scholarly journals Corrosion resistance evaluation of carbon and vanadium-based sputtered coatings on steel substrates

2022 ◽  
Vol 2153 (1) ◽  
pp. 012008
Author(s):  
C Vera ◽  
R Sorzano ◽  
L Ardila ◽  
G Orozco ◽  
W Aperador
Keyword(s):  
Physical Vapor Deposition ◽  
Material Surface ◽  
Carbon Target ◽  
Corrosion Rates ◽  
Relevant Effect ◽  
Deposition Parameters ◽  
Target Power ◽  
Potential Alternative ◽  
Factorial Design Of Experiments ◽  
Steel Substrates

Abstract Steels are in constant contact with fluids that could generate corrosion regardless the application in which this steel is located. AISI-SAE 1045 like steels is widely used in different applications in engineering, even several of these parts made of this steel suffers wear processes. The synergy between corrosion and wear phenomena exacerbates the detriment of some physical properties of the material conducing it to a failure. A potential alternative to avoid this issue is to coat the material surface with an anticorrosive material, and among different techniques to produce coatings, physical vapor deposition ones are environmentally friendly, secure and with excellent properties on the final product. We report the production of coatings based on vanadium and carbon on AISI-SAE 1045 steels substrates varying some of the deposition parameters in a sputtering coatings machine. A 23-factorial design of experiments was done with power applied to the vanadium target, power applied to the carbon target and temperature as active factors with two levels each one. A relevant effect of the power applied to V target and temperature on the anticorrosive properties of the coatings was found, thus increasing these factors levels always gives higher surface roughness and higher corrosion rates, this result together provides an important insight into the values that must be considered to achieve good anticorrosive properties on the material. Overall, these results indicate that with low V target power and room temperature, and high C target power the lowest corrosion rates and roughness of the group are achieved, both results agree.

Novel Multilayer Process for CuInSe2 Thin Film Formation by Rapid Thermal Processing

1997 ◽  
Vol 485 ◽  
Author(s):  
Chih-hung Chang ◽  
Billy Stanbery ◽  
Augusto Morrone ◽  
Albert Davydov ◽  
Tim Anderson
Keyword(s):  
Thermal Processing ◽  
Physical Vapor Deposition ◽  
Film Formation ◽  
Rapid Thermal Processing ◽  
Precursor Film ◽  
Bilayer Structure ◽  
X Ray Diffraction ◽  
X Ray ◽  
Deposition Parameters ◽  
Cuinse2 Thin Film

AbstractCuInSe2 thin films have been synthesized from binary precursors by Rapid Thermal Processing (RTP) at a set-point temperature of 290°C for 70 s. With appropriate processing conditions no detrimental Cu2-xSe phase was detected in the CIS films. The novel binary precursor approach consisted of a bilayer structure of In-Se and Cu-Se compounds. This bilayer structure was deposited by migration enhanced physical vapor deposition at a low temperature (200°C) and the influence of deposition parameters on the precursor film composition was determined. The bilayer structure was then processed by RTP and characterized for constitution by X-ray diffraction and for composition by Wavelength Dispersive X-ray Spectroscopy.

The Effect of Deposition Parameters on the Structural and Mechanical Properties of BN Coatings Deposited onto High-Speed Steel by the PLD Method

2015 ◽  
Vol 220-221 ◽  
pp. 737-742
Author(s):  
Krzysztof Gocman ◽  
Tadeusz Kałdoński ◽  
Waldemar Mróz ◽  
Bogusław Budner
Keyword(s):  
Mechanical Properties ◽  
High Speed ◽  
High Speed Steel ◽  
Rf Discharge ◽  
Internal Stresses ◽  
Force Microscopy ◽  
Gas Nitriding ◽  
Atomic Force ◽  
Deposition Parameters ◽  
Steel Substrates

Boron nitride coatings have been deposited onto high-speed steel substrates using pulsed laser deposition technique combined with RF-discharge. In order to improve adhesion and reduce internal stresses, substrates were subjected to gas nitriding. The structure and morphology of coatings were investigated applying atomic force microscopy (AFM) and FTIR spectroscopy. Nanohardness and elastic modulus were examined employing a nanoanalyzer (CETR). On the basis of the conducted experiments, stable, crystalline, multiphase coatings have been obtained. It has been proved that morphology, structure and mechanical properties strongly depend on the parameters of the PLD process; in particular, the temperature of the substrate has a crucial influence on the properties of BN coatings.

