Lead Iodide Thin Films Grown Using N.N-Dimethylformamide as Solvent

2007 ◽  
Vol 994 ◽  
Author(s):  
Jose Fernando Condeles ◽  
Ademar Marques Caldeira-Filho ◽  
Marcelo Mulato
Keyword(s):  
Thin Films ◽  
Spray Pyrolysis ◽  
Dark Conductivity ◽  
Medical Systems ◽  
X Ray Diffraction ◽  
Lead Iodide ◽  
Final Thickness ◽  
X Ray ◽  
Deposition Parameters ◽  
X Ray Imaging

AbstractSpray pyrolysis was used for the deposition of lead iodide (PbI2) thin films using N.N-dimethylformamide (DMF) as an alternative solvent under varying deposition parameters. Final thickness of 60 μm was obtained for a total deposition time of 2.5 hours. The films were characterized mainly by using Raman and photoluminescence, but additional techniques such as X-ray diffraction, scanning electron microscopy and dark conductivity as a function of temperature were also employed. Thick PbI2 films deposited by spray pyrolysis using DMF as a solvent are promising to be used in medical systems as X-ray imaging.

Evaluation of an alternative technique for the fabrication of direct detector X-ray imagers: spray pyrolysis of lead iodide and mercury iodide

2004 ◽  
Vol 808 ◽  
Author(s):  
J. F. Condeles ◽  
J. C. Ugucioni ◽  
M. Mulato
Keyword(s):  
Thin Films ◽  
Spray Pyrolysis ◽  
Deposition Process ◽  
Radiation Detectors ◽  
Deposition Technique ◽  
X Ray Diffraction ◽  
Large Area ◽  
Lead Iodide ◽  
X Ray ◽  
Mercury Iodide

ABSTRACTThis work discusses the new use of an old deposition technique: spray pyrolysis. The objective is the deposition of thin films of lead iodide and mercury iodide and their future use as photoconductors in medical X-ray digital imagers. We discuss the main advantages and limitations of the deposition process comparing both materials. The final thin films are structurally investigated using X-ray diffraction and microscopy. The deposition technique seems to be very promising for the future development of large area radiation detectors.

scholarly journals Influence of the growth parameters of TiO2 thin films deposited by the MOCVD method

Cerâmica ◽  
2002 ◽  
Vol 48 (305) ◽  
pp. 38-42 ◽  
Author(s):  
M. I. B. Bernardi ◽  
E. J. H. Lee ◽  
P. N. Lisboa-Filho ◽  
E. R. Leite ◽  
E. Longo ◽  
...  
Keyword(s):  
Thin Films ◽  
Growth Parameters ◽  
Structural Characteristics ◽  
Chemical Vapor ◽  
X Ray Diffraction ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Deposition Parameters

The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.

scholarly journals Shedding Light on Phase Stability and Surface Engineering of Formamidinium Lead Iodide (FaPbI3) Thin Films for Solar Cells

2021 ◽  
Vol 12 (1) ◽  
pp. 1
Author(s):  
Julia Marí-Guaita ◽  
Amal Bouich ◽  
Bernabé Marí
Keyword(s):  
Thin Films ◽  
Surface Engineering ◽  
Optical Analysis ◽  
X Ray Diffraction ◽  
Lead Iodide ◽  
X Ray ◽  
Structure Surface ◽  
Uv Visible ◽  
The Stability ◽  
Humidity Environment

In this work, FAPbI3 thin films with different antisolvents (toluene, diethyl ether and chlorobenzene) were successfully elaborated by the spin coating technique to study the influence of the different antisolvents in the films. The crystal structure, surface morphology and optical properties were characterized by X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM) photoluminescence and UV–visible spectrometry. According to XRD, the crystalline structure of FAPbI3 was found in the orientation of the (110) plane, and it is observed that the type of antisolvent content in the absorber layer plays an important role in the growth and stabilization of the film. Here, chlorobenzene leads to a smooth and homogenous surface, a large grain size and a pinhole-free perovskite film. Additionally, the optical analysis revealed that the band gap is in the range from 1.55 to 1.57 eV. Furthermore, in an approximately 60% humidity environment and after two weeks, the stability and absorption of FaPbI3 showed low degradation.

