scholarly journals The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiOxHigh-Entropy Alloy Oxide Thin Films

2015 ◽  
Vol 2015 ◽  
pp. 1-6 ◽  
Author(s):  
Chun-Huei Tsau ◽  
Zhang-Yan Hwang ◽  
Swe-Kai Chen

The (Al, Cr, Ti)FeCoNi alloy thin films were deposited by PVD and using the equimolar targets with same compositions from the concept of high-entropy alloys. The thin films became metal oxide films after annealing at vacuum furnace for a period; and the resistivity of these thin films decreased sharply. After optimum annealing treatment, the lowest resistivity of the FeCoNiOx, CrFeCoNiOx, AlFeCoNiOx, and TiFeCoNiOxfilms was 22, 42, 18, and 35 μΩ-cm, respectively. This value is close to that of most of the metallic alloys. This phenomenon was caused by delaminating of the alloy oxide thin films because the oxidation was from the surfaces of the thin films. The low resistivity of these oxide films was contributed to the nonfully oxidized elements in the bottom layers and also vanishing of the defects during annealing.

2016 ◽  
Vol 665 ◽  
pp. 86-92 ◽  
Author(s):  
A. GuruSampath Kumar ◽  
T. Sofi Sarmash ◽  
D. Jhansi Rani ◽  
L. Obulapathi ◽  
G.V.V. Bhaskara Rao ◽  
...  

2018 ◽  
Vol 20 (8) ◽  
pp. 5636-5643 ◽  
Author(s):  
Christoph Möller ◽  
Hanna Fedderwitz ◽  
Claudine Noguera ◽  
Jacek Goniakowski ◽  
Niklas Nilius

STM and DFT calculations are employed to explore structural phase transitions in thin copper-oxide films grown on Au(111).


2019 ◽  
Vol 6 (5) ◽  
pp. 911-930 ◽  
Author(s):  
Yong Zhang ◽  
Chunrui Ma ◽  
Xiaoli Lu ◽  
Ming Liu

Recent progress in fabricating freestanding single-crystalline functional oxide thin films and their potential in integration with advanced electronics.


RSC Advances ◽  
2020 ◽  
Vol 10 (49) ◽  
pp. 29394-29401
Author(s):  
Chandrasekaran Abinaya ◽  
Kevin Bethke ◽  
Virgil Andrei ◽  
Jonas Baumann ◽  
Beatrix Pollakowski-Herrmann ◽  
...  

This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere.


2008 ◽  
Vol 587-588 ◽  
pp. 343-347 ◽  
Author(s):  
C. Batista ◽  
J. Mendes ◽  
Vasco Teixeira ◽  
Joaquim Carneiro

Vanadium oxides are a class of materials with outstanding physical and chemical properties. They find a wide field of technological applications such as optical and electrical switching devices, light detectors, temperature sensors, micro batteries, etc. There are several studies regarding the production of vanadium oxide films by radio-frequency (RF) magnetron sputtering, and with increasing interest on the thermochromic VO2 phase. However, literature with focus on vanadium oxide films deposited by direct current (DC) magnetron sputtering is very limited. In this work, we have successfully deposited vanadium oxide thin films by reactive DC magnetron sputtering under several processing conditions. The effect of substrate type, temperature, and O2/Ar flow ratio on phase formation has been studied. Structural analysis and phase determination have been carried out by X-ray diffractometry (XRD). Some single phase samples were also analysed with respect to surface morphology by means of scanning electron microscopy (SEM) and atomic force microscopy (AFM). The thermochromic behaviour of single phase VO2(M) films has been evaluated by optical spectrophotometry.


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