Low target power wafer sputtering regime identified during magnetron tantalum barrier physical vapor deposition

2005 ◽  
Vol 98 (2) ◽  
pp. 024904 ◽  
Author(s):  
Phillip J. Stout ◽  
Dean J. Denning ◽  
Lynne M. Michaelson ◽  
Sandeep Bagchi ◽  
Da Zhang ◽  
...  
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Target Power

scholarly journals The Effect of the Formation of Superelastic NiTi Phase on Static and Dynamic Corrosion Performance of Ni-P Coating

Solids ◽  
2021 ◽  
Vol 2 (3) ◽  
pp. 278-292
Author(s):  
Zhi Li ◽  
Zoheir Farhat
Keyword(s):  
Corrosion Resistance ◽  
Composite Coatings ◽  
Corrosion Performance ◽  
Abrasive Particles ◽  
Aggressive Environment ◽  
Corrosion Rates ◽  
Niti Phase ◽  
Order Of Magnitude ◽  
Steel Substrates ◽  
Static Corrosion

The addition of superelastic NiTi particles is a great benefit to the toughness of the Ni-P coating. Nonetheless, NiTi nanopowder costs 10 times more than Ti nanopowder. Therefore, in the present study, to reduce the cost, Ni-P-NiTi composite coatings were prepared on AISI 1018 steel substrates by the electroless incorporation of Ti nanoparticles into Ni-P followed by the annealing of Ni-P-Ti coatings. The effect of the formation of a superelastic NiTi phase on static and dynamic corrosion performance was investigated. It was found that the annealed Ni-P-Ti coating (i.e., Ni-P-NiTi coating) has much higher static corrosion resistance than the as-deposited Ni-P coating. The dynamic corrosion rates in the absence of abrasive particles are 10 times higher than the static corrosion rates of the coatings. The dynamic corrosion rates in the presence of abrasive particles are one order of magnitude higher than the dynamic corrosion rates in the absence of abrasive particles. The formation of a superelastic NiTi phase considerably improved the static and dynamic corrosion performance of the Ni-P coating. In the absence of abrasive particles under flowing condition, the dynamic corrosion resistance of the annealed Ni-P-Ti coating (i.e., Ni-P-NiTi coating) is 19 times higher than that of the as-deposited Ni-P coating. In the most aggressive environment (in the presence of abrasive particles), the dynamic corrosion resistance of the annealed Ni-P-Ti coating (i.e., Ni-P-NiTi coating) is four times higher than that of the as-deposited Ni-P coating. The annealed Ni-P-Ti coating (i.e., Ni-P-NiTi coating) can be used in applications where high corrosion resistance is required, especially in an extremely aggressive environment.

A Detailed Study of the Synthesis of Bismuth Thin Films by PVD-Methods and their Structural Characterization

2012 ◽  
Vol 1477 ◽  
Author(s):  
Enrique Camps ◽  
Sandra E. Rodil ◽  
J. Antonio Salas ◽  
Horacio V. Estrada
Keyword(s):  
Thin Films ◽  
Physical Vapor Deposition ◽  
Thermal Evaporation ◽  
Synthesis Method ◽  
Crystallographic Structure ◽  
Silicon Substrates ◽  
Flexible Films ◽  
Deposition Parameters ◽  
Sputtering Power ◽  
Complete Study

ABSTRACTA comprehensive and rather complete study for the synthesis of Bismuth thin-films using physical vapor deposition (PVD) techniques aimed at identifying key features of their crystallographic structure and morphology/topography, as a function of the synthesis method is presented. These films were deposited on oxidized and non-oxidized polished silicon substrates, glass-plates and polyimide flexible films, by thermal evaporation (resistive boat and e-beam) DC- and RF-magnetron assisted sputtering, and pulsed laser (ablation) deposition (PLD). The synthesis was performed controlling the main deposition parameters of these methods.XRD-spectra conclusively indicate that the films can be preferentially oriented along the [003] or [012] Bi-structure’s directions, depending on the source-to- substrate (STS)-distance, sputtering power, substrate’s temperature and PLD ion’s kinetic energy. It is also concluded that a relatively short STS-distance results in a rather polycrystalline structure, near independent to the used sputtering power.

INFLUENCE OF NITROGEN FLOW RATE IN REDUCING TIN MICRODROPLETS ON BIOMEDICAL TI-13ZR-13NB ALLOY

2016 ◽  
Vol 78 (5-10) ◽  
Author(s):  
Arman Shah ◽  
S. Izman ◽  
M. A. Hassan
Keyword(s):  
Flow Rate ◽  
Physical Vapor Deposition ◽  
Gas Flow ◽  
Detrimental Effect ◽  
Gas Flow Rate ◽  
X Ray Diffraction ◽  
Tin Coating ◽  
Nitrogen Gas ◽  
Deposition Parameters ◽  
Cathodic Arc

Cathodic arc physical vapor deposition (CAPVD) is one of the promising techniques that have a potential to coat titanium nitride (TiN) on biomedical implants due to its good adhesion and high evaporation rate. However, this method emits microdroplets which have the possible detrimental effect on the coating performance. Past studies indicated that micro droplets can be controlled through proper deposition parameters. In the present work, an attempt was made to study the effect of nitrogen gas flow rates (100 to 300 sccm) on TiN coating of the Ti-13Zr-13Nb biomedical alloy. Scanning electron microscopy (SEM) was used to evaluate surface morphology and coating thickness while crystal phase of the coated substrates was determined using X-Ray Diffraction (XRD). Image analysis software was employed to quantify microdroplets counts. Results show that higher nitrogen gas flow rate able to decrease a significant amount of microdroplets and concurrently increase the thickness of TiN coating. A mixed crystal planes of (111) and (220) are obtained on the coated substrates at this setting which exhibits denser structure with higher adhesion strength as compared to substrates coated at the lower N2 gas flow rate.

