scholarly journals Liquid-liquid interfaces: a unique and advantageous environment to both prepare and process thin films of complex materials

2021 ◽  
Author(s):  
Aldo J.G. Zarbin

Thin film technology is pervasive for many fields with high impact in our daily lives, which makes processing materials such as thin films a very important subject in materials science...

Author(s):  
E.L. Veera Prabakaran ◽  
K Senthil Vadivu ◽  
B Mouli Prasanth

Abstract Thin film sensors are used to monitor environmental conditions by measuring the physical parameters. By using thin film technology, the sensors are capable of conducting precise measurements. Moreover, the measurements are stable and dependable. Furthermore, inexpensive sensor devices can be produced. In this paper, thin film technology for the design and fabrication of sensors that are used in various applications is reviewed. Further, the applications of thin film sensors in the fields of biomedical, energy harvesting, optical, and corrosion applications are also presented. From the review, the future research needs and future perspectives are identified and discussed.


2003 ◽  
Vol 11 (5) ◽  
pp. 26-31 ◽  
Author(s):  
A. Sehgal ◽  
A. Karim ◽  
C. Stafford ◽  
M. Fasolka

Combinatorial and high-throughput (C&HT) approaches accelerate research by addressing multiple experimental parameters in a parallel or otherwise highly efficient fashion. First used by the pharmaceutical industry for product discovery, the C&HT paradigm is being extended to the study of complex materials systems that require measurements of properties and phenomena over a huge number of conditions. As with traditional materials science, microscopy and imaging of morphology are essential for C&HT materials research.


2021 ◽  
Author(s):  
Edwin Acosta

Since its discovery in early times, thin films rapidly found industrial applications such as in decorative and optics purposes. With the evolution of thin film technology, supported by the development of vacuum technology and electric power facilities, the range of applications has increased at a level that nowadays almost every industrial sector make use of them to provide specific physical and chemical properties to the surface of bulk materials. The possibility to tailor the film properties through the variation of the microstructure via the deposition parameters adopted in a specific deposition technique has permitted their entrance from the simplest like protective coatings against wear and corrosion to the most technological advanced applications such as microelectronics and biomedicine, recently. In spite of such impressive progress, the connection among all steps of the thin film production, namely deposition parameters-morphology and properties, is not fully accurate. Among other reasons, the lack of characterization techniques suitable for probing films with thickness less than a single atomic layer, along with a lack of understanding of the physics have impeded the elaboration of sophisticated models for a precise prediction of film properties. Furthermore, there remain some difficulties related to the large scale production and a relative high cost for the deposition of advanced structures, i.e. quantum wells and wires. Once these barriers are overcome, thin film technology will become more competitive for advanced technological applications.


Processes ◽  
2021 ◽  
Vol 9 (2) ◽  
pp. 298
Author(s):  
Keith J. Stine

The field of thin film technology [...]


1992 ◽  
Vol 268 ◽  
Author(s):  
Yasunori Taga

ABSTRACTThe thin film processes of the sputter deposition method have been reviewed with special emphasis on the effects of kinetic energy of sputtered particles and ion bombardment during deposition on thin film properties. An overview is first given to describe the thin film process and ion-surface interactions, where the methods of measuring the energy distribution of sputtered ions and the anisotropic-emission-effect sputter deposition are presented. Experimental results for Cr, SiO2 and Ni-Si-B films are presented, and the correlation between the structure and properties of the thin films is discussed. Research in modification of thin films by energetic atoms and ions is an exciting area of materials science in the future.


MRS Bulletin ◽  
1992 ◽  
Vol 17 (7) ◽  
pp. 25-27 ◽  
Author(s):  
John C. Bravman ◽  
William D. Nix

The use of materials based on their mechanical behavior has moderated key aspects of the development of civilization. Starting perhaps with stone and wood, used more or less in forms provided directly by nature, progressing to the ferrous metallurgies that gave birth to the entire industrial revolution, and continuing with today's exotic high-strength, light-weight alloys and composites, materials have frequently been selected to fulfill the structural engineering needs of designers, builders, and inventors. Following these trends, studies of the mechanical behavior of solids, once the exclusive purview of blacksmiths and artisans, came to occupy the attention of scientists and engineers worldwide, and were foundational to the modern discipline of materials science and engineering.In this issue of the MRS Bulletin, we have selected five articles that highlight the intellectual coupling of traditional mechanical behavior investigations with the use of materials in thin film forms. Such a coupling is not entirely new. In an ASM-sponsored seminar held in 1963, for instance, one of the papers presented was entitled simply “Mechanical Properties of Thin Films.” Within the last decade, however, and due largely to developments within the microelectronic and magnetic disk industries, awareness of the need to predict, control, and understand the mechanical behavior of thin film media has grown rapidly. Many of the most important failure mechanisms operative in integrated circuits, for example, such as stress and electromigration voiding, are mechanical in nature.


1995 ◽  
Vol 401 ◽  
Author(s):  
M. Yoshimoto ◽  
T. Maeda ◽  
T. Ohnishi ◽  
G. H. Lee ◽  
H. Koinuma

AbstractAdvanced thin film technology based on laser MBE has enabled us to control the molecular layer-by-layer epitaxial growth and interface structure of oxide thin films in an atomic scale. Molecular layer epitaxy of oxide thin film growth was verified from in situ monitoring of intensity oscillation in reflection high energy electron diffraction (RHEED). Advanced oxide thin film technology was applied to form oxide superlattices for quantum functional oxides and to achieve lattice-matched heteroepitaxy in oxide films on silicon substrate for all epitaxial oxide/silicon hybrid devices. The key factors to develop oxide lattice engineering are discussed with respect to not only in situ monitoring of growth process using RHEED but also atomic regulation of the substrate surface by atomic force microscopy and ion scattering spectroscopy.


Author(s):  
Vinod Kumar Gupta ◽  
S.B. Shrivastava ◽  
Geeta Bhatia

Environmental conservation is a challenge to the mankind. The measures to check it must be easy to use, cheap and eco friendly. Thin film technology is providing answers to some of these problems. Nanostructured thin films of metal oxide are used in solar cells, semi permeable membrane, protective coatings, electronic devices, optoelectronics etc. Recently thin films have been developed to be used in different fields of environment. These include gas sensors, nanofilters etc. A brief review of the work done in this field is given in this paper.


2018 ◽  
Vol 7 (6) ◽  
pp. 433-451 ◽  
Author(s):  
HO SOONMIN

Thin film technology is getting huge attention across the world due to its wide applications. Deposition of thin films involves creation, transportation and condensation of target materials with thickness varying from few nanometers to several microns onto the substrate. This review will highlight thin film depositing techniques which consist of non-vacuum and vacuum based deposition method. Besides this, thin films and their applications in gas sensing and corrosion protection have also been discussed.


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