity and optical band gap values changed from ~ 10-19 (Ω· cm )-1 to ~ 10-10 (Ω· cm )-1 and 2.542 eV to 2.178 eV, respectively, and between these values, the most appropriate layers can be selected.

Highly Conductive and Wide Band GaP Microcrystalline Silicon Films Prepared by Photochemical Vapor Deposition and Applications to Devices

1985 ◽  
Vol 49 ◽  
Author(s):  
S. Nishida ◽  
H. Tasaki ◽  
M. Konagai ◽  
K. Takahashi
Keyword(s):  
Band Gap ◽  
Optical Band Gap ◽  
Wide Band ◽  
Dark Conductivity ◽  
Hydrogen Gas ◽  
Microcrystalline Silicon ◽  
Wide Band Gap ◽  
Wide Gap ◽  
P Type ◽  
Photochemical Vapor Deposition

AbstractDoped hydrogenated microcrystalline silicon (μc-Si:H) and fluorinated hydrogenated microcrystalline (μc-Si:F:H) films were prepared by the mercury photosensitized decomposition of a disilane-hydrogen or a difluorosilane-hydrogen gas mixture, respectively. The maximum dark conductivity and optical band gap of μc-Si:H films were respectively 20 S•cm−1 and ∼2.0 eV for n-type and 1 S•cm−1 and 2.3 eV for p-type. A higher dark conductivity as much as 50 S•cm−1 and a wide gap of 2.0 eV were obtained for n-type μc-Si:F:H. It is most significant that the gaseous ratio of hydrogen to disilane should be enhanced to obtain such a highly conductive and wide gap film. The crystallinity of the photo-deposited μc-Si:H films appeared to be improved in comparison with that of films by the conventional plasma glow discharge technique.

Thin Film WSe2 for Use as a Photovoltaic Absorber Material

2014 ◽  
Vol 1670 ◽  
Author(s):  
Qinglei Ma ◽  
Hrachya Kyureghian ◽  
Joel D. Banninga ◽  
N. J. Ianno
Keyword(s):  
Thin Film ◽  
Band Gap ◽  
Optical Band Gap ◽  
Visible Spectrum ◽  
Absorber Material ◽  
Excellent Candidate ◽  
Earth Abundant ◽  
Type Semiconductor ◽  
Sputter Deposited ◽  
P Type

ABSTRACTAn excellent candidate for an earth abundant absorber material is WSe2 which can be directly grown as a p-type semiconductor with a band gap near 1.4 eV. In this work we present the structural, optical, and electrical properties of thin film WSe2 grown via the selenization of sputter deposited tungsten films. We will show that highly textured films with an optical band gap in range of 1.4 eV, and absorption coefficients greater than 105/cm across the visible spectrum can be easily achieved. In addition we will present Hall Effect and carrier density measurements as well, where will show densities in the 1017cm-3 range and p-type Hall mobilities greater than 10 cm2/V-s range can be obtained. We employ these results to numerically simulate solar cells based on this material, where we will show efficiencies greater than 20% are possible.

Effect of B Boping Concentration on the Properties of P-Type Hydrogenated Amorphous Silicon Thin Films

2011 ◽  
Vol 239-242 ◽  
pp. 247-251
Author(s):  
Wei Yuan Wang ◽  
Qing Nan Zhao ◽  
Wen Hui Yuan ◽  
Pu Lei Yang ◽  
Hong Yu Liang ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Band Gap ◽  
Doping Concentration ◽  
Optical Band Gap ◽  
Hydrogenated Amorphous Silicon ◽  
Chemical Vapor ◽  
Float Glass ◽  
B Doping ◽  
P Type ◽  
Hydrogenated Amorphous

P-type hydrogenated amorphous silicon films were deposited on float glass substrates by plasma enhanced chemical vapor deposition (PECVD). The effect of B doping concentration on the properties of the films was studied. The structure of the films was investigated by X-ray diffraction (XRD). The transmittance of the films was measured using an UV–Vis–NIR spectrophotometer in the wavelength range 200–2600nm.The film thickness was fitted by NKD-7000W optical thin film analysis system. The optical band gap of the films was obtained by the Tauc method. The conductivity of the films was tested by Electrometer Keithley 6517B. The results show that the optical band gap of the films changes from 1.93 eV to 1.65eV with the increase of B doping concentration, the highest conductivity of the film doped with 1.86% B2H6is 7.82 × 10-4S/cm.

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