Strained Linbo3/Sapphire Heterostructures Grown by Pulsed Laser Deposition

1995 ◽  
Vol 397 ◽  
Author(s):  
Yoshihiko Shibata ◽  
Naohiro Kuze ◽  
Masahiro Matsui ◽  
Masaki Kanai ◽  
Tomoji Kawai

ABSTRACTThin LiNbO3 films are deposited on (001) sapphire substrates by Ar F pulsed laser ablation. The films are evaluated by X-ray diffraction analysis at various temperatures, as well as high-resolution transmission electron microscopy (TEM). The deposited films are highly epitaxial but that are strained, that is, the a-axis is longer and the c-axis is shorter than those of LiNbO3 single crystals. X-ray diffraction analysis at deposition temperature, as well as TEM show that the strain is caused by the difference in thermal expansion coefficients between LiNbO3 and sapphire substrates.

1993 ◽  
Vol 8 (4) ◽  
pp. 890-898 ◽  
Author(s):  
Moo-Chin Wang ◽  
Min-Hsiung Hon

The addition of CaO to Li2O–Al2O3–SiO2–TiO2(LAST), forming the Li2O–CaO–Al2O3–SiO2–TiO2(LCAST) system, is used in the preparation of low themal expansion coefficient glass-ceramics. By a progressive weight percent substitution of CaO for SiO2, at constant ratios of concentration of Li2O, Al2O3, and TiO2, a number of properties of these glasses have been studied. The results indicated that these thermal properties increased progressively with increasing CaO concentration. X-ray diffraction analysis was utilized to identify the crystalline phase in glass-ceramics of the Li2O–CaO–Al2O3–SiO2-TiO2system. Thed-spacings of the major crystallites were precisely measured and fitted with those of β-spodumene. The minor crystalline phase of titanite, CaO · TiO2· SiO2, was also present. The average thermal expansion coefficients from 25 to 700 °C were 3.50 × 10−6/°C, 3.81 × 10−6/°C, and 3.91 × 10−6/°C for samples A, B, and C, respectively.


2002 ◽  
Vol 16 (27) ◽  
pp. 1049-1059 ◽  
Author(s):  
X. M. CHEN ◽  
Y. WANG ◽  
C. X. LIU ◽  
Y. N. ZHAO ◽  
M. LI ◽  
...  

La 0.5 Ca 0.5 MnO 3 (LCMO) thin films grown by pulsed laser deposition (PLD) and annealed at different temperatures were investigated by high angle X-ray diffraction, atomic force microscope (AFM), scanning electron microscope (SEM), and energy dispersive spectroscopy (SEM-EDS). The lattice parameters, surface morphology as well as the metal compositions of the films were obtained. It was found that the surface morphology of the films strongly depends on the annealing temperatures. The difference of the thermal expansion coefficients between the film and the substrate plays an important role in determining the morphology of the film surface. It induces an in-plane compressive stress in the LCMO films. The strains in the film can be relaxed by nanoscale grains and cracks.


2008 ◽  
Vol 373-374 ◽  
pp. 726-729
Author(s):  
Li Ge Wang ◽  
Guo Qing Li ◽  
Yuan Rong Hu ◽  
Wei Gou ◽  
Meng Shi

WO3 and Ti-doped WO3 electrochromic films were prepared by mid-frequency dual-target magnetron sputtering method. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), transmission electron microscope (TEM) and spectrophotometer were used to characterize the structure, morphology, composition and transmittance properties of the films, respectively. The results show that this method is available to deposit WO3 and Ti-doped WO3 electrochromic films. The as-deposited films prepared at room temperature are amorphous and display good transmittance. The difference value of transmittance between the bleached and coloration states of WO3 film is above 60% at 633nm. Ti-doped WO3 films have smoother surface and smaller grains than undoped ones. Moreover, the crystalline temperature increases after doping titanium, because the titanium atoms influence the lattice distortion of the WO3 films. So it is more convenient for Li+ ions to inject into films and can enhance the response speed and stability of Ti-doped WO3 electrochromic films.


2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Mikolaj Grabowski ◽  
Ewa Grzanka ◽  
Szymon Grzanka ◽  
Artur Lachowski ◽  
Julita Smalc-Koziorowska ◽  
...  