AES CHARACTERIZATION OF CONSTITUENTS’ OXIDATION STATE IN SPECTRALLY SELECTIVE TITANIUM-OXYNITRIDE COATINGS ON METALS FOR HIGH EFFICIENT SOLAR ABSORBERS

2019 ◽  
Vol 27 (03) ◽  
pp. 1950120
Author(s):  
DARJA STEINER PETROVIČ ◽  
ANKA TRAJKOVSKA PETKOSKA ◽  
ILIJA NASOV ◽  
DJORDJE MANDRINO
Keyword(s):  
Oxidation State ◽  
Physical Vapor Deposition ◽  
Solar Absorbers ◽  
Spectral Selectivity ◽  
Spectrally Selective ◽  
Deposition Parameters ◽  
High Efficient ◽  
Cu Substrates ◽  
Oxynitride Coatings

In this study, a surface-sensitive Auger Electron Spectroscopy (AES) was used to comprehensively characterize titanium-oxynitride coatings on metals for high efficient solar absorbers. Primary information obtained from the AES is chemical composition, but chemical state of the elements may also be estimated. Corroborative information about the coating’s structure was obtained from the estimate of Cu, Al and Ti oxidation state vs depth, also derived from the AES data. Ti/(O [Formula: see text] N) concentration ratios vs depth in TiOXNY layer of the coatings on the Al and Cu substrate were also determined. Physical Vapor Deposition (PVD) was used to prepare TiOXNY multilayered on Al and Cu substrates. Individual layer’s depth was in submicron domain. Deposition procedure and corresponding deposition parameters are presented. Optical properties (emittance, absorptance) of the coatings on both substrate types were also measured to confirm that coatings performed well their intended function (i.e. spectral selectivity).

Investigations of the effect of (Cr1−x, Alx)N coatings’ micro Structure on Impact Toughness

2004 ◽  
Vol 843 ◽  
Author(s):  
K. Bobzin ◽  
E. Lugscheider ◽  
O. Knotek ◽  
M. Maes
Keyword(s):  
Wear Resistance ◽  
Impact Toughness ◽  
Physical Vapor Deposition ◽  
Test Methods ◽  
Coated Materials ◽  
Novel Approach ◽  
Deposition Parameters ◽  
Impact Tester ◽  
The Impact ◽  
Load Behavior

ABSTRACTOriginated from the tooling industry, PVD (Physical Vapor Deposition) coating development focused on increasing the wear resistance. Nowadays, a steadily increasing market is evolving by coating machine parts. The requirements that have to be met due to the needs of this new market segment focus on tribological behavior. This means, that the focus of wear resistance is shifted towards properties like coefficient of friction, wetting behavior and the response of coatings towards dynamic loads. For many tribological applications, coatings are exposed to severe alternating loads, which are usually left out in common test methods. The approach of common coating test methods are based on the static behavior of deposited coatings. The impact tester is a testing device with a novel approach to dynamic load behavior of both bulk and coated materials. In this paper, the effect of the coatings' microstructure and Young's modulus on the impact toughness was investigated. A change in microstructure was provoked by changing deposition parameters like aluminum content. In a second stage these coatings were then tested with respect to their response to high alternating loads. For this purpose both load and number of impacts were varied.

The Influence of Electrodes Deposition on the Interface and Dielectric Characteristics of Polymer Gate for Thin Films Transistors

2017 ◽  
Vol 1143 ◽  
pp. 227-232
Author(s):  
Elena Emanuela Herbei ◽  
Michael P.M. Jank ◽  
Susanne Oertel ◽  
Laurentiu Frangu ◽  
Viorica Mușat
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Deposition Rate ◽  
Physical Vapor Deposition ◽  
Metal Electrode ◽  
Electrical Performance ◽  
Pmma Film ◽  
Pmma Layer ◽  
Deposition Parameters ◽  
Dielectric Performance

The paper presents some results on the effect of the metal electrode deposition on the electrical performance of amorphous polymthylmetacrylate (PMMA) thin films, measured in a MIM structure consisting of metal (Al)-insulator (PMMA)-metal (Ta). Aluminium (Al) electrode was deposited by physical vapor deposition method (PVD) on the top of PMMA film with the deposition rate of 5 and 10Å/s. The effect of aluminium deposition rate and post deposition annealing temperature on the morphology of the interface between Al electrode (100 or 300 nm thick) and PMMA thin film (40 or 70 nm thick) has been investigated by cross-section scanning electron microscopy (SEM). Based on SEM data, I-V characteristic measurements and dielectric constant values of insulating films, the deposition parameters of Al top-electrode was optimised. Our results showed that when the deposition of the Al electrode take place at a rate of 10 Å/s, no inter-diffusion or interfacial reaction at the interface between Al electrode and PMMA films were observed and the best delectric parameters of PMMA thin film were measured, which led to the best dielectric performance of PMMA layer in TFT configuration.

Sign in / Sign up

Export Citation Format

Share Document