Influence of deposition parameters on the residual stresses of WC-Wo sputtered thin films

MRS Advances ◽  
2020 ◽  
Vol 5 (23-24) ◽  
pp. 1215-1223
Author(s):  
R.R. Phiri ◽  
O.P. Oladijo ◽  
E.T. Akinlabi
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Residual Stresses ◽  
Substrate Surface ◽  
Tribological Performance ◽  
X Ray Diffraction ◽  
X Ray ◽  
Compressive Stresses ◽  
Deposition Parameters ◽  
Cobalt Thin Films

AbstractControl and manipulation of residual stresses in thin films is a key for attaining coatings with high mechanical and tribological performance. It is therefore imperative to have reliable residual stress measurements methods to further understand the dynamics involved. The sin2ψ method of X-ray diffraction was used to investigate the residual stresses on the tungsten carbide cobalt thin films deposited on a mild steel surface to understand the how the deposition parameters influence the generation of residual stresses within the substrate surface. X-ray spectra of the surface revealed an amorphous phase of the thin film therefore the stress measured was of the substrate surface and the effects of sputtering parameters on residual stress were analysed. Compressive stresses were identified within all samples studied. The results reveal that as the sputtering parameters are varied, the residual stresses also change. Optimum deposition parameters in terms of residual stresses were suggested.

SnO2:F Thin Films with High Fluorine Contents Produced by Spray Pyrolysis at Constant Substrate Temperature

1996 ◽  
Vol 441 ◽  
Author(s):  
D. R. Acosta ◽  
E. Zironi ◽  
W. Estrada ◽  
E. Montoya
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Spray Pyrolysis ◽  
Tin Oxide ◽  
Spray Pyrolysis Technique ◽  
Structural Parameters ◽  
Final Concentration ◽  
X Ray Diffraction ◽  
Electrical And Optical Properties ◽  
X Ray

AbstractFluorine doped tin oxide thin films were prepared from solutions with high fluorine contents using the spray pyrolysis technique; the resulting films were studied by electron and X-ray diffraction methods; the resonant nuclear reaction (RNR) method was used to determine the final concentration of fluorine atoms in our films for different doping levels. Also, electrical and optical properties of SnO2:F films were measured and correlated with deposition and structural parameters obtained from X-Ray diffraction and electron microscopy studies.

Deposition of Nano Fiber ZnO and Zn1-xCdxO Thin Films by a Simple Spray Pyrolysis and Characterizations for Optoelectronic Applications

2012 ◽  
Vol 545 ◽  
pp. 100-104 ◽  
Author(s):  
J. Podder ◽  
M.R Islam
Keyword(s):  
Thin Films ◽  
Spray Pyrolysis ◽  
Optical Band Gap ◽  
Zinc Alloy ◽  
X Ray Diffraction ◽  
Sem Images ◽  
X Ray ◽  
Vis Spectroscopy ◽  
Nano Fiber ◽  
Cadmium Zinc

ZnO and Zn1-xCdxO thin films have been deposited onto glass substrate using spray pyrolysis at 200°C. Cadmium-zinc alloy thin films have been prepared by taking different concentrations of cadmium (Cd). The elemental analysis and the surface morphology of the films were carried by the energy dispersive X-ray (EDX) and scanning electron microscopy (SEM). The EDX data show that the films are highly stoichiometric. The SEM images show that the film changes from nano fiber to grain with the increase of Cd concentrations. The X-ray diffraction pattern shows that the films are polycrystalline in nature. The crystal structure of the films changes from hexagonal-ZnO to cubic-CdO depending on the concentration of Zn and Cd in the Zn1-xCdxO films. The optical properties of these films were studied by UV-VIS spectroscopy. The optical band gap of the films was changed from 3.2 to 2.4 with the variation of cadmium.

X-ray diffraction and compositional studies of AgInS2 thin films obtained by spray pyrolysis

2008 ◽  
Vol 43 (21) ◽  
pp. 6848-6852 ◽  
Author(s):  
M. Calixto-Rodriguez ◽  
A. Tiburcio-Silver ◽  
A. Sanchez-Juarez ◽  
M. E. Calixto
Keyword(s):  
Thin Films ◽  
Spray Pyrolysis ◽  
X Ray Diffraction ◽  
X Ray

scholarly journals Nanocrystalline Hexagonal Shaped CdS Thin Films for Photoconducting Application

2014 ◽  
Vol 36 ◽  
pp. 153-167
Author(s):  
S.M. Patil ◽  
P.H. Pawar
Keyword(s):  
Thin Films ◽  
Cadmium Sulphide ◽  
X Ray Diffraction ◽  
X Ray ◽  
Analytical Technique ◽  
Deposition Parameters ◽  
Cds Thin Films ◽  
Response And Recovery ◽  
Nanocrystalline Thin Films

Nanocrystalline thin films of cadmium sulphide were prepared by chemical bath deposition technique onto glass substrate at 60 °C. The deposition parameters were optimized to obtain good quality of nanocrystalline thin films such as, time, precursor concentration, temperature of deposition and pH of the solution. The studies on crystal structure, composition, surface morphology, electrical conductivity and photoconductivity of the films were carried out by using different analytical technique. Characterization includes X-ray diffraction (XRD), Field emission scanning electron microscopy (FE-SEM), Energy dispersive X-ray analysis (EDAX), Electrical and photoconductivity. The response and recovery time of the thin film were measured and presented.

scholarly journals Lead potassium niobate thin films grown by Pulsed Laser Deposition

2016 ◽  
Vol vol1 (1) ◽  
Author(s):  
Billal Allouche ◽  
Yaovi Gagou ◽  
M. El Marssi
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Potassium Niobate ◽  
X Ray Diffraction ◽  
X Ray ◽  
Deposition Parameters ◽  
Out Of Plane

By pulsed laser deposition, lead potassium niobate Pb2KNb5O15 was grown on (001) oriented Gd3Ga5O12 substrate using a platinum buffer layer. The PKN thin films were characterized by X-Ray diffraction and Scanning Electron Microscopy (SEM). The dependence of their structural properties as a function of the deposition parameters was studied. It has been found that the out of plane orientation of PKN film depends on the oxygen pressure used during the growth. Indeed, PKN thin film is oriented [001] for low pressure and is oriented [530] for high pressure. For these two orientations, the crystalline quality of PKN film was determined using omega scans.

Effect of Deposition Time on Structural and Optical Properties of ZnO Thin Films Deposited by Spray Pyrolysis

2019 ◽  
Vol 397 ◽  
pp. 81-87 ◽  
Author(s):  
Farid Khediri ◽  
Abdelkader Hafdallah ◽  
Mouna Bouhelal
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Spray Pyrolysis ◽  
Deposition Time ◽  
Spray Pyrolysis Technique ◽  
Precursor Solution ◽  
Zno Thin Films ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
X Ray

In this work Zinc oxide thin films prepared by spray pyrolysis technique. A set of ZnO thin films were deposited with various deposition times, on glass substrate at 350 °C. The precursor solution is formed with zinc acetate in distilled methanol with 0.1 molarity. The deposition time was ranged from 2 to 8 min. The structural and optical properties of those films were examined by X-ray diffraction (XRD) and ultraviolet-visible spectrometer (UV). X-ray diffraction patterns of the ZnO thin films showed polycrystalline hexagonal wurtzite structure and the preferred orientation was along (002) plane when the grain size varied between 9.66 and 16.67nm. ZnO thin films were highly transparent in the visible with the maximum transmittance of 85% and the optical band gap was found between 3.25 and 3.28 eV.

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