AbstractThe aim of this paper is to give an experimental evidence that point defects (most probably gallium vacancies) induce decomposition of InGaN quantum wells (QWs) at high temperatures. In the experiment performed, we implanted GaN:Si/sapphire substrates with helium ions in order to introduce a high density of point defects. Then, we grew InGaN QWs on such substrates at temperature of 730 °C, what caused elimination of most (but not all) of the implantation-induced point defects expanding the crystal lattice. The InGaN QWs were almost identical to those grown on unimplanted GaN substrates. In the next step of the experiment, we annealed samples grown on unimplanted and implanted GaN at temperatures of 900 °C, 920 °C and 940 °C for half an hour. The samples were examined using Photoluminescence, X-ray Diffraction and Transmission Electron Microscopy. We found out that the decomposition of InGaN QWs started at lower temperatures for the samples grown on the implanted GaN substrates what provides a strong experimental support that point defects play important role in InGaN decomposition at high temperatures.


Materials ◽  
2021 ◽  
Vol 14 (12) ◽  
pp. 3191
Author(s):  
Arun Kumar Mukhopadhyay ◽  
Avishek Roy ◽  
Gourab Bhattacharjee ◽  
Sadhan Chandra Das ◽  
Abhijit Majumdar ◽  
...  

We report the surface stoichiometry of Tix-CuyNz thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu3N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti3CuN phase.


1996 ◽  
Vol 449 ◽  
Author(s):  
P. Kung ◽  
A. Saxler ◽  
D. Walker ◽  
X. Zhang ◽  
R. Lavado ◽  
...  

ABSTRACTWe present the metalorganic chemical vapor deposition growth, n-type and p-type doping and characterization of AlxGa1-xN alloys on sapphire substrates. We report the fabrication of Bragg reflectors and the demonstration of two dimensional electron gas structures using AlxGa1-xN high quality films. We report the structural characterization of the AlxGa1-xN / GaN multilayer structures and superlattices through X-ray diffraction and transmission electron microscopy. A density of screw and mixed threading dislocations as low as 107 cm-2 was estimated in AlxGa1-xN / GaN structures. The realization of AlxGa1-xN based UV photodetectors with tailored cut-off wavelengths from 365 to 200 nm are presented.


1990 ◽  
Vol 68 (8) ◽  
pp. 1352-1356 ◽  
Author(s):  
Walter Abriel ◽  
André Du Bois ◽  
Marek Zakrzewski ◽  
Mary Anne White

The crystal structure of the title compound has been determined by single crystal X-ray diffraction data collected at 293 K, and refined to a final Rw of 0.057. The crystals are rhombohedral, space group [Formula: see text], with a = 27.134(8) Å, c = 10.933(2) Å, and Z = 18. The mole ratio of Dianin's compound (4-p-hydroxyphenyl-2,2,4-trimethylchroman) to CCl4 is 6:1. The guest molecules are disordered. X-ray powder diffraction was carried out in the temperature range from 10 to 300 K. From this, the thermal expansion coefficients for the a- and c-axes and the volume have been determined. Keywords: thermal expansion, crystal structure, clathrate.


2008 ◽  
Vol 368-372 ◽  
pp. 1665-1667
Author(s):  
M.M. Wu ◽  
X.L. Xiao ◽  
Y.Z. Cheng ◽  
J. Peng ◽  
D.F. Chen ◽  
...  

A new series of solid solutions Dy2-xGdxMo4O15 (x = 0.0-0.9) were prepared. These compounds all crystallize in monoclinic structure with space group P21/c. The lattice parameters a, b, c and unit cell volumes V increase almost linearly with increasing gadolinium content. The intrinsic thermal expansion coefficients of Dy2-xGdxMo4O15 (x = 0.0 and 0.25) were obtained in the temperature range of 25 to 500°C with high-temperature X-ray diffraction. The correlation between thermal expansion and crystal structure was discussed.


2005 ◽  
Vol 38 (6) ◽  
pp. 1038-1039 ◽  
Author(s):  
Robert Hammond ◽  
Klimentina Pencheva ◽  
Kevin J. Roberts ◽  
Patricia Mougin ◽  
Derek Wilkinson

Variable-temperature high-resolution capillary-mode powder X-ray diffraction is used to assess changes in unit-cell dimensions as a function of temperature over the range 188–328 K. No evidence was found for any polymorphic transformations over this temperature range and thermal expansion coefficients for urea were found to be αa= (5.27 ± 0.26) × 10−5 K−1and αc= (1.14 ± 0.057) × 10−5 K−1.


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