CuxSbySz THIN FILMS PRODUCED BY ANNEALING CHEMICALLY DEPOSITED Sb2S3-CuS THIN FILMS

2001 ◽  
Vol 15 (17n19) ◽  
pp. 667-670 ◽  
Author(s):  
Y. RODRÍGUEZ-LAZCANO ◽  
M. T. S. NAIR ◽  
P. K. NAIR
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Optical Band Gap ◽  
Deposition Method ◽  
Photovoltaic Devices ◽  
Large Area ◽  
Electrical And Optical Properties ◽  
Ternary Compounds ◽  
Glass Substrates ◽  
Different Temperatures

The possibility of generating ternary compounds through annealing thin film stacks of binary composition has been demonstrated before. In this work we report a method to produce large area coating of ternary compounds through a reaction in solid state between thin films of Sb2S3 and CuS. Thin films of Sb2S3 -CuS were deposited on glass substrates in the sequence of Sb2S3 followed by CuS (on Sb2S3 ) using chemical bath deposition method. The multilayer stack, thus produced, of approximately 0.5 μm in thickness, where annealed under nitrogen and argon atmospheres at different temperatures to produce films of ternary composition, CuxSbySz . An optical band gap of ~1.5 eV was observed in these films, suggesting that the thin films of ternary composition formed in this way are suitable for use as absorber materials in photovoltaic devices. The results on the analyses of structural, electrical and optical properties of films formed with different combinations of thickness in the multilayers will be discussed in the paper.

scholarly journals Optical and Electrical Properties of Thin Films of CuS Nanodisks Ensembles Annealed in a Vacuum and Their Photocatalytic Activity

2013 ◽  
Vol 2013 ◽  
pp. 1-9 ◽  
Author(s):  
J. Santos Cruz ◽  
S. A. Mayén Hernández ◽  
F. Paraguay Delgado ◽  
O. Zelaya Angel ◽  
R. Castanedo Pérez ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Hydrogen Peroxide ◽  
Photocatalytic Activity ◽  
Electrical Properties ◽  
Absolute Temperature ◽  
Glass Substrates ◽  
Transmission Electron ◽  
Different Temperatures ◽  
Blue Solution

Effects on the optical, electrical, and photocatalytic properties of undoped CuS thin films nanodisks vacuum annealed at different temperatures were investigated. The chemical bath prepared CuS thin films were obtained at 40°C on glass substrates. The grain size of13.5±3.5 nm was computed directly from high-resolution transmission electron microscopy (HRTEM) images. The electrical properties were measured by means of both Hall effect at room temperature and dark resistivity as a function of the absolute temperature 100–330 K. The activation energy values were calculated as 0.007, 0.013, and 0.013 eV for 100, 150, and 200°C, respectively. The energy band gap of the films varied in the range of 1.98 up to 2.34 eV. The photocatalytic activity of the CuS thin film was evaluated by employing the degradation of aqueous methylene blue solution in the presence of hydrogen peroxide. The CuS sample thin film annealed in vacuum at 150°C exhibited the highest photocatalytic activity in presence of hydrogen peroxide.

Absorber Films of Ag2S and AgBiS2 prepared by Chemical Bath Deposition

2002 ◽  
Vol 730 ◽  
Author(s):  
A. Nuñez Rodriguez ◽  
M.T.S. Nair ◽  
P.K. Nair
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Electrical Conductivity ◽  
Silver Nitrate ◽  
Band Gap ◽  
Chemical Bath Deposition ◽  
Optical Band Gap ◽  
Sodium Thiosulfate ◽  
Xrd Pattern ◽  
Glass Substrates

AbstractAg2S thin films of 90 nm to 300 nm in thickness were deposited at 70°C on glass substrates immersed in a bath mixture containing silver nitrate, sodium thiosulfate and dimethylthiourea. When the films are heated in nitrogen at temperatures 200°C to 400°C, crystallinity is improved and XRD pattern similar to that of acanthite is observed. These films possess electrical conductivity of 10-3 (ohm cm)-1, are photoconductive and exhibit an optical band gap of 1.36 eV. When Ag2S thin film is deposited over a thin film of Bi2S3, also obtained by chemical bath deposition from bismuth nitrate, triethanolamine and thioacetamide, and heated at 300°C to 400°C in nitrogen, a ternary compound, AgBiS2 is formed. This material has an electrical conductivity of 5x10-5 (ohm cm)-1, is photoconductive and possesses optical band gap 0.95 eV.

scholarly journals Effect of Different Deposition Power of In2O3Target on the Characteristics of IGZO Thin Films Using the Cosputtering Method

2014 ◽  
Vol 2014 ◽  
pp. 1-7 ◽  
Author(s):  
Shang-Chao Hung ◽  
Kin-Tak Lam ◽  
Cheng-Fu Yang ◽  
Yu-Jhen Liou
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Deposition Time ◽  
Optical Band Gap ◽  
Transparent Electrode ◽  
Amorphous Structure ◽  
Electrical And Optical Properties ◽  
Glass Substrates ◽  
Deposition Power ◽  
Sputtering System

The (In, Ga, Zn)Ox(IGZO) thin films were deposited on glass substrates using cosputtering method in radio frequency magnetron sputtering system. Zn2Ga2O5(Ga2O3-2 ZnO, GZO) and In2O3ceramics were used as targets and dual guns were used to deposit the IGZO thin films. Deposition power of GZO target was 80 W and deposition power of pure In2O3target was changed from 70 W to 100 W, and the deposition time was 30 min. The effect of deposition power of In2O3target on the crystalline, surface, electrical, and optical properties of the IGZO thin films was investigated at room temperature in a pure Ar atmosphere. The cosputtered IGZO thin films showed a very smooth and featureless surface and an amorphous structure regardless of the deposition power of In2O3target due to the room temperature sputtering process. However, the cosputtered IGZO thin films exhibited transparent electrode properties because they had high transmittance ratio and low resistivity. The value variations in the optical band gap(Eg)values of the IGZO thin film were evaluated from the plots of(αhν)2=c(hν-Eg). We would also show that the deposition power of In2O3target would have a large effect on mobility andEgvalue of the IGZO thin films.

Properties of TiO2 Thin Film Prepared by Sol-Gel Dip Coating

2015 ◽  
Vol 723 ◽  
pp. 528-531
Author(s):  
Jun Wang ◽  
Ling Yun Bai
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Refractive Index ◽  
Optical Properties ◽  
Band Gap ◽  
Optical Band Gap ◽  
Sol Gel ◽  
Dip Coating ◽  
Gel Method ◽  
Glass Substrates

TiO2 thin films were prepared on glass substrates by sol-gel method. The effect of withdraw speed on the thickness and optical properties of TiO2 thin films was investigated. The films were transparent in the visible wavelength. The thickness of the TiO2 films was increased from 90 nm for the withdraw speed of 1000 μm/s to 160 nm for the withdraw speed of 2000 μm/s. While, The refractive index of the TiO2 thin film decreased from 2.38 to 2.07. It may be due to the porosity of the film was increased. The optical band-gap of the films was around 3.45 eV.

The Fabrication of Titanium Dioxide (TiO2) Thin Film via Deposited Spray Pyrolysis Using for Antibacterial Applications

2015 ◽  
Vol 804 ◽  
pp. 183-186
Author(s):  
Prapon Lertloypanyachai ◽  
Eakgapon Kaewnuam ◽  
Krittiya Sreebunpeng
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Titanium Dioxide ◽  
Spray Pyrolysis ◽  
Uv Light ◽  
Spray Pyrolysis Technique ◽  
Low Cost ◽  
Large Area ◽  
Bacteria Growth ◽  
Glass Substrates

Titanium dioxide (TiO2) is coated onto the materials (e.g.glass ceramic) to inhibit the bacteria growth. TiO2has become a popular photocatalyst for both air and water purification. It has also shown to be very active for bacterial destruction even under UV light. The photocatalytic of TiO2involves the light-induced catalysis of reducing and oxidizing reactions on the surface of materials. The spray pyrolysis technique for material synthesis in thin-film configuration is an interesting option due to the use of inexpensive precursor materials and low-cost equipment suitable for large-area coatings. In this research, TiO2thin films were deposited onto glass substrates using spray pyrolysis technique. Escherichia coli (E.coli) was used as testing bacteria. TiO2thin films showed some antibacterial effect in the halo test.

scholarly journals Effect of Annealing on the Nanostructure Formation in Alkoxy Substituted Phthalocyanine Thin Films

2012 ◽  
Vol 9 (4) ◽  
pp. 1992-1999
Author(s):  
Vinu. T. Vadakel ◽  
C. S. Menon
Keyword(s):  
Thin Films ◽  
Band Gap ◽  
Annealing Temperature ◽  
Optical Band Gap ◽  
Band Gap Energy ◽  
Sem Images ◽  
Glass Substrates ◽  
Heat Treated ◽  
Different Temperatures ◽  
Post Deposition

Vacuum deposited 2,3,9,10,16,17,23,24-octakis (octyloxy) phthalocyanine (H2PcOC8) thin films on glass substrates have exhibited a change on their surface morphology with the post deposition annealing temperature under normal atmosphere. These films have been characterized by optical absorptions and Scanning Electron Microscopy. SEM images also have shown nano-rod like structures for the samples annealed at different temperatures. The variation of optical band gap with annealing temperature is determined. The direct and allowed optical band gap energy has been evaluated from the α2versus hυ plots. The electrical conductivity of the films at various heat treated samples are also studied. The activation energies are determined from the Arrhenius plots of lnσ versus 1000/T . It shows variation with the annealing temperature.

Production of InSb Thin Films Through Annealing Sb2S3-In Thin Films

1999 ◽  
Vol 573 ◽  
Author(s):  
M. T. S. Nair ◽  
Y. Rodríguez-Lazcano ◽  
P. K. Nair
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Indium Antimonide ◽  
Single Phase ◽  
Nitrogen Atmosphere ◽  
X Ray Diffraction ◽  
Large Area ◽  
Electrical And Optical Properties ◽  
Insb Thin Films ◽  
The Individual

ABSTRACTA method to produce large area indium antimonide thin films through a reaction, Sb2S3 + 2 In → 2 InSb + 3 S↑ is presented. A thin film of Sb2S3 with typically 0.2 μm thickness is produced on glass substrate by chemical bath deposition (CBD) at 10°C using thiosulfatoantimonate(III) complex. Subsequently, a thin film of indium is deposited on the Sb2S3 film by thermal evaporation. Annealing the thin film stack of Sb2S3-In at 300°C in a nitrogen atmosphere produces the InSb thin film. The formation of this film is confirmed by x-ray diffraction studies. We would discuss the optimization of the individual film thickness in the Sb2S3-In stack to produce a thin film of single phase InSb or a heterostructure, Sb2S3-InSb. The electrical and optical properties of the films are presented.

Effect of Annealing on the Structural Electrical and Optical Properties of CdSe Thin Films

2018 ◽  
Vol 24 (8) ◽  
pp. 5700-5702
Author(s):  
T. C. M Santhosh ◽  
Kasturi V Bangera ◽  
G. K Shivakumar
Keyword(s):  
Thin Films ◽  
Optical Band Gap ◽  
Hexagonal Structure ◽  
Annealing Duration ◽  
X Ray Diffraction ◽  
Electrical And Optical Properties ◽  
X Ray ◽  
Glass Substrates ◽  
Post Deposition ◽  
Absorption Measurements

CdSe thin films have been deposited on glass substrates at 453 K and subjected to post-deposition annealing. The effect of annealing on the properties of thermally evaporated CdSe thin films has been studied in detail. Structural and compositional studies have been carried out using X-ray diffraction, scanning electron microscopy (SEM) and energy dispersive analysis of X-ray (EDX) techniques. It is observed that as-deposited CdSe as well as annealed CdSe thin films exhibits hexagonal structure. The grain size was found to increase marginally with an increase in the annealing duration. The optical band gap of the grown films was evaluated from absorption measurements found to be 1.67 eV. An improvement in photoconductivity has been observed for annealed films.

scholarly journals Effects of Annealing Temperature of TiO2 Thin Film Deposited by Spray Pyrolysis Deposition Method for Dye-Sensitized Solar Cell (DSSC) Application

2015 ◽  
Vol 773-774 ◽  
pp. 662-666
Author(s):  
Noor Kamalia Abd Hamed ◽  
Nur Ain Adam ◽  
Mohd Khairul bin Ahmad
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Spray Pyrolysis ◽  
Annealing Temperature ◽  
Dye Sensitized Solar Cell ◽  
Deposition Method ◽  
Optimum Temperature ◽  
Dye Sensitized ◽  
Spray Pyrolysis Deposition ◽  
Different Temperatures

Titaniumdioxide (TiO2) Thin Films Have been Fabricated and Deposited on Ftoglass Substrates by Spray Pyrolysis Deposition (SPD) Method. the TiO2thin Films were Annealed at Four Different Temperatures for an Hour. Thetemperature was Set at 100°C, 300°C, 400°C and 500°C. Surface Morphology Andelectrical Properties of TiO2 Thin Films were Investigated Usingfesem and 2 Point- Probe I-V Measurement, Respectively. the FESEM Result Shows Thatthe Grain Size of the Tio2 increases when Annealed Temperatureincreases. for XRD Test Shows that the Crystallinity Improved with Theincreasing of Annealing Temperature. when the Annealing Temperature Increases,the Electrical Properties of TiO2 Also Change. the Result Shows Thatthe Optimum Temperature for Annealing of TiO2 Thin Film was 400°C.

ON THE STRUCTURE, ELECTRICAL AND OPTICAL PROPERTIES OF TiO2 SPUTTERED THIN FILMS

2006 ◽  
Vol 13 (01) ◽  
pp. 87-92 ◽  
Author(s):  
A. ASHOUR
Keyword(s):  
Thin Films ◽  
Optical Constants ◽  
Optical Band Gap ◽  
Optical Transmittance ◽  
X Ray Diffraction ◽  
Electrical And Optical Properties ◽  
X Ray ◽  
Lattice Constants ◽  
Glass Substrates ◽  
Deposited Films

Titanium oxide thin films were prepared by sputtering technique onto glass substrates at room temperature (RT). The structure of the films was confirmed using X-ray diffraction (XRD) and revealed the stoichiometry with an O and Ti ratio of 2. The deposited films at RT were found to be amorphous and the films annealed at 300 and 400°C for 2 h were crystalline with orthorhombic structure. The lattice constants and grain size of the film are calculated. The electrical resistivity was found to depend on the film thickness and decreased with increasing the film thicknesses. The optical constants of the films such as the refractive index, extinction coefficient, and absorption coefficient were also determined using the optical transmittance measurements, and the results were discussed. The optical band gap varies from 3.2 to 3.5 eV as a function of oxygen/argon ratios